功率二极管反向恢复特性模拟研究

针对功率二极管反向恢复既快又软的开关特性要求,根据Rajapakse．二极管反向恢复模型,模拟二极管反向恢复I-t、V-t变化规律,模拟结果与已有文献结果吻合,通过控制变量得到不同存储时间trra、恢复时间trrb、正向电流If、正向电流上升速率dIf/dt对反向恢复电流的影响,模拟结果表明：trra,trrb跟二极管反向恢复过程密切相关。文中最后分析计算了不同电压,不同电流下二极管反向恢复过程中的功率损耗。     

关于缩短大电流开关二极管反向恢复时间的研究

通过长期的工作实践，阐述了适当条件下的金扩散对缩短反向恢复时间，提高二极管2CK28开关速度，满足了反向恢复时间，改善了二极管的反向特性。     

TR-Ⅱ反向恢复时间测试仪

反向恢复时间是电视机用二极管的重要参数,按部标规定,它是被测二极管正向导通时,突然加上反向电压的最大值。用示波器观察其反向电流,从最大恢复到其10％这段时间,定为反向恢复时间。由于用示波器观察速度较慢,目前国内电视机生产厂元器件的认定及筛选所用的仪器都是用表头直读,取其有效值,精度不高,稳定性较差。若两只二极管测试波形不同,如图1,但T_r(恢复时间)相     

理解功率MOSFET体二极管反向恢复特性

半桥、全桥和LLC的电源系统以及电机控制系统的主功率MOSFET、同步Buck变换器的续流开关管、以及次级同步整流开关管,其体内寄生的二极管都会经历反向电流恢复的过程。功率MOSFET的体二极管的反向恢复性能和快恢复二极管及肖特基二极管相比,其反向恢复速度要低很多,反向恢复电荷也要大很多,因此反向恢复的特性较差。这样,导致二极管的开关损耗增加,降低系统的效率,同时,也会产生较高的振铃,影响功率MOSFET的安全工作。功率MOSFET数据表中,通常给出了一定条件下的Qrr和反向恢复的时间,并没有给出和实际应用相关     

两种新结构SiGe/Si功率二极管特性模拟

提出了在 n- 区中采用掺杂浓度三层渐变式结构 Si Ge/Si功率二极管及台面结构的 Si Ge/Si功率二极管。由 Medici模拟所得的特性表明 ,在采用 n- 区渐变掺杂结构的 p+ ( Si Ge) -n- -n+ 功率二极管中 ,在正向特性基本不发生变化的前提下 ,与 n-区固定掺杂结构相比反向恢复过程加快 ,二极管下降时间 t A 缩短近 1 /2 ;在采用台面结构的 p+ ( Si Gi) -n- -n+功率二极管中 ,反向恢复特性也有明显改进 ,电流反向恢复时间缩短近 1 /3 ,而电压反向恢复时间缩短近 1 /2。     

电力系统用高电压快速恢复二极管坚固性优化北大核心

高压快恢复二极管芯片过渡区是反向恢复坚固性的薄弱点,一旦失效将影响电力装置稳定运行。提出了一种高阻型过渡区优化结构,通过建立三种模拟模型,研究了过渡区宽度和掺杂浓度对快恢复二极管反向恢复性能的影响。采用高阻型过渡区结构的快恢复二极管反向恢复安全工作区仿真极限值提高到电压为2900 V、电流为630 A、电流变化率为1600 A/μs。基于该设计制备的3300 V/1500 A FRD器件可通过电压为3200 V、电流为3000 A、电流变化率为8648 A/μs条件下的反向恢复测试,显著提高了FRD器件的反向恢复坚固性。     

测试二极管反向恢复特性的分析仪

测试二极管的反向恢复特性一般都需要复杂的测试设备.必须能够建立正向导通条件、正向闭锁状态、及两者间的过渡.     

铂扩散快恢复二极管特性的研究

描述了用直拉单晶(CZ)硅片采取铂液态源扩散的方法控制少子寿命,以达到减小快恢复二极管的反向恢复时间的目的.通过一系列的实验对铂扩散二极管的特性进行研究,分析了铂扩散二极管的反向恢复时间TRR、正向压降VF以及漏电流IR等参数之间的关系,并分析了反向恢复时间TRR的温度特性.得到TRR与VF之间的理想折衷:TRR为80～500 ns,VF控制在0.9～1.3 V.不但使TRR与VF的折衷有了较大的改善,而且在材料上采用了成本较低的直拉单晶硅片代替成本较高的外延片.分析了铂扩散温度和时间对反向恢复时间TRR和正向压降VF的影响,理论上解释了各主要参数之间相互影响的原因.     

一种新型n-区多层渐变掺杂SiGe/Si功率开关二极管

n^-区掺杂浓度采用多层渐变式结构的p^ (SiC．e)-n^--n^ 异质结功率二极管。对该新结构的反向恢复特性及正反向I-V特性进行了模拟,从器件运行机理上对模拟结果做出了详细的分析。与n^-区固定掺杂的普通p^ (SiGe)-n^--n^ 二极管相比。在正向压降基本不发生变化的前提下,渐变掺杂后的器件反向恢复时间可缩短一半,反向峰值电流能降低33％,反向恢复软度因子可提高1．5倍。并且,随着n^-区渐变掺杂的层数增多,反向恢复特性越好。     

温度对SiGe/Si异质结功率二极管电学特性的影响(英文)

在考虑到各种物理机制如载流子-载流子散射、俄歇复合、禁带窄化效应及结温效应等的基础上,数值模拟分析了SiGe/Si功率开关二极管的各种温度依赖特性。对Si和SiGe/Si功率二极管而言,温度对器件的正向压降VF、反向击穿电压VB以及反向漏电流JR的影响规律基本相似,即随着温度的升高,正向压降降低,击穿电压增加,反向漏电流迅速提高。然而在相同的温度下,与Si功率开关二极管相比,SiGe/Si二极管(20%Ge含量)的正向压降降低了近0.1V(在正向电流密度10A/cm2的情况下),反向恢复时间缩短了一半以上,反向峰值电流密度也下降了约三分之一,软度因子S提高了2倍多。SiGe二极管的另外一个重要优点是其反向恢复特性受温度影响很小。当温度从300K增加到400K时,Si功率二极管的反向恢复时间增加了近1倍,而SiGe/Si二极管(20%Ge含量)的反向恢复时间基本保持不变。SiGe/Si功率开关二极管的一个缺点是在高温下产生较大的漏电流,但这可以通过适当降低Ge含量来改善。Ge的引入为器件设计提供了更大的自由度,其含量对器件特性有重要影响。为了获得低的正向压降和短的反向恢复时间,应该提高Ge的含量,但Ge含量增加将导致大的漏电流,因此Ge含量的大小应该优化折衷考虑。     

Dynamics of reverse recovery of high-power P-i-N diodes

The reverse recovery of high-power P-i-N diodes is studied under resistive (step recovery) and inductive (ramp recovery) switching conditions. It is shown that, under resistive switching, the reverse recovery characteristics of P-i-N diodes depend significantly on whether it is turned off during the turn-on transients (forward recovery) or whether it is turned off when the diode has reached a steady forward conducting state. It is pointed out that, under inductive switching, the voltage across the diode becomes negative even when the current in the diode is still, ramping down in the reverse direction. It is also shown that the ramp recovery characteristics of P-i-N diodes depend quite significantly on the circuit operating conditions and the reverse recovery characteristics can be different even if the current that the diode turns-off and the rate at which the diode current ramps down are the same. Finally, a novel test circuit is proposed and employed to carry out accurate reverse recovery measurements of high-power P-i-N diodes under resistive switching     

高压功率快恢复二极管的寿命控制研究

利用质子辐照感生的空位缺陷对铂原子的汲取作用,获得了局域寿命控制,辅以能量为4MeV电子辐照整体寿命控制技术,在具有低阳极发射效率结构的高压功率快恢复二极管中实现了更好的综合性能的优化。测试结果表明,此类快恢复二极管具有反向恢复时间短、软度大、反向漏电低的优良特性,在国际上处于领先水平。     

超结硅锗功率二极管电学特性的研究

超结SiGe功率开关二极管可以克服常规Si功率二极管存在的一些缺陷,如阻断电压增大的同时,正向导通压降也将增大,反向恢复时间也变长。该新型功率二极管有两个重要特点:一是由轻掺杂的p型柱和n型柱相互交替形成超结结构,代替传统功率二极管的n-基区;二是p+区采用很薄的应变SiGe材料。该器件可以同时实现高阻断电压、低正向压降和快速恢复的电学特性。与相同器件厚度的常规Si功率二极管相比较,反向阻断电压提高了42%,反向恢复时间缩短了40%,正向压降减小了约0.1V(正向电流密度为100A/cm2时)。应变SiGe层中Ge含量和器件的基区厚度是影响超结SiGe二极管电学特性的重要参数,详细分析了该材料参数和结构参数对正向导通特性、反向阻断特性和反向恢复特性的影响,为器件结构设计提供了实用的参考价值。     

MPS二极管的少子特性仿真

混合pin/肖特基(MPS)二极管是广泛应用于电子电路中的快恢复功率器件,具有高击穿电压、快速开关和正向电流大等特性。对MPS二极管漂移区的少数载流子的特性进行了仿真分析。仿真结果表明,MPS二极管的p^+区向漂移区注入的少数载流子浓度随外加正向电压和pn结面积占元胞总面积比例的增大而增大。虽然漂移区的少数载流子改变了MPS二极管的工作模式,增大了电流,但是存储在漂移区的少数载流子增大了反向峰值电流和恢复时间,进而增大了功耗并降低了关断速度。折中考虑正向电流和反向恢复特性,可获得具有正向电流大、反向峰值电流小和反向恢复时间短的MPS二极管。     

Asymmetric anode and cathode extraction structure fast recovery diode

This paper presents an asymmetric anode structure and cathode extraction fast and soft recovery diode.The device anode is partial-heavily doped and partial-lightly doped.The P+ region is introduced into the cathode.Firstly,the characteristics of the diode are simulated and analyzed.Secondly,the diode was fabricated and its characteristics were tested.The experimental results are in good agreement with the simulation results.The results show that,compared with the P-i-N diode,although the forward conduction characteristic of the diode is declined,the reverse recovery peak current is reduced by 47％,the reverse recovery time is shortened by 20％ and the softness factor is doubled.In addition,the breakdown voltage is increased by 10％.     

3300V碳化硅肖特基二极管及混合功率模块研制

基于数值仿真结果,采用结势垒肖特基(JBS)结构和多重场限环终端结构实现了3 300 V/50 A 4H-SiC肖特基二极管(SBD),所用4H-SiC外延材料厚度为35 μm、n型掺杂浓度为2× 1015cm-3.二极管芯片面积为49 mm2,正向电压2.2V下电流达到50 A,比导通电阻13.7 mΩ· cm2;反偏条件下器件的雪崩击穿电压为4 600 V.基于这种3 300 V/50 A 4H-SiC肖特基二极管,研制出3 300 V/600 A混合功率模块,该模块包含24只3 300 V/50 A Si IGBT与12只3 300 V/50 A 4H-SiC肖特基二极管,SiC肖特基二极管为模块的续流二极管.模块的动态测试结果为:反向恢复峰值电流为33.75 A,反向恢复电荷为0.807 μC,反向恢复时间为41 ns.与传统的Si基IGBT模块相比,该混合功率模块显著降低了器件开关过程中的能量损耗.     

Improving the reverse recovery of power mosfet integral diodes by electron irradiation

This paper demonstrates that controlled electron irradiation of silicon power MOSFET devices can be used significantly improve the reverse recovery characteristics of their integral reverse conducting diodes without adversely affecting the MOSFET characteristics. By using 3 MeV electron irradiation at room temperature it was found that the reverse recovery charge in the integral diode could be continuously reduced in a well controlled manner from over 500 nC to less than 100 nC without any significant increase in the forward voltage drop of the integral diode under typical operating peak currents. The reverse recovery time was also observed to decrease from 3 microseconds to less than 200 nsec when the radiation dose was increased from 0 to 16 Megarads. The damage produced in gate oxide of the MOSFET due to the electron radiation damage was found to cause an undersirable decrease in the gate threshold voltage. This resulted in excessive channel leakage current flow in the MOSFET at zero gate bias. It was found that this channel leakage current was substantially reduced by annealling the devices at 140°C without influencing the integral diode reverse recovery speed. Thus, the electron irradiation technique was found to be effective in controlling the integral diode reverse recovery characteristics without any degradation of the power MOSFET characteristics.     

An analysis and experimental approach to MOS controlled diodesbehavior

The metal oxide semiconductor (MOS)-controlled diode (MCD) is a new class of power semiconductor diode that can achieve ideal diode performance. In this paper, experimental verification of the MCD key concept is presented for the first time by using commercially available power metal oxide semiconductor field effect transistors (MOSFETs) operating as MCDs. Measurements of the reverse recovery currents and reverse recovery charges of these “MCDs” are obtained and compared with the body diodes of the MOSFETs. These measurements suggest that MCDs can reduce the reverse recovery current, storage charge, and switching loss significantly. Optimized MCD performances at 1.2 kV, 2.4 kV, and 4.5 kV are also predicted based on numerical simulations. Ideal performance of the MCD close to that predicted by the device simulation should be obtained once an optimized MCD is developed