非晶态类金刚石碳覆层的沉积工艺及设备

引言由碳-氢系统形成的多种多样的材料,如金刚石、石墨直至高聚合的碳氢化合物,其中,人们知之不多的是非晶态类金刚石覆层(ADLC)。这种覆层除碳外,还包含有相当份量的氢。所谓“类金刚石”则表示,ADLC覆层的许多性质,如高硬度、电绝缘性、好的导热性和低的摩擦系数等与晶态的金刚石很相似。表1列出了ADLC覆层的一些最重要的性质。ADLC覆层不仅有这么多优良的性质,而且还可能在较低的温度下沉积出,这就吸引人们将这种技术工业化,以用于磨损防护。     

等离子热丝化学气相沉积金刚石膜工艺参数研究

采用等离子热丝化学气相沉积(PHFCVD)装置进行了金刚石薄膜的制备实验。实验条件为：氢气流量为200sccm,甲烷流量为2～12sccm,基体温度为700～900℃,偏压为0～400V,真空室压力为4kPa。通过实验得出了甲烷含量、基体温度和偏压对沉积金刚石膜的影响,并运用扫描电子显微镜(SEM)、原子力显微镜(AFM)和X射线衍射(XRD)等测试方法对金刚石薄膜进行了观察分析。     

液相法在Si基底上沉积非晶碳膜

液相法以成本低、制备工艺简单等特点成为制备非晶碳膜的热点。然而适合工业化生产的制备工艺参数尚不明确。以Si单晶为基底,通过液相沉积法在Si表面制备非晶碳膜,并研究了沉积电压与其摩擦学性能之间的关系。研究结果表明,在1 800V下所制备的非晶碳膜表面光滑平整、硬度最高。此时非晶碳膜的干摩擦系数最小,耐磨性最强,具有良好的摩擦学性能。     

DC—PCVD法沉积的非晶态氮化硅的结构与性能研究

对用直流等离子体化学气相沉积法得到的非晶态氮化硅薄膜结构与性能进行了研究。对氮薄膜的表面显微硬度和剖面显微硬度进行了测试，并对非晶态氮化硅硬度高于晶态氮化硅硬度的原因进行了探讨。     

DC-PCVD法沉积的非晶态氮化硅的结构与性能研究

对用直流等离子体化学气相沉积（ＤＣ－ＰＣＶＤ）法得到的非晶态氮化硅薄膜结构与性能进行了研究。对氮化硅薄膜的表面显微硬度和剖面显微硬度进行了测试，并对非晶态氮化硅硬度高于晶态氮化硅硬度的原因进行了探讨     

电沉积Fe-W非晶态合金的研究

叙述了用三价铁盐溶液电沉积Fe-W非晶态合金,研究了电沉积条件对镀层结构的影响,给出了晶态与非晶态结构区域图。Fe-W非晶态合金镀层的阳极极化曲线表明,镀层在酸性环境中具有优良的耐腐蚀性能。     

化学沉积镍磷非晶态合金沉积过程及耐蚀性的研究

对化学沉积镍磷非晶在主合金的沉积过程和机制了进行了试验研究。采用扫描电镜，能谱仪和Ｘ射线衍射仪对不同沉积时间沉积产物的表面形貌，化学成分，组织结构和耐蚀性能进行了分析与探讨。为提高化学沉积镍磷合金的工艺水平及其应用提供了理论依据。     

非晶态Fe-Mo合金电沉积研究

从强碱性溶液体系不同含 Mo 量的溶液中以及不同电沉积工艺条件下,可以获得非晶态或晶态 Fe-Mo 合金镀层。这种镀液稳定、工艺简单,镀液中允许 Fe~(2+)离子浓度范围宽。获取非晶态Fe-Mo 合金的条件是:保持镀层中含 Mo 量在20wt-%以上。要达到此条件就必须保持镀液中的(Mo)/(Fe+Mo)×100量在66%以上,镀液温度在20—45℃范围内,Fe-Mo 合金镀层才成为非晶态。反之,当镀液温度超过55℃,镀层将转变成为晶态。     

Crystallization of amorphous silicon thin film by using a thermal plasma jet

Amorphous silicon (a-Si) films deposited on glass substrates were crystallized using a thermal plasma jet and the treated films are analyzed to find the relationship between plasma characteristics and crystallization process conditions. The crystallization process conditions were found to have different optimal operating regimes depending on the nozzle geometry. Numerical analysis of the thermal plasma jets showed that the different operating regimes for crystallization were caused by modifications of the plasma characteristics by the nozzle geometry. It is revealed that a stepped-divergent nozzle is more efficient for the thermal plasma annealing process than the conventional cylindrical one due to the broadened high-temperature region and the lowered axial velocity in the plasma jet.     

Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition

The annealing effects on the structural and electrical properties of fluorinated amorphous carbon (a-C:F) thin films prepared from C₆F₆ and Ar plasma are investigated in a N₂ environment at 200 mTorr. The a-C:F films deposited at room temperature are thermally stable up to 250 °C, but as the annealing temperature is increased beyond 300 °C, the fluorine incorporation in the film is reduced, and the degree of crosslinking and graphitization in the film appears to be enhanced. At the annealing temperature of 250 °C, the chemical bond structures of the film are unchanged noticeably, but the interface trapped charges between the film and the silicon substrate are reduced significantly. The increased annealing temperature contributes the decrease of both the interface charges and the effective charge density in the a-C:F film. Higher self-bias voltage is shown to reduce the charge density in the film.     

锐钛矿型TiO2薄膜的低温制备及性能研究

采用液相沉积法,在低温下制备TiO2薄膜,研究了制备条件对薄膜中TiO2的晶型、薄膜厚度、透光性、亲水性及光催化活性的影响.结果表明,在90℃下制备的TiO2为锐钛矿型,薄膜的厚度与反应温度、沉积时间、HBO3的加入量及反应物浓度有关,所制备的薄膜具有良好的光诱导超亲水特性和光催化活性,在可见光区的透光率＞80%.     

氟化非晶碳薄膜的低频介电性质分析

研究了电子回旋共振等离子体技术沉积的氟化非晶碳(α-C：F)薄膜的低频(10^2～10^6Hz)介电性质。发现α-C：F薄膜的低频介电色散随源气体CHF3／C6H6的比例、微波入射功率而改变。结合薄膜键结构的红外分析,发现薄膜中C=C相对含量的增大是导致低频介电色散增强的原因,而C—F相对含量的增大则使低频介电色散减弱。     

Oxidation of the surface of a thin amorphous silicon film

The oxidation of clean crystalline silicon surfaces is self-limiting at moderate oxygen pressures (10^− 5 Pa) and temperatures (500 °C), forming 0.7-0.8 nm thick oxide layers. This study looks at the oxidation of a surface of a thin amorphous silicon film to establish if a similar mechanism is active in this case. We have devised a special experimental procedure to check the oxidation mechanism of thin amorphous silicon films. For the spectroscopic investigations we used photoemission with synchrotron radiation with the highest possible surface sensitivity and resolution. This permits a detailed decomposition of the Si 2p spectral details, using a mathematical decomposition procedure. The results clearly show that the oxidation mechanism of the surface of an amorphous silicon film under similar conditions is severely hindered compared to cases of crystalline substrates, indicating less reactivity at the surface and less transport of oxygen into the amorphous material.     

Preparation and antibacterial activity of Ag-TiO2 composite film by liquid phase deposition (LPD) method

A liquid phase deposition (LPD) method has been devised for the deposition of Ag-TiO₂ thin films on ceramic tiles with glazed surface at a low temperature. The Ag-TiO₂ thin films obtained were well-adhered, homogenous and coloured by interference of reflected light. The films were characterized by X-ray diffraction and scanning electron microscopy. From these analyses, it was found that silver ions were trapped in TiO₂ matrix and their reduction could be achieved at 600°C annealing temperature. The antibacterial activity against S. aureus and E. coli has been studied applying the so called antibacterial-drop test. The Ag-TiO₂ thin films exhibited a high antibacterial activity. AAS was used for the quantitave determination of silver ion concentration releasing from the Ag-TiO₂ thin film. The releasing rate of silver ions from the Ag-TiO₂ film was 0·118 μg/ml during 192 h. The antibacterial effect of Ag-TiO₂ thin film before and after aging in a weathering chamber for 48 h was compared and the results show that the antibacterial activity is not compromised after weathering.     

液相电沉积金刚石薄膜的研究进展

评述了液相沉积(类)金刚石薄膜的研究现状,介绍了液相合成(类)金刚石薄膜的装置、液态源及薄膜的性能,分析了如何更好地提高(类)金刚石薄膜质量,并在此基础上提出了一种可能制备出高质量金刚石薄膜的脉冲电弧放电沉积装置.     

Stripping voltammetric behavior of nitrogen-doped tetrahedral amorphous carbon thin film electrodes in NaCl solutions

Conductive nitrogen-doped tetrahedral amorphous carbon (ta-C:N) thin films fabricated with a filtered cathodic vacuum arc technique were investigated for their ability to detect multiple trace heavy metals such as mercury, copper and lead by linear sweep anodic stripping voltammetry in sodium chloride aqueous solutions. The ta-C:N film electrodes exhibited a significant stripping response for determination of individual elements (Pb²⁺ and Hg²⁺) and multiple elements (Pb²⁺ + Hg²⁺ and Cu²⁺ + Hg²⁺), indicating that these electrodes have a great potential for simultaneously tracing multiple heavy metals in aqueous solutions.     

Deposition of zinc oxide thin films by an atmospheric pressure plasma jet

The ZnO thin film deposition process by using an atmospheric pressure (AP) plasma jet is studied. In this process, nebulized ZnCl₂ solution is sprayed into the downstream of the nitrogen plasma jet to perform thin film deposition. X-ray diffraction analysis confirms that this AP jet has the capability to convert ZnCl₂ solution to well-crystallized ZnO thin films with a hexagonal wurtzite structure in a short time. This film exhibits a smooth and mirror-like appearance visually. Scanning electron microscopy and atomic force microscopy show that the deposited film is dense and continuous with a root mean square surface roughness of 8.6 nm. A 1.29 nm/s deposition rate is obtained using this process. Given the fast deposition rate, we believe that both the temperature and the reactivity of the plasma play important roles. A ZnO film on a larger substrate is fabricated, which suggests the process capability in large area and continuous processing applications.     

液相沉积法制备氧化物薄膜

本文介绍了一种新的湿化学成膜法－液机沉积法,对液相沉积法制备氧化物薄膜的原理、工艺流程及成的种类和性能进行了详细阐述,并概述了其发展和应用前景。