纳米Al2O3及PTFE的加入对镀层性能的影响

在化学镀Ni-P合金镀液中添加纳米Al2O3及PTFE制得Ni-P/PTFE-Al2O3复合镀层.研究了纳米Al2O3及PTFE的添加量对镀层硬度、磨损及减摩性能的影响.结果表明:纳米Al2O3及PTFE的加入能提高Ni-P合金镀层的硬度、耐磨及减摩性.     

MoS2含量对聚酰亚胺复合膜摩擦性能的影响

为降低PI膜的摩擦系数,在PI中加入不同质量比例的MoS2作为减摩相制备复合润滑膜.考察不同MoS2含量复合膜的机械性能和摩擦性能,研究复合膜表面Mo元素分布.结果显示加入量为30%的MoS2在复合膜表面富集,且分布较为均匀,在此配比下的复合膜能够在保证机械性能的基础上有效降低摩擦系数,随载荷的增加,摩擦系数稳定.     

热浸镀锌合金的研究现状以及发展趋势

热浸镀锌液中添加合金元素,将对镀层厚度、显微组织、耐蚀性和外观质量等产生重要的影响.本文重点介绍了含有Ni、Mg、Ti、Mn、Bi 5种合金镀层技术,探讨了这几种合金元素对热浸镀层组织、性能的影响,并展望了其发展趋势.     

二硫化钼填充聚酰亚胺复合材料的摩擦学性能

利用MM-200型摩擦磨损试验机,对不同体积含量MoS2填充聚酰亚胺（PI）复合材料在干摩擦条件下与GCr15轴承钢对摩时的摩擦磨损性能进行了研究,并利用扫描电子显微镜对PI复合材料及其偶件的磨损表面进行了分析。研究发现,添加MoS2可有效降低PI复合材料的摩擦系数,且PI复合材料的摩擦系数随MoS2含量的增大而减小。除PI＋10％MoS2外,其它含量MoS2填充PI复合材料的耐磨性能均明显优于纯PI材料,但当MoS2的含量超过30％后,PI复合材料的磨损率基本不随MoS2含量变化。在较高的载荷条件下,MoS2填充PI复合材料均呈现出良好的减摩耐磨性能。     

合金元素(Ti,Cr,Ni)对IBAD制备的碳膜性质的影响

本文采用离子束辅助沉积技术（IBAD）制备一系列碳膜，重点分析添加合金元素（Ti，Cr，Ni）对薄膜性质的影响。实验结果表明：添加Ti，Cr，Ni元素对碳膜厚度，硬度无明显影响，但提高了薄膜的结合强度，其中加入Ni后，薄膜的结合强度最好；添加合金元素可以显著减小碳膜的摩擦系数；添加Ti元素碳膜的组织以非晶态为主，与纯碳膜相当。相对于类金刚石薄膜，本实验制备的碳膜试样更接近于类石墨膜。     

分步法制备MoS2/Ti3SiC2层状复合材料

研究了采用分步法制备MoS2/Ti3SiC2层状复合材料的工艺,其制备过程分2步进行.首先制备Ti3SiC2高纯粉,再在1 400℃,30 MPa条件下热压烧结制备MoS2/Ti3SiC2层状复合材料.其MoS2含量分别为2%,4%,6%,8%(w/%).用XRD分析比较4种不同MoS2含量的烧结试样的相组成,并测试维氏硬度和电导率.实验结果表明,当MoS2含量为4%时,MoS2/Ti3SiC2烧结试样的硬度达到7.83 GPa,且电导率达到10.05×106 S·m-1.MoS2含量再增加时,烧结试样的硬度有所增大,但电导率有所下降.     

钛合金表面Ni-P-PTFE自润滑复合镀层的制备及其摩擦磨损性能

为提高钛合金零部件的使用寿命,以传统的化学镀Ni-P合金工艺为基础,通过添加PTFE粒子使其均匀分布在Ni-P合金镀层中,在钛合金基体上制备了具有耐磨、减摩性能的自润滑复合镀层;分析了PTFE乳液浓度、表面活性剂浓度等参数对复合镀层中PTFE微粒子含量的影响规律;采用SEM、EDS和XRD等手段对复合镀层的微观形貌、相结构和成分进行了分析;研究了不同PTFE含量复合镀层及钛合金基体在相同载荷下的摩擦磨损性能。结果表明:Ni-P-PTFE复合镀层具有良好的减摩耐磨性能,当膜层中PTFE微粒子的含量为20.4%(体积分数)时,钛合金表面的摩擦系数降至0.2左右,而磨损量也显著减小。     

铅锡合金镀层的润滑减摩性能研究

减摩涂层是降低航空发动机零件磨损的有效手段之一,为此,制备了铅锡合金镀层,并通过摩擦磨损仪、盐雾试验、金相显微观察和镀层结合力测试等手段,对所研究的铅锡合金减摩镀层与几种常用航空润滑减摩镀层的摩擦磨损性能进行了对比研究.结果表明,铅锡合金减摩镀层比常用的铅镀层、铅铟镀层、银镀层等具有更小的磨损量和更低的摩擦系数,结合强度和耐蚀性能也较好,是一种综合性能优良的润滑减摩镀层.     

Ni-P-SiC-MoS2化学复合镀层的组织结构及耐磨性能

在Ni-P化学镀液中添加第二相粒子可提高镀层性能,但目前已有的此类研究中镀层性能还不甚理想。在35CrNi钢基体上沉积了Ni-P-SiC-MoS2复合镀层,借助扫描电镜(SEM)、能谱仪、显微硬度计、磨损试验机等分析了复合镀层的表面形貌、成分、硬度及耐磨性。结果表明:Ni-P-SiC-MoS2镀层为非晶态结构;镀层硬度随SiC和MoS2混合微粒含量的增加而增加,随热处理温度的升高先升后略降;添加SiC和MoS2的混合微粒6g/L的镀层摩擦磨损性能最好。     

纳米SiC-MoS2/Ni基复合电刷镀层组织与耐磨性能

通过对纳米SiC颗粒进行表面修饰处理,采用电刷镀技术制备纳米SiC-MoS2/Ni基复合刷镀层,分析探讨了纳米SiC和MoS2的含量对镀层形貌和耐磨性能的影响。结果表明,镀液中加入经表面修饰的纳米SiC颗粒可以提高镀层硬度,同时在干滑动磨损试验条件下,纳米SiC-MoS2复合刷镀层具有良好的耐磨减摩性能。     

磁控溅射MoS2/WS2复合薄膜的工艺与摩擦学性能研究

采用MoS2/WS2复合靶材在不锈钢和硅基片上溅射MoS2/WS2纳米薄膜,通过多次实验,得到溅射MoS2/WS2薄膜的最佳工艺如下:溅射气压4.0Pa,靶基距为70mm,溅射功率为150W,溅射时间为3h.使用X-射线衍射仪,能谱仪,扫描电子显微镜对薄膜的成分和结构进行分析.采用HH-3000薄膜结合强度划痕试验仪,纳米压痕测试系统,UNT-3摩擦磨损试验机对薄膜进行机械性能和摩擦磨损性能分析,结果表明:在大气环境中,WS2/MoS2 复合薄膜摩擦性能要优于纯MoS2薄膜.     

Influence of Deposition Conditions on the Crystal Structure of MoS2 Coating

MoS2 coatings were prepared using an unbalanced bipolar pulsed DC （direct current） magnetron sputtering apparatus under different targets, cathode current densities, power modes and bias voltages. The morphology, structure and growth characteristics of MoS2 coatings were observed and identified respectively by scanning electron microscopy, X-ray diffractometry and mass spectrometry. The results show that MoS2 coatings evolve with the （002） basal plane parallel to the surface by using cold pressed target with lower density, lower cathodic current density, bipolar pulse DC power and minus bias voltage, whereas the coatings deposited under hot pressed target, higher cathodic current density, simple DC power and positive bias voltage have the （002） basal plane perpendicular to the surface. The influence of deposition conditions on the crystal structure of MoS2 coating is implemented by altering its growth rate and the energy of sputtering-deposition particles.     

Structure and mechanical properties of DC magnetron sputtered TiC/Cu films

TiC/Cu nanocomposite films with various copper content were deposited by DC unbalanced magnetron sputtering from sintered TiC target fixed by Cu rings of different inner diameters in pure argon. This makes it possible to prepare TiC/Cu films with Cu content ranging from approximately 5 to 85 at% Cu. The structure (XRD, Raman, SEM) and mechanical properties were examined as a function of deposition parameters and Cu content in the film. Special attention is devoted to the total internal stress, parameters determining its magnitude and their correlation with mechanical properties. The TiC/Cu system is compared with similar nitride MeN_x/Cu(Ni) (Me=Ti, Zr) systems and an explanation of the different behavior of nitride and carbide systems is proposed.     

非晶态Ti—B—N薄膜的制备及晶化研究

采用双靶轮流溅射技术，以Ｔｉ和六方氮化硼反应合成了Ｔｉ－Ｂ－Ｎ薄膜，并采用ＸＲＤ，ＴＥＭ和显微硬度计研究薄膜的微结构及其力学性能。结果表明，镀态Ｔｉ－Ｂ－Ｎ薄膜为非晶体Ｔｉ（Ｎ，Ｂ）化合物，其硬度达到ＨＫ２４７０；薄膜经过热处理晶化形成ＴｉＮ结构类型的Ｔｉ（Ｎ，Ｂ）晶体，硬度略有降低。     

工业纯铁等离子体氮化及Ti/TiN多层薄膜沉积复合处理研究

为改善工业纯铁的耐磨抗腐蚀性能,本文采用低偏压高频等离子浸没离子注入及氮化技术(HLPⅢ)对工业纯铁进行表面改性,然后利用非平衡磁控溅射技术(UBMS)在低压高频等离子浸没离子注入及氮化处理样品表面制备Ti/TiN多层膜.研究发现,工业纯铁在3.5kV脉冲电压(频率15.15kHz,占空比25%)下等离子注入及氮化3h后,表面形成了深度达4μm的氮化层,其相结构以ε-Fe_3N和γ-Fe_4N结构为主.等离子氮化及Ti/TiN多层薄膜沉积复合处理后,工业纯铁的硬度、耐磨损性能以及抗腐蚀性能均得到大大提高,等离子注入及氮化形成的氮化层有利于提高Ti/TiN多层薄膜与工业纯铁基体之间的结合力和耐磨性.     

无机填料增强聚苯酯/聚四氟乙烯复合材料的力学和摩擦磨损性能

采用石墨/ 二硫化钼填充改性聚苯酯/ 聚四氟乙烯复合材料, 研究了复合材料的力学性能和摩擦磨损性能。研究表明, 石墨和MoS₂ 的加入不仅能够很好地改善Ekonol/ PTFE 复合材料的力学性能, 使复合材料的拉伸强度、弯曲强度和硬度均有所提高, 而且还使Ekonol/ PTFE 复合材料的摩擦系数增加, 磨损体积减小, 耐磨性能显著提高。当Ekonol 含量为5 % , 石墨/ 二硫化钼总含量为8 %时, 拉伸强度、弯曲强度分别提高了31 %和41 % ,硬度值约提高了713 %。SEM 分析表明, Ekonol/ 石墨/ MoS₂ / PTFE 复合材料的磨损主要以粘着磨损为主。      

Deposition of TiN films on Co–Cr for improving mechanical properties and biocompatibility using reactive DC sputtering

This study reports the deposition of TiN films on Co–Cr substrates to improve the substrates’ mechanical properties and biological properties. In particular, the argon to nitrogen (Ar:N₂) gas flow ratio was adjusted to control the microstructure of the TiN films. A Ti interlayer was also used to enhance the adhesion strength between the Co–Cr substrate and TiN films. A series of TiN films, which are denoted as TiN-(Ar/N₂)1:1, Ti/TiN-(Ar/N₂)1:1, and Ti/TiN-(Ar:N₂)1:3, were deposited by reactive DC sputtering. All the deposited TiN films showed a dense, columnar structure with a preferential orientation of the (200) plane. These TiN films increased the mechanical properties of Co–Cr, such as the critical load during scratch testing, hardness, elastic modulus and plastic resistance. In addition, the biological properties of the Co–Cr substrates, i.e. initial attachment, proliferation, and cellular differentiation of the MC3T3-E1 cells, were improved considerably by deposition of the TiN films. These results suggest that TiN films would effectively enhance both the mechanical properties and biocompatibility of biomedical Co–Cr alloys.     

TiAlSiN-Ti(Mo)N/MoS2复合涂层微观结构及摩擦学性能的研究

采用磁控溅射技术在AISI-304不锈钢上制备了TiAlSiN-Ti(Mo)N/MoS2复合涂层。采用电子显微镜(SEM)、X射线衍射仪(XRD)、显微硬度计、球盘摩擦磨损试验机、表面形貌仪等对涂层的表面形貌、显微组织、硬度和摩擦学性能进行了系统的研究。结果表明TiAlSiN-Ti(Mo)N/MoS2复合涂层的硬度为27.56 GPa,相比于TiAlSiN涂层的硬度(29.1 GPa)有所下降,但是涂层的耐磨性能得到明显提高。在室温至600℃条件下TiAlSiN-Ti(Mo)N/MoS2复合涂层的主要磨损机理为黏着磨损,200和400℃时的磨损率分别为0.0339×10^-3和0.1122×10^-3mm^3/(Nm),相较于TiAlSiN涂层分别降低了38%和57%,600℃时的磨损率接近TiAlSiN涂层。总体来说TiAlSiN-Ti(Mo)N/MoS2复合涂层的性能高于单一的TiAlSiN涂层。     

RF sputtered piezoelectric zinc oxide thin film for transducer applications

This paper demonstrates the substrate dependency of the c-axis zinc oxide growth in radio-frequency sputtering system. Different deposition conditions were designed to study the influences of Si, SiO₂/Si, Au/Ti/Si, and Au/Ti/SiO₂/Si substrates on the piezoelectric and crystalline qualities of the ZnO thin films. Experimental results showed that the multilayer of Au/Ti/SiO₂/Si-coated silicon substrate provided a surface that facilitated the growth of ZnO thin film with the most preferred crystalline orientation. The 1.5 μm-thick thermally grown amorphous silicon dioxide layer effectively masked the crystalline surface of the silicon substrate, thus allowing the depositions of high-quality 20 nm-thick titanium adhesion layer followed by 150 nm-thick of gold thin film. The gold-coated surface allowed deposition of highly columnar ZnO polycrystalline structures. It was also demonstrated that by lowering the deposition rate at the start of sputtering by lowering RF power to less than one-third of the targeted RF power, a fine ZnO seed layer could be created for subsequent higher-rate deposition. This two-step deposition method resulted in substantially enhanced ZnO film quality compared to single-step approach. The influence of stress relaxation by annealing was also investigated and was found to be effective in releasing most of the residual stress in this layered structure.