The use of metalorganic chemical vapor deposition to prepare device quality Ga(AsP) strained-layer superlattices

Strained-layer superlattices (SLS’s), which consist of thin (<300 Å) alternating layers of Ga(AsP) and GaAs or GaP, have been prepared by metalorganic chemical vapor deposition (MOCVD). Transmission electron microscopy and x-ray diffraction of the SLS’s indicate that the layers are coherently strained and dislocation free. The mismatch between these very thin layers is totally accommodated by strain for misfits of one percent or less. The layer thickness for the binaries and the ternary is controlled by the TMG flow while the solid composition for the ternary is determined by the arsine/phosphine ratio. The solid composition for a fixed arsine/phosphine ratio is a function of temperature and arsine partial pressure. Uniformly doped SLS’s have properties similar to the ternary of the same composition. A photodiode has been prepared from a GaAs_0.2P_0.8/ GaP SLS with a leakage current of 155 × 10^-6 A/cm² at -5V and a quantum efficiency of 40% at 420 nm.     

Field dependence of mobility in Al0.2Ga0.8As/GaAs heterojunctions at very low fields

Multiple-period (Al, Ga)As/GaAs modulation doped heterojunction structures have been grown with molecular beam epitaxy. Electron mobilities of about 200 000 cm2/Vs at 10 K and 90000 cm2/Vs at 77 K with associated sheet carrier concentrations of about 2×1012 cm?2 have been observed. The current parallel to the interfaces for low electric fields was examined as a function of lattice temperature. The electron mobility has been observed to be strongly dependent on the strength of the electric field, and hot electron effects were observable at a field as low as 10 V/cm. To our knowledge this is the first report of hot electron phenomena in GaAs at such small fields.     

In0.2Ga0.8As/GaAs quantum well laser with C doped cladding and ohmic contact layers

Carbon doping in Al_xGa_1−xAs was achieved using different approaches. The moderate growth temperature of 650°C was employed to grow C bulk-doped Al_xGa_1−xAs with a high Al mole fraction. The hole-density was altered using different V/III ratios. The trimethylaluminum (TMAl) was used as an effective C δ-doping precursor for growth of C δ-doped pipi doping superlattices in Al_xGa_1−xAs. the average hole-density of C δ-doped pipi superlattices was greater than 2−3 × 10¹⁹ cm⁻³. Zn-free GRINSCH In_0.2Ga_0.8As/GaAs laser structures were then grown using the C bulk-doped Al_xGa_1−xAs and C δ-doped pipi superlattice as a cladding and ohmic contact layer, respectively. The ridge waveguide laser diodes were fabricated and characterized to verify flexibility of these two doping approaches for device structures.     

Field dependence of impact ionization coefficients in In/sub 0.53/Ga/sub 0.47/As

Electron and hole ionization coefficients in In/sub 0.53/Ga/sub 0.47/As are deduced from mixed carrier avalanche photomultiplication measurements on a series of p-i-n diode layers, eliminating other effects that can lead to an increase in photocurrent with reverse bias. Low field ionization is observed for electrons but not for holes, resulting in a larger ratio of ionization coefficients, even at moderately high electric fields than previously reported. The measured ionization coefficients are marginally lower than those of GaAs for fields above 250 kVcm/sup -1/, supporting reports of slightly higher avalanche breakdown voltages in In/sub 0.53/Ga/sub 0.47/As than in GaAs p-i-n diodes.     

MOCVD生长InGaAs／Alj0.2Ga0.8As应变多量子阱

用MOCVD方法生长了3种InGaAs/Al0.2Ga0.8As应变多量子阱（MQWs）样品，用于研究在气相中TMIn的含量对MQWs的发光波长和半峰宽（FWHM）以及在X射线中零级峰位的影响。研究表明，随着In组分在MQW中的增加，MQWs中应变也随之增加，这是造成FWHM增大的原因。同时也研究了应变MQWs中In组分与气相中TMIn含量的关系，为准确设计和控制MQWs的组分提供了依据。     

强THz场下GaAs和InSb中瞬态谷间散射和碰撞电离

运用系宗蒙特卡罗法计算了强THz场作用下, n型掺杂的GaAs和InSb中随时间变化的散射机制以及载流子非线性动力学演变, 获取了电子散射至卫星谷并弛豫回原能谷的时间信息, 并追踪描绘了载流子瞬态增加的过程, 结果同时显示了强场作用下谷间散射是GaAs中的主要散射机制, 而碰撞电离则是InSb中的关键因素.此外进一步讨论了这两种机制对于相关物理量: 平均动能、平均速度、材料的电导率的影响, 结果说明这两种机制导致了非线性效应并在两种材料中起到相反的作用, InSb中碰撞电离的响应时间比GaAs中谷间散射的响应时间更长.该研究结果在THz调制领域有一定的指导意义.     

Experimental determination of impact ionization coefficients in

The room-temperature electron and hold impact ionization coefficients, α and β, respectively, have been determined for     

Type I and Type II Alignment of the Light Hole Band in In0.15Ga0.85As/GaAs and in ln0.15Ga0.85As/Al0.15Ga0.85As Strained Quantum Wells

We present results of photoluminescence and cathodoluminescence measurements of strained undoped In_0.15Ga_0.85As/GaAs and In_0.15Ga_0.85As/Al_0.15Ga_0.85As quantum well structures, designed to throw light on the current controversy over light-hole band alignment at low In content. We compare these data with theoretical calculations of the confined state energies within the eight band effective mass approximation. Our analysis shows that for In_0.15Ga_0.85As/GaAs, the observed two transitions are consistent with either type I or type II alignment of the light hole band for band offset ratios within the accepted range. In the case of In_0.15Ga_0.85As/Al_0.15Ga_0.85As, however, our results clearly indicate type II alignment for the light hole band. We derive the band offset ratio Q, defined here as Q = δE_c/δE_g where δE_c is the conduction band offset and δE_g is the bandgap difference between the quantum well and the barrier in the presence of strain, for the In_0.15Ga_0.85As/Al_0.15Ga_0.85As system to be Q = 0.83 and discuss it in the context of the common anion rule.     

Long wavelength GaAs/Al x Ga1−x As quantum well infrared photodetectors grown using metal organic chemical vapor deposition

High performance quantum well infrared photodetectors (QWIPs) have been grown using metalorganic chemical vapor deposition. Detailed optical and electrical measurements as a function of growth temperature T_G, show that the best quality samples were grown at the highest temperature tried,i.e. T _G = 700°C.     

High uniformity of Al0.3Ga0.7As/ln0.15Ga0.85As doped-channel structures grown by molecular beam epitaxy on 3″ GaAs substrates

Al_0.3Ga_0.7As/ln_0.15Ga_0.85As doped-channel structures were grown by molecular beam epitaxy on 3″ GaAs substrates. The uniformities of electrical and optical properties across a 3″ wafer were evaluated. A maximum 10% variation of sheet charge density and Hall mobility was achieved for this doped-channel structure. A1 μm long gate field-effect transistor (FET) built on this layer demonstrated a peak transconductance of 350 mS/mm with a current density of 470 mA/mm. Compared to the high electron mobility transistors, this doped-channel FET provides a higher current density and higher breakdown voltage, which is very suitable for high-power microwave device applications.     

Ga1-xAlxSb avalanche photodiodes: Resonant impact ionization with very high ratio of ionization coefficients

The liquid-phase epitaxy and device fabrication of p-n and p-i-n Ga1-xAlxSb avalanche photodiodes is described. Breakdown voltages up to 95 V and dark currents of 10^-4A/cm²have been obtained. With p-i-n diodes we have measured the impact ionization coefficients α (electrons) and β (holes) with different composition and temperature. A resonant enhancement of the hole ionization coefficient is found forx = 0.065(300 K) where the ratiobeta/alphaexceeds values of 20. This effect is attributed to impact ionization initiated by holes from the split-off valence band: if the spin orbit splitting Δ is equal to the bandgap energy Eg, the threshold energy for hole initiated impact ionization reaches the smallest possible value (E_{i} = E_{g}) and the ionization process occurs with zero momentum. This leads to a strong increase of β atDelta/E_{g} = 1. The experimentally determined dependence of ionization coefficients on threshold energy is compared with theoretical expectations.     

Ga/sub 0.8/In/sub 0.2/As/GaAs/Ga/sub 0.51/In/sub 0.49/P buried ridge structure single quantum well laser emitting at 0.98 mu m

The first fabrication is reported of a buried ridge structure Ga/sub 0.8/In/sub 0.2/As/GaAs/Ga/sub 0.51/In/sub 0.49/P laser emitting at 0.98 mu m grown by two-step low pressure metal organic chemical vapour deposition. The width of the ridge is 2 mu m. Laser output power greater than 40 mW with a threshold current of 30 mA has been measured. A typical quantum efficiency of eta =60% was obtained without any facet coating. Excellent homogeneity and uniformity have been achieved over a wafer area of 10 cm/sup 2/.<>     

Photocurrent anisotropy in compositional modulated superlattice of long-range ordered Ga0.5In0.5P

Photocurrent anisotropy of long-range ordered Ga_0.5In_0.5P alloys has been sys-tematically investigated. The ordered Ga_0.5In_0.5P is a compositional modulated superlattice of Ga_0.5+η/2In_0.5-η/2P and Ga_0.5-η/2In_0.5+η/2P monolayer planes, where η is a long-range order parameter. The photocurrent edge of the [110] polarization is lower than that of the . The observed anisotropy in the photocurrent spectra is due to a crystal-field splitting at the valence-band maximum in ordered Ga_0.5In_0.5P. The anisotropy shows a continous variation as a function of η. In order to make clear the effects of the valence-band splitting on the polarized photocurrent spectra, we performed theoretical calculations in which a distribu-tion of η in the epitaxial film and an order-parameter dependence of oscillator strength were considered. From these calculations, it is found that oscillator strength is a key parameter in the anisotropic character. The calculated results moderately agree with the measured data. Furthermore, the epitaxial thickness dependence of the anisotropic character in photocurrent was investigated.     

In0．2Ga0．8As-GaAs复合应力缓冲层上的1.3μm InAs／GaAs自组织量子点

用光荧光谱和原子力显微镜测试技术系统研究了在2 nm In0.2Ga0.8As和x ML GaAs的复合应力缓冲层上生长的InAs/GaAs自组织量子点的发光特性和表面形貌.采用In0.2Ga0.8As与薄层GaAs复合的应力缓冲层,由于减少了晶格失配度致使量子点密度从约1.7×109 cm-2显著增加到约3.8×109cm-2.同时,复合层也有利于提高量子点中In的组份,使量子点的高宽比增加,促进量子点发光峰红移.对于x=10 ML的样品室温下基态发光峰达到1350 nm.     

Direct interferometric measurements of quantum-confined Stark effect in InAs/GaAs short period strained-layer superlattice MQWs

The electrorefraction within and below the band edge of multiple (50) InAs/GaAs short period strained-layer superlattice quantum wells has been measured. An index change of 4*10/sup -3/ was measured near the excitonic resonance with an applied electric field of 27 kV/cm, corresponding to a quadratic electro-optic coefficient of -3*10/sup -13/ cm/sup 2//V/sup 2/. These results agree with predictions from the Kramers-Kronig relations based on measurements of electroabsorption.<>     

Highly strained ln0.35Ga0.65As/GaAs layers grown by molecular beam epitaxy for high hole mobility transistors

We have grown highly strained In_0.35Ga_0.65As layers on GaAs substrates by molecular beam epitaxy to improve the performance of high hole mobility transistors (HHMTs). The mobility and sheet hole concentration of double side doped pseudomorphic HHMT structures at room temperature reached 314 cm2/V-s and 1.19 × 10¹² cm⁻², respectively. Photoluminescence measurements at room temperature show good crystalline quality of the In^0.35Ga_0.65As layers. This study suggests that the performance of HHMTs can be improved by using high-quality In_0.35Ga_0.65As layers for the channel of double side doped heterostructures pseudomorphically grown on GaAs substrates.     

In_（0．2）Ga_（0．8）As／GaAs应变多量子阱结构的光调制反射和热调制反射谱的研究

对Ｉｎ（０．２）Ｇａ（０．８）Ａｓ／ＧａＡｓ应变多量子阱在７７Ｋ下的光调制反射谱（ＰＲ）和热调制反射谱（ＴＲ）进行了实验研究．对ＰＲ结果的线形拟合指认了应变多量子阱中子能级的跃迁，并与理论计算结果作了比较．实验对比确认ＰＲ中１１Ｈ、１３Ｈ等跃迁结构为非耦合态、具有电场调制机构的一阶微商性质．而１１Ｌ、３１Ｈ、２２Ｈ等跃迁结构为阶间耦合态，对这些隧穿耦合的低场调制产生三阶微商特性．     

Influence of Ga vs As prelayers on GaAs/Ge growth morphology

The surface morphology of GaAs films grown on Ge substrates is studied by scanning force microscopy. We find a dramatic difference arising from Ga as opposed to As prelayers in the formation of anti-phase boundaries (APBs), surface features near threading dislocations, and surface roughness, for films as thick as 1 μm. Ga prelayer samples are smooth; thin films display some APBs with predominantly one growth domain while the 1 μm thick film displays the morphology of a homoepitaxial GaAs film. In contrast, As prelayer samples are rough with complicated APB structures, which can be attributed to the increase in single steps during As₂ deposition.     

碲镉汞探测器在高温目标下的光电倍增效应

针对不同波段的碲镉汞红外探测器在探测高温目标情况下的特性进行了研究。测量结果显示随着所探测目标温度的不断升高,器件光生电流亦随之上升,但并非平行变化,这就导致了探测器动态微分阻抗不断下降。器件微分电阻下降的主要原因是p?蛳n结由于背景辐照和反向偏压的增加,引起光生载流子的激增,碰撞电离导致的光电倍增效应引起的,这种效应使得器件光生电流并非是单纯叠加在器件反偏暗电流之上、只随辐射通量而变化的变量,同时也是偏压的函数,随着偏压的增大会对微分阻抗有一个降低作用。通过理论计算这种假设得到了证实,实验结果和理论计算吻合的比较好。     

Boundary effects on multiplication noise in thin heterostructure avalanche photodiodes: theory and experiment [Al/sub 0.6/Ga/sub 0.4/As/GaAs]

The history-dependent recurrence theory for multiplication noise in avalanche photodiodes (APDs), developed by Hayat et al., is generalized to include inter-layer boundary effects in heterostructure APDs with multilayer multiplication regions. These boundary effects include the initial energy of injected carriers as well as bandgap-transition effects within a multilayer multiplication region. It is shown that the excess noise factor can be significantly reduced if the avalanche process is initiated with an energetic carrier, in which case the initial energy serves to reduce the initial dead space associated with the injected carrier. An excess noise factor reduction up to 40% below the traditional thin-APD limit is predicted for GaAs, depending on the operational gain and the multiplication-region's width. The generalized model also thoroughly characterizes the behavior of dead space as a function of position across layers. This simultaneously captures the effect of the nonuniform electric field as well as the anticipatory nature of inter-layer bandgap-boundary effects.