p型掺杂GaAs液相外延材料的光致发光研究

对Si掺杂和Zn掺杂p型GaAs液相外延材料进行光致发光研究。用发射波长为510.6nm和578.2nm的溴化亚铜激光器为激发光源,样品的低温由氦循环致冷机提供,样品室温度在10～300K中可调。在所选取的狭缝宽度下谱仪的分辨率大致为2nm,所提供的数据全部经过系统灵敏度校正并进行分峰拟合。对Si掺杂p型GaAs样品PL谱中一些主要特征进行讨论,认为A_1,A_2,A_3三个发射带分别对应着导带“尾”态中电子向价带和两个浅受主能级的跃迁,它们随温度变化的情况,和带隙宽度及电子填充状态随温度变化有关。此外,我们还观察了掺Zn的p型GaAs样品的PL谱,与掺Si样品比较,具有明显不同的特征,谱线在长波端(～950nm)的上扬趋势表明在低能区域可能存在一个与深能级复合有关的宽发射带。     

AlInGaAs/AlGaAs Strained Quantum Well Lasers Grown by Molecular Beam Epitaxy

Strained InGaAs/AIGaAs quantum well lasers have demonstrated improved performance compared with lattice--matched,unstrained GaAs/AIGaAsorAIGaAs/AIGaAs quantum well lasers,which has been attributed to modifications of the band tructure due to the strained natur...     

Al_xGa_(1-x)As/GaAs Solar Cell Grown by Multi-substrate Liquid Phase Epitaxy

A novel horizontal push-pull multi-substrate epitaxy boat with three separate cells is introduced in this article, with which multi-substrate LPE processing is feasible in horizontal LPE furnace. The processes of LPE Al_xGa_(1-x))As/ GaAs solar cells are studied and the efficiency of the solar cells achieved 19.8% (AMO, 25℃, 120 mW/cm~2).     

AlxGa1—xAs Solar Cell Grown by Multi—substrate Liquid Phase Epitaxy

A novel horizontal push-pull multi-substrate epitaxy boat with three separate cells is introduced in this article, with multi-substrate LPE processing is feasible in horizontal LPE furnace. The processes of LPE Alx Ga1-xAs/GaAs solar cells are studied and the efficiency of the solar cells achieved 19.8%(AM0,25℃,120mW/cm^2).     

High-Gain Low Turn-On Voltage AlGaAs/GaAsNSb/GaAs Heterojunction Bipolar Transistors Grown by Molecular Beam Epitaxy

AlGaAs/GaAsNSb heterojunction bipolar transistors (HBTs) with low turn-on voltage have been fabricated. The turn-on voltage of the device fabricated from an as-grown sample is ~180 mV lower than that of a conventional AlGaAs/GaAs HBT. The effect of rapid thermal annealing on device performance is an increase in the gain from ~8.5 to ~20. However, the knee voltage of the annealed sample (~3 V), as well as the turn-on voltage, is also higher compared with that of the as-grown sample (~1.5 V).     

用MBE生长的长波长高速应变量子阱激光器

目前实验证明，由分子束外延生长的应变层ＧａＩｎＡｓ渐变折射率分别限制异质结（ＧＲＩＮ　ＳＣＨ）量子阱激光器，其性能相当于或优于ＯＭＶＰＥ生长的激光器。提高ＭＢＥ生长的激光器性能主要是优化生长条件，该结论来自以前生长应变调制掺杂ＦＥＴ的应变沟道。在此，我们将讨论ＧａＡｓＩｎ／ＧａＡｓ应变层结构的生长条件，这些应变层材料的特点以及在此条件下生长的激光器的直流和微波特性。     

分子束外延AlGaN/GaN异质结场效应晶体管材料

用自组装的氨源分子束外延 (NH3-MBE)系统和射频等离子体辅助分子束外延 (PA-MBE)系统在 C面蓝宝石衬底上外延了优质 Ga N以及 Al Ga N/Ga N二维电子气材料。Ga N膜 (1 .2 μm厚 )室温电子迁移率达3 0 0 cm2 /V· s,背景电子浓度低至 2× 1 0 1 7cm- 3。双晶 X射线衍射 (0 0 0 2 )摇摆曲线半高宽为 6arcmin。 Al Ga N/Ga N二维电子气材料最高的室温和 77K二维电子气电子迁移率分别为 73 0 cm2 /V·s和 1 2 0 0 cm2 /V· s,相应的电子面密度分别是 7.6× 1 0 1 2 cm- 2和 7.1× 1 0 1 2 cm- 2 ;用所外延的 Al Ga N/Ga N二维电子气材料制备出了性能良好的 Al Ga N/Ga N HFET(异质结场效应晶体管 ) ,室温跨导为 5 0 m S/mm(栅长 1 μm) ,截止频率达 1 3 GHz(栅长 0 .5μm)。该器件在 3 0 0°C出现明显的并联电导 ,这可能是材料中的深中心在高温被激活所致     

Study of HgCdSe Material Grown by Molecular Beam Epitaxy

Much progress has been made in developing high-quality HgCdTe/Si for large-area focal-plane array (FPA) applications. However, even with all the material advances made to date, there is no guarantee that this technology will be mature enough to meet the stringent FPA specifications required for long-wavelength infrared (LWIR) systems. With this in mind, the Army Research Laboratory (ARL) has begun investigating HgCdSe material for infrared (IR) applications. Analogous to HgCdTe, HgCdSe is a tunable semiconductor that can detect any wavelength of IR radiation through control of the alloy composition. In addition, several mature, large-area bulk III–V substrates are nearly lattice matched to HgCdSe, giving this system a possible advantage over HgCdTe, for which no scalable, bulk substrate technology exists. We have initiated a study of the growth of HgCdSe using molecular beam epitaxy (MBE). Growth temperature and material flux ratios were varied to ascertain the best growth conditions. Smooth surface morphology has been achieved using a growth temperature much lower than that used for HgCdTe. Additionally, zero void defects were nucleated at these lower temperatures. Preliminary data suggest a linear relationship between the Se/Cd flux ratio used during growth and the cutoff wavelength as measured by Fourier-transform infrared (FTIR) spectroscopy.     

Growth Parameters for Thin Film InBi Grown by Molecular Beam Epitaxy

The alloying of bismuth with III–V semiconductors, in particular GaAs and InAs thin films grown by molecular beam epitaxy (MBE), has attracted considerable interest due to the accompanying changes in band structure and lattice constant. Specifically, bismuth incorporation in these compounds results in both a reduction in band gap (through shifting of the valence band) and an increase in the lattice constant of the alloy. To fully understand the composition of these alloys, a better understanding of the binary endpoints is needed. At present, a limited amount of literature exists on the III-Bi family of materials, most of which is theoretical work based on density functional theory calculations. The only III-Bi material known to exist (in bulk crystal form) is InBi, but its electrical properties have not been sufficiently studied and, to date, the material has not been fabricated as a thin film. We have successfully deposited crystalline InBi on (100) GaAs substrates using MBE. Wetting of the substrate is poor, and regions of varying composition exist across the substrate. To obtain InBi, the growth temperature had to be below 100 °C. It was found that film crystallinity improved with reduced Bi flux, into an In-rich regime. Additionally, attempts were made to grow AlBi and GaBi.     

X-Ray Diffraction and Photoluminescence Studies of InN Grown by Plasma-Assisted Molecular Beam Epitaxy with Low Free-Carrier Concentration

We report studies of InN grown by plasma-assisted molecular beam epitaxy. GaN templates were first grown on sapphire substrates followed by InN overgrown at 457°C to 487°C. Atomic force microscopy shows the best layers to exhibit step-flow growth mode of the InN, with a root-mean-square roughness of 0.7 nm for the 2 μm × 2 μm scan and 1.4 nm for the 5 μm × 5 μm scan.␣Measurements of the terrace edges indicate a step height of 0.28 nm. Hall measurements at room temperature give mobilities ranging from 1024 cm²/V s to 1904 cm²/V s and the electron concentrations are in the range of 5.9 × 10¹⁷ cm⁻³ to 4.2 × 10¹⁸ cm⁻³. Symmetric and asymmetric reflection x-ray diffraction measurements were performed to obtain lattice constants a␣and c. The corresponding hydrostatic and biaxial stresses are found to range from −0.08 GPa to −0.29 GPa, and −0.05 GPa to −0.32 GPa, respectively. Low-temperature photoluminescence peak energies range from 0.67 eV to 0.70 eV, depending on residual biaxial stress, hydrostatic pressure, and electron concentrations. The electron concentration dependence of the estimated Fermi level is analyzed using Kane’s two-band model and conduction-band renormalization effects.     

Photoluminescence Characterization of Boron-doped Si Layers Grown by Molecular Beam Epitaxy

Photoluminescence spectra were used to characterize the boron-doped Si layers grown by molecular beam epitaxy using HBO2 as the doping source. The influence of boron doping concentration on the dislocation-related photoluminescence spectra of molecular beam epitaxy Si layers annealed at 900 ℃ was studied with different doping concentrations and growth temperature. The broad photoluminescence band（from 0.75 eV to 0. 90 eV） including D1 and D2 bands was associated with high boron doping concentration in the samples, while D3 and D4 bands might be related to oxygen precipitates.     

Effect of Substrate Nitridation on Properties of Thick GaN Film Grown by Hydride Vapour Phase Epitaxy

Thick GaN films were grown on the sapphire substrate by hydride vapour phase epitaxy. The properties of GaN films were found to be significantly influenced by the duration of exposing the sapphire substrate to ammonia prior to the GaN growth initiation. The crystalline quality of GaN films revealed by high resolution X-ray diffraction were strongly dependent on the nitridation time, which determined substrate surface topography. The different nitridation schemes strongly affected the morphology of GaN overlayers resulting in the blue shift of the main excitonic peak in photoluminescence spectra at room temperature.     

Structural Properties of Boron-Doped Germanium-Tin Alloys Grown by Molecular Beam Epitaxy

Boron-doped Ge_1?x Sn _x alloys with atomic fractions of tin up to x = 0.08 were grown on n-Ge(001) substrates using solid-source molecular beam epitaxy, in order to study their structural properties. The total boron concentration in the alloys was ~ 10¹⁸ cm^?3 as measured by secondary-ion mass spectroscopy, which also indicated low amounts of impurities such as carbon and oxygen. More than 90% of the Sn atoms occupied substitutional lattice sites in the alloy as determined by Rutherford backscattering spectrometry. High-resolution x-ray diffraction showed that the boron-doped Ge_1?x Sn _x alloys were single crystals that were completely strained with low defect densities and coherent interfaces for thickness up to 90 nm, and for Sn composition of 8%. The boron-doped Ge_1?x Sn _x /n-Ge formed p–n junctions with conventional rectifying characteristics, indicating that the boron produced electrically active acceptor states.     

ZnSe单晶的热壁外延生长(英文)

We have successfully grown a ZnSe single crystal film on GaAs(100) by hoi wall epitaxy. We confirmed that the epilayer is ZnSe single crystal from the analysis of scanning eletron microscopy and X-ray diffraction. The strong near-band-edge emission is found in the PL spectra and the Es-band related to free exiton is also very strong. They are much stronger than the deep center band emission, which shows the perfection of the epilayer. We have also studied the ZnSe/GaAs interface by AES and XPS.     

Planarization and Processing of Metamorphic Buffer Layers Grown by Hydride Vapor-Phase Epitaxy

Hydride vapor-phase epitaxy (HVPE) is a high-growth-rate, cost-effective means to grow epitaxial semiconductor material. Thick HVPE-based metamorphic buffer layers (MBLs) can serve as “pseudosubstrates” with controllable lattice parameter. In our structures, the indium content in In _x Ga_1?x As is gradually increased from zero to the final composition corresponding to the desired lattice constant, and then a thick (～10 μm) constant-composition capping layer is grown. This thick capping layer promotes maximum strain relaxation while permitting use of polishing procedures to achieve surface planarity. Lattice-mismatched growth of MBLs invariably results in rough, cross-hatched surface morphology exhibiting up to 200 nm peak-to-valley roughness. This roughness can be eliminated by chemical mechanical planarization, thus creating a suitable surface for subsequent regrowth. Polishing of In _x Ga_1?x As is complicated by the sensitivity of the surface layer to the polishing parameters, particularly the applied pressure. Polishing at high applied pressure (12 psi) results in the formation of circular asperities hundreds of nanometers high and tens of microns in diameter. When lower applied pressure (4 psi) was used, the cross-hatching height of MBLs was lowered from 200 nm to <10 nm over a 350 μm lateral scale. The successfully planarized In_0.20Ga_0.80As MBLs were used as a substrate for a superlattice (SL) structure such as that used in quantum cascade lasers. Use of planarization before regrowth of the SL resulted in a reduction of the high-resolution x-ray diffraction peak full-width at half-maximum from 389″ to 159″.     

太阳电池最大功率点跟踪研究

根据太阳电池的特性,设计了一种基于“二次插值法”的太阳能电池最大功率跟踪器,并对设计的MPPT控制器进行了测试。实验结果表明它有较好的跟踪性能。     

Modeling and Design of a Thin-Film CdTe/Ge Tandem Solar Cell

Thin-film cadmium telluride (CdTe) solar cells have found widespread application, with current commercially available module efficiencies reaching 14.4% and production costs falling as low as $$ \hbox{US}\,\$0.75/W_{\rm p}$$ . Despite the proliferation of this technology, there have been comparatively few developments in research circles in recent years. Rather than attempt to further advance the materials science of CdTe solar cells, it is proposed to realize an efficiency improvement over conventional cells by means of a novel tandem structure. Three such structures are examined herein, and results of simulation using Synopsys Sentaurus TCAD are presented.     

Nature of Growth Pits in Lead Salt Epilayers Grown by Molecular Beam Epitaxy

We present a detailed study on the surface morphologies and chemical composition of growth pits in lead selenide (PbSe) epilayers grown by molecular-beam epitaxy. Various growth pits were investigated by scanning electron microscopy and energy-dispersive x-ray analysis. The vast majority of growth pits within the PbSe epilayers contained either single or multiple PbSe microcrystals with a distinct cuboid shape. Based on the observed structures and morphologies of the PbSe microcrystals, the formation mechanism of the cuboid structures was considered to be (100) preferential crystal growth originating from PbSe polycrystalline seeds.     

Density Control of InP/GaInP Quantum Dots Grown by Metal-Organic Vapor-Phase Epitaxy

We investigated structural and emission properties of self-organized InP/GaInP quantum dots (QD) grown by metal organic chemical vapor deposition using an amount of deposited In from 7 to 2 monolayers (ML). In the uncapped samples, using atomic force microscopy (AFM), we observed lateral sizes of 100–200 nm, together with a bimodal height distribution having maxima at ～5 and ～15 nm, which we denoted as QDs of type A and B, respectively; and reduction of the density of the type-B dots from 4.4 to 1.6 μm^–2. The reduction of the density of B-type dots were observed also using transmission electron microscopy of the capped samples. Using single dot low-temperature photoluminescence (PL) spectroscopy we demonstrated effects of Wigner localization for the electrons accumulated in these dots.