Holographic creation of photonic crystals

We describe the creation of general photonic crystals by means of holography with an experimental demonstration. The recordings of periodic variations of amplitude and phase by the interference of coherent laser beams offer a natural means for the creation of one- two- or three-dimensional photonic crystals. Based on the principle of the interference of four noncoplanar beams, we present a comparative analysis of two different approaches for creating photonic crystals and use numerical simulated lattice structures to illustrate the differences between these two approaches. We then use a specific symmetrical optical architecture and select the proper approach to create holographic photonic crystals. The advantages and constraints of this holographic method are discussed.     

Formation of three-dimensional periodic microstructures by interference of four noncoplanar beams

A newly reported method of making three-dimensional microstructures or photonic crystals by holographic lithography has some obvious advantages over other techniques with the same purpose. A systematic and comprehensive analysis of interference of four noncoplanar beams (IFNB) is provided. It shows that all 14 Bravais lattices can be formed by means of IFNB and gives explicit relationships between each lattice and the corresponding recording geometry. The concept of pattern contrast is extended to the case of IFNB, and it is indicated that a uniform contrast for each interference term can be obtained by properly choosing the beam ratio and polarization. A calculation algorithm is then developed to optimize the direction of polarization of each beam to ensure maximum uniform contrast. These results, verified by computer simulations, may lay a theoretical foundation for fabrication of photonic crystals with the approach of IFNB.     

Creation of line defects in holographic photonic crystals by a double-exposure thresholding method

Recording of periodic variations of amplitude and phase by the interference of coherent laser beams in a hologram offers a natural means for creating one-, two-, and three-dimensional photonic crystals. For device applications such as waveguides in optical communications, one usually needs to create defects in photonic crystals. We present an analysis and an experimental demonstration of a double-exposure method for creating photonic crystals with line defects. The idea is based on the principle of superposition of holographic grating patterns of different spatial periods while the recording medium is held stationary and on the application of a threshold to the recording medium. We use the same symmetrical optical architecture to achieve nondefective and defective holographic photonic crystals. The technique may be extended to the creation of defects based on functional synthesis by means of Fourier series, by use of light sources of other wavelengths with an appropriate high-contrast recording material.     

激光全息法制备三维光子晶体的研究进展

三维光子晶体作为一种光子带隙材料,在光学器件、化学生物传感以及信息传输和存储等方面具有广泛的潜在应用价值。激光全息法制备光子晶体具有均匀性好、无缺陷、成本低廉等优点。综述了激光全息法制备三维光子晶体的理论及实验方面的研究进展,并阐述了各种方法的代表性工作以及各自的优缺点。     

Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure

We report a combined holographic and nanoimprinting lithography technique to produce three-dimensional woodpile photonic crystal templates through only one single exposure. The interference lithography process uses an integratable diffractive optical element for large throughout 3D pattern manufacturing. The diffractive optical element consists of two layers of phase grating separated by an intermediate layer, fabricated by repeated nanoimprinting lithography, followed by an SU8 photoresist bonding technique. Grating periods, relative orientation, diffraction angle, and efficiency, as well as layer to layer phase delay, are well designed during manufacturing. By thermally optimizing the thickness of the intermediate layer, this paper demonstrates the fabrication of interconnected 3D photonic structures with arbitrary symmetry through a single laser exposure. The two-layer phase mask approach enables a CMOS-compatible monolithic integration of 3D photonic structures with other integrated optical elements and waveguides.     

Fabrication of three-dimensional photonic crystals by interference lithography with low light absorption

We report on the fabrication of polymer templates of photonic crystals by means of holographic (or interference) lithography. The grating is written in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined.     

Large complete bandgaps in a two-dimensional square photonic crystal with isolated single-atom dielectric rods in air

It is well known that the square lattice of isolated single-atom dielectric rods in air does not give rise to complete bandgaps even when asymmetry is introduced to lift some degeneracy. However, in this paper, a new kind of two-dimensional square photonic crystal with isolated single-atom dielectric rods in air formed by holographic lithography is proposed, and the relation between their photonic bandgap properties and their specific holographic design are systematically analyzed. In addition to the large complete relative bandgap, namely 9.68% gap/midgap ratio for the dielectric constant contrast of 13.6:1, this structure has very large tolerance on the system parameters and fabrication conditions. This fact can greatly relax the experimental requirements. This work may demonstrate the unique feature and advantages of photonic crystals made by the holographic method and provide a guideline for their design and fabrication.     

SU-8光刻胶制作三维光子晶体

针对SU-8光刻胶应用于三维光子晶体的制作研究,本文提出并实现了对SU-8光刻胶的重要成分SU-8环氧树脂采用柱层析和高压液相色谱-尺寸排阻色谱法进行分离,分离结果表明SU-8环氧树脂分子量分布范围很大,从大约100～100000,包括SU-1、SU-2、SU-4、SU-6、SU-8多种组分及其混合物.采用分离后的SU-8和SU-6纯组分配制了性能优化的SU-8光刻胶,并总结了其最佳光刻工艺,结合干涉光刻技术制作了晶格常数为922nm的三维面心立方光子晶体结构.     

Single-beam data encoding using a holographic angular multiplexing technique

We propose a novel configuration for angular multiplexing holographic encoding in which the signal beam and the reference beam are combined into a single beam. By using a spatial light modulator based on twisted nematic liquid crystals, the signal and the reference beams are modulated in amplitude mode and phase mode, respectively. The multiplexed interference patterns with the reference beams of different incident angles are recorded near the Fourier transform plane, and then the signals are selectively reconstructed by the corresponding reference beam. Both the simulation and the experiment of single-beam angular multiplexed holography are performed with consistent results. Compared with the traditional angular multiplexing holographic recording system, the single-beam configuration is more compact, easier to adjust, and less sensitive to the vibration of the environment. Therefore, it will be more attractive for potential applications in many fields, such as high-density signal recording and data encryption.     

Holographic control of motive shape in plasmonic nanogap arrays

Here we demonstrate that 4-beam holographic lithography can be utilized to create plasmonic nanogaps that are 70 times smaller than the laser wavelength (488 nm). This was achieved by controlling phase, polarization, and laser beam intensity in order to tune the relative spacing of the two sublattices in the interference pattern of a compound-lattice in combination with the nonlinear resist response. Exemplarily, twin and triplet motive features were designed and patterned into polymer in a single exposure step and then transferred into gold nanogap arrays resulting in an average gap size of 22 nm and smallest features down to 7 nm. These results extend the utility of high-throughput, wafer-scale holographic lithography into the realm of nanoplasmonics.     

Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography

A comprehensive and fully three-dimensional model of holographic lithography is used to predict more rigorously the geometry and transmission spectra of photonic crystals formed in Epon SU-8 photoresist. It is the first effort known to the authors to incorporate physics of exposure, postexposure baking, and developing into three-dimensional models of photonic crystals. Optical absorption, reflections, standing waves, refraction, beam coherence, acid diffusion, resist shrinkage, and developing effects combine to distort lattices from their ideal geometry. These are completely neglected by intensity-threshold methods used throughout the literature to predict lattices. Numerical simulations compare remarkably well with experimental results for a face-centered-cube (FCC) photonic crystal. Absorption is shown to produce chirped lattices with broadened bandgaps. Reflections are shown to significantly alter lattice geometry and reduce image contrast. Through simulation, a diamond lattice is formed by multiple exposures, and a hybrid trigonal-FCC lattice is formed that exhibits properties of both component lattices.     

Single-exposure, photorefractive holographic surface contouring with multiwavelength diode lasers

We studied the use of multiwavelength diode lasers for surface profilometry through holographic recording in sillenite Bi12TiO20 crystals. When such lasers are used, the holographic image from single-exposure recordings appears covered with interference fringes providing information on the surface relief of the object. By taking advantage of the narrow interference fringes due to the multiwavelength emission of the laser, we obtained interferograms by holographic recording with two reference beams, which improves the surface analysis by visual inspection and enhances the profilometry sensitivity.     

Triply periodic bicontinuous structures through interference lithography: a level-set approach

Interference lithography holds the promise of fabricating large-area, defect-free photonic structures on the sub-micrometer scale both rapidly and cheaply. There is a need for a procedure to establish a connection between the structures that are formed and the parameters of the interfering beams. There is also a need to produce self-supporting three-dimensional bicontinuous structures. A generic technique correlating parameters of the interfering beams with the symmetry elements present in the resultant structures by a level-set approach is developed. A particular space group is ensured by equating terms of the intensity equation to a representative level surface of the desired space group. Single- and multiple-exposure techniques are discussed. The beam parameters for certain cubic bicontinuous structures relevant to photonic crystals, viz.,the diamond(D), the simple cubic (P), and the chiral gyroid (G) are derived by utilizing either linear or elliptically polarized light.     

Controlling large-scale film morphology by phase manipulation in interference lithography

An experimental arrangement is described where a Babinet-Soleil compensator is inserted into the path of one of the three beams used for noncoplanar beam interference lithography. This birefringent element can change the phase of the beam so that either a positive two-dimensional pattern or an inverselike structure is generated in a photoresist without disturbing the mechanical geometry of the setup. Simulations are presented that confirm the validity of this approach. Large defect-free sample areas (>1 cm(2)) with submicrometer periodic patterns were obtained by expanding the laser beams used in the lithography experiment.     

A holographic method for studying absorptivity modulation in transparent media

A dual-beam holographic method is described that can be used for measuring small induced absorptivity modulation in a transparent medium. The proposed method is based on a diffraction-interference scheme in which the interference field inducing an amplitude grating is shifted by a quarter of period relative to a reference volume phase grating. The induced amplitude grating introduces a nonequivalent energy exchange between the transmitted beams, which is proportional to changes in the absorption coefficient of the medium. The new dual-beam holographic method of measuring small absorptivity modulation is compared to the well-known single-beam diffraction technique.     

Functional integrated optical elements for beam shaping with coherence scrambling property, realized by interference lithography

Many applications, such as semiconductor lithography and material processing, require the shaping of laser beams to provide a homogenous field illumination. We present the conception, implementation, and experimental verification of a combined single-element homogenizer. Additionally, for excimer laser applications, the concept is associated with a coherence scrambling capability. We used the technique of holographic interference lithography to integrate the multifunctional properties in a diffractive optical element. The wavelength difference between the recording process (457.9 nm) and the application (193 nm) results in a change of the imaging properties and requires a geometrical adaptation of the optical setup. The coherence scrambling effect of the setup is based on an off-axis design, including the beam shaping diffractive structure.     

Simple interferometric fringe stabilization by charge-coupled-device-based feedback control

A method for producing stabilized interference patterns for ultraviolet interference lithography using a CCD camera as the detector element is described. Intensity data obtained from the CCD element are filtered in software to minimize speckle and detector noise effects as well as to determine the relative phase of the interfering beams. A control signal is then issued to correct the fringe drift. The system allows rapid reconfiguration of the lithography setup with minimum realignment of optical components.     

Fabrication of a submicrometer crystalline structure by thermoplastic holography

We report what we believe to be a novel method for fabrication of permanent submicrometer periodic structures by interference laser fields. The new method is holographic lithography combined with laser-induced thermoplastification. The crystalline structures that result from this new method not only can be maintained permanently after the optical field is evacuated but also can be rewritten by exposure of an inteference laser field for the second time. The process of fabrication is rapid, convenient, and effective.     

Fabrication of three-dimensional photonic crystals with two-beam holographic lithography

A holographic technique used to fabricate three-dimensional photonic crystals with a two-beam interference method is presented. In the optical setup of fabrication one beam is incident on the recording plate in the direction of the plate normal and the other beam with an angle to the normal. Three exposures were taken. Between each exposure, the recording plate was rotated 120 degrees on axis until three exposures were completed. Good three-dimensional lattice structures have been obtained. Theoretical analysis, computer simulations, and experimental results are presented.     

Ultrahigh-Q nanocavities written with a nanoprobe

High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>10(6)) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.