Ag/PEPC/NiPc/ZnO/Ag thin film capacitive and resistive humidity sensors

A thin film of blended poly-N-epoxypropylcarbazole (PEPC) (25 wt.%),nickel phthalocyanine (NiPc) (50 wt.%) and ZnO nano-powder (25 wt.%) in benzene (5 wt.%) was spin-coated on a glass substrate with silver electrodes to produce a surface-type Ag/PEPC/NiPc/ZnO/Ag capacitive and resistive sensor.Sensors with two different PEPC/NiPc/ZnO film thicknesses (330 and 400 nm) were fabricated and compared.The effects of humidity on capacitance and resistance of the Ag/PEPC/NiPc/ZnO/Ag sensors were investigated at two frequencies of the applied voltage:120 Hz and 1 kHz.It was observed that at 120 Hz under humidity of up to 95% RH the capacitance of the sensors increased by 540 times and resistance decreased by 450 times with respect to humidity conditions of 50% RH.It was found that the sensor with a thinner semiconducting film (330 nm) was more sensitive than the sensor with a thicker film (400 nm).The sensitivity was improved when the sensor was used at a lower frequency as compared with a high frequency.It is assumed that the humidity response of the sensors is associated with absorption of water vapors and doping of water molecules in the semiconductor blend layer.This had been proven by simulation of the capacitance-humidity relationship.     

Ag层的厚度对ZnO/Ag/ZnO多层膜性能的影响

采用射频磁控溅射ZnO陶瓷靶、直流磁控溅射Ag靶的方法制备了不同厚度Ag夹层的ZnO(60nm)/Ag/ZnO(60nm)多层膜.分别用X射线衍射仪、紫外可见分光光度计、四探针测试仪对样品的结构、光学性质、电学性质进行了研究.结果表明:随着Ag层厚度的增加,ZnO/Ag/ZnO多层膜呈现多晶结构,Ag(111)衍射峰的强度增强.Ag夹层厚度为11nm时,ZnO(60nm)/Ag/ZnO(60nm)膜在554nm处的透过率高达92.3%.随着Ag层厚度的增加,Ag膜的特征吸收峰呈现红移和宽化,ZnO/Ag/ZnO多层膜的面电阻先减小后趋于稳定.     

ZnO/Ag/ZnO多层膜的制备和性质研究

采用射频磁控溅射ZnO陶瓷靶和直流磁控溅射Ag靶的方法制备了ZnO/Ag/ZnO多层膜。用X射线衍射仪、紫外–可见分光光度计、四探针测试仪和金相显微镜对ZnO/Ag/ZnO薄膜的结构、光学透过率、方阻和稳定性进行了研究。结果表明,ZnO(60nm)/Ag/(10nm)/ZnO(60nm)薄膜呈现多晶结构,薄膜在520nm处的光学透过率高达87.5%,方阻Rs为6.2Ω/□。随着顶层ZnO薄膜厚度的增加,ZnO/Ag/ZnO薄膜的稳定性提高。     

室温下制备的ZnO/Ag/ZnO多层膜的性能

采用射频磁控溅射ZnO陶瓷靶、直流磁控溅射Ag靶的方法在室温下制备了不同厚度的ZnO/Ag/ZnO多层膜。对样品进行了研究。结果表明:随着Ag层厚度的增加,ZnO(002)衍射峰的强度先增加后减小,Ag(111)衍射峰的强度增强,ZnO/Ag/ZnO多层膜的面电阻先减小后趋于稳定。ZnO膜厚度增加,Ag膜易形成晶状结构,ZnO/Ag/ZnO多层膜的透射峰向长波方向移动。ZnO(60nm)/Ag(11nm)/ZnO(60nm)膜在554nm处的透过率高达92.3%,面电阻为4.2?/□,品质常数?TC最佳,约40×10–3/?。     

ZnO/Ag 纳米线复合薄膜的光电导型紫外探测器

ZnO/Ag纳米线复合薄膜紫外探测器是利用水热法在旋涂制备的Ag纳米线薄膜上生长ZnO 纳米线阵列制备得到。此紫外探测器在4.9 mW cm_-2紫外光强和1V偏压下,其明暗电流比为3100,响应恢复时间分别为3.47s和3.28s,响应度为0.25A/W,探测度为6.9×10₁₂Jones。制备和工作参数被分析以优化紫外探测器结构和性能,如ZnO 纳米线的生长时间,Ag纳米线薄膜的旋涂转速和紫外探测器的工作温度。     

表面等离子体共振增强ZnO/Ag薄膜发光特性研究

为了提高氧化锌光致发光强度,以磁控溅射氧化锌/银复合薄膜为研究对象,系统地研究了氧化锌薄膜的光学性质。实验中首先在硅衬底上用射频磁控溅射的方法沉积氧化锌/银复合薄膜,作为对比,同时沉积了一层氧化锌薄膜。通过扫描电子显微镜和原子力显微镜对样品的形貌及成份进行表征,并且在室温下测试样品在300~800 nm波长范围内的光致发光光谱。实验结果表明:所制得样品为均匀分布的氧化锌纳米薄膜,纯氧化锌光致发光光谱结果显示有波长位于378 nm左右的紫光、470 nm左右的蓝色发光峰存在,加入银薄膜后,氧化锌可见光区和紫外光区的光致发光光谱强度均有所增强,而且紫外光峰位出现了红移。实验结果结合样品吸收谱对光致发光机理的分析作了进一步的分析。     

ITO-free flexible organic light-emitting diode using ZnS/Ag/MoO3 anode incorporating a quasi-perfect Ag thin film

The multi-layer electrode (ZnS/Ag/MoO₃) was optimized by investigating the formation of a continuous Ag thin film according to the base layer. The aggregation of the Ag atom was strictly limited on the ZnS layer, which showed the best thermal stability for Ag. The thermally evaporated 7-nm-thick Ag film with surface coverage of 99.6% was achieved on the ZnS layer. We fabricated the ZnS (25 nm)/Ag (7 nm)/MoO₃ (5 nm) (Z25A7M5) multi-layer electrode, optimized through the numerical calculation. The transmittance of 83% at λ = 550 nm and sheet resistance of 9.6 Ohm/sq were recorded from the Z25A7M5 electrode. These results were mainly attributed to the uniform film-like morphology of the Ag thin film. The flexible OLEDs, based on the Z25A7M5 anode also showed feasible I–V–L characteristics compared to those of ITO-based devices.     

ZnO:Ag薄膜的制备及其光学性能研究

采用蒸镀与氧化二步法,以高纯混合金属Zn:Ag作蒸发源,在石英衬底上沉积Zn:Ag金属薄膜,经不同热氧化处理生长Ag掺杂ZnO薄膜。结果显示,以Ag含量为质量分数3%的蒸发源沉积的Zn:Ag薄膜经500℃氧化后,生成的ZnO:Ag薄膜在380 nm附近出现很强的近带边紫外发光峰,在438~470 nm附近出现较弱的深能级缺陷发光峰,该薄膜在360 nm有接近垂直的吸收边,其载流子浓度为1.810×1021cm–3,表现出p型导电特性和较好的光学质量。     

Low resistive transparent and flexible ZnO/Ag/ZnO/Ag/WO3 electrode for organic light-emitting diodes

Transparent electrodes cannot easily be created with high transmittance and low sheet resistance simultaneously, although some optoelectronic devices, such as large organic light-emitting diode (OLED) displays and lightings, require very low resistive transparent electrodes. Here, we propose a very low resistive transparent electrode (～1.6 Ω/sq) with a high transmittance (～75%) for OLED devices, the transmittance level of which represents the highest reported value to date given such a low sheet resistance level. It consists of a stacked silver (Ag)/zinc oxide (ZnO)/Ag multilayer covered by high refractive index dielectric layers. The proposed multilayer electrode with optimal layer thicknesses has a high and wide spectral transmittance peak due to interference. The low sheet resistance is a result of two Ag layers connected via the sandwiched ZnO layer. In addition to its low sheet resistance coupled with high transmittance, the proposed multilayer electrode has good flexibility. An OLED with an anode of the stacked Ag/ZnO/Ag multilayer shows performance comparable to that of an anode of indium tin oxide.     

Effect of Ag on the Microstructure of Sn-8.5Zn-xAg-0.01Al-0.1Ga Solders Under High-Temperature and High-Humidity Conditions

The effect of Ag on the microstructure and thermal behavior of Sn-Zn and Sn-8.5Zn-xAg-0.01Al-0.1Ga solders (x from 0.1 wt.% to 1 wt.%) under high-temperature/relative humidity conditions (85°C/85% RH) for various exposure times was investigated. Scanning electron microscopy (SEM) studies revealed that, in all the investigated solders, the primary α-Zn phases were surrounded by eutectic β-Sn/α-Zn phases, in which fine Zn platelets were dispersed in the β-Sn matrix. SEM micrographs revealed that increase of the Ag content to 1 wt.% resulted in coarsening of the dendritic plates and diminished the Sn-9Zn eutectic phase in the microstructure. Differential scanning calorimetry (DSC) studies revealed that the melting temperature of Sn-8.5Zn-xAg-0.01Al-0.1Ga solder decreased from 199.6°C to 199.2°C with increase of the Ag content in the solder alloy. Both ZnO and SnO₂ along with Ag-Zn intermetallic compound (IMC) were formed on the surface when Sn-8.5Zn-0.5Ag-0.01Al-0.1Ga solder was exposed to high-temperature/high-humidity conditions (85°C/85% RH) for 100 h. The thickness of the ZnO phase increased as the Ag content and exposure time were increased. Sn whiskers of various shapes and lengths varying from 2 μm to 5 μm were extruded from the surface when the investigated five-element solder with Ag content varying from 0.5 wt.% to 1 wt.% was exposed to similar temperature/humidity conditions for 250 h. The length and density of the whiskers increased with further increase of the exposure time to 500 h and the Ag content in the solder to 1 wt.%. The Sn whisker growth was driven by the compressive stress in the solder, which was generated due to the volume expansion caused by ZnO and Ag-Zn intermetallic compound formation at the grain boundaries of Sn.     

Effect of Zn Addition on Interfacial Reactions Between Sn-4Ag Solder and Ag Substrates

In this study, the effect of Zn (Zn = 1 wt.%, 3 wt.%, and 7 wt.%) additions to Sn-4Ag solder reacting with Ag substrates was investigated under solid-state and liquid-state conditions. The composition and microstructure of the intermetallic compounds (IMCs) significantly changed due to the introduction of different Zn contents. In the case of Sn-4Ag solder with 1 wt.% Zn, a continuous Ag-Sn IMC layer formed on the Ag substrates; discontinuous Ag-Zn layers and Sn-rich regions formed on the Ag substrates under liquid-state conditions when the Sn-4Ag solders contained 3 wt.% and 7 wt.% Zn. If 3 wt.% Zn was added to Sn-4Ag solder, the Ag-Sn IMC would be transformed into a Ag-Zn IMC with increasing aging time. Rough interfaces between the IMCs and the Ag substrates were observed in Sn-4Ag-7Zn/Ag joints after reflowing at 260°C for 15 min; however, the interfaces between the IMCs and the Ag substrates became smooth for Sn-4Ag-1Zn/Ag and Sn-4Ag-3Zn/Ag joints. The nonparabolic growth mechanism of IMCs was probed in the Sn-4Ag-3Zn/Ag joints during liquid-state reaction, and can be attributed to the detachment of IMCs. On the other hand, the effect of gravity was also taken into account to explain the formation of IMCs at the three different interfaces (bottom, top, and vertical) during the reflow procedure.     

Photoconductive properties of organic-inorganic Ag/p-CuPc/n-GaAs/Ag cell

A thin film of copper phthalocyanine(CuPc),a p-type semiconductor,was deposited by thermal evaporation in vacuum on an n-type gallium arsenide(GaAs) single-crystal semiconductor substrate.Then semitransparent Ag thin film was deposited onto the CuPc film also by thermal evaporation to fabricate the Ag/p-CuPc /n-GaAs/Ag cell.Photoconduction of the cell was measured in photoresistive and photodiode modes of operation. It was observed that with an increase in illumination,the photoresistance decreased in reverse bias while it increased in forward bias.The photocurrent was increased in reverse bias operation.In forward bias operation with an increase in illumination,the photocurrent showed a different behavior depending on the voltage applied.     

Fabrication of Ag nanoparticle/ZnO thin films using dual-plasma-enhanced metal-organic chemical vapor deposition (DPEMOCVD) system incorporated with photoreduction method and its application

We report a novel method to grow silver nanoparticle/zinc oxide (Ag NP/ZnO) thin films using a dual-plasma-enhanced metal-organic chemical vapor deposition (DPEMOCVD) system incorporated with a photoreduction method. The crystalline quality, optical properties, and electrical characteristics of Ag NP/ZnO thin films depend on the AgNO₃ concentration or Ag content and annealing temperature. Optimal Ag NP/ZnO thin films have been grown with a AgNO₃ concentration of 0.12 M or 2.54 at%- Ag content and 500 °C- rapid thermal annealing (RTA); these films show orientation peaks of hexagonal-wurtzite-structured ZnO (002) and face-center-cubic-crystalline Ag (111), respectively. The transmittance and resistivity for optimal Ag NP/ZnO thin films are 85% and 6.9×10⁻⁴ Ω cm. Some Ag NP/ZnO transparent conducting oxide (TCO) films were applied to InGaN/GaN LEDs as transparent conductive layers. The InGaN/GaN LEDs with optimal Ag NP/ZnO TCO films showed electric and optical performance levels similar to those of devices fabricated with indium tin oxide.     

The electronic structure of Ni-phthalocyanine/metal interfaces studied by X-ray and ultraviolet photoelectron spectroscopy

Nickel phthalocyanine (NiPc) thin films were grown stepwise on polycrystalline gold and silver substrates and the formed interfaces were characterized by X-ray and ultraviolet photoelectron spectroscopies (XPS, UPS). The variation of the XPS core level binding energy with NiPc film thickness yields information about band bending and interface dipoles. The valence band structure of the NiPc thin films was determined by UPS and exhibits four main features at binding energies 1.50 eV, 3.80 eV, 6.60 eV and 8.85 eV, respectively. The NiPc highest occupied molecular orbital (HOMO) cut-off was measured at ∼1.00 eV from the analyzer Fermi level and from the measured work function change of the growing NiPc film a final work function value for NiPc was estimated at 3.90 ± 0.10 eV. The main C1s peak of the NiPc film (∼5.0 nm) consists of two components at 284.8 eV (C–C bonds), 286.2 eV (C–N bonds) reflecting photoemission from multiple carbon sites within the molecule and a satellite at 287.9 eV, whereas the Ni2p and N1s peaks appear at ∼855.9 eV and ∼399.3 eV, respectively and are due to Ni–N bonds. The energy level diagrams of the NiPc/Au and NiPc/Ag interfaces were determined from a combination of the XPS and UPS results, yielding a hole injection barrier of 0.90 ± 0.10 eV for both substrates.     

Effects of the Ag content on the geometrical and electrical characteristics of the screen-printed etched gate electrodes of OTFTs using Ag ink

During the fabrication of gate electrodes by Ag ink screen-printing combined with a wet-etching process, the effects of the Ag content on the geometrical and electrical characteristics such as the thickness and surface roughness of gate electrode, step coverage with the gate dielectric, leakage current associated with the step coverage, and the electrical performance of organic thin film transistors (OTFTs) were investigated. An increase of Ag content resulted in the thick and densely-packed Ag electrode, which had a stable and excellent conductivity. But, the large thickness of Ag electrode caused the worse step coverage of PVP (polyvinylphenol) dielectric layer on the edge of the Ag gate electrode, therefore, for Ag contents more than 40 wt.%, MIM (metal-insulator-metal) devices and OTFTs with the Ag gate electrodes had very large leakage current (>10⁻⁴ A/cm²) and off-state current (>∼19 pA/μm) due to the poor step coverage of PVP dielectric layers, respectively. Finally, we found that an Ag content of 20-30 wt.% was suitable for the screen-printed etched gate electrode of OTFTs using Ag ink. This range generated a mobility of 0.18 cm²/V s, an on/off current of 5 × 10⁶, and an off-state current of 0.002 pA/μm, which are suitable to drive e-paper.     

Ag掺杂ZnO/GaN异质结可见光吸收特性的第一性原理

ZnO/GaN异质结带隙宽度较宽,制约了对可见光的吸收。为研究Ag对ZnO/GaN异质结可见光吸收的影响,在(1-100)非极性面上构建GaN/ZnO异质结,并用Ag分别取代不同位置的Zn和Ga原子,采用第一性原理计算Ag掺杂对ZnO/GaN异质结稳定性、电子结构、光学性质和带边位置的影响。研究结果表明：Ag掺杂ZnO/GaN异质结形成能为负值,结构稳定;Ag置换Zn和Ga使带隙宽度由2.93 eV分别减小至2.7 eV和2.3 eV,吸收系数和光电导产生红移,有利于可见光的吸收,Ag掺杂ZnO/GaN异质结具有良好的光催化活性。     

An optical fiber hydrogen sensor with Pd/Ag film

A20 nanometer palladium-silver （Pd/Ag） ultra-thin film was used for hydrogen gas sensing. The atomic ratio of Pd： Ag was 3：1, the thin film was evaporated on the optical glass, the Pd/Ag alloy could increase the life and provide the stability of the sensing film. The artificial neutral network was used for processing the data collected from the optical fiber bundle hydrogen sensor, which could enhance the measuring accuracy, at the same time, the intrinsic and extrinsic influences were eliminated mainly. Experimental results and numerical simulation show the training method available, a linear precision of 0. 1% for the optical hydrogen sensor is achieved.     

Flexible organic light-emitting diodes with ZnS/Ag/ZnO/Ag/WO3 multilayer electrode as a transparent anode

We investigated the highly flexible, transparent and very low resistance ZnS/1st Ag/ZnO/2nd Ag/WO₃ (ZAZAW) multilayer electrodes on PET substrate as an anode in flexible organic light-emitting diodes (OLEDs). A theoretical calculation was first conducted to obtain the optimal thickness of the ZAZAW multilayer for high transparency. Its measured luminous transmittance was over 80% in the visible range with a very low sheet resistance of 2.17 Ω/sq., and it had good mechanical flexibility due to the ductility of Ag. Ag’s effect on optical and electrical properties was also studied. Flexible OLEDs devices that were fabricated on ZAZAW multilayer anode showed good hole injection properties comparable to those of ITO-based OLEDs due to the use of WO₃ as a hole injection layer. However, the electroluminescent properties of the ZAZAW-based OLEDs varied depending on WO₃ thickness. Although the transmittance of the ZAZAW electrode was reduced by tuning the WO₃ thickness to adjust the microcavity effect, the device efficiency could be enhanced above that of ITO-based OLEDs.     

Preparation and photocatalytic performance of Ag/ZnO nano-composites

Ag/ZnO nano-composites sized between 20 and 50 nm were prepared by the coordination homogeneous co-precipitation method. Thermogravimetry/differential thermal analysis (TG-DTA), Fourier transform infrared (FT-IR), X-ray diffraction (XRD), transmission electron microscopy (TEM) and ultraviolet–visible (UV–vis) were used to characterize the microstructure and morphology of the precursor and the products obtained at various temperatures. The research on the growth dynamics of product Ag/ZnO showed that the dynamic growth index was 1.32, indicating that the rate of the grain growth was quick at 300–600 °C. The results of the photocatalytic degradation of methyl orange (MO) in aqueous solution indicated that the Ag/ZnO photocatalyst prepared by the coordination homogeneous co-precipitation method exhibited better photocatalytic performance than that prepared by the photoreduction method, especially the photocatalyst calcined at 300 °C, and the photocatalytic performance decreased when the calcining temperature increased from 300 to 700 °C.     

Ag modified bathocuproine:ZnO nanoparticles electron buffer layer based bifacial inverted-type perovskite solar cells

An Ag modified bathocuproine:ZnO nanoparticles (BCP:ZnO NPs) thin film was used as the buffer layer of inverted-type perovskite solar cells, which increased the bifacial power conversion efficiency from 6.82% to 15.50%. The surface-enhanced Raman scattering and absorbance spectra show that the Ag modified BCP small molecules can effectively passivate the surface oxygen defects of ZnO NPs and thereby increasing the crystallinity, which simultaneously increases the short-circuit current density (J_SC) and fill factor. It is noted that a high incident photon-to-electron conversion efficiency (IPCE) of 92% is achieved at the wavelength of 587 nm due to the constructive interference effect in the multilayer structure, which can be used to explain the high photocurrent generation in a semi-transparent solar cell. In addition, the light intensity-dependent experimental results of the bifacial perovskite solar demonstrates that the hole transportation is better than the electron transportation in the perovskite thin film. This concept can be readily used in the optimization of high-efficiency bifacial perovskite solar cells.