AlN钝化层对AlGaN/GaN异质结及其高温特性的影响

主要研究了A1N钝化介质层对AlGaN/GaN异质结势垒层应力的修改以及应力的变化对二维电子气高温输运性质的影响.研究结果表明:AlN介质层会对AlGaN势垒层产生附加的平面压应变;AlN和传统的si3N4钝化介质都能减轻AlGaN势垒层在高温下的应变弛豫,但AlN介质层效果更明显.和传统的Si,N4钝化介质相比较,AlN钝化层不仅会显著增加AlGaN/GaN异质结二维电子气密度度,还会明显提高二维电子气迁移率,同时,AlN钝化后二维电子气密度的温度稳定性也更好.因此,对AlGaN/GaN异质结器件来说,AIN是一种有潜力的钝化介质.     

高效本征薄层异质结(HIT)太阳电池技术研究进展

高效本征薄层异质结(HIT)是由本征钝化层沉积在a-Si/c-Si界面处组成,这种硅异质结(SHJ)结构由于钝化性能好,实际效率值往往比同质结电池更高。本文首先介绍了HIT高效电池发展现状、电池基本结构的特点,然后从制备工艺、钝化原理、能带带阶等几个方面对衬底层、非晶硅层(本征/掺杂)、TCO薄膜以及金属格栅电极展开讨论,并对未来高效HIT电池的工业化发展趋势做了展望。     

低能离子注入对PAn/Si异质结太阳电池的改性研究

利用电化学方法制备了聚苯胺 /Si太阳电池 ,将离子注入改性技术引用到聚苯胺 /Si异质结太阳电池的改性研究中 ,对离子注入后太阳电池顶区材料的吸收光谱和热稳定性能进行了研究 ,测量了改性后电池的输出特性。研究结果表明 :经离子注入改性后的聚苯胺吸收光谱明显变宽 ,材料的热分解温度较注入前提高了 40℃ ,电池在 10 92W/m2 光照时的转换效率提高了 18倍 ,在 37 2W/m2 光照时的转换效率提高了近 3倍     

低能离子注入对PAn／Si异质结太阳电池的改性研究

利用电化学方法制备了聚苯胺／Ｓｉ太阳电池，将离子注入改性技术引用到聚苯胺／Ｓｉ异质结太阳电池的改性研究中，对离子注入后太阳电池顶区材料的吸收光谱和热稳定性能进行了研究，测量了改性后电池的输出特性。研究结果表明：经离子注入改性后的聚苯胺吸收光谱明显变宽，材料的热分解温度较注入前提高了４０℃，电池在１０．９２Ｗ／ｍ＾２光照时的转换效率提高了１８倍，在３７．２Ｗ／ｍ＾２光照时的转换效率提高了近３倍。     

高分子p—n异质结太阳电池的研究

用合成的十二烷基苯磺酸（ＤＢＳＡ）掺杂的聚苯胺（ＰＡｎ）导电材料和Ｂｅｉ染料组合，采用涂覆技术，研制成ＳｎＯ２／ＰＡｎ膜／Ｂｅｉ染料薄层／Ａｌ栅电极结构和Ａｌ／ＰＡｎ导电基片／Ｂｅｉ染料薄层／Ａｌ栅电极结构的ｐ－ｎ异质结太阳电池，测定了该电池的光电效应和伏安特性，在４．７２ｍＷ／ｃｍ＾２的氙灯照射下，开路电压Ｖｏｃ达４００ｍＶ短路电流Ｉｓｃ为１０μＡ，填充因子可达５７．４％，光电转换效率为０．０９     

晶体硅电池表面钝化的研究进展

随着晶体硅太阳电池技术的不断发展,硅片的厚度不断降低,电池表面钝化对提高太阳能电池转化效率变得尤为重要。本文介绍了表面钝化膜在晶体硅太阳电池中的应用,以及几种晶体硅电池表面钝化方法,包括等离子体增强化学气相沉积法、氢化非晶硅、热氧化法、原子层沉积法以及叠层钝化,并分别介绍了它们在应用上的优缺点。分析了制备钝化膜过程中存在的问题,并提出了相应措施及发展趋势。表面钝化技术是提高晶体硅电池转换效率最有效的手段之一,今后晶体硅电池表面钝化技术仍将是国内和国际研究的热点之一。     

对非晶硅薄膜进行快速磷扩散以获得本征薄层异质结

本征薄层异质结(HIT)太阳能电池具有优异的性能,包括效率高、成本低、稳定性好、制备温度低等。本研究利用磁控溅射技术在p型单晶硅(pc-Si)衬底上制备一定厚度的本征非晶硅薄膜(i-a-Si),以磷纸为扩散源,通过快速热扩散(RTD)方法进行扩散得到具有p-n结的掺杂非晶硅层(n+-a-Si),最终得到n+-a-Si/i-a-Si/c-Si的异质结结构。系统地研究了扩散过程对a-Si膜(包括i-a-Si和n+-a-Si)晶化程度以及p-n结深度的影响,利用拉曼光谱(Raman)、X射线衍射(XRD)仪、台阶仪、扫描电镜(SEM)等对a-Si膜进行表征,并利用金相显微镜测量p-n结(采用磨角染色法染色)深度,从而获得制备p-n结的最佳扩散温度和时间。     

95%高双面率异质结太阳电池的叠层减反射研究

本文通过PV Lighthouse模拟了硅片厚度(从50μm至200μm)对晶硅异质结(SHJ)太阳电池的光学吸收及光生电流密度的影响,剖析了电池柔性化面临的瓶颈问题,并模拟了不同厚度的TCO/MgF₂与TCO/SiO₂减反射结构,获得了最佳光生电流密度。通过热蒸发制备了MgF₂薄膜,射频磁控溅射制备了SiO₂薄膜,经过优化构建了具有高透过率(92.56%)的MgF₂/SiO₂叠层减反射结构,将器件入光面反射率从6.70%降低至5.46%。在SHJ电池背面应用MgF₂/SiO₂叠层减反射结构,正面辅以单层SiO₂或MgF₂减反射薄膜,背面入光时的外部量子效率(EQE)显著提高了2.35%,使短路电流密度提升1.10 mA/cm²以上。该叠层减反射方案实现了95.16%的超高双面率,对提升双玻组件的发电量具有重要意义。     

多晶硅扩散氧化层对太阳电池性能的影响

重点研究了多晶硅扩散氧化层对电池性能的影响,并对大规模生产多晶硅扩散工艺进行了优化研究。采用少子寿命测试仪分析了扩散前后的硅片少子寿命,发现当扩散氧化时的干氧流量控制在2800sccm,扩散后的方块电阻控制在60～70Ω/□时,扩散后硅片少子寿命最高达到了10.45μs,与扩散前的硅片少子寿命相比延长了5倍多;此时的太阳电池并联电阻和短路电流分别高达40.4Ω和8522mA,光电转换效率也由16.69%(干氧流量2000sccm)提高到了16.83%。此外,主要针对扩散氧化层对片内方阻均匀性及少子寿命的影响做了解释。     

退火温度对ZnO/Si异质结光电转换特性的影响

采用直流反应溅射法在P-Si(100)衬底上制备了ZnO薄膜,XRD测量表明ZnO为沿c轴高度取向的多晶薄膜,1-V特性曲线表明,ZnO/Si异质结具有明显的整流特性.研究了退火温度对异质结光电转换特性的影响,结果显示,合适的退火温度能显著增大异质结的开路电压和短路电流,进而增大异质结的光电转换效率,经400℃退火后异质结获得最佳的转换效率.当退火温度达到或超过500℃时,异质结的反向电流迅速增加,光生电压和光生电流大幅度减小.通过对ZnO薄膜结构和电学性质的测量和分析,推测异质结的光电转换特性改变主要受ZnO薄膜的电学性质影响.     

Nanostructure formation and passivation of large-area black silicon for solar cell applications

Nanoscale textured silicon and its passivation are explored by simple low-cost metal-assisted chemical etching and thermal oxidation, and large-area black silicon was fabricated both on single-crystalline Si and multicrystalline Si for solar cell applications. When the Si surface was etched by HF/AgNO(3) solution for 4 or 5 min, nanopores formed in the Si surface, 50-100 nm in diameter and 200-300 nm deep. The nanoscale textured silicon surface turns into an effective medium with a gradually varying refractive index, which leads to the low reflectivity and black appearance of the samples. Mean reflectance was reduced to as low as 2% for crystalline Si and 4% for multicrystalline Si from 300 to 1000 nm, with no antireflective (AR) coating. A black-etched multicrystalline-Si of 156 mm × 156 mm was used to fabricate a primary solar cell with no surface passivation or AR coating. Its conversion efficiency (η) was 11.5%. The cell conversion efficiency was increased greatly by using surface passivation process, which proved very useful in suppressing excess carrier recombination on the nanostructured surface. Finally, a black m-Si cell with efficiency of 15.8% was achieved by using SiO(2) and SiN(X) bilayer passivation structure, indicating that passivation plays a key role in large-scale manufacture of black silicon solar cells.     

Band gap profiles of intrinsic amorphous silicon germanium films and their application to amorphous silicon germanium heterojunction solar cells

Intrinsic amorphous silicon germanium (i-a-SiGe:H) films with V, U and VU shape band gap profiles for amorphous silicon germanium (a-SiGe:H) heterojunction solar cells were fabricated. The band gap profiles of i-a-SiGe:H were prepared by varying the GeH₄ and H₂ flow rates during the deposition process. The use of i-a-SiGe:H with band gap profile in an absorber layer for a-SiGe:H heterojunction solar cells was investigated. The solar cell using a VU shape band gap profile shows a higher efficiency compared to other shapes. The highest efficiency obtained for an a-SiGe:H heterojunction solar cell using the VU shape band gap profile technique was 9.4% (V_oc = 0.79 V, J_sc = 19.0 mA/cm² and FF = 0.63).     

Optical absorption enhancement in solar cells with cylindrical Ag nanoparticles by localized surface plasmons

The use of nanoparticles on thin-film solar cells is an effective way to enhance optical absorption. A simulation is presented of a three-dimensional array of cylindrical Ag nanoparticles on the surface of a solar cell, which has been proved very efficient to enhance the optical absorption of the silicon substrate by utilizing localized surface plasmons. The enhancement ratio has been simulated with respect to nanoparticle radius and height as well as crystalline silicon substrate thickness and is discussed in detail. The absorption enhancements were found to exhibit a damping oscillation when only height or thickness of the cylindrical nanoparticle were varied. Even without intentional optimization, an enhancement factor of 1.283 for a silicon substrate with a thickness of 500?nm was still achieved in our simulations. A further optimized structure has the potential to attain a higher factor.     

T型发射区单晶硅太阳电池的输出特性研究

利用TCAD半导体器件仿真软件对具有T型发射区结构的单晶硅太阳电池进行了仿真研究。全面系统地分析了在不同衬底少子寿命情况下,不同T型发射区深度对太阳电池外量子效率、短路电流密度、开路电压、填充因子及转换效率的影响。仿真结果表明:采用T型发射区结构可在一定程度上提高常规均匀发射区太阳电池的电学性能;T型发射区结构对700~1200nm长波段入射光的外量子效率具有明显的改善作用;当衬底少子寿命一定时,太阳电池短路电流密度、填充因子均随T型发射区深度的增大而增大,而开路电压随T型发射区深度的增大而减小;当T型发射区深度大于80μm时,对于低衬底少子寿命的单晶硅太阳电池,T型发射区结构对其转换效率的改善效果最为显著。     

溅射法低温生长纳米硅薄膜及异质结电池

用射频溅射法在P型硅衬底上生长了纳米硅薄膜,衬底温度控制在100℃左右,工作气体选用H2 Ar,氢气的分压控制在31%到73%,同时改变薄膜的沉积时间.用Raman、XRD、AFM、SEM 及椭偏仪对薄膜的特性进行了测定.XRD的测试结果表明,样品中存在一种微结构,不同于用PECVD方法生长的薄膜.椭偏仪的测试结果给出这种薄膜具有宽带隙.在室温条件下对异质结薄膜电池的I-V特性进行了测量.     

高效单晶硅太阳电池基区结构设计与参数优化

首先利用TCAD半导体器件仿真软件全面系统地分析了在不同少子寿命的情况下,基区电阻率对常规P型单晶硅太阳电池输出特性的影响。然后基于对仿真结果的分析,提出一种具有非均匀基区的单晶硅太阳电池结构,并对其输出特性进行了仿真研究。结果表明:当少子寿命一定时,存在最优的基区电阻率,使得常规电池的转换效率最大;随着少子寿命的减小,电池最优的基区电阻率减小;提高基区电阻率有利于常规电池长波段量子效率和短路电流的提高,但同时会降低电池的开路电压和填充因子;当少子寿命较低时,非均匀基区结构不具有提高常规电池转换效率的作用。但当少子寿命增大到一定值时,通过优化非均匀基区的表面浓度,非均匀基区结构可有效改善常规电池的电学性能。     

Direct writing of semiconducting polythiophene and fullerene derivatives composite from bulk heterojunction solar cell by inkjet printing

The direct writing approach of poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester (P3HT:PCBM) composite from bulk-heterojunction (BHJ) solar cell was efficiently addressed by inkjet printing technology using conventional chlorobenzene ink solution. The structure of inkjet-printed P3TH:PCBM BHJ film was fabricated by the repetitive direct writing of new line overlapped partially on former line. The best structure of P3HT:PCBM film for BHJ solar cell was observed from inkjet printing condition of around 50% of droplet overlaps with 2 wt.% BHJ ink at 25 °C of substrate temperature. The maximum power conversion efficiency reached 2.83% with an open circuit voltage of 0.62 V, a short circuit current density of 8.60 mA/cm², and a fill factor of 0.53 under air mass 1.5 G irradiation (100 mW/cm²).     

SiNx钝化膜厚度对pHEMT的性能影响

深入地研究了ＳｉＮｘ钝化膜厚度对ＡｌＧａＡｓ／ＩｎＧａＡｓ／ＧａＡｓ ｐＨＥＭＴ电性能的影响,实验结果表明,ｐＨＥＭＴ器件的截止频率随着氮化硅钝化膜厚度的增加而下降;妆膜厚超过２００ｎｍ时,将影响ｐＨＥＭＴ器件电特性。     

染料敏化太阳电池中铂金对电极的制备及性能之比较

分别采用了3种不同的方法制备了用于染料敏化TiO2太阳电池的铂金对电极，并分别以此3种铂金对电极组装染料敏化太阳电池，对比、分析和探讨了它们对光电转化性能的影响。结果表明：采用纳米粒子电沉积法与电化学电镀法制备的铂金对电极，具有较高的催化活性，以这两种方法制备的铂金对电极组装的DSSCs获得较好的光电转化性能，电池的光电转化效率分别为6．40％和6．63％，且采用纳米粒子电沉积法制备的铂金对电极铂金含量较低；而采用热分解法制备的铂金对电极来组装的DSSCs获得的光电性能相对较低，电池效率为5．58％。