抛物面研磨的材料去除率及表面粗糙度研究

固着磨料抛物面研磨是一种新型的抛物面加工方法,文中从单个磨粒的角度出发,讨论了研磨工艺参数对材料去除率和表面粗糙度的影响,建立了理论预测模型,然后利用计算机辅助软件对不同硬度工件材料的材料去除率和表面粗糙度进行了数值模拟仿真,最后用实验验证了模型的正确性,并得出结论:理论预测模型仅能预测材料去除率和表面粗糙度的变化趋势,并不能代替实验得出具体的实验数值,即固着磨料抛物面研磨的材料去除率与主轴转速、研磨压力的5/4次方成正比,与磨粒浓度的1/4次方成反比;表面粗糙度随磨粒尺寸和研磨压力的增加而增加,随磨粒浓度的增加而减小。     

研磨压力对固结聚集体磨料垫自修正影响

固结磨料研磨过程中磨料的微破碎是实现固结磨料垫自修正特性的主要途径,研磨压力是影响磨粒微破碎的关键参数。选用单晶金刚石和聚集体金刚石作为磨粒制备固结磨料垫,在15 kPa压力下以石英玻璃为加工对象进行研磨实验,比较两者的材料去除率及加工稳定性;制备了4种陶瓷结合剂含量的聚集体金刚石,并制备成固结聚集体金刚石磨料垫,探索了不同压力下的固结聚集体金刚石磨料垫的自修正性能;分析了研磨后的工件表面粗糙度和表面微观形貌。结果表明:采用固结聚集体金刚石磨料垫,研磨后工件表面粗糙度低,去除效率稳定;在15~21 kPa的压力下,结合剂含量次高的聚集体金刚石研磨效率高,材料去除率达到8.94~12.43μm/min,加工性能较稳定,研磨后的工件表面粗糙度R a在60 nm左右;在3.5~7 kPa压力下,结合剂含量次低的聚集体金刚石研磨性能较稳定,材料去除率在2.67~3.12μm/min,研磨后的表面粗糙度R a在40 nm左右。高结合剂含量的聚集体金刚石磨粒更适合高研磨压力条件,而低结合剂的聚集体金刚石磨粒更适合于低研磨压力。     

游离磨料和固结磨料研磨后亚表面裂纹层深度研究

不同研磨方式加工K9玻璃产生不同的亚表面裂纹层深度,亚表面裂纹层深度的测量对确定材料下一步的加工去除量和提高加工效率具有重要意义。利用磁流变抛光斑点法测量游离磨料和固结磨料两种方式研磨后的亚表面裂纹层深度,每种研磨方式选用粒径分别为W40和W14的两种磨料。结果表明:磨粒粒径为W40和W14的游离磨料研磨后K9玻璃的亚表面裂纹层深度分别为20.1μm和3.646μm,而对应固结磨料研磨后的深度分别为3.37μm和0.837μm。固结磨料研磨在加工过程中能有效减小K9玻璃的亚表面裂纹层深度,提高加工效率和工件表面质量,改善器件的性能。     

固结磨料研磨铝合金工艺研究

通过建立单粒磨料切削铝合金的受力模型,利用研磨过程中工件的受力平衡,计算单粒磨料切入工件的深度,从而建立粗糙度数学模型。并以该模型为基础,利用Matlab软件进行参数分析,讨论磨粒大小、研磨压力和磨粒浓度对表面粗糙度的影响,并进行了实验验证。结果表明:该模型准确预测了最后的表面粗糙度,为研磨铝合金工件提供了重要参考依据。     

光学硬脆材料固结磨料研磨中的亚表面损伤预测

研磨过程中亚表面损伤层深度的正确预测是研磨工艺参数制定的重要依据。针对固结磨料的研磨特点,选择两种典型光学硬脆材料(镁铝尖晶石和石英玻璃),采用离散元仿真技术,分别建立了两种材料的二维离散元模型,分析了工艺参数对光学硬脆材料亚表面损伤(裂纹)层深度的影响。而后,采用角度抛光法测量了镁铝尖晶石和石英玻璃的亚表面损伤层深度,进行了实验验证。结果表明:采用固结磨料研磨时,磨粒粒径对光学硬脆材料亚表面损伤的影响相当显著,在相同研磨工艺条件下,随着磨粒粒径的增大,亚表面损伤层深度和微裂纹密集程度明显增加。离散元仿真结果与实验结果的对比表明:采用离散元技术可以对光学硬脆材料的亚表面损伤深度进行快速有效的预测,从而为后续的研磨抛光工艺提供参考与指导。     

不同粒径金刚石固结磨料抛光硫化锌晶体研究

磨粒粒径是影响抛光最重要的参数之一,是决定加工效率和工件表面质量的关键要素。采用1~3μm、2~4μm、3~5μm 3种粒径的金刚石固结磨料抛光垫加工硫化锌晶体,分析磨粒粒径对工件表面质量和材料去除率的影响。实验结果表明,磨粒粒径对硫化锌晶体的固结磨料抛光影响显著,随着磨粒粒径的增大,固结磨料抛光硫化锌晶体的材料去除率增大,而表面质量变差。2~4μm金刚石固结磨料抛光垫加工硫化锌晶体可同时获得高材料去除率和优表面质量,材料去除率达到100 nm/min,表面粗糙度为4.37 nm。     

铌酸锂晶体的研磨亚表面损伤深度

针对光学材料研磨过程引入的亚表面损伤层(SSD)深度对工件的抛光工序效率和表面质量的影响,探索了光学材料在研磨过程中的亚表面损伤规律。采用角度抛光的方法测量了软脆材料铌酸锂(LN)晶体的损伤层深度,分析了研磨方式、磨粒粒径和研磨压力对工件亚表面损伤层的影响规律。结果表明:研磨方式对损伤缺陷的影响最为显著,相同研磨条件下游离磨料研磨后的损伤层深度约为固结磨料研磨的3~4倍,游离磨料研磨后工件亚表面存在多处圆弧形裂纹,固结磨料研磨后主要显现细小裂纹和"人"字型裂纹;当磨粒粒径从W28下降到W14后,游离研磨的亚表面损伤层深度下降至原来的45%,而固结研磨的损伤层深度下降至30%;另外,研磨压力的降低有利于减小工件的亚表面损伤。该研究对LN晶体研磨方式及研磨工艺的选择具有指导意义。     

乙醇浓度对亲水性固结磨料垫自修整特性的影响

自修整能力是评价亲水性固结磨料研磨垫加工性能的重要指标。本文选择不同浓度的乙醇水溶液作为研磨介质,表征了亲水性固结磨料垫基体在研磨介质中的溶胀率与砂浆磨损速率,探索了亲水性固结磨料垫在不同研磨介质条件下研磨石英玻璃的加工性能,采用亲水性固结磨料垫在不同阶段的材料去除速率变化(Material Removal Rate Variation,MRRV)衡量固结磨料垫的自修整能力。结果表明:随着研磨介质中乙醇浓度的增加,溶胀率与砂浆磨损速率均增大,分别达到了1.05%与5.5mg/h,不仅研磨垫的材料去除率与表面质量得到了提高,同时,不同阶段的MRRV大幅减小,体现了更优的自修整能力。当乙醇浓度为25%时,平均材料去除率达到11.82μm/min,表面粗糙度Ra为75nm,磨料垫具备了良好的加工性能。研磨介质中引入乙醇能有效提高固结磨料垫的加工性能。     

固结磨料研磨的材料去除率建模及仿真研究

通过对固结磨料研磨过程作适当简化和假设,在磨粒尺度下,依据磨粒的受力平衡条件,建立工件的材料去除率模型,并用MATLAB软件进行数值模拟,分析影响固结磨料研磨材料去除率的因素,得出结论:固结磨料研磨的材料去除率分别与磨料粒度、研磨外加载荷的二分之三次方及工件与研磨盘的相对速度呈正比,与磨料的体积分数成反比,因此可以通过增加磨料粒度、外加载荷和研磨盘的转速来提高材料去除率。     

氧化铝工程陶瓷研磨工艺研究

通过对氧化铝陶瓷工件的离散磨料研磨和固结磨料研磨试验,分析了研磨方式、磨料粒度、浓度及结合剂种类、研磨压力、研磨速度、研磨时间等工艺参数对成品的形状精度、表面粗糙度、研磨效率的影响,分析其研磨机量,提出了研磨工程陶瓷的合理方法。     

Surface roughness and material removal rate of lapping process on ceramics

Lapping is a widely used surface finishing process for ceramics. An experimental investigation is conducted into the lapping of alumina, Ni−Zn ferrite and sodium silicate glass using SiC abrasive to study the effect of process parameters, such as abrasive particle size, lapping pressure, and abrasive concentration, on the surface roughness and material removal rate during lapping. A simple model is developed based on the indentation fracture and abrasive particle distribution in the slurry to explain various aspects of the lapping process. The model provides predictions for the surface roughness,R _a andR _t , on the machined surface and rough estimation for the material removal rate during lapping. Comparison of the predictions with the experimental measurements reveals same order of magnitude accuracy.     

硬脆性材料用柔性磨具研磨的加工表面粗糙度建模

通过分析磨粒与工件表面的作用过程,建立了硬脆性材料柔性磨具加工表面粗糙度的理论预测模型.以橡胶结合剂金刚石研磨盘为柔性磨具、蓝宝石衬底为工件,在不同弹性模量、磨粒浓度、磨粒粒度和研磨压力下开展研磨试验,将不同研磨条件下的表面粗糙度试验值与理论预测值进行比较,发现试验结果与理论模型预测结果的趋势一致,且预测误差为7.71...     

Effects of particle size, polishing pad and contact pressure in free abrasive polishing

The objective of this research is to better understand the mechanisms of material removal in the free abrasive polishing process. Experiments were carried out to understand the effects of particle size, polishing pad and nominal contact pressure on the wear rate and surface roughness of the polished surface. A theoretical model was developed to predict the relationship between the polishing parameters and the wear rate for the case of hard abrasive particles sandwiched between a soft pad and a workpiece (softer than the abrasive particles). Experimental results and theoretical predictions indicate that the wear rate increases with an increase in particle size, hardness of polishing pad and nominal contact pressure, and with a decrease in elastic modulus of the polishing pad. Surface roughness increases with an increase in particle size and hardness of polishing pad, and nominal contact pressure has little effect on the roughness. A dimensionless parameter, wear index which combines all of the preceding parameters, was introduced to give a semi-quantitative prediction for the wear rate in free abrasive polishing. It is also suggested that when polishing hard material, in order to achieve a high materials removal rate and a smooth surface, it is preferable to use diamond as the polishing particles because of their high deformation resistance.     

硬盘巨磁电阻磁头的超精密抛光工艺

硬盘巨磁电阻磁头的抛光可分为自由磨粒抛光和纳米研磨,在自由磨粒抛光中,精确控制载荷和金刚石磨粒的粒径,可以避免脆性去除实现延性去除。通过控制抛光过程中的抛光盘表面粗糙度、金刚石粒径大小及粒径分布和载荷等进行滚动磨粒和滑动磨粒比例的调控,获得较好的磁头表面质量和较高的材料去除率。在自由磨粒抛光阶段,先采用铅磨盘抛光,然后用锡磨盘抛光,以纳米研磨作为最后一道抛光工序对磁头表面进行研磨,获得了亚纳米级粗糙度的磁头表面。用两种工艺制作的纳米研磨盘进行加工,分别获得了0.37nm和0.8nm的磁头表面粗糙度,去除率分别为5.3 nm/min和3.9nm/min。     

光学材料研磨亚表面损伤快速检测及其影响规律研究

基于印压断裂力学理论,针对光学材料研磨加工过程建立了亚表面损伤深度与表面粗糙度间关系的理论模型,以实现亚表面损伤深度的快速、准确和非破坏性检测。使用磁流变抛光斑点技术测量了K9玻璃在不同研磨条件下的亚表面损伤深度,对上述理论模型进行实验验证。最后,分析了研磨加工参数对亚表面损伤深度的影响规律,提出了以提高光学零件加工效率为目的的研磨加工策略。研究表明：光学材料研磨后亚表面损伤深度与表面粗糙度成单调递增的非线性关系,该幂函数的幂为4/3。磨粒粒度对亚表面损伤深度的影响最显著,研磨盘硬度的影响次之,而研磨压力和研磨盘公转速度的影响基本可以忽略。     

碳化硼研磨后蓝宝石晶体的亚表面损伤

介绍了蓝宝石材料的亚表面损伤形成机制。考虑碳化硼磨料可产生较小亚表面损伤的优点,本文基于游离磨料研磨方式,研究了不同粒度碳化硼磨料研磨后蓝宝石晶体的亚表面损伤。利用KOH化学腐蚀处理技术,对研磨后的样品进行了刻蚀;通过特定的腐蚀坑图像间接反映了蓝宝石晶体的亚表面损伤形貌特征,获得了W20、W10和W5碳化硼磨料产生的亚表面损伤深度,得到了在不同刻蚀时间下蓝宝石亚表面损伤形貌、表面粗糙度和刻蚀速率。研究结果显示:游离碳化硼磨料研磨造成的蓝宝石晶体的亚表面损伤密度相当显著,但损伤深度并不大,其随磨料粒度的增大而增大,W20、W10和W5粒度的磨料研磨后产生的亚表面损伤深度分别为7.4,4.1和2.9μm,约为磨料粒度的1/2。得到的结果表明采用碳化硼磨料研磨有利于获得低亚表面损伤的蓝宝石晶片,而采用由大到小的磨料逐次研磨可以快速获得低亚表面损伤的蓝宝石晶片。     

A review on the progress towards improvement in surface integrity of Inconel 718 under high pressure and flood cooling conditions

Self-conditioning performance of polishing pad is an important characteristic to influence processing efficiency and service life in chemical mechanical polishing (CMP). The slurry can react with the pad surface, which affects its self-conditioning performance in fixed abrasive polishing process. Wear ratio of wafer material removal rate (MRR) and pad wear rate is introduced to evaluate self-conditioning performance of fixed abrasive pad (FAP). To clear the effect of chemical additive on FAP self-conditioning, wear ratio, FAP surface topography, friction coefficient, and acoustic emission signal of polishing process were investigated in fixed abrasive polishing of quartz glass with ferric nitrate, ethylenediamine (EDA), and triethanolamine (TEA) slurry, respectively. Results indicate that TEA slurry can provide excellent self-conditioning of FAP in fixed abrasive polishing of quartz glass. MRR and wear ratio maintain high levels during the whole polishing process. Friction coefficient and acoustic emission signal are more stable than that of the other two chemical additives. An appropriate amount of TEA, which is beneficial to enhance MRR and extends service life of FAP, is added in the polishing slurry to improve FAP self-conditioning in fixed abrasive polishing process.