Erratum

Factors affecting the nucleation and propagation of dislocations, stacking faults, microtwins, and inversion domain boundaries in epitaxially grown semiconductor layers are reviewed, with examples for heteroepitaxial MBE-grown layers on substrates having varying degrees of mismatch or different crystal symmetry. Mechanisms for generation of defects at the heterointerface and in the epilayer are discussed. For epilayers with bulk mismatch from 0 to 4%, methods for reducing defect density in the epitaxial layer are considered. Examples of structural details in the epilayers and at heterointerfaces, particularly those which may be revealed by transmission electron microscopy, are given. The online version of the original article can be found at     

Recent Advances in Mechanically Transferable III-Nitride Based on 2D Buffer Strategy

Group III-nitrides have attracted significant attention in recent years for their wide tunable band-gaps and excellent optoelectronic capabilities, which are advantageous for several applications including light-emitting diodes, lasers, photodetectors, and large-size low-cost power electronic devices. However, conventional epitaxy accompanied by the covalent bond formation renders the transfer of nitride epilayers difficult, thereby limiting the application potential of nitrides in wearable and flexible electronics. Furthermore, interfacial covalent bonds also limit substrate selection and hinder the development of heterogeneous integration between nitrides and other material systems. 2D materials can mitigate these problems significantly. On the one hand, due to the weak van der Waals forces between the layers of 2D materials, influences of lattice mismatch can be avoided to improve crystal quality. On the other hand, delamination and transfer of nitride epilayers can be achieved easily. Therefore, this study focuses on providing comprehensive guidelines regarding the exfoliation of epitaxial layers using 2D materials to provide new design freedoms for nitride devices. Different 2D buffers and release layers have also been discussed. Furthermore, the limitations, promising solutions, future directions, and applicability of this strategy to flexible nitride devices are presented.     

晶格失配对InAs基室温中波红外探测器性能的影响

采用液相外延技术生长了InAs基室温红外探测器件材料,通过光学显微镜、扫描电子显微镜、X射线衍射仪分析了外延材料表面形貌、截面形貌与晶格失配的关系。分析发现,不恰当的晶体晶格常数匹配度会导致材料表面形貌变差,降低材料的结晶质量,晶格失配在0.22%左右的InAs基外延材料表面形貌较好,缺陷少,晶体质量较好。在此基础上,成功制备出室温探测率D^*为6.8×10⁹ cm·Hz^1/2·W^-1的InAs基室温中波红外探测器,这一性能与国际上红外探测器领军企业美国Teledyne Judson Technologies和日本滨松株式会社的商用InAs基红外探测器性能处于同等水平。     

Suppression of strain-induced cross-hatch on molecular beam epitaxy (211)B HgCdTe

Because the performance of HgCdTe-based photodiodes can be significantly degraded by the presence of dislocations, we have systematically investigated and suppressed lattice-mismatch-induced cross-hatch formation and the associated generation of dislocations in (211)B HgCdTe/CdZnTe. A series of HgCdTe epilayers were deposited simultaneously on pairs of substrates with differing ZnTe mole fractions. Epilayers’ CdTe mole fraction and substrates’ ZnTe mole fractions were measured using optical-transmission spectra. Lattice mismatch and residual strain were estimated from room-temperature, x-ray diffraction, and double-crystal rocking-curve measurements (DCRC). It was found that cross-hatch patterns were suppressed in epilayers deposited on nearly lattice-matched substrates (|Δa/a_sub|<0.02%). Such epilayers exhibited excellent crystalline quality as revealed by defect-decoration etching (etch-pit density (EPD)<10⁵ cm⁻²) and x-ray diffraction (full-width at half-maximum (FWHM) ∼10 arcsec). In addition to determining the upper limits of lattice mismatch needed to eliminate cross-hatch, we investigated the use of reticulated substrates as a means to suppress cross-hatch. We found that growth on reticulated mesa structures (<100 μm) with edges parallel to [01-1] resulted in epilayers with substantially reduced cross-hatch-line densities despite large lattice mismatch (Δa/a_sub <0.04%). The use of reticulated substrates could suppress cross-hatch because of lateral-alloy variation in large substrates and complex multistack epilayers (e.g., multicolor detectors).     

Growth and Analysis of HgCdTe on Alternate Substrates

Dislocations generated at the HgCdTe/CdTe(buffer layer) interface are demonstrated to play a significant role in influencing the crystalline characteristics of HgCdTe epilayers on alternate substrates (AS). A dislocation density >10⁸?cm^?2 is observed at the HgCdTe/CdTe interface. Networks of dislocations are generated at the HgCdTe/CdTe interface. The dislocation networks are observed to entangle. Significant dislocation reduction occurs within a few microns of the HgCdTe/CdTe interface. The reduction in dislocation density as a function of depth is enhanced by annealing. Etch pit density and x-ray diffraction full-width at half-maximum values increase as a function of the lattice mismatch between HgCdTe epilayer and the buffer layer/substrate. The experimental results suggest that only by reducing HgCdTe/CdTe lattice mismatch will the desired crystallinity be achieved for HgCdTe epilayers on AS.     

Ga_(1-x)In_xAs_ySb_(1-y)/GaSb LPE生长及其性质研究

报导了在n型(100)GaSb衬底上,温度为520—530℃时,用液相外延的方法实现了组分在0≤x≤0.19,0≤y≤0.14范围内的Ga_(1-x)In_xAs_ySb_(1-y)四元合金半导体的生长。X射线双晶衍射,电子探针及光学显微镜的观察和分析测试表明:所得外延层的表面形貌和界面特性优良,组分分布和层厚均匀,晶格匹配及单晶性能良好。对外延层表面的氧化情况使用Auger能谱仪进行测试分析。另外,对生长中存在的一些问题进行了讨论。     

液相外延生长Hg_（1－x）Cd_xTe薄膜及其特性分析

报道了用液相外延技术生长Ｈｇ１－ｘＣｄｘＴｅ薄膜的工艺及分析薄膜特性的方法．结果表明Ｈｇ气压、过冷度、降温速率及退人条件等因素对波相外延薄膜的性能有很大影响．由Ｘ射线双晶回摆曲线可定量分析点阵失配度及外延层的组份，由红外透射光谱确定外延层组份的纵向分布．     

Formation conditions of random laser cavities in annealed ZnO epilayers

The possibilities to realize room-temperature random laser action in ZnO epilayers with MgO as the buffer layer are studied. It is found that the formation of random laser cavities inside the ZnO epilayers can be achieved by post-growth annealing. Incoherent and coherent random lasing phenomena are observed from ZnO epilayers with (220)- and [200]-oriented MgO buffer layers, respectively. Lasing linewidth of the ZnO epilayers with incoherent and coherent feedback under 355-nm optical excitation is found to be /spl sim/4 and /spl sim/0.4 nm, respectively.     

High-resolution X-ray diffraction studies of molecular beam epitaxy-grown HgCdTe heterostructures and CdZnTe substrates

Lattice mismatch between substrates and epitaxial layers of different molefractions can create a variety of distortions and defects in Hg_(1−x)Cd_(x)Te epilayers, thus degrading the performance of infrared detectors fabricated from this material. X-ray diffraction is a sensitive nondestructive technique, which allows in-depth characterization of the crystal lattice prior to detector fabrication. We present results of triple-axis diffractometry performed on single- and double-layer HgCdTe films grown on (211)B CdZnTe substrates by molecular beam epitaxy (MBE). In this study, both the ω and 2θ diffraction angles have been recorded absolutely so that the diffraction peaks in the RSMs can be positioned directly in reciprocal space, without requiring reference to a substrate peak. The positions of both surface-symmetric and asymmetric diffraction peaks have been used to extract lattice spacings parallel and perpendicular to the (211) growth direction. The relaxed lattice parameter of each epilayer has been calculated assuming that the layers are elastically strained. The low symmetry of the (211) growth direction, coupled with the anisotropic elasticity of zinc-blende semiconductors, results in monoclinic distortion of the lattice, as observed in these samples. In double-layer samples, the mosaicity of both layers is greater than that observed in single epilayers. Layers subjected to a Hg-saturated anneal show greater lattice distortion than as-grown samples.     

原位退火对HVPE生长的GaN外延层光学性质和结构的影响

研究了原位退火对用氢化物外延方法在(0001)面蓝宝石衬底上生长的氮化镓(GaN)外延薄膜的结构和光学性能的影响.测试表明,氨气气氛下在生长温度进行的原位退火,明显提高了GaN外延膜的质量.X射线衍射(XRD)分析表明,随着原位退火时间的增加,(0002)面和(1012)面摇摆曲线的半峰宽逐渐变窄.喇曼散射谱显示样品退火后E2(high)峰位向低频区移动;随着退火时间的延长,趋向于块状GaN的峰位.可见,原位退火使GaN外延膜中的双轴应力明显减少.光致发光的测试结果与XRD和喇曼散射谱的结论一致.表明原位退火能有效提高GaN外延膜的结构和光学性能.     

4H-SiC低压热壁CVD同质外延生长及特性

为了获得高质量4H-SiC外延材料,研制出一套水平式低压热壁CVD(LP-HWCVD)生长系统,在偏晶向的4H-SiC Si(0001)晶面衬底上,利用"台阶控制生长"技术进行了4H-SiC的同质外延生长,典型生长温度和压力分别为1500℃和1.3×103Pa,生长速率控制在1.0μm/h左右.采用Nomarski光学显微镜、扫描电镜(SEM)、原子力显微镜(AFM)、X射线衍射、Raman散射以及低温光致发光测试技术,研究了4H-SiC的表面形貌、结构和光学特性以及用NH3作为n型掺杂剂的4H-SiC原位掺杂技术,并在此基础上获得了4H-SiC p-n结二极管以及它们在室温及400℃下的电致发光特性,实验结果表明4H-SiC在Si不能工作的高温环境下具有极大的应用潜力.     

Recombination lifetime profiling in very thin Si epitaxial layersused for bipolar VLSI

A recently proposed measurement technique (P. Spirito and G. Cocorullo, IEEE Trans. Electron Devices, vol.ED-32, no.9, p.1708-13, 1985) to evaluate the recombination lifetime along epitaxial layers is used to characterize the quality of very thin Si epitaxial layers used for bipolar technology. The experimental results show the ability of the technique to give accurate and detailed information on the quality of epilayers that could be useful in monitoring and improving the growth process. The experimental results show that the lifetime values in thin epilayers are not correlated with doping profiles in the same layers; moreover, they are only slightly dependent on different processes used to make the test devices     

原位退火对HVPE生长的GaN外延层光学性质和结构的影响

研究了原位退火对用氢化物外延方法在(0001)面蓝宝石衬底上生长的氮化镓(GaN)外延薄膜的结构和光学性能的影响.测试表明,氨气气氛下在生长温度进行的原位退火,明显提高了GaN外延膜的质量.X射线衍射(XRD)分析表明,随着原位退火时间的增加,(0002)面和(1012)面摇摆曲线的半峰宽逐渐变窄.喇曼散射谱显示样品退火后E2(high)峰位向低频区移动;随着退火时间的延长,趋向于块状GaN的峰位.可见,原位退火使GaN外延膜中的双轴应力明显减少.光致发光的测试结果与XRD和喇曼散射谱的结论一致.表明原位退火能有效提高GaN外延膜的结构和光学性能.     

High-quality AlGaN layers over pulsed atomic-layer epitaxially grown AlN templates for deep ultraviolet light-emitting diodes

In this paper, we report the pulsed atomic-layer epitaxy (PALE) of ultrahigh-quality AlN epilayers over basal-plane sapphire substrates and their use as templates to grow high-quality AlGaN layers with Al content ranging from 0.3 to 1. Symmetric/asymmetric x-ray diffraction (XRD) and room-temperature (RT) photoluminescence (PL) measurements were used to establish the high-structural and optical quality. The XRD (002) and (114) rocking-curve full-width at half-maximum (FWHM) values of the PALE-grown AlN epilayers were less than 60 arcsec and 250 arcsec, respectively. Using these ultrahigh-quality layers as templates, Si-doped AlGaN layers with a large Al content from 30% to 100% were grown and used for milliwatt power sub-280-nm, deepultraviolet (UV) light-emitting diodes (LEDs).     

Growth of Ga0.47In0.53As on InP by low-pressure m.o. c.v.d.

The first heteroepitaxy is reported of Ga0.47In0.53As on InP by low-pressure metalorganic chemical vapour deposition (m.o. c.v.d.). Triethylindium (t.e.i.) and triethylgallium (t.e.g) were used as group III sources, and arsine as the group V source. These Ga0.47In0.53As epilayers exhibit high electron mobility (7.74 cm2 V?1 s?1 for a total impurity concentration of 2.5 × 1016 cm?3 at 300 K) and a photoluminescence efficiency comparable to l.p.e. layers. The lattice mismatch is only ?a0/a0 ? 4 × 10?4. Our mobility measurements indicate that m.o. c.v.d. Ga0.47In0.53As is a promising material for microwave device applications.     

Growth of GaN on Buffer Layers with Different Polarities by Hydride Vapor-Phase Epitaxy

This paper reports the properties of GaN grown by the hydride vapor-phase epitaxy (HVPE) technique on buffer layers with different polarities. The N-, mixed-, and Ga-polarity buffer layers were grown by molecular-beam epitaxy (MBE) on sapphire (0001) substrates; then, thicker GaN epilayers were grown on these by HVPE. The surface morphology, structural, and optical properties of these HVPE-GaN epilayers were characterized by atomic force microscopy (AFM), x-ray diffraction (XRD), scanning electron microscopy, and photoluminescence (PL) spectroscopy. The results indicate that the crystallinity of these HVPE-GaN epilayers depends on the polarity of the buffer layer.     

Radiative recombination via direct optical transitions in In1 −x GaxAs (0≤x≤0.16) solid solutions

Photoluminescence from In_1?x Ga_xAs (0≤x≤0.16) solid solution epilayers LPE-grown on (111)InAs substrates and electroluminescence from p-n junctions on their bases have been studied in the temperature range 77–450 K. Despite the negative lattice mismatch between epilayer and substrate, radiative recombination in epilayers occurs via direct optical transitions ensuring a high internal quantum efficiency of luminescence (6% at 295 K).     

Influences of Te-Rich and Cd-Rich Precipitates of CdZnTe Substrates on the Surface Defects of HgCdTe Liquid-Phase Epitaxy Materials

Influences of Te-rich and Cd-rich precipitates of CdZnTe substrates on the surface defects of HgCdTe epilayers grown by Te-rich liquid-phase epitaxy were investigated. The results show that HgCdTe surface defects are mainly attributable to precipitates on CdZnTe substrate surfaces. At the same time, the remelting of substrate surface layers during the liquid-phase epitaxial process also affects the number and morphology of HgCdTe surface defects. According to the morphological characteristics of surface defects, three types of surface defects were observed on the surfaces of HgCdTe epilayers. There are no obvious differences in the morphologies of the surface defects grown on Te-rich and Cd-rich substrates. However, the dislocation distributions around surface defects are different for HgCdTe epilayers grown on different substrates.     

Optimization of High-Quality AlN Epitaxially Grown on (0001) Sapphire by Metal-Organic Vapor-Phase Epitaxy

A systematic study is performed to optimize aluminum nitride (AlN) epilayers grown on (0001) sapphire by metal-organic vapor-phase epitaxy. Specifically, the impact of the AlN nucleation conditions on the crystalline quality and surface morphology of AlN epilayers is studied. Atomic force microscopy (AFM) and x-ray diffraction (XRD) results reveal that the nucleation layer plays a critical role in the growth of subsequent layers. The magnitude of the TMAl flow of AlN nucleation layer is found to have a strong effect on the crystalline quality and surface morphology of the high-temperature (HT) AlN epilayer. A simple Al adatom-diffusion-enhancement model is presented to explain the strong dependence of the crystalline quality and surface morphology on TMAl flow. Furthermore, ammonia flow, nucleation temperature, and growth time of the AlN nucleation layer are found to affect the surface morphology and the crystalline quality as well. A trade-off is found between surface morphology and crystalline quality; that is, we do not obtain the best surface morphology and the highest crystalline quality for the same growth parameters. For optimized AlN nucleation layers and HT AlN epilayers, a clear and continuously linear step-flow pattern with saw-tooth shaped terrace edges is found by AFM on AlN epilayers. Triple-axis x-ray rocking curves show a full-width at half-maximum (FWHM) of 11.5 arcsec and 14.5 arcsec for the (002) and (004) reflection, respectively. KOH etching reveals an etch-pit density (EPD) of 2 × 10⁷ cm⁻², as deduced from AFM measurements.     

蓝宝石衬底上原子级光滑AlN外延层的MOCVD生长

在蓝宝石衬底表面无氮化、低Ⅴ/Ⅲ比的情况下,采用1200℃的衬底温度、5kPa反应室气压,用MOCVD方法在蓝宝石衬底上生长出了表面原子级光滑的AlN外延层.原子力显微镜测试表明其平均粗糙度为0.44nm,X射线衍射(0002)回摆曲线FWHM为166".实验结果和分析表明,极性和气相反应是影响AlN表面形貌的主要原因.以原子级光滑的AlN为模板生长出了高质量的高Al组分的n型AlGaN,证实了AlN模板具有较好的质量.