N型表面钝化晶体硅太阳电池Al2O3/SiNx减反射叠层的优化研究

减反射特性是进一步提高N型太阳电池能量转换效率的重要因素之一。研究采用Al2O3/SiNx叠层优化了N型太阳电池的减反射特性,并通过理论模拟和实验测量系统地探讨了叠层中SiNx厚度对表面反射性能的影响。研究证实在Al2O3层上增加一层SiNx,可以有效地优化表面减反射性质,从而提高N型太阳电池的光伏性质。     

Multi‐crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot‐wire CVD silicon nitride as antireflection coating

Hot‐wire chemical vapor deposition (HWCVD) is a promising technique for very fast deposition of high quality thin films. We developed processing conditions for device‐ quality silicon nitride (a‐SiN_x:H) anti‐reflection coating (ARC) at high deposition rates of 3 nm/s. The HWCVD SiN_x layers were deposited on multicrystalline silicon (mc‐Si) solar cells provided by IMEC and ECN Solar Energy. Reference cells were provided with optimized parallel plate PECVD SiN_x and microwave PECVD SiN_x respectively. The application of HWCVD SiN_x on IMEC mc‐Si solar cells led to effective passivation, evidenced by a V_oc of 606 mV and consistent IQE curves. For further optimization, series were made with HW SiN_x (with different x) on mc‐Si solar cells from ECN Solar Energy. The best cell efficiencies were obtained for samples with a N/Si ratio of 1·2 and a high mass density of >2·9 g/cm³. The best solar cells reached an efficiency of 15·7%, which is similar to the best reference cell, made from neighboring wafers, with microwave PECVD SiN_x. The IQE measurements and high V_oc values for these cells with HW SiN_x demonstrate good bulk passivation. PC1D simulations confirm the excellent bulk‐ and surface‐passivation for HW SiN_x coatings. Interesting is the significantly higher blue response for the cells with HWCVD SiN_x when compared to the PECVD SiN_x reference cells. This difference in blue response is caused by lower light absorption of the HWCVD layers (compared to microwave CVD; ECN) and better surface passivation (compared to parallel plate PECVD; IMEC). The application of HW SiN_x as a passivating antireflection layer on mc‐Si solar cells leads to efficiencies comparable to those with optimized PECVD SiN_x coatings, although HWCVD is performed at a much higher deposition rate. Copyright © 2007 John Wiley & Sons, Ltd.     

Performance enhancement of multicrystalline silicon solar cells and modules using double‐layered SiNx:H antireflection coatings

Silicon nitride coating deposited by the plasma‐enhanced chemical vapor deposition method is the most widely used antireflection coating for crystalline silicon solar cells. In this work, we employed double‐layered silicon nitride coating consisting of a top layer with a lower refractive index and a bottom layer (contacting the silicon wafer) with a higher refractive index for multicrystalline silicon solar cells. An optimization procedure was presented for maximizing the photovoltaic performance of the encapsulated solar cells or modules. The dependence of their photovoltaic properties on the thickness of silicon nitride coatings was carefully analyzed. Desirable thicknesses of the individual silicon nitride layers for the double‐layered coatings were calculated. In order to get statistical conclusions, we fabricated a large number of multicrystalline silicon solar cells using the standard production line for both the double‐layered and single‐layered antireflection coating types. On the cell level, the double‐layered silicon nitride antireflection coating resulted in an increase of 0.21%, absolute for the average conversion efficiency, and 1.8 mV and 0.11 mA/cm² for the average open‐circuit voltage and short‐circuit current density, respectively. On the module level, the cell to module power transfer factor was analyzed, and it was demonstrated that the double‐layered silicon nitride antireflection coating provided a consistent enhancement in the photovoltaic performance for multicrystalline silicon solar cell modules than the single‐layered silicon nitride coating. Copyright © 2015 John Wiley & Sons, Ltd.     

物理冶金多晶硅太阳电池叠层钝化减反射结构模拟

采用PC1D模拟软件对p型物理冶金多晶硅太阳电池的SiO2/Si Nx/SiNx叠层钝化减反射结构进行了计算模拟。结果表明:在SiNx/Si Nx双层减反射结构中引入SiO2钝化层后可以明显改善电池的外量子效率与表面减反射效果,并最终提高电池转换效率;随着SiO2膜厚度的增加,电池表面反射率呈先降低后增加的趋势,而电池外量子效率及转换效率则呈现出相反的趋势。二氧化硅膜厚度在2~8 nm时,电池转换效率变化不大,并在6 nm时效率达到最大值18.04%,当二氧化硅膜厚度大于8 nm后电池转换效率会出现明显下降。     

铝浆在晶体硅太阳电池上的应用讨论

主要介绍了铝浆作为晶体硅太阳电池的背电场,在烧结使用的过程中常常出现的问题,探讨了背场形成过程中铝珠、铝包的成因及解决方案,分析了背场附着力的影响因素,并对影响电池片弯曲度的因素作了说明.     

Optimum antireflection coatings for heteroface AlGaAs/GaAs solar cells—Part II: The influence of uncertainties in the parameters of window and antireflection coatings

This paper details both theoretical and experimental results of an enhanced model to design MgF₂/ZnS double-layer antireflection coatings for AlGaAs/GaAs heteroface solar cells. The main contribution of this work is that a method for taking technological tolerances or uncertainties into account in the optically relevant parameters for antireflection coating design is presented. This is done by the calculation of contours of quasi-optimum performance for a certain range of variation of the uncertain parameters. A number of experiments testing different aspects of the predictions made by the model are commented on, showing good agreement with the calculated performance. Unwanted window oxidation, described in Part I of this work, has proven to be the key factor influencing quasi-optimum contours.     

晶体硅表面纳米孔减反光结构的制备及其性能表征

利用金属辅助硅化学刻蚀法在晶体硅表面制备 了 大面积有序硅纳米结构,并基于金属辅助硅化学刻蚀的机理,实现了硅纳米结构从线阵列到 孔阵列转变。漫反射光谱的测试结果表 明,相对于平面、金字塔结构,硅纳米孔织构的晶体硅具有卓越的减反光性能,在300100nm 光谱范围内的AM1.5G太阳光子的光反射损失比低于3.6%。硅纳米孔阵列减反光性能优异, 制备方法简单、快速,且其孔壁互连,有益于晶体硅太阳电池的后续制备工艺及其表面结构 机械稳定,可作为减反光结构应用于晶体硅太阳电池。     

Silicon nitride processing for control of optical and electronic properties of silicon solar cells

Thin films of SiN are well suited as antireflection (AR) coatings for Si solar cells because their optical properties, such as refractive index and absorption coefficient, can be tailored during deposition to match those of Si solar cells. The SiN layers, particularly those deposited by a plasma-enhanced chemical vapor deposition (PECVD) process, can serve other functions in Si solar-cell fabrication. They can be excellent buffer layers through which the front metal contact can be fired. The PECVD nitridation also introduces H into the Si surface, which diffuses deep into the solar cell and passivates residual impurities and defects during metal-contact firing. The optimization of SiN properties and processing conditions may have conflicting demands based on its multifunctional role. To fully exploit these multiple functions, the SiN processing sequence must be optimized based on the properties of the nitride, the diffusion behavior of H, and the interactions of metal with the SiN/Si composite substrate.     

Thermal oxidation for crystalline silicon solar cells exceeding 19% efficiency applying industrially feasible process technology

Thermal oxides are commonly used for the surface passivation of high‐efficiency silicon solar cells from mono‐ and multicrystalline silicon and have led to the highest conversion efficiencies reported so far. In order to improve the cost‐effectiveness of the oxidation process, a wet oxidation in steam ambience is applied and experimentally compared to a standard dry oxidation. The processes yield identical physical properties of the oxide. The front contact is created using a screen‐printing process of a hotmelt silver paste in combination with light‐induced silver plating. The contact formation on the front requires a short high‐temperature firing process, therefore the thermal stability of the rear surface passivation is very important. The surface recombination velocity of the fired oxide is experimentally determined to be below S ≤ 38 cm/s after annealing with a thin layer of evaporated aluminium on top. Monocrystalline solar cells are produced and 19·3% efficiency is obtained as best value on 4 cm² cell area. Simulations show the potential of the developed process to approach 20% efficiency. Copyright © 2008 John Wiley & Sons, Ltd.     

Ultra‐low concentration Na2CO3/NaHCO3 solution for texturization of crystalline silicon solar cells

In this work, a novel diluted carbonate/bicarbonate solution was applied for texturization of monocrystalline silicon for solar cells. The content of reactants in the solution was decreased 20 times with respect to the previously optimum found by our group and 12 times with respect to the lowest values reported in the literature as optimum. The use of this low‐cost and nonhazardous solution, free of additives as isopropyl alcohol, can reduce costs in solar cell processing. Copyright © 2011 John Wiley & Sons, Ltd.     

Optimization of anti‐reflection moth‐eye structures for use in crystalline silicon solar cells

An anti‐reflection (AR) moth‐eye structure made of acrylic resin and deposited on a polyethylene terephthalate (PET) substrate was optimized in the wavelength range from 400 to 1170 nm; crystalline silicon (c‐Si) solar cells function efficiently in this wavelength range. The rigorous coupled wave analysis (RCWA) method was used for optical simulation, and the Taguchi method was used for efficient optimization. The simulation results showed that the reflectance of the optimized structure over the above‐mentioned wavelength range was less than 0.87% and that a minimal reflectance of 0.1% was observed at 400 nm. Experimental results showed that the reflectance of a fabricated moth‐eye structure was less than 1.0% in the wavelength range and that a minimal reflectance of 0.55% was observed at 700 nm. A c‐Si solar cell, which was enclosed in a polyvinyl butyral (PVB) layer of uniform thickness, was coated with the fabricated moth‐eye film, and it was observed that the moth‐eye film increased electric generation (EG) up to 15%, depending on the incident angle. Further, a daily increase in EG of up to 8.7% was estimated on a clear summer day in Japan when the moth‐eye film was used. Copyright © 2010 John Wiley & Sons, Ltd.     

太阳能电池的电势诱导衰减及检测

晶体硅组件的电势诱导衰减是现在的晶体硅电池组件在高电压系统下广泛面临的失效模式。常规组件的测试方法需要至少96小时的测试时间。在本文中,我们试图通过实验找到一种快速的太阳能电池的抗电势诱导衰减性能的方法。采用NaCl溶液作为Na+源, PVB 作为封装材料,我们能够在1小时内完成实验。在使用了新的抗电势诱导衰减工艺的太阳能电池上也成功进行了测试。经过试验证明实验前后电池片的反向电流的变化是很重要的判断标准。通常具有抗电势诱导衰退性能的电池反向漏电试验后变化是小于2倍的。电池的结果和相对应的组件的测试结果进行了比较,结果显示两者吻合的很好。     

Ag surface plasmon enhanced double-layer antireflection coatings for GaAs solar cells

Cs. A new SiO2/Ag-ZnS double-layer coating with better antireflection ability can be achieved if the particle volume fraction in ZnS is 1%-2%.     

Textured silicon surface passivation by high‐rate expanding thermal plasma deposited SiN and thermal SiO2/SiN stacks for crystalline silicon solar cells

Expanding thermal plasma (ETP) deposited silicon nitride (SiN) with optical properties suited for the use as antireflection coating (ARC) on silicon solar cells has been used as passivation layer on textured monocrystalline silicon wafers. The surface passivation behavior of these high‐rate (>5 nm/s) deposited SiN films has been investigated for single layer passivation schemes and for thermal SiO₂/SiN stack systems before and after a thermal treatment that is normally used for contact‐firing. It is shown that as‐deposited ETP SiN used as a single passivation layer almost matches the performance of a thermal oxide. Furthermore, the SiN passivation behavior improves after a contact‐firing step, while the thermal oxide passivation degrades which makes ETP SiN a better alternative for single passivation layer schemes in combination with a contact‐firing step. Moreover, using the ETP SiN as a part of a thermal SiO₂/SiN stack proves to be the best alternative by realizing very low dark saturation current densities of <20 fA/cm² on textured solar‐grade FZ silicon wafers and this is further improved to <10 fA/cm² after the anneal step. Optical and electrical film characterizations have also been carried out on these SiN layers in order to study the behavior of the SiN before and after the thermal treatment. Copyright © 2008 John Wiley & Sons, Ltd.     

Ag颗粒表面等离子体增强GaAs太阳电池双层减反射膜的设计与模拟

Surface plasmon enhanced antireflection coatings for GaAs solar cells have been designed theoretically.The reflectance of double-layer antireflection coatings（ARCs） with different suspensions of Ag particles is calcu-lated as a function of the wavelength according to the optical interference matrix and the Mie theory.The mean dielectric concept was adopted in the simulations.A significant reduction of reflectance in the spectral region from 300 to 400 nm was found to be beneficial for the design of ARCs.A new SiO2/Ag-ZnS double-layer coating with better antireflection ability can be achieved if the particle volume fraction in ZnS is 1%-2%.     

TiO2 DLAR coatings for planar silicon solar cells

In this paper we demonstrate that a double‐layer anti‐reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO₂). Two TiO₂ thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO₂ DLAR coatings in air and under glass, respectively. An increase in the short‐circuit current density of Δ J_sc = 2.5 mA/cm² can be expected for an optimised TiO₂ DLAR coating when compared with a commercial TiO₂ single‐layer anti‐reflection coating. Copyright © 2003 John Wiley & Sons, Ltd.     

硅基纳米结构的减反特性及其在太阳能电池中的应用

本文利用湿法化学腐蚀方法在硅基抛光衬底以及金字塔制绒的衬底上成功制备了纳米线阵列结构。在300~1000纳米波段,硅纳米线结构以及纳米线-金字塔混合结构都表现出了很好的减反特性,其平均反射率分别为2.53%、8%。利用传统工艺,我们在125mm125mm²的硅衬底上成功制备了短路电流密度为34.82mA/cm,开路电压为 594mv,效率为12.45%的纳米线太阳能电池。我们发现钝化对纳米结构的太阳能电池很重要,沉积钝化层之后可以将开路电压由420mv提高到560mv。我们通过分析所制备的太阳能电池的基本参数以及外量子效率,系统研究了硅基纳米结构太阳能电池的效率损失机制。实验证实钝化层以及电极的接触特性对提高纳米线太阳能电池的效率具有重要作用,并发现在已含PN结的硅衬底上制备纳米结构有助于提高太阳能电池的性能。     

Antireflection properties and solar cell application of silicon nanoscructures

Silicon nanowire arrays（SiNWAs） are fabricated on polished pyramids of textured Si using an aqueous chemical etching method.The silicon nanowires themselves or hybrid structures of nanowires and pyramids both show strong anti-reflectance abilities in the wavelength region of 300-1000 nm,and reflectances of 2.52%and less than 8%are achieved,respectively.A 12.45%SiNWAs-textured solar cell（SC） with a short circuit current of 34.82 mA/cm² and open circuit voltage(K_oc) of 594 mV was fabricated on 125×125 mm² Si using a conventional process including metal grid printing.It is revealed that passivation is essential for hybrid structure textured SCs,and K_oc can be enlarged by 28.6%from 420 V to 560 mV after the passivation layer is deposited.The loss mechanism of SiNWA SC was investigated in detail by systematic comparison of the basic parameters and external quantum efficiency（EQE） of samples with different fabrication processes.It is proved that surface passivation and fabrication of a metal grid are critical for high efficiency SiNWA SC,and the performance of SiNWA SC could be improved when fabricated on a substrate with an initial PN junction.     

Sunrise to sunset optimization of thin film antireflective coatings for encapsulated,planar silicon solar cells

We present an approach for the optimization of thin film antireflective coatings for encapsulated planar silicon solar cells in which the variations in the incident spectra and angle of incidence (AOI) over a typical day are fully considered. Both the angular and wavelength dependences of the reflectance from the surface, absorptance within the coating, and transmittance into the device are calculated for both single‐ and double‐layer antireflection coatings with and without thin silicon oxide passivation layers. These data are then combined with spectral data as a function of time of day and internal quantum efficiency to estimate the average short‐circuit current produced by a fixed solar cell during a day. This is then used as a figure of merit for the optimization of antireflective layer thicknesses for modules placed horizontally at the equator and on a roof in the UK. Our results indicate that only modest gains in average short‐circuit current could be obtained by optimizing structures for sunrise to sunset irradiance rather than AM1·5 at normal incidence, and fabrication tolerances and uniformities are likely to be more significant. However, we believe that this overall approach to optimization will be of increasing significance for new, potentially asymmetric, antireflection schemes such as those based on subwavelength texturing or other photonic or plasmonic technologies currently under development especially when considered in combination with modules fixed at locations and directions that result in asymmetric spectral conditions. Copyright © 2009 John Wiley & Sons, Ltd.     

Optimum antireflection coatings for heteroface AlGaAs/GaAs solar cells—Part I: The influence of window layer oxidation

This paper details both the theoretical and experimental results of a modified model for designing MgF₂/ZnS double-layer antireflection coatings for AlGaAs/GaAs heteroface solar cells. The main contribution of the model presented is that it takes into account the possible existence of an oxide layer in the AlGaAs window layer. In a first step the optical behavior of the oxide is modeled and that model is used to recalculate optimal double-layer antireflection coating when a thin AlGaAs oxide layer is present. Significant differences with classical double-layer antireflection coating design are found, such as, the antireflection properties of the oxide layer when formed onto originally thick windows or its equivalent role to that of the ZnS layer (as a high refractive index media) in the coating. Finally, an experimental analysis is carried out to assess empirically the conclusions of the model. These experiments have yielded an excellent agreement with the proposed theory.