共查询到20条相似文献,搜索用时 109 毫秒
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主要介绍了我国工业射线胶片的生产现状,达到的水平,与国外工业射线胶片先进水平相比存在的差距。阐述了我国工业射线胶片今后的发展方向。 相似文献
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本文介绍美国材料协会标准ASTME-746测定工业射线胶片相对图像质量的标准试验方法,以及对无锡产工业X射线胶片实样测试的结果。 相似文献
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本文扼要介绍了国外几家主要感光器材工业公司,如:爱克发、柯达和富士生产,用于无损探伤的工业射线照相胶片系列的品种、性能、规格和应用范围。 相似文献
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工业非胶片射线照像技术 一.射线实时成像 总被引:1,自引:1,他引:0
传统的工业胶片射线照相正受到数字射线照相的严重挑战。射线照相图像的探测器从胶片到图像增强器,从荧光体成像板到非晶硅和非晶硒成像板,再到阵列探测器,射线检测系统从硬件到软件在不断翻新,工业射线检查的效率和可靠性也在不断提高。采用与计算机结合的非胶片射线照相技术,能大大减少曝光时间,缩短检测周期,还可以完全避免由胶片冲洗引起的环境污染,而且射线照相影像便于存档、检索、远程传递和评定。本文系列介绍有关这方面的新技术。 相似文献
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本文综合介绍一种新型管道专用工业射线胶片的研究开发,在详细介绍其特性的基础之上,描述了此类型胶片在曝光和自动冲洗加工过程中的应用细节,并展望国内管道专用工业射线胶片的市场前景. 相似文献
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天津牌工业射线胶片通常用于2—200mm母材厚度钢熔化焊对接接头的射线照相。本文结合GB/T3323—2005《金属熔化焊焊接接头射线照相》,通过对射线照相质量影响因素的分析,提出胶片操作优化,从而确保射线照相质量、降低检测成本。 相似文献
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介绍欧洲最近推行的射线胶片主要性能、质量的校核、验收方法。此法的要点是利用PMC片验证胶片系统在一定黑度下的梯度G和梯噪比G/oo,以此划类分级,确保工业射线照相象质水平。 相似文献
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Rough TiC/a-C films were intentionally grown on smooth surface to simulate a rough finishing of industrial substrates. Surface roughness and growth dynamics of TiC/a-C nanocomposite films deposited on such rough surfaces by non-reactive pulsed-DC (p-DC) sputtering of graphite targets at 350 kHz pulse frequency were studied using atomic force microscopy, cross-sectional scanning electron microscopy. Intensive concurrent ion impingement during the film growth at higher pulse frequency of p-DC sputtering leads to rapid smoothing of such initial rough surfaces. It was shown that rapid smoothing of initially rough surfaces with RMS roughness ~ 6 nm to < 1 nm can be effectively achieved by 350 kHz p-DC sputtering. These films exhibit dense and glassy microstructure. The surface roughness strongly influences the frictional behavior of TiC/a-C nanocomposite films where the rougher surfaces yielded higher steady state friction coefficient (CoF).The observed dynamic smoothing phenomenon was applied to obtain ultra-smooth and ultra-low friction (μ ~ 0.05) TiC/a-C:H nanocomposite films on industrial polished steel substrates by 200 and 350 kHz p-DC sputtering of Ti-targets in an argon/acetylene atmosphere. 相似文献
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Academic and industrial research groups are currently working to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films, as they are important for designing smart devices and systems for microoptics and microelectronics (for example, multilayer structures, optical resonators, photonic crystals, Cu interconnects, insulating layers and so on). Here, we report a robust and simple procedure to prepare highly porous and resistant semicrystalline magnesium oxyfluoride thin films through liquid deposition followed by a flash and short thermal treatment. These films are water insensitive, mechanically resistant (E=1 GPa), exhibit high optical quality and have an ultralow refractive index (n(700 nm) = 1.09) and an ultralow dielectric constant (k(100 kHz) = 1.6) which are required for the above-mentioned applications. Moreover, the process used to prepare these nanomaterials is well suited for industrial production on larger surfaces. 相似文献
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Großflächenbeschichtung mit superhartem Kohlenstoff. Large area deposition of superhard carbon films
Thomas Stucky Urs Baier Carl‐Friedrich Meyer Hans‐Joachim Scheibe Bernd Schultrich 《真空研究与实践》2003,15(6):299-304
During the nineties the Laser‐Arc technology for the deposition of superhard amorphous carbon films (Diamor®) has been developed at the Fraunhofer Institute for Material and Beam Technology. This technology has now been scaled up by a factor of 4 compared to existing devices and integrated in an industrial large‐volume vacuum arc coater. First results demonstrate the possibility of depositing well adherent Diamor® films with a thickness of more than 2 microns and a hardness above 4000 HV on larger parts and tools. This opens a wide field of industrial applications. 相似文献
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Ultra thin nickel transparent electrodes 总被引:1,自引:0,他引:1
Stefano Giurgola Anabel Rodriguez Luis Martinez Paolo Vergani Federico Lucchi Sarah Benchabane Valerio Pruneri 《Journal of Materials Science: Materials in Electronics》2009,20(Z1):181-184
Transparent electrodes made of ultra thin metals have recently been demonstrated with performances comparable to those offered
by transparent conductive oxides (TCOs), which are traditionally used in applications such as photovoltaic cells, light emitting
devices, photodetectors and electro-optical modulators. In this work we report highly uniform, optically transparent and electrically
conductive nickel films. Their good performance, combined with low cost and simplicity in processing, make ultra thin Ni films
highly competitive, even with respect to the latest developments in TCO technology. Nickel films can be easily incorporated
into an industrial process flow and could therefore be an attractive alternative to TCOs in many industrial applications. 相似文献
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Preparation of (001)-oriented Pb(Zr,Ti)O3 thin films and their piezoelectric applications 总被引:1,自引:0,他引:1
Fujii E Takayama R Nomura K Murata A Hirasawa T Tomozawa A Fujii S Kamada T Torii H 《IEEE transactions on ultrasonics, ferroelectrics, and frequency control》2007,54(12):2431
Preparation of (001)-oriented Pb(Zr,Ti)O(3) (PZT) thin films and their applications to a sensor and actuators were investigated. These thin films, which have a composition close to the morphotropic phase boundary, were epitaxially grown on (100)MgO single-crystal substrates by RF magnetron sputtering. These (001)-oriented PZT thin films could be obtained on various kinds of substrates, such as glass and Si, by introducing (100)-oriented MgO buffer layers. In addition, the (001) oriented PZT thin films could be obtained on Si substrates without buffer layers by optimizing the sputtering conditions. All of these thin films showed excellent piezoelectric properties without the need for poling treatment. The PZT thin films on the MgO substrates had a high piezoelectric coefficient, d(31), of -100 pm/V, and an extremely low relative dielectric constant, epsilon(r), of 240. The PZT thin films on Si substrate had a very high d(31) of -150 pm/V and an epsilon(r) = 700. These PZT thin films were applied to an angular rate sensor with a tuning fork in a car navigation system, to a dual-stage actuator for positioning the magnetic head of a high-density hard disk drive, and to an actuator for an inkjet printer head for industrial on-demand printers. 相似文献
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Hans‐Joachim Scheibe Dr. Michael Leonhardt Andreas Leson Carl‐Friedrich Meyer Thomas Stucky Volker Weihnacht 《真空研究与实践》2008,20(6):26-31
Superhard carbon film deposition by means of Laser‐Arco® on the way from the Laboratory into the industrial series coating Diamond‐like carbon films (DLC) are more and more applied as wear protection coatings for components and tools due to their unique combination of high hardness, low friction and sticking tendency to metallic counter bodies. Up to now applied DLC films are hydrogen containing (a‐C:H) or metal carbon films (Me‐C:H) deposited by a plasma assisted CVD process from carbon‐hydrogen gas mixtures. Their wide industrial effort results from that the can be deposited with slowly modified coating machines for classical hard coating (e.g. TiN or CrN). A new generation DLC films are the hydrogen‐free ta‐C films (ta‐C = tetrahedral bounded amorphous carbon) with a between two and three‐times higher hardness and with a resulting higher wear resistance under extreme condition than classical DLC films. They have excellent emergency running properties at lubrication break down. Their industrial application is more difficult due to that they cannot deposited with modified coating machines for classical hard and DLC coating and a new technology with corresponding equipment was not available up to now. The laser controlled, pulsed arc deposition technology (Laser‐Arco®) of the Fraunhofer IWS Dresden has this potential. In kind of a Laser‐Arc‐Module‐source the ta‐C film deposition can be integrated in every industrial used deposition machine. 相似文献
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Preparation and application in p-n homojunction diode of p-type transparent conducting Ga-doped SnO2 thin films 总被引:2,自引:0,他引:2
Tieying Yang Huan-hua Wang Quanjie Jia Baoyi Wang Kurash Ibrahim Qing He 《Thin solid films》2010,518(19):5542-5545
The direct preparation of p-type transparent conducting Ga-doped SnO2 thin films and their fundamental application in transparent p-n homojunction diode were realized. The films were grown in an active oxygen ambient using reactive rf magnetron sputtering without post-deposition annealing involved. This method improved the electrical properties of the films while maintaining their optical transparency. By growing a p-type thin film on commercial n-type SnO2:F-coated glass, transparent p-n homojunction diode was obtained. It exhibits a distinct current-voltage rectifying characteristic, manifesting this p-type thin film and the fabrication technology are suitable for industrial applications. 相似文献