SiGe HBT低频噪声PSPICE模拟分析

对SiGe HBT低频噪声的各噪声源进行了较全面的分析,据此建立了SPICE噪声等效电路模型,进一步用PSPICE软件对SiGe HBT的低频噪声特性进行了仿真模拟.研究了频率、基极电阻、工作电流和温度等因素对低频噪声的影响.模拟结果表明,相较于Si BJT和GaAs HBT,SiGe HBT具有更好的低频噪声特性;在低频范围内,可通过减小基极电阻、减小工作电流密度或减小发射极面积、降低器件的工作温度等措施来有效改善SiGe HBT的低频噪声特性.所得结果对SiGe HBT的设计和应用有重要意义.     

Si/ SiGe/ Si HBT 的直流特性和低频噪声

在对Si/SiGe/Si HBT及其Si兼容工艺的研究基础上，研制成功低噪声Si/SiGe/Si HBT，测试和分析了它的直流特性和低频噪声特性，为具有更好的低噪声性能的Si/SiGe/Si HBT的研究建立了基础。     

SiGe/Si HBT高频噪声特性研究

基于器件Y参数,对Si/Si1-xGexHBT的高频噪声进行了模拟。Si/Si1-xGexHBT的高频最小噪声系数随Ge组份x的增加而减小。与Si BJT相比,Si/SiGe HBT具有优异的高频噪声特性。     

混合模式电应力损伤对SiGe HBT器件1/f噪声特性的影响研究

研究了混合模式应力损伤对SiGe HBT器件直流电性能的影响,对比了混合模式损伤前后器件1/f噪声特性的变化。结果表明,在SiGe HBT器件中,混合模式损伤在Si/SiO₂界面产生界面态缺陷P_b,导致小注入下基极电流增加;H原子对多晶硅晶界悬挂键的钝化作用引起中等注入区基极电流减小,导致电流增益增强。混合模式损伤缺陷位于硅禁带宽度内本征费米能级附近,虽然使基区SRH复合电流增加,却不会改变器件的低频噪声特性。     

低偏置电流下大功率半导体激光器低频电噪声特性

测量了大功率InGaAsP/GaAs量子阱半导体激光器在五十分之一阈值电流下的电压低频噪声功率谱密度.实验结果显示,激光器的低频电噪声呈现1/f噪声,在不同的偏置电流范围内,1/f噪声幅度随电流的变化关系不同,整体上随偏置电流的增大而减小,实验中并未发现g-r噪声.结合低偏置电流时激光器动态电阻的大小,给出了1/f噪声的模型,分析了在低偏置电流下的1/f噪声主要来自有源区和漏电电阻,其幅度的大小及其随偏置电流的变化趋势与激光器的可靠性有密切的关系.     

光电耦合器件低频噪声特性与可靠性老化研究

在宽的输入偏置电流范围条件下,开展了光电耦合器件低频噪声特性测试与功率老化和高温老化的可靠性试验研究。结果表明,光电耦合器件的低频噪声主要是内部光敏晶体管1/f噪声,并随输入偏置电流的增大呈现先增大后减小的规律,这与器件的工作状态密切相关。功率老化试验后,高输入偏置电流条件下的低频噪声有所增大,这归因于电应力诱发的有源区缺陷。高温老化试验后,整个器件线性工作区条件下的低频噪声都明显增大,说明温度应力能够更多地激发器件内部的缺陷。相对于1/f噪声幅度参量,低频噪声宽带噪声电压参量可以更灵敏准确地进行器件可靠性表征。     

硅基N沟道VDMOS不同偏置下总剂量效应研究

通过⁶⁰Co γ射线辐照试验,研究了不同栅极和漏极偏置下硅基N沟道VDMOS器件的总剂量效应,获得了器件的电学特性与低频噪声特性随辐射总剂量的变化规律。试验结果表明：受辐射诱生的氧化物陷阱电荷与界面陷阱电荷的影响,在栅极偏置为+20 V时,器件的电学特性随累积剂量的增大而退化明显。通过退火试验发现,相比于导通电阻和正向压降,阈值电压、漏电流、亚阈值摆幅和输出电容对于总剂量辐射更加敏感。而在低频噪声特性方面,辐照后器件的沟道电流归一化噪声功率谱密度与正栅极偏置呈现正相关性,与负栅极偏置呈现负相关性。在不同漏极偏置条件下,辐照后器件的沟道电流归一化噪声功率谱密度降低,且基本重合。依据噪声模型,认为N沟道VDMOS内部局域电场分布对辐射感生陷阱电荷的形成影响显著,导致器件Si/SiO₂界面或者附近的载流子与陷阱交换引起的沟道电流波动不同,成为低频噪声主要来源。研究结果可为N沟道VDMOS器件的辐射效应评估、筛选和抗辐射加固设计提供参考。     

台面型InGaAs探测器暗电流及低频噪声研究

制备了一系列不同面积的台面型InGaAs红外探测器,通过周长面积比(P/A)的变化分析了器件的暗电流机制及低频噪声性能。结果表明,在现有的材料和工艺水平下,台面边缘和体内的产生复合电流都在总暗电流中占了较大部分。对测试结构器件的低频噪声测量表明,在反偏下,器件表现出明显的1/f噪声;由于边缘产生复合电流对小尺寸器件的影响大,其产生的噪声使得器件总噪声变大。这些结果表明,以后的工艺改进应注重减少边缘电流和体内产生复合电流。     

DC／DC变换器低频噪声及其测量技术

噪声是DC／DC变换器重要的性能指标，它限制了其在高精密电子系统中的应用。DC／DC变换器的噪声分为高频噪声和低频噪声。高频噪声包括电流纹波与热噪声。低频噪声主要成分有1/f噪声和散粒噪声。高频噪声直接影响产品性能，低频噪声除了与产品性能有关之外，还与产品质量和可靠性密切相关。本文在详细研究DC／DC变换器低频噪声测量技术的基础上，完成了对国产军用DC／DC变换器低频噪声的测量。实验结果表明，1/f噪声和散粒噪声是DC／DC变换器低频噪声的主要成分。基于此实验结果，本文对DC／DC变换器低频噪声的产生机理进行了分析，并进一步讨论了低频噪声作为DC／DC变换器质量与可靠性诊断工具可行性。     

低频低噪声器件概况

叙述了Si低频低噪声器件的噪声性能.在低频工作时,器件的1/f噪声和猝发噪声占支配地位,并对其产生机理作了讨论.介绍了目前主要采用的一些技术,例如完美晶体、低温钝化、氧化铝钝化等都能有效地改善和保护器件表面状态,从而获得良好的噪声特性.     

高频大功率SiGe/Si HBT的设计

详细地阐述了高频大功率SiGe/Si异质结双极晶体管(HBT)设计中的一些主要问题,主要包括器件的纵向设计中发射区、基区以及收集区中掺杂浓度、形貌分布、层厚的选择以及横向布局设计中的条宽、间隔的选择等.并对这些主要参数的选择给出了一些实用的建议.     

SiGe薄膜材料电阻率与掺杂浓度的关系研究

目前，应变Si1-xGex薄膜材料杂质浓度尚未有准确且简便易行的测试方法。为了快速准确地确定应变Si1-xGex薄膜材料的掺杂浓度，在研究应变Si1-xGex材料多子迁移率模型的基础上，采用Matlab编程模拟仿真，求解并建立了不同Ge组分下应变Si1-xGex薄膜材料掺杂浓度与其电阻率的关系曲线，讨论了轻、重掺杂两种情况下该关系曲线的变化趋势。通过Si1-xGex薄膜材料样品的四探针电阻率测试及电化学C-V掺杂浓度测试的对比实验，对本关系曲线进行了验证。     

新颖的Si_(1-x)Ge_x/Si异质结内光电发射长波红外探测器和焦平面阵列的发展

本文主要介绍新颖的Si_(1-x)Ge_x/Si异质结内光电发射长波红外探测器和焦平面阵列的现状、典型结构、性能参数及制备技术.     

应变硅n-MOSFET中电子迁移率的增强及其温度特性

采用减压化学气相淀积(RPCVD)技术在弛豫Si_(1-x)Ge_x虚拟衬底上赝晶生长应变硅层,以其为沟道材料制造得到的应变硅n-MOSFET表现出显著的性能提升。研究了通过改变Si_(1-x)Ge_x中Ge的摩尔组分x以改变硅帽层中的应变以及在器件制造流程中通过控制热开销来避免应变硅层发生弛豫等关键问题。在室温下,相对于体硅器件,应变硅器件表现出约87%的低场电子有效迁移率增强,在相同的过驱动电压下,饱和漏端电流增强约72%。在293 K到353 K的温度范围内研究了反型层电子有效迁移率和饱和漏端电流随温度的变化,实验结果表明,当温度升高时应变硅材料的电子迁移率增强倍数保持稳定。     

Low 1/f noise characteristics of AlGaAs/GaAs heterojunction bipolartransistor with electrically abrupt emitter-base junction

It is shown that the use of an electrically abrupt emitter-base junction considerably reduces the 1/f noise of self-aligned AlGaAs/GaAs heterojunction bipolar transistor (HBT). Although this device does not have depleted AlGaAs ledge passivation layer, the low-frequency noise spectra show a very low 1/f noise corner frequency of less than 10 kHz, which is much lower than previously reported value of about 100 kHz from conventional passivated or unpassivated AlGaAs/GaAs HBT's. Except for a residual generation-recombination (g-r) noise component, the noise power is comparable to that of Si BJT. It is also found that the low-frequency noise power of the AlGaAs/GaAs HBT is proportional to the extrinsic GaAs base surface recombination current square. Unlike the other HBT's reported, the noise sources associated with interface state and emitter-base (E-B) space charge region recombination are not significant for our device     

Ionizing radiation tolerance and low-frequency noise degradation inUHV/CVD SiGe HBT's

The effect of ionizing radiation on both the electrical and 1/f noise characteristics of advanced UHV/CVD SiGe HBT's is reported for the first time. Only minor degradation in the current-voltage characteristics of both SiGe HBT's and Si BJT's is observed after total radiation dose exposure of 2.0 Mrad(Si) of gamma-radiation. The observed immunity to ionizing radiation exposure suggests that these SiGe HBT's are well suited for many applications requiring radiation tolerance. We have also observed the appearance of ionizing-radiation-induced generation-recombination (G/R) noise in some of these SiGe HBT's     

Effect of substrate biasing on Si/SiGe heterostructure MOSFETs for low-power circuit applications

We have investigated the effect of substrate biasing on the subthreshold characteristics and noise levels of Si/Si/sub 1-x/Ge/sub x/ (x=0,0.15,0.3) heterostructure MOSFETs. A detailed analysis of the dependence of threshold voltage, off-state current, and low-frequency noise level on the substrate-source (V/sub bs/) biasing showed that SiGe heterostructure MOSFETs offer a significant speed advantage, an extended subthreshold operation region, a reduced noise level, and reduced bulk potential sensitivity compared to Si bulk devices. These experimental results demonstrate that SiGe heterostructure MOSFETs render a promising extension to the CMOS technologies at the low-power limit of operation, eventually making the micropower implementation of radio frequency (RF) functions feasible.     

Calculation of band edge levels of strained Si/(111)Si_(1-x)Ge_x

Calculations were performed on the band edge levels of (111)-biaxially strained Si on relaxed Si_(1-x)Ge_x alloy using the k·p perturbation method coupled with deformation potential theory. The results show that the conduction band (CB) edge is characterized by six identicalvalleys, that the valence band (VB) edge degeneracies are partially lifted, and that both the CB and VB edge levels move up in electron energy as the Ge fraction (x) increases. In addition, the dependence of the indirect bandgap and the VB edge splitting energy on x was obtained. Quantitative data from the results supply valuable references for Si-based strained device design.     

Low-frequency noise in UHV/CVD epitaxial Si and SiGe bipolartransistors

In this work a comprehensive investigation of low-frequency noise in ultrahigh vacuum/chemical vapor deposition (UHV/CVD) Si and SiGe bipolar transistors is presented. The magnitude of the noise of SiGe transistors is found to be comparable to the Si devices for the identical profile, geometry, and bias. A comparison with different technologies demonstrates that the SiGe devices have excellent noise properties compared to AlGaAs/GaAs heterojunction bipolar transistors (HBT's) and conventional Si bipolar junction transistors (BJT's). Results from different bias configurations show that the 1/f base noise source is dominant in these devices. The combination of a 1/Area dependence on geometry and near quadratic dependence on base current indicates that the 1/f noise sources are homogeneously distributed over the entire emitter area and are probably located at the polysilicon-Si interface. Generation/recombination (Gm) noise and random telegraph signal (RTS) noise was observed in selected Si and SiGe devices. The bias dependence and temperature measurements suggest that these G/R centers are located in the base-emitter space charge region. The activation energies of the G/R traps participating in these noise processes were found to be within 250 meV of the conduction and valence band edges