Electron field emission properties on UNCD coated Si-nanowires

The electron field emission (EFE) properties of Si-nanowires (SiNW) were improved by coating a UNCD films on the SiNWs. The SiNWs were synthesized by an electroless metal deposition (EMD) process, whereas the UNCD films were deposited directly on bare SiNW templates using Ar-plasma based microwave plasma enhanced chemical vapor deposition (MPE–CVD) process. The electron field emission properties of thus made nano-emitters increase with MPE–CVD time interval for coating the UNCD films, attaining small turn-on field (E₀ = 6.4 V/μm) and large emission current density (J_e = 6.0 mA/cm² at 12.6 V/μm). This is presumably owing to the higher UNCD granulation density and better UNCD-to-Si electrical contact on SiNWs. The electron field emission behavior of these UNCD nanowires emitters is significantly better than the bare SiNW ((E₀)_SiNWs = 8.6 V/μm and (J_e)_SiNWs < 0.01 mA/cm² at the same applied field) and is comparable to those for carbon nanotubes.     

Plasma post-treatment process for enhancing electron field emission properties of ultrananocrystalline diamond films

This paper demonstrated the plasma post-treatment (ppt) process for modifying the granular structure of ultrananocrystalline diamond (UNCD) films so as to improve their electron field emission (EFE) properties. The ppt-processed UNCD films exhibited improved EFE properties as turn-on field of E₀ = 7.0 V/μm (J_e = 0.8 mA/cm² at 17.8 V/μm). TEM investigation revealed that the prime factor, which enhanced the EFE properties of the UCND films, is the induction of nano-graphitic clusters due to the ppt-process. However, for achieving such a goal, the granular structure of the primary UNCD layer has to be relatively open. That is, the size of grains should be sufficiently small and the grain boundaries should be of considerable thickness, containing abundant hydro-carbon species. Such a simple and robust process for synthesizing conductive UNCD films is especially useful for practical applications.     

Synthesis of diamond using ultra-nanocrystalline diamonds as seeding layer and their electron field emission properties

A modified nucleation and growth process was adopted so as to improve the electron field emission (EFE) properties of diamonds films. In this process, a thin layer of ultra-nanocrystalline diamonds (UNCD), instead of bias-enhanced-nuclei, were used as nucleation layer for growing diamond films in H₂-plasma. The morphology of the grains changes profoundly due to such a modified CVD process. The geometry of the grains transform from faceted to roundish and the surface of grains changes from clear to spotty. The Raman spectroscopies and SEM micrographs imply that such a modified diamond films consist of UNCD clusters (~ 10–20 nm in size) on top of sp³-bonded diamond grains (~ 100 nm in size). Increasing the total pressure in CVD chamber deteriorated the Raman structure and hence degraded the EFE properties of the films, whereas either increasing the methane content in the H₂-based plasma or prolonged the growth time improved markedly the Raman structure and thereafter enhanced the EFE properties of diamond films. The EFE properties for the modified diamond films can be turned on at E₀ = 11.1 V/μm, achieving EFE current density as large as (J_e) = 0.7 mA/cm² at 25 V/μm applied field.     

Fabrication and field emission properties of ultra-nanocrystalline diamond lateral emitters

Field emission characteristics of ultra-nanocrystalline diamond (UNCD) have recently caught much attraction due to its importance in technological applications. In this work, we have fabricated lateral-field emitters comprised of UNCD films, which were deposited in CH₄/Ar medium by microwave plasma-enhanced chemical vapor deposition method. The substrates, silicon-on-insulator (SOI) or SiO₂-coated silicon, were pre-treated by mixed-powders-ultrasonication process for forming diamond nuclei to facilitate the synthesis of UNCD films on these substrates. Lateral electron field emitters can thus be fabricated either on silicon-on-insulator (SOI) or silicon substrates. The lateral emitters thus obtained possess large field enhancement factor (β = 1500–1721) and exhibit good electron field emission properties, regardless of the substrate materials used. The electron field emission can be turned on at 5.25–5.50 V/μm, attaining 5500–6000 mA/mm² at 12.5 V/μm (100 V applied voltage).     

Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers

In this work, tetrahedral diamond-like carbon (DLC) films are deposited on Si, Ti/Si and Au/Si substrates by a new plasma deposition technique — filtered arc deposition (FAD). Their electron field emission characteristics and fluorescent displays of the films are tested using a diode structure. It is shown that the substrate can markedly influence the emission behavior of DLC films. An emission current of 0.1 μA is detected at electric field E_DLC/Si=5.6 V/μm, E_DLC/Au/Si=14.3 V/μm, and E_DLC/Ti/Si=5.2 V/μm, respectively. At 14.3 V/μm, an emission current density J_DLC/Si=15.2 μA/cm², J_DLC/Au/Si=0.4 μA/cm², and J_DLC/Ti/Si=175 μA/cm² is achieved, respectively. It is believed that a thin TiC transition layer exists in the interface between the DLC film and Ti/Si substrate.     

Substrate temperature effects on the electron field emission properties of nitrogen doped ultra-nanocrystalline diamond

For the purpose of improving the electron field emission properties of ultra-nanocrystalline diamond (UNCD) films, nitrogen species were doped into UNCD films by microwave plasma chemical vapor deposition (MPCVD) process at high substrate temperature ranging from 600° to 830 °C, using 10% N₂ in Ar/CH₄ plasma. Secondary ion mass spectrometer (SIMS) analysis indicates that the specimens contain almost the same amount of nitrogen, regardless of the substrate temperature. But the electrical conductivity increased nearly 2 orders of magnitude, from 1 to 90 cm^− 1 Ω^− 1, when the substrate temperature increased from 600° to 830 °C. The electron field emission properties of the films were also pronouncedly improved, that is, the turn-on field decreased from 20 V/μm to 10 V/μm and the electron field emission current density increased from less than 0.05 mA/cm² to 15 mA/cm². The possible mechanism is presumed to be that the nitrogen incorporated in UNCD films are residing at grain boundary regions, converting sp³-bonded carbons into sp²-bonded ones. The nitrogen ions inject electrons into the grain boundary carbons, increasing the electrical conductivity of the grain boundary regions, which improves the efficiency for electron transport from the substrate to the emission sites, the diamond grains.     

Effect of H2/Ar plasma on growth behavior of ultra-nanocrystalline diamond films: The TEM study

Incorporation of H₂ species into Ar plasma was observed to markedly alter the microstructure of diamond films. TEM examinations indicate that, while the Ar/CH₄ plasma produced the ultrananocrystalline diamond films with equi-axed grains (~ 5 nm), the addition of 20% H₂ in Ar resulted in grains with dendrite geometry and the incorporation of 80% H₂ in Ar led to micro-crystalline diamond with faceted grains (~ 800 nm). Optical emission spectroscopy suggests that small percentage of H₂-species (< 20%) in the plasma leads to partially etching of hydrocarbons adhered onto the diamond clusters, such that the C₂-species attach to diamond surface anisotropically, forming diamond flakes, which evolve into dendrite geometry. In contrast, high percentage of H₂-species in the plasma (80%) can efficiently etch away the hydrocarbons adhered onto the diamond clusters, such that the C₂-species can attach to diamond surface isotropically, resulting in large diamond grains with faceted geometry. The field needed to turn on the electron field emission for diamond films increases from E₀ = 22.1 V/μm (J_e = 0.48 mA/cm² at 50 V/μm applied field) for 0% H₂ samples to E₀ = 78.2 V/μm (J_e < 0.01 mA/cm² at 210 V/μm applied field) for 80% H₂ samples, as the grains grow, decreasing the proportion of grain boundaries.     

The stability of the CNT/Ni field emission cathode fabricated by the composite plating method

A novel composite plating method has been developed for the fabrication of carbon nanotube/Ni (CNT/Ni) field emission cathode. The field emission properties of the initial CNT/Ni field emitter show a low turn-on electric field E_on of about 1.1 V/μm with an emission current density of 1 μA/cm², and a low threshold electric field E_th of about 1.7 V/μm with an emission current density of 1 mA/cm². After performing a stability test with a high emission current density in high vacuum, the corresponding microstructure and the degree of graphitization of the CNT/Ni field emitter were measured by using scanning electron microscopy and Raman spectroscopy. We found that the degree of graphitization slowly decreases with the duration time t_FE of the stability test, the size of small rod-like CNT/Ni composite structures in the film increases with t_FE, and obvious cracks appear in the film as t_FE is larger than 60 h. The degradation of the field emission properties may be explained by the Joule heating effect on the CNT/Ni field emitter under high emission current density.     

Super growth of vertically-aligned carbon nanofibers and their field emission properties

We demonstrate a very efficient synthesis of vertically-aligned ultra-long carbon nanofibers (CNFs) with sharp tip ends using thermal chemical vapor deposition. Millimeter-scale CNFs with a diameter of less than 50 nm are readily grown on palladium thin film deposited Al₂O₃ substrate, which activate the conical stacking of graphitic platelets. The field emission performance of the as-grown CNFs is better than that of previous CNFs due to their extremely high aspect ratio and sharp tip angle. The CNF array gives the turn-on electric field of 0.9 V/μm, the maximum emission current density of 6.3 mA/cm² at 2 V/μm, and the field enhancement factor of 2585.     

Improved field emission properties of carbon nanotubes decorated with Ta layer

The field emission (FE) properties of vertically aligned carbon nanotube (CNT) arrays having a surface decorated with Ta layer were investigated. The CNTs with 6 nm thickness of Ta decoration showed improved FE properties with a low turn-on field of 0.64 V/μm at 10 μA/cm², a threshold field of 1.06 V/μm at 1 mA/cm² and a maximum current density of 7.61 mA/cm² at 1.6 V/μm. After Ta decoration, the increased emission centres and/or defect sites on the surface of CNTs improved the field enhancement factor. The work function of CNTs with Ta decoration measured with ultraviolet photoelectron spectroscopy decreased from 4.74 to 4.15 eV with increasing Ta thickness of 0–6 nm. The decreased work function and increased field enhancement factor were responsible for the improved FE properties of the vertically aligned CNTs. Moreover, a significant hysteresis in the cycle-testing of the current density with rising and falling electric field process was observed and attributed to the adsorption/desorption effect, as confirmed by the photoelectron spectrum.     

High-current field emission of point-type carbon nanotube emitters on Ni-coated metal wires

The fabrication and field emission characteristics are reported for point-type carbon nanotube (CNT) emitters formed by transferring a CNT film onto a Ni-coated Cu wire with a diameter of 1.24 mm. A Ni layer plays a role in enhancing the adhesion of CNTs to the substrate and improving their field emission characteristics. On firing at 400 °C, CNTs appear to directly bonded to a Ni layer. With a Ni layer introduced, a turn-on electric field of CNT emitters decreases from 1.73 to 0.81 V/μm by firing. The CNT film on the Ni-coated wire produces a high emission current density of 667 mA/cm² at quite a low electric field of 2.87 V/μm. This CNT film shows no degradation of emission current over 40 h for a current density of 60 mA/cm² at electric field of 6.7 V/μm. X-ray imaging of a printed circuit board with fine features is demonstrated by using our point-type CNT emitters.     

Time dependent growth of ZnO nanoflowers with enhanced field emission properties

Herein, we report the facile growth of ZnO nanoflowers composed of nanorods on silicon substrate by non-catalytic thermal evaporation process. The grown nanoflowers were examined in terms of their morphological, structural, optical and field emission properties. The detailed characterizations revealed that the nanoflowers are grown in high density, possessing well-crystallinity and exhibiting wurtzite hexagonal phase. The Raman-scattering spectrum shows a sharp optical-phonon E₂ mode at 437 cm⁻¹ which confirmed the wurtzite hexagonal phase for the grown nanoflowers. The room-temperature PL spectrum depict a strong ultraviolet emission at 381 nm, revealed good optical properties for the ZnO nanoflowers. The field emission studies revealed that a turn-on field for the ZnO nanoflowers based field emission device was 4.3 V/μm and the emission current density reached to 0.075 mA/cm² at an applied electric field of 7.2 V/μm and exhibit no saturation. The field enhancement factor ‘β’ for the fabricated device was estimated from the F-N plot and found to be ~2.75×10³. Finally, systematic time-dependent experiments were performed to determine the growth process for the formation of ZnO nanoflowers composed of nanorods.     

Long-term stability of a horizontally-aligned carbon nanotube field emission cathode coated with a metallic glass thin film

A horizontally-aligned carbon nanotube (HACNT) field emission cathode was coated with a metallic glass thin film (MGTF) to improve the stability of the field emission properties. HACNT field emission cathodes have previously been fabricated on glass substrates using composite plating and crack-formation techniques. A carbon nanotubes/nickel (CNTs/Ni) composite film is deposited onto a glass substrate at 80 °C by the composite plating technique alone. Cracks are then formed in the CNT/Ni composite film during 30 min heating at 300 °C, and HACNTs are exposed in the cracks. The field emission properties of the HACNT field emission cathode show a low turn-on electric field E_on of about 2.3 V/μm, a low threshold electric field E_th of about 4.7 V/μm at an emission current density of 1 mA/cm², and a stability time of 78 h. The degradation of the HACNT field emission cathode is prevented by using a MGTF-coating technique and superior long-term stability (i.e. >125 h, with 5 nm MGTF; >270 h, with 10 nm MGTF) for the MGTF/HACNT field emission cathode is achieved.     

Field emission characteristics of CNFB-CNT hybrid material grown by one-step MPCVD

A hybrid material consisting of carbon nanotubes (CNTs) and carbon nanoflake balls (CNFBs) was successfully synthesized by microwave-plasma-assisted chemical vapor deposition using a H₂/CH₄/N₂ ratio of 4:1:2 at 80 Torr for 30 min. The precursor used was a sol-gel solution containing ferric nitrate, tetrabutyl titanate, and n-propanol. The carbon hybrid material (CNFB-CNT) exhibited excellent field emission properties, with its turn-on field being 1.77 V/μm. It also showed two field enhancement factors (1536 and 7932) for different electric fields. The emission current density of the hybrid remained higher than 0.65 mA/cm² for more than 50 h and was 0.82 mA/cm² even after 50 h of continuous emission. Further, the field emission properties of the CNFB-CNT hybrid were better than those of other single-structured carbon nanomaterials (CNTs, CNFs, or CNFBs). Therefore, the CNFB-CNT hybrid material should be a promising candidate for use in high-performance field emitters.     

Carbon nanotube loop arrays for low-operational power,high uniformity field emission with long-term stability

We present a rational field emitter array architecture composed of thin multi-walled carbon nanotube “loops” which simultaneously satisfies the important requirements for practical applications. We achieved low turn-on voltage (1.27 V/μm for 10 μA/cm² emission), high enhancement factor (2400), uniformity, and long-term emission stability exceeding 10,000 h at 1 mA/cm², where each of the values approaches or exceeds the highest reported values to date for field emission arrays.     

Open circuit voltage increase by substituted spacer and thieno[3,4-c]pyrrole-4,6-dione for polymer solar cells

We reported on two donor polymers containing thieno[3,4-c]pyrrole-4,6-dione(TPD) derivatives as electron withdrawing units for organic photovoltaics (OPVs). To control molecular weight and solubility of polymers, hexyl side chains are inserted to thiophene spacers. Due to the electron donating characteristic of hexyl side chains, highest occupied molecular orbital (HOMO) energy level of polymer is decreased as 0.18 eV, whereas the open circuit voltage is increased to 1.08 V. When bulk heterojunction devices were fabricated, the best PCE value of 0.360% (V_OC = 0.89 V, J_SC = 1.2 mA/cm², FF = 36.3%) under 100 mW/cm² irradiation.     

Enhancement of electron field emission of nitrogenated carbon nanotubes on chlorination

Multi-wall nitrogenated carbon nanotubes (N-CNTs) are modified by the chlorine–plasma treatment (N-CNTs:Cl) and hence studied their field emission characteristics. It is observed that the turn-on voltage of N-CNTs is decreased from ~ 1.0 V/µm to ~ 0.875 V/µm on chlorination. The current density is enhanced from 1.3 mA/cm² (N-CNTs) to ~ 15 mA/cm² (N-CNTs:Cl) at an electric field of 1.9 V/µm. The X-ray absorption near edge structure spectra revels, the formation of different bonding of chlorine with carbon and nitrogen presence in the N-CNTs during the process of chlorine–plasma treatment by the charge transfer (or else) that increase the density of free charge carriers and hence enhanced the field emission characteristics of N-CNTs:Cl.     

Improvement of field emission performance on nitrogen ion implanted ultrananocrystalline diamond films through visualization of structure modifications

The relationship between the electron field emission properties and structure of ultra-nanocrystalline diamond (UNCD) films implanted by nitrogen ions or carbon ions was investigated. The electron field emission properties of nitrogen-implanted UNCD films and carbon-implanted UNCD films were pronouncedly improved with respect to those of as-grown UNCD films, that is, the turn-on field decreased from 23.2 V/μm to 12.5 V/μm and the electron field emission current density increased from 10E−5 mA/cm² to 1 × 10E−2 mA/cm². The formation of a graphitic phase in the nitrogen-implanted UNCD films was demonstrated by Raman microscopy and cross-sectional high-resolution transmission electron microscopy. The possible mechanism is presumed to be that the nitrogen ion irradiation induces the structure modification (converting sp³-bonded carbons into sp²-bonded ones) in UNCD films.     

Enhancing electron field emission properties of UNCD films through nitrogen incorporation at high substrate temperature

The electron field emission (EFE) and electrochemical (EC) properties of N₂(10%)-incorporated ultra-nanocrystalline diamond (N₂-UNCD) films were investigated. Microstructure examination using TEM indicates that incorporating the N₂ species without the substrate heating induced the presence of stacking faults, which can be effectively suppressed by growing the films at elevated temperature. While the synthesis of N₂-UNCD without substrate heating can efficiently enhance the EC properties (large potential window with smaller background current) of the films, the EFE behavior of the films can be improved only when the films were grown at an elevated temperature. Moreover, coating the conducting N₂-UNCD on Si-tips can further enhance the EFE and CV behaviors, viz. (E₀)_tip = 5.0 V/μm with (J_e)_tip = 0.28 mA/cm² at 15 V/μm applied field and ΔE_p = 0.5 V with redox peak 170 μA were achieved.     

Low threshold field emission from nitrogen-incorporated carbon nanowalls

Field emission performance of nitrogen-incorporated vertically-aligned graphene layers, so called “carbon nanowalls (CNWs)”, is found to depend upon their electrical conduction properties. The CNW samples with n-type conduction exhibit near-ideal Ohmic contacts with various metals such as Cu, Ti, and Au, regardless of the work function of the metals. The high resistivity CNWs for lower deposition temperatures (T_D) show semiconducting behavior in the Arrhenius plots, while the low resistivity CNWs for higher T_D show semi-metallic behavior. The emission turn-on field versus T_D has a very similar trend to the bulk resistivity versus T_D, and is reduced down to about 3 V/μm when the resistivity reaches a minimum (3.0 × 10^? 3 Ω cm). The lower turn-on field for semi-metallic CNWs is attributed to an upward shift of the emission level, which is responsible for a decrease in the surface potential barrier height for emission.