Room temperature far infrared (8~10 μm) photodetectors usingself-assembled InAs quantum dots with high detectivity

Room temperature operation of far-infrared detectors made of self-assembled quantum dots embedded in the channel region of modulation-doped heterostructures is demonstrated. At room temperature, the detector shows a low dark current ranging in the nano-amperes at a bias voltage of 10 V. After the optimization of the separation between the quantum dot region and the 2DEG, a peak responsivity of 5.3 A/W is obtained at 9.0 μm. The high detectivities of 6×10⁸ and 5×10¹⁰ cmHz^1/2/W are obtained at room temperature and 80 K, respectively     

Self-assembled InAs-GaAs quantum-dot intersubband detectors

The use of self-assembled InAs-GaAs quantum dots in photoconductive intersubband detectors in the far-infrared is presented. Far-infrared absorption is observed in self-assembled quantum dots in the 6-18-μm range for subband-subband and subband-continuum transitions. Photoconductive quantum-dot intersubband detectors were fabricated and demonstrate tunable operating wavelengths between 6-18 μm using subband-subband or subband-continuum transitions. The use of AlAs barriers allows further tuning to shorter wavelengths of 3-7 μm. Subband-continuum quantum dot intersubband detectors show encouraging normal incidence performance characteristics at T=40 K, with responsivities of 10-100 mA/W, detectivities of 1-10 ×10⁹ cm·Hz^1/2/W and large photoconductive gain up to g=12 for a ten-layer quantum-dot heterostructure. With improvements in device structure, self-assembled quantum dots can be expected to provide intrinsic normal incidence broad-band detectors with advantages over quantum wells     

Two-colour quantum well infra-red photodetector with peaksensitivities at 3.9 and 8.1 μm

A two-colour infra-red photodetector using multistacks of GaAs/AlGaAs quantum wells is demonstrated. The response peaks are at 3.9 and 8.1 μm. The peak responsivities of the detector are 0.4 A/W and 35 A/W for 8.1 μm and 3.9 μm bands, respectively. The detectivities of the 3.9 and 8.1 μm bands are 7.5×10⁹ and 1.5×10¹⁰ cmHz^1/2/W. These values are the best reported results for two-colour detectors with peak sensitivities in the spectral regions of 3-5 and 8-12 μm     

GaInAsSb/GaSb infrared photodetectors prepared by MOCVD

GaInAsSb/GaSb heterojunction photodetectors have been grown by metalorganic chemical vapour deposition (MOCVD). The room temperature performances of the photodetectors are described. The responsivity spectrum is peaked at 2.25 μm and cut off at 1.7 μm in the short wavelength and at 2.4 μm in the long wavelength, respectively. The room temperature detectivity D* is 10⁹ cm Hz W^-1 at 2.25 μm     

High-performance, 0.1 μm InAlAs/InGaAs high electron mobilitytransistors on GaAs

This letter describes the material characterization and device test of InAlAs/InGaAs high electron mobility transistors (HEMTs) grown on GaAs substrates with indium compositions and performance comparable to InP-based devices. This technology demonstrates the potential for lowered production cost of very high performance devices. The transistors were fabricated from material with room temperature channel electron mobilities and carrier concentrations of μ=10000 cm² /Vs, n=3.2×10¹² cm^-2 (In=53%) and μ=11800 cm²/Vs, n=2.8×10¹² cm^-2 (In=60%). A series of In=53%, 0.1×100 μm² and 0.1×50 μm² devices demonstrated extrinsic transconductance values greater than 1 S/mm with the best device reaching 1.074 S/mm. High-frequency testing of 0.1×50 μm² discrete HEMT's up to 40 GHz and fitting of a small signal equivalent circuit yielded an intrinsic transconductance (g_m,i) of 1.67 S/mm, with unity current gain frequency (f_T) of 150 GHz and a maximum frequency of oscillation (f_max) of 330 GHz. Transistors with In=60% exhibited an extrinsic g_m of 1.7 S/mm, which is the highest reported value for a GaAs based device     

非故意掺杂吸收层InP/InGaAs异质结探测器研究

为了获得低噪声铟镓砷（InGaAs）焦平面,需要采用高质量的非故意掺杂InGaAs（u-InGaAs）吸收层进行探测器的制备。采用闭管扩散方式,实现了Zn元素在u-InGaAs吸收层晶格匹配InP/In_0.53Ga_0.47As异质结构材料中的P型掺杂,利用扫描电容显微技术(SCM)对Zn在材料中的扩散过程进行了研究,结果表明,随着扩散温度和时间增加,p-n结结深显著增加,u-InGaAs吸收层材料的扩散界面相比较高吸收层浓度材料（5×1016 cm?3）趋于缓变。根据实验结果计算了530 ℃下Zn在InP中的扩散系数为1.27×10?12 cm2/s。采用微波光电导衰退法(μ-PCD)提取了InGaAs吸收层的少子寿命为5.2 μs。采用激光诱导电流技术(LBIC)研究了室温下u-InGaAs吸收层器件的光响应分布,结果表明:有效光敏面积显著增大,对实验数据的拟合求出了少子扩散长度L_D为63 μm,与理论计算基本一致。采用u-InGaAs吸收层研制的器件在室温(296 K)下暗电流密度为7.9 nA/cm2,变温测试得到激活能E_a为0.66 eV,通过拟合器件的暗电流成分,得到器件的吸收层少子寿命τ_p约为5.11 μs,与微波光电导衰退法测得的少子寿命基本一致。     

1.1 kV 4H-SiC power UMOSFETs

Silicon Carbide (4H-SiC), power UMOSFETs were fabricated and characterized from room temperature to 200°C. The devices had a 12-μm thick lightly doped n-type drift layer, and a nominal channel length of 4 μm. When tested under Fluorinert^TM at room temperature, blocking voltages ranged from 1.0 kV to 1.2 kV. Effective channel mobility ranged from 1.5 cm²/V.s at room temperature with a gate bias of 32 V (3.5 MV/cm) up to 7 cm²/V.s at 100°C with an applied gate bias of 26 V (2.9 MV/cm). Specific on-resistance (R_on,sp) was calculated to be as low as 74 mΩ.cm² at 100°C under the same gate bias     

InGaAsPN-InP-based photodetectors for long wavelength(λ>1.65 μm) applications

We demonstrate InGaAsPN p-i-n photodetectors lattice-matched to InP substrates with cutoff wavelengths larger than 1.65 μm. The narrow bandgap InGaAsPN absorption layers were grown by gas source molecular beam epitaxy using an RF plasma nitrogen source. Optical absorption spectra reveal that InGaAsPN with 5% P and 2.8% N has a cutoff wavelength λ_CO=1.90 μm Background doping in the absorption layer for a detector with 1.5% N and 5% P is reduced from (1.5±0.5)×10¹⁷ cm^-3 for the as-grown device, to (5±0.5)×10¹⁶ cm^-3 for a thermally annealed device. The unintentional high background doping is due to N-H bond formation or local strain induced defects. Spectral response measurements indicate that λ_CO=1.85 μm is achieved for detectors annealed at 800°C with 2% N and 5% P in the InGaAsPN absorption layer, suggesting that annealed InGaAsPN alloys are promising for use in detectors with response in the near and mid-IR wavelength spectral range     

Delta-doped AlGaN/AlN/GaN microwave HFETs grown by metalorganicchemical vapour deposition

The performance of an innovative delta-doped AlGaN/AlN/GaN heterojunction field-effect transistor (HFET) structure is reported. The epitaxial heterostructures were grown on semi-insulating SiC substrates by low-pressure metalorganic chemical vapour deposition. These structures exhibit a maximum carrier mobility of 1058 cm²/V s and a sheet carrier density of 2.35×10¹³ cm^-2 at room temperature, corresponding to a large n_s μ_n product of 2.49×10¹⁶ V s. HFET devices with 0.25 μm gate length were fabricated and exhibited a maximum current density as high as 1.5 A/mm (at V_G=+1 V) and a peak transconductance of g_m=240 mS/mm. High-frequency device measurements yielded a cutoff frequency of f_t≃50 GHz and maximum oscillation frequency f_max≃130 GHz     

Structural and electrooptical characteristics of quantum dotsemitting at 1.3 μm on gallium arsenide

We present a comprehensive study of the structural and emission properties of self-assembled InAs quantum dots emitting at 1.3 μm. The dots are grown by molecular beam epitaxy on gallium arsenide substrates. Room-temperature emission at 1.3 μm is obtained by embedding the dots in an InGaAs layer. Depending on the growth structure, dot densities of 1-6×10¹⁰ cm^-2 are obtained. High dot densities are associated with large inhomogeneous broadenings, while narrow photoluminescence (PL) linewidths are obtained in low-density samples. From time-resolved PL experiments, a long carrier lifetime of ≈1.8 ns is measured at room temperature, which confirms the excellent structural quality. A fast PL rise (τ_rise=10±2 ps) is observed at all temperatures, indicating the potential for high-speed modulation. High-efficiency light-emitting diodes (LEDs) based on these dots are demonstrated, with external quantum efficiency of 1% at room temperature. This corresponds to an estimated 13% radiative efficiency. Electroluminescence spectra under high injection allow us to determine the transition energies of excited states in the dots and bidimensional states in the adjacent InGaAs quantum well     

Application of indium-tin-oxide with improved transmittance at 1.3μm for MSM photodetectors

The optical transmittance of indium-tin oxide (ITO) at a wavelength of 1.3 μm has been improved by adding forming gas (H₂ /N₂) to the Ar sputtering gas. It is shown that the presence of H₂ in the plasma decreases the carrier concentration in ITO and increases the optical transmittance of a 320 nm-thick ITO film from 69.7% to 99.5%. The application of the high transmittance ITO to the fabrication of metal-semiconductor-metal (MSM) photodiodes on InAlAs/InGaAs heterostructures has resulted in an improvement of responsivity from 0.6 A/W to 0.76 A/W. This is double the responsivity of 0.39 A/W obtained for Ti/Au detectors. A 3-dB bandwidth of 6 GHz was obtained for the high transparency ITO device with 3 μm fingers and gaps and with an area of 50 μm×50 μm     

Operation of SiGe heterojunction bipolar transistors in theliquid-helium temperature regime

We present the first dc measurements of silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) operating in the liquid-helium temperature (LHeT=4.2 K) regime. The current gain of the self-aligned, UHV/CVD-grown SiGe HBT increases monotonically from 110 at 300 K to 1045 at 5.84 K, although parasitic base current leakage limits the useful operating current to above about 1.0 μA at 5.84 K. An aggressively designed base profile (peak N_AB≈8×10¹⁸ cm ^-3) is used to suppress base freeze-out at LHeT (R_bi =18.3 kΩ/□ at 4.48 K). We have also identified a non-ideal minority carrier transport mechanism in the collector current at temperatures below 77 K (I_C is not proportional to exp(qV _BE/kT)) which is unaccounted for in conventional device theory. Preliminary calculations suggest that this phenomenon is due to trap-assisted carrier tunneling from the emitter to the collector through the base potential barrier     

1-2 micron (Hg, Cd)Te photodetectors

The performance of mercury cadmium telluride detectors in the 1-2 micron spectral region has been predicted from basic material parameters. Photovoltaic devices should be characterized by specific responsivities of 1 A/W for a 1000 ohm load when transit time limited to less than 20 ns. Photoconductive detectors made from n-type material should have radiative lifetimes of 1 ms. The feasibility of high performance 1-2 micron (Hg, Cd)Te detectors has been demonstrated experimentally. Deep junction devices operating at room temperature without bias have been fabricated by impurity indiffusion. Detectivities at 1.75 microns approached 10¹⁰cm.Hz^1/2/W with open-circuit responsivities of approximately 500 V/W. In addition, 1.5 micron detectors have been fabricated from p-type, 25 Ω.cm material. With no bias at room temperature, these detectors showed D* λ>10¹⁰cm.Hz/12/W, open-circuit responsivities in excess of 10³V/W, and response times on the order of microseconds. These preliminary results indicate that detectors fabricated from the pseudobinary alloy of (Hg, Cd)Te are well suited for high speed, near infrared photodetection in which room temperature operation is required.     

Inverter performance of 0.10 μm CMOS operating at roomtemperature

The switching performance of 0.10 μm CMOS devices operating at room temperature has been discussed on the basis of both experimental and simulated results. The measured propagation delay time of a 0.10 μm gate length CMOS has been quantitatively divided into intrinsic and parasitic components for the first time. The results have shown that the drain junction capacitance strongly affects the propagation delay time in the present 0.10 μm CMOS. The switching performance of a 0.10 μm ground rule CMOS has been simulated by using device parameters extracted from the experimental results. In the 0.10 μm ground rule CMOS, it has been shown that an increase of the contact resistance will degrade the propagation delay time, which is one of the most essential problems in further device miniaturization. It has been also demonstrated that even if the specific contact resistance ρ_c is reduced to be less than 1×10^-7 Ω cm, further reduction of the gate overlap capacitance C_ov will be required to achieve the propagation delay time to be less than 10 ps in the 0.10 μm ground rule CMOS at room temperature     

High power 875 nm Al-free laser diodes

Data are presented on Al-free InGaAsP-GaAs single quantum well laser diodes operating at 875 nm. Total output powers in excess of 4 W are achieved from a 100 μm broad area gain-guided device. Threshold currents under 200 A/cm² are reported for diodes operated continuous wave (cw) at room temperature (20°C)     

Low frequency noise in 6H-SiC MOSFET's

The noise spectra for n-channel, depletion-mode MOSFETs fabricated in 6H-SiC material were measured from 1-10⁵ Hz at room temperature. Devices were biased in the linear regime, where the noise spectra was found to be dependent upon the drain-to-source bias current density. At a drain-to-source current of 50 μA for MOSFETs with a W/L of 400 μm/4 μm, the measured drain-to-source noise power spectral density was found to be A/(f^λ), with A being 2.6×10^-12 V², and λ being between 0.73 and 0.85, indicating a nonuniform spatial trap density skewed towards the oxide-semiconductor interface. The measured Hooge parameter (α_H) was 2×10^-5. This letter represents the first reported noise characterization of 6H-SiC MOSFET's     

Exploration of velocity overshoot in a high-performance deepsub-0.1-μm SOI MOSFET with asymmetric channel profile

The electron velocity overshoot phenomenon in the inversion layer is experimentally investigated using a novel thin-film silicon-on-insulator (SOI) test structure with channel lengths down to 0.08 μm. The uniformity of the carrier density and tangential field is realized by employing a lateral asymmetric channel (LAC) profile. The electron drift velocity observed in this work is 9.5×10⁶ cm/s for a device with L_eff=0.08 μm at 300 K. The upward trend in electron velocity can be clearly noticed for decreasing channel lengths     

p-channel modulation-doped field-effect transistors based on AlSb0.9As0.1/GaSb

Operation of the first AlSbAs/GaSb p-channel modulation-doped field-effect transistor (MODFET) is reported. Devices with 1-μm gate length exhibit transconductance of 30 and 110 mS/mm at room temperature and 80 K, with respective maximum drain current densities of 25 and 80 mA/mm. The low field Hall mobility and sheet carrier density of this modulation doped structure were 260 cm²/V-s and 1.8×10 ¹² cm^-2 at room temperature and 1700 cm²/V-s and 1.4×10¹² cm^-2 at 77 K. Calculations based on these results indicate that room-temperature transconductances of 200 mS/mm or greater could be achieved. This device can be integrated with an InAs n-channel HFET for complementary circuit applications     

Spectroscopy and diode laser-pumped operation of Tm,Ho:YAG

Spectroscopic measurements and analysis of diode laser-pumped operation of Tm,Ho:YAG at 2.1 μm at room temperature have been performed. The peak effective stimulated emission cross section is measured to be 9×10^-21 cm² at 2.091 μm and the upper state lifetime is 8.5 ms. Under diode laser pumping, thresholds of 4.4 mW of absorbed power and slope efficiency of 19% have been demonstrated. Calculations of threshold power are performed based on the spectroscopic measurements. An energy transfer upconversion process is identified which leads to a sublinear rise in upper-state population with pump power     

Room-temperature long-wavelength (λ=13.3 μm) unipolarquantum dot intersubband laser

Long-wavelength (λ=13.3 μm) unipolar lasing at 283 K from self-organised In_0.4Ga_0.6As/GaAs quantum dots, due to intersubband transitions in the conduction band, is demonstrated for the first time. The threshold current density under continuous wave operation is 1.1 kA/cm² for a 60 μm×1.2 mm broad-area plasmon-enhanced waveguide device and the maximum power output is ≈ μW. The long intersubband relaxation time in quantum dots, together with the short lifetime in the ground state, due to interband stimulated emission, help to achieve the necessary population inversion and gain