Analysis and optimization of shielded RLC global interconnects for gigascale integration

Compact physical models are presented for on-chip double-sided shielded transmission lines, which are mainly used for long global interconnects where inductance effects should not be ignored. The models are then used to optimize the width and spacing of long global interconnects with repeater insertion. The impacts of increasing line width and spacing on various performance parameters such as delay, data-flux density, power dissipation and total repeater area are analysed. The product of data-flux density and reciprocal delay per unit length are defined as a figure of merit (FOM). By maximizing the FOM, the optimal width and spacing of shielded RLC global interconnects are obtained for various international technology roadmap for semiconductors (ITRS) technology nodes.     

Global interconnect width and spacing optimization for latency, bandwidth and power dissipation

This paper addresses a novel methodology optimizing global interconnect width and spacing for International Technology Roadmap for Semiconductors technology nodes. Global interconnects with and without buffer insertion are considered. The effects of the width and spacing of global interconnects on performance, such as delay, bandwidth, total repeater area and energy dissipation, are analyzed. The product of delay and bandwidth is used as the figure of merit for simultaneous short latency and large bandwidth and the proposed methodology can optimize global interconnects for the maximal figure of merit. It is demonstrated that buffers should not be inserted in global interconnects if interconnect length is shorter than a critical length, which is a constant for a given technology. For global interconnects with buffer insertion, the optimal width and spacing have analytical expressions and are constants for a given technology. For global interconnects without buffer insertion, the optimal width and spacing are dependent on both the technology parameters and interconnect length and can be computed numerically.     

Compact physical models for multilevel interconnect crosstalk in gigascale integration (GSI)

For the first time, compact physical models are derived for crosstalk noise of coplanar resistance-inductance-capacitance lines in a gigascale integration (GSI) chip that simultaneously consider far and near aggressors in both the same metal level and distant metal levels. Since both the amplitude and duration of noise are important, the noise voltage-time integral can be defined as a figure-of-merit for crosstalk, and it is shown that this integral attains its maximum at the length at which the interconnect resistance becomes equal to twice the characteristic impedance. It is also shown that crosstalk can be prohibitively large if interconnects have small resistances. There is, therefore, a tradeoff between interconnect latency and crosstalk. The compact models are finally used to calculate the crosstalk noise voltage for the case that wire width is optimized by simultaneously maximizing data flux density and minimizing latency. It has been proven that by utilizing the optimal wire width for signal interconnects and twice of that for power and ground lines, the worst case peak crosstalk noise voltage becomes smaller than 0.25 V/sub dd/ for all generations of technology.     

Compact Performance Models and Comparisons for Gigascale On-Chip Global Interconnect Technologies

The on-chip global interconnect with conventional Cu/low-k and delay-optimized repeater scheme faces great challenges in the nanometer regime owing to its severe performance degradation. This paper describes the analytical models and performance comparisons of novel interconnect technologies and circuit architectures to cope with the interconnect performance bottlenecks. Carbon nanotubes (CNTs) and optics-based interconnects exhibit promising physical properties for replacing the current Cu/low-k-based global interconnects. We quantify the performance of these novel interconnects and compare them with Cu/low-k wires for future high-performance integrated circuits. The foregoing trends are studied with technology node and bandwidth density in terms of latency and power dissipation. Optical wires have the lowest latency and power consumption, whereas a CNT bundle has a lower latency than Cu. The new circuit scheme, i.e., “capacitively driven low-swing interconnect (CDLSI),” has the potential to effect a significant energy saving and latency reduction. We present an accurate analytical optimization model for the CDLSI wire scheme. In addition, we quantify and compare the delay and energy expenditure for not only the different interconnect circuit schemes but also the various future technologies, such as Cu, CNT, and optics. We find that the CDLSI circuit scheme outperforms the conventional interconnects in latency and energy per bit for a lower bandwidth requirement, whereas these advantages degrade for higher bandwidth requirements. Finally, we explore the impact of the CNT bundle and the CDLSI on a via blockage factor. The CNT shows a significant reduction in via blockage, whereas the CDLSI does not help to alleviate it, although the CDLSI results in a reduced number of repeaters due to the differential signaling scheme.      

Minimal-Power, Delay-Balanced Smart Repeaters for Global Interconnects in the Nanometer Regime

A smart repeater is proposed for driving capacitively-coupled, global-length on-chip interconnects that alters its drive strength dynamically to match the relative bit pattern on the wires and thus the effective capacitive load. This is achieved by partitioning the driver into main and assistant drivers; for a higher effective load capacitance both drivers switch, while for a lower effective capacitance the assistant driver is quiet. In a UMC 0.18-mum technology the potential energy saving is around 10% and the reduction in jitter 20%, in comparison to a traditional repeater for typical global wire lengths. It is also shown that the average energy saving for nanometer technologies is in the range of 20% to 25%. The driver architecture exploits the fact that as feature sizes decrease, the capacitive load per transistor shrinks, whereas global wire loads remain relatively unchanged. Hence, the smaller the technology, the greater the potential saving.     

Performance Comparisons Between Carbon Nanotubes, Optical, and Cu for Future High-Performance On-Chip Interconnect Applications

Optical interconnects and carbon nanotubes (CNTs) present promising options for replacing the existing Cu-based global/semiglobal (optics and CNT) and local (CNT) wires. We quantify the performance of these novel interconnects and compare it with Cu/low-kappa wires for future high-performance integrated circuits. We find that for a local wire, a CNT bundle exhibits a smaller latency than Cu for a given geometry. In addition, by leveraging the superior electromigration properties of CNT and optimizing its geometry, the latency advantage can be further amplified. For semiglobal and global wires, we compare both optical and CNT options with Cu in terms of latency, energy efficiency/power dissipation, and bandwidth density. The above trends are studied with technology node. In addition, for a future technology node, we compare the relationship between bandwidth density, power density, and latency, thus alluding to the latency and power penalty to achieve a given bandwidth density. Optical wires have the lowest latency and the highest possible bandwidth density using wavelength division multiplexing, whereas a CNT bundle has a lower latency than Cu. The power density comparison is highly switching activity (SA) dependent, with high SA favoring optics. At low SA, optics is only power efficient compared to CNT for a bandwidth density beyond a critical value. Finally, we also quantify the impact of improvement in optical and CNT technology on the above comparisons. A small monolithically integrated detector and modulator capacitance for optical interconnects (~10 fF) yields a superior power density and latency even at relatively lower SA (~20%) but at high bandwidth density. At lower bandwidth density and SA lower than 20%, an improvement in mean free path and packing density of CNT can render it most energy efficient.     

基于单壁碳纳米管束的三维互连线设计与分析

Metallic carbon nanotubes(CNTs) have been proposed as a promising alternative to Cu interconnects in future integrated circuits(ICs) for their remarkable conductive, mechanical and thermal properties. Compact equivalent circuit models for single-walled carbon nanotube(SWCNT) bundles are described, and the performance of SWCNT bundle interconnects is evaluated and compared with traditional Cu interconnects at different interconnect levels for through-silicon-via-based three dimensional(3D) ICs. It is shown that at a local level, CNT interconnects exhibit lower signal delay and smaller optimal wire size. At intermediate and global levels, the delay improvement becomes more significant with technology scaling and increasing wire lengths. For 1 mm intermediate and 10 mm global level interconnects, the delay of SWCNT bundles is only 49.49% and 52.82% that of the Cu wires, respectively.     

A global interconnect optimization scheme for nanometer scale VLSI with implications for latency, bandwidth, and power dissipation

This paper addresses the critical problem of global wire optimization for nanometer scale very large scale integration technologies, and elucidates the impact of such optimization on power dissipation, bandwidth, and performance. Specifically, this paper introduces a novel methodology for optimizing global interconnect width, which maximizes a novel figure of merit (FOM) that is a user-defined function of bandwidth per unit width of chip edge and latency. This methodology is used to develop analytical expressions for optimum interconnect widths for typical FOMs for two extreme scenarios regarding line spacing: 1) spacing kept constant at its minimum value and 2) spacing kept the same as line width. These expressions have been used to compute the optimal global interconnect width and quantify the effect of increasing the line width on various performance metrics such as delay per unit length, total repeater area and power dissipation, and bandwidth for various International Technology Roadmap for Semiconductors technology nodes.     

Self-Timed Regenerators for High-Speed and Low-Power On-Chip Global Interconnect

In this paper, we propose a new circuit technique called self-timed regenerator (STR) to improve both speed and power for on-chip global interconnects. The proposed circuits are placed along global wires to compensate the loss in resistive wires and to amplify the effect of wire inductance in the wires to enable transmission line like behavior. For different wire widths, the number of STR and sizing of the transistors are optimized to accelerate the signal propagation while consuming minimum power. In 90-nm CMOS technology, STR design achieved a delay improvement of 14% over the conventional repeater design. Furthermore, 20% power reduction is achieved for iso-delay, and 8% delay improvement for iso-power compared with the repeater design. The proposed technique has also been applied to a clock distribution network, reducing clock power by 26%.     

Technology and reliability constrained future copper interconnects.II. Performance implications

For pt. I see ibid., vol.49, no.4, pp.590-7 (2002). This work extends the realistic resistance modeling of on-chip copper interconnects to assess its impact on key interconnect performance metrics. As quantified in part I of this work, the effective resistivity of copper is not only significantly larger than its ideal, bulk value but also highly dependent on technology and reliability constraints. Performance is quantified under various technological conditions in the future. In particular, wire delay is extensively addressed. Further, the impact of optimal repeater insertion to improve these parameters is also studied using realistic resistance trends. The impact of technologically constrained resistance on power penalty arising from repeater insertion is briefly addressed. Where relevant, aforementioned results are contrasted with those obtained using ideal copper resistivity     

Transition Skew Coding for Global On-Chip Interconnect

This paper presents new simulation results of the previously proposed transition skew coding (TSC) for global on-chip interconnects. Considering 2-GHz global clock frequency at the 90-nm node, we show that TSC can be applied to broad range of wire length on both semiglobal and global metal layers, while maintaining its energy efficiency and its advantages in terms of crosstalk reduction and signal integrity, and wiring and repeater area minimization.     

基于C8051F060单片机的多路数据采集系统设计

本数据采集系统采用C8051F060单片机内置的数模转换器,最多可对8路模拟量数据进行采集,进行模数转换后将通过串口向计算机传输。同时使用Visual Basic 程序语言进行上位机设计,接收单片机发送的数据,并进行波形还原,实现实时数据采集功能。     

High-speed and low-power repeater for VLSI interconnects

This paper proposes a repeater for boosting the speed of interconnects with low power dissipation. We have designed and implemented at 45 and 32 nm technology nodes. Delay and power dissipation performances are analyzed for various voltage levels at these technology nodes using Spice simulations. A significant reduction in delay and power dissipation are observed compared to a conventional repeater. The results show that the proposed high-speed low-power repeater has a reduced delay for higher load capacitance. The proposed repeater is also compared with LPTG CMOS repeater, and the results shows that the proposed repeater has reduced delay. The proposed repeater can be suitable for high-speed global interconnects and has the capacity to drive large loads.     

Circuit Modeling and Performance Analysis of Multi-Walled Carbon Nanotube Interconnects

Metallic carbon nanotubes (CNTs) have received much attention for their unique characteristics as a possible alternative to Cu interconnects in future ICs. Until this date, while almost all fabrication efforts have been directed toward multiwalled CNT (MWCNT) interconnects, there is a lack of MWCNT modeling work. This paper presents, for the first time, a detailed investigation of MWCNT-based interconnect performance. A compact equivalent circuit model of MWCNTs is presented for the first time, and the performance of MWCNT interconnects is evaluated and compared against traditional Cu interconnects, as well as Single-Walled CNT (SWCNT)-based interconnects, at different interconnect levels (local, intermediate, and global) for future technology nodes. It is shown that at the intermediate and global levels, MWCNT interconnects can achieve smaller signal delay than that of Cu interconnects, and the improvements become more significant with technology scaling and increasing wire lengths. At 1000- global or 500- intermediate level interconnects, the delay of MWCNT interconnects can reach as low as 15% of Cu interconnect delay. It is also shown that in order for SWCNT bundles to outperform MWCNT interconnects, dense and high metallic-fraction SWCNT bundles are necessary. On the other hand, since MWCNTs are easier to fabricate with less concern about the chirality and density control, they can be attractive for immediate use as horizontal wires in VLSI, including local, intermediate, and global level interconnects.     

Differential current-sensing for on-chip interconnects

This paper presents a differential current-sensing technique as an alternative to existing circuit techniques for on-chip interconnects. Using a novel receiver circuit, it is shown that, delay-optimal current-sensing is a faster (20% on an average) option as compared to the delay-optimal repeater insertion technique for single-cycle wires. Delay benefit for current-sensing increases with an increase in wire width. Unlike repeaters, current-sensing does not require placement of buffers along the wire, and hence, eliminates any placement constraints. Inductive effects are negligible in differential current-sensing. Current-sensing also provides a tighter bound on delay with respect to process variations. However, current-sensing has some drawbacks. It is power inefficient due to the presence of static-power dissipation. Current-sensing is essentially a low-swing signaling technique, and hence, it is sensitive to full swing aggressor noise.     

Optimization of throughput performance for low-power VLSI interconnects

The technique of optimal voltage scaling and repeater insertion is analyzed in this paper to reduce power dissipation on global interconnects. An analytical model for the maximum bit-rate of a very large scale integration interconnect with repeaters has been derived and results are compared with HSPICE simulations. The analytical model is also used to study the effects of interconnect length and scaling on throughput. The throughput-per-bit-energy is analyzed to determine an optimum combination of supply voltage and repeaters for a low-power global interconnect with 250 nm /spl times/ 250 nm cross-sectional dimensions implemented with the 180 nm micro-optical silicon system technology node. It is shown that the optimal supply voltage is approximately equal to twice the threshold voltage. A case study illustrates that a combination of 1 V supply along with one repeater per millimeter increases the throughput-per-bit-energy to over three times that of a latency-centric interconnect of 2 V, which results in a 70% reduction in power dissipation without any loss of throughput performance.     

Current-mode signaling in deep submicrometer global interconnects

This paper addresses propagation delay and power dissipation for current mode signaling in deep submicrometer global interconnects. Based on the effective lumped element resistance and capacitance approximation of distributed RC lines, simple yet accurate closed-form expressions of delay and power dissipation are presented. A new closed-form solution of delay under step input excitation is first developed, exhibiting an accuracy that is within 5% of SPICE simulations for a wide range of parameters. The usefulness of this solution is that resistive load termination for current mode signaling is accurately modeled. This model is then extended to a generalized delay formulation for ramp inputs with arbitrary rise time. Using these expressions, the optimum-line width that minimizes the total delay for current mode circuits is found. Additionally, a new power-dissipation model for current-mode signaling is developed to understand the design tradeoffs between current and voltage sensing. Based on the results and derived formulations, a comparison between voltage and current mode repeater insertion for long global deep submicrometer interconnects is presented.     

Design and Performance Modeling for Single-Walled Carbon Nanotubes as Local, Semiglobal, and Global Interconnects in Gigascale Integrated Systems

Based on physical models, distributed circuit models are presented for single-walled carbon nanotubes (SWCNs) and SWCN bundles that are valid for all voltages and lengths. These models can be used for circuit simulations and compact modeling. It is demonstrated that by customizing SWCN interconnects at the local, semiglobal, and global levels, several major challenges facing gigascale integrated systems can potentially be addressed. For local interconnects, monolayer or multilayer SWCN interconnects can offer up to 50% reduction in capacitance and power dissipation with up to 20% improvement in latency if they are short enough (<20 mum). For semiglobal interconnects, either latency or power dissipation can be substantially improved if bundles of SWCNs are used. The improvements increase as the cross-sectional dimensions scale down. For global interconnects, bandwidth density can be improved by 40% if there is at least one metallic SWCN per 3-nm² cross-sectional area     

A routing algorithm for FPGAs with time-multiplexed interconnects

Previous studies show that interconnects occupy a large portion of the timing budget and area in FPGAs.In this work,we propose a time-multiplexing technique on FPGA interconnects.In order to fully exploit this interconnect architecture,we propose a time-multiplexed routing algorithm that can actively identify qualified nets and schedule them to multiplexable wires.We validate the algorithm by using the router to implement 20 benchmark circuits to time-multiplexed FPGAs.We achieve a 38%smaller minimum channel width and 3.8%smaller circuit critical path delay compared with the state-of-the-art architecture router when a wire can be time-multiplexed six times in a cycle.     

Modeling, Analysis, and Design of Graphene Nano-Ribbon Interconnects

Graphene nanoribbons (GNRs) are considered as a prospective interconnect material. A comprehensive conductance and delay analysis of GNR interconnects is presented in this paper. Using a simple tight-binding model and the linear response Landauer formula, the conductance model of GNR is derived. Several GNR structures are examined, and the conductance among them and other interconnect materials [e.g., copper (Cu), tungsten (W), and carbon nanotubes (CNTs)] is compared. The impact of different model parameters (i.e., bandgap, mean free path, Fermi level, and edge specularity) on the conductance is discussed. Both global and local GNR interconnect delays are analyzed using an RLC equivalent circuit model. Intercalation doping for multilayer GNRs is proposed, and it is shown that in order to match (or better) the performance of Cu or CNT bundles at either the global or local level, multiple zigzag-edged GNR layers along with proper intercalation doping must be used and near-specular nanoribbon edge should be achieved. However, intercalation-doped multilayer zigzag GNRs can have better performance than that of W, implying possible application as local interconnects in some cases. Thus, this paper identifies the on-chip interconnect domains where GNRs can be employed and provides valuable insights into the process technology development for GNR interconnects.