辐照诱生的双极性线性稳压器的1/f 噪声退化研究

研究发现辐照能使双极线性稳压器LM117的输出1/f噪声性能退化。本文在研究双极线性稳压器LM117的辐照失效机理基础上,认为LM117的内部带隙基准是其噪声性能退化的关键部件,辐照引起的带隙基准内部的双极性晶体管的基极表面复合电流的退化,导致LM117输出1/f噪声发生退化。通过对比,可以看出1/f噪声比电参数敏感,也可以用来表征LM117辐照损伤。     

Buck型小功率DC／DC模块电源总剂量辐照实验研究

用于空间系统的电子元器件和电路性能受辐照累积剂量的严重影响。本文针对一种Buck型小功率DC／DC模块电源进行了电离辐照实验，研究结果表明：随着辐照剂量的增加，该类器件输出电压增大，输入电流增大和整体转换效率降低，且加偏辐照DC／DC模块电源更早出现上述参数退化，其低频噪声参量呈现出与电参数相似但幅度更大的退化趋势。进一步的研究结果表明，其内部的功率MOSFET辐照引起的阈值电压漂移是导致该类电源辐照后输出电压增加的主要原因。本文研究结果可为该类器件的抗辐照性能加固提供实验基础。     

双极线性稳压器(LM317)的电离总剂量效应及剂量率的影响

对一款双极集成、三端线性稳压器LM317进行了不同偏置、不同剂量率条件下的电离辐射效应及室温退火特性研究。研究结果表明:器件输出电压、输入输出压差等敏感参数在电离辐射环境下发生了不同程度的变化,且在零偏偏置辐照下的变化比工作偏置辐照下的变化大;在零偏偏置条件,总剂量相同时低剂量率辐照下的损伤明显大于高剂量率辐照,表现出低剂量率损伤增强效应;在工作偏置条件,高剂量率辐照下的损伤大于低剂量率辐照下的损伤,但随后的退火实验中恢复到低剂量率辐照损伤水平,表现出时间相关效应。对稳压器辐射敏感参数的影响因素和不同偏置下的剂量率影响进行了分析和讨论。     

TPS61322集成式升压DC-DC电源变换器的总剂量效应研究

对低功率、升压型集成式DC-DC电源变换器的电离总剂量辐射损伤效应进行了研究。探讨了变换器在不同负载、不同输入电压条件下输出电压随总剂量的变化关系;揭示了升压型器件在高剂量率条件下输出电压瞬间损伤退化机理;分析了器件在关机模式（Shutdown mode）条件下关机电流变化规律。详细研究了负载电流对输出电压的影响,实验结果表明,相同辐照剂量,输出电压的退化程度随负载电流的增加而增大,满载条件下,输出电压退化最严重。关机电流在关机模式条件下出现显著退化,可以作为评估器件抗辐射性能的敏感参数。此外,发现Boost器件满载条件下高剂量率损伤效应,高剂量率条件下的输出电压瞬间损伤退化显著大于低剂量率下的输出电压退化。研究剂量率辐射效应对分析和评估应用于核电站环境下的DC-DC电源变换器辐射损伤具有重要意义。     

一种用于负LDO稳压器的高精度带隙基准源

介绍了一种高精度带隙基准电路结构。采用二阶曲率补偿技术,通过增加一正温度系数项,补偿电路中Vbe(T)展开的负温度系数对数项,改善了基准电压源的温度稳定性。应用该基准电路,设计了一个负输出低压差(LDO)线性稳压器,用高压BIPIC工艺进行流片。测试结果显示,该负LDO线性稳压器的温度系数为85 ppm/℃,线性调整率≤0.02%/V,负载调整率≤0.2%。     

用于LDO稳压器的CMOS基准电压源的设计

LDO稳压器对其中的基准电压电路较高精度要求和较低静态电流要求是一对矛盾,本文折衷设计了一款简单实用的CMOS电压基准电路。仿真结果显示,基准电路静态电流约为35μA,基准电压的温度系数为±15×10~(-6)/℃;低频时电源抑制比为63 dB,电压调整率为0．005。     

不同工艺线性稳压器电离辐射效应及退火特性

研究掺氯氧化+PE钝化、无氯氧化+PE钝化、掺氯氧化+BPSG钝化三种不同工艺线性稳压器的电离辐照响应及退火特性。实验结果发现,掺氯氧化+BPSG钝化工艺样品比其他两种工艺电离损伤明显减小,具有较强的抑制电离辐射损伤的能力。退火实验表明,辐射感生的界面态是影响稳压器电离辐射性能的主要因素,减少界面态可大大提高器件抑制电离辐射损伤的能力。     

不同偏置下CCD器件γ射线及质子辐射研究

电荷耦合器件(CCD)是用于空间光电系统可见光成像的图像传感器,在空间应用环境下受辐射效应作用导致CCD性能退化甚至失效。对于CCD空间辐射效应的地面模拟试验研究,辐照试验中CCD采用合适的偏置条件是分析其空间辐射损伤的必要措施。由于CCD对质子辐照导致的电离总剂量效应和位移损伤效应均非常敏感,因此针对CCD空间应用面临的电离总剂量效应和位移损伤效应威胁,开展不同辐照偏置下CCD的辐射效应及损伤机理研究。针对一款国产埋沟CCD器件,开展不同偏置条件下的γ射线和质子辐照试验,获得了CCD的暗电流、光谱响应等辐射敏感参数的电离总剂量效应,位移损伤效应退化规律以及辐照偏置对CCD辐射效应的影响机制。研究表明,γ射线辐照下CCD的偏置产生重要影响,质子辐照下没有明显的偏置效应。根据CCD结构和辐照后的退火试验结果,对CCD的辐射效应损伤机理进行分析。     

GaN HEMT器件中子辐照效应实验研究

建立了GaN HEMT器件(氮化镓高电子迁移率晶体管)中子原位测试技术和辐照效应实验方法,开展了GaN HEMT器件脉冲反应堆中子辐照效应实验研究,重点研究了电离辐射和位移损伤对器件性能退化的影响,获取了GaN HEMT中子位移损伤效应敏感参数和效应规律.结果表明,阈值电压、栅极泄漏电流以及漏极电流是中子辐照损伤的敏感...     

高压电源管理中内部稳压器的设计

设计了一用于高压电源管理芯片中的内部稳压器电路,为系统中低压模块提供稳定的电源电压输入.电路分为基准和线性稳压器两个部分.整个电路结构为:峰值电流源为Brokaw基准供电,获得的基准电压输入后端放大器的正向端中,运用线性稳压器结构进行降压,为后级各模块提供三组不同的电压,又根据各个电源使用场合的不同,对数字电源加入关断机制,并且加强了功率电源的负载调整能力,有效地防止了后续模块的不正常工作.系统测试表明,电路能够产生三组需要的电压,并在容差范围内能够使系统正常工作.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.