InAs/GaAs multiple quantum dot structures grown by LP-MOVPE

Structures with self-organised InAs quantum dots in a GaAs matrix were grown by the low pressure metal–organic vapour phase epitaxy (LP-MOVPE) technique. Photoluminescence and atomic force microscopy were used as the main characterisation methods for the growth optimisation. The properties of multiple-stacked quantum dot structures are influenced by the thickness of the GaAs separation layers (spacers) between quantum dot-containing InAs layers, by the InAs layer thickness, by arsine partial pressure during growth, and by group III precursor flow interruption time.     

Self-assembled growth of GaAs anti quantum dots in InAs matrix by migration enhanced molecular beam epitaxy

Self-assembled GaAs anti quantum dots (AQDs) were grown in an InAs matrix via migration enhanced molecular beam epitaxy. The transmission electron microscopy image showed that the 2D to 3D transition thickness is below 1.5 monolayers (MLs) of GaAs coverage. The average diameter and height of the GaAs AQDs for 1.5 ML GaAs coverage taken from the atomic force microscopy image were approximately 29.0 nm and 1.4 nm, respectively. The density was approximately 6.0 x 10(10) cm(-2). The size of the AQDs was enlarged in the InAs matrix compared with that on the surface. These results indicate that the GaAs AQDs in the InAs matrix under tensile strain can be effectively formed with the assistance of the migration enhanced epitaxy method.     

Photoluminescence and magnetophotoluminescence of circular and elliptical InAs/GaAs quantum dots

Photoluminescence, magnetophotoluminescence, and atomic force microscopy were used for the characterization of MOVPE prepared InAs/GaAs quantum dots. Significant differences in the behaviour of the first excited photoluminescence transition in magnetic field are explained by the different lateral shape of quantum dots. While the first excited luminescence peak of circular quantum dots splits with increasing magnetic field into two peaks, no splitting occurs for quantum dots with elliptic shape, only small red shift is observed. Theoretical calculations of energy levels in InAs/GaAs quantum dots with circular and elliptical shape with different elongations are presented and compared with experimental results.     

Ordering of Ge islands on Si(001) substrates patterned by nanoindentation

Spatial organization of Ge islands, grown by physical vapor deposition, on prepatterned Si(001) substrates has been investigated. The substrates were patterned prior to Ge deposition by nanoindentation. Characterization of Ge dots is performed by atomic force microscopy and scanning electron microscopy. The nanoindents act as trapping sites, allowing ripening of Ge islands at those locations during subsequent deposition and diffusion of Ge on the surface. The results show that island ordering is intrinsically linked to the nucleation and growth at indented sites and it strongly depends on pattern parameters.     

Topographie und elektrische Eigenschaften von InAs‐Quantenpunkten

Topography and electrical properties of InAs quantum dots Self assembled InAs‐islands were grown on GaAs with molecular beam epitaxy in the Stranski‐Krastanow growth mode. The topography of surface quantum dots was investigated by atomic force (AFM) and scanning electron microscopy (SEM). While the AFM enables to determine the dot height of ≈ 10 nm the SEM is best suited to study the lateral dimensions of uncapped islands. The latter technique gives a dot diameter of ≈ 30 nm. Although the size distribution of the islands is convoluted in the capacitance measurements on a dot ensemble, it was possible to determine roughly a Coulomb blockade energy of ≈ 20 meV for the ground state and ≈ 10 meV for the first excited dot level. Taking advantage of AFM‐lithography we were able to study electron transport through a single InAs island. Here we got a Coulomb blockade energy of 12 meV when electrons tunnel through the first excited state of the dot.     

Atomic force microscopy of InAs quantum dots on the vicinal surface of a GaAs crystal

An approach to the processing of images obtained by atomic force microscopy is proposed. An example of determining the parameters of InAs clusters formed on the vicinal surface of a GaAs crystal is presented. Using the proposed technique within the framework of the previously developed spherical cluster model, it is possible to determine the energy levels of electrons and holes in InAs quantum dots.     

Study of the spontaneous alignment of InAs quantum dots along the surface steps as a function of the InAs coverage

The evolution of InAs quantum dots (QDs) deposited on GaAs (001) was investigated in a continuous and unambiguous way as a function of the InAs coverage. Taking advantage of the intrinsic non-uniformity of the In flux in the molecular beam epitaxy system, a single sample was grown where the amount of InAs material varied in a monotonic way along the sample area. High-quality atomic force microscopy (AFM) images showed a saturation of the number of QDs nucleated out of the surface steps as the system evolved and confirmed that QDs can be effectively aligned along the surface steps up to the highest densities, which is an important subject for device application.     

Directed self-assembly of quantum structures by nanomechanical stamping using probe tips

We demonstrate that nanomechanically stamped substrates can be used as templates to pattern and direct the self-assembly of epitaxial quantum structures such as quantum dots. Diamond probe tips are used to indent or stamp the surface of GaAs(100) to create nanoscale volumes of dislocation-mediated deformation, which alter the growth surface strain. These strained sites act to bias nucleation, hence allowing for selective growth of InAs quantum dots. Patterns of quantum dots are observed to form above the underlying nanostamped template. The strain state of the patterned structures is characterized by micro-Raman spectroscopy. The potential of using nanoprobe tips as a quantum dot nanofabrication technology are discussed.     

Shape and size control of InAs/InP (113)B quantum dots by Sb deposition during the capping procedure

The role of Sb atoms present on the growth front during capping of InAs/InP (113)B quantum dots (QDs) is investigated by cross-sectional scanning tunnelling microscopy, atomic force microscopy, and photoluminescence spectroscopy. Direct capping of InAs QDs by InP results in partial disassembly of InAs QDs due to the As/P exchange occurring at the surface. However, when Sb atoms are supplied to the growth surface before InP capping layer overgrowth, the QDs preserve their uncapped shape, indicating that QD decomposition is suppressed. When GaAs(0.51)Sb(0.49) layers are deposited on the QDs, conformal growth is observed, despite the strain inhomogeneity existing at the growth front. This indicates that kinetics rather than the strain plays the major role during QD capping with Sb compounds. Thus Sb opens up a new way to control the shape of InAs QDs.     

Studying the formation of self-assembled (In,Mn)As quantum dots

Self-assembled quantum dots (SQDs) based on (In,Mn)As solid solutions have been synthesized by molecular beam epitaxy on GaAs(100) substrates. Examination of the surface morphology of samples by the method of atomic force microscopy showed that the presence of Mn influences the surface density and dimensions of SQDs. The effect of a preliminarily deposited sublayer of Mn atoms on the properties of subsequently grown layers with (In,Mn)As quantum dots has been studied.     

Optical anisotropy in self-assembled InAs nanostructures grown on GaAs high index substrate

We present a study of the optical properties of InAs self-assembled nanostructures grown by molecular beam epitaxy on GaAs(11N)A substrates (N?=?3-5). Photoluminescence (PL) measurements revealed good optical properties of InAs quantum dots (QDs) grown on GaAs(115)A compared to those grown on GaAs(113)A and (114)A orientations substrate. An additional peak localized at 1.39 eV has been shown on PL spectra of both GaAs(114)A and (113)A samples. This peak persists even at lower power density. Supporting on the polarized photoluminescence characterization, we have attributed this additional peak to the quantum strings (QSTs) emission. A theoretical study based on the resolution of the three dimensional Schr?dinger equation, using the finite element method, including strain and piezoelectric-field effect was adopted to distinguish the observed photoluminescence emission peaks. The mechanism of QDs and QSTs formation on such a high index GaAs substrates was explained in terms of piezoelectric driven atoms and the equilibrium surfaces at edges.     

Self-organization of three-dimensional lead telluride nanoislands under conditions close to thermodynamic equilibrium

Three-dimensional lead telluride (PbTe) nanoislands were grown on (111)BaF₂ substrates by hotwall epitaxy (HWE) from vapor phase under conditions close to thermodynamic equilibrium and their surface morphology was studied by atomic force microscopy in various growth stages, including the initial stage of nucleation and the subsequent evolution of the size and shape of nanoislands. The distributions of island dimensions in the samples grown under various thermodynamic conditions were statistically analyzed. It is shown that the proposed HWE method ensures the formation of dense (∼8 × 10¹⁰ cm⁻²) self-organized arrays of PbTe quantum dots with parameters comparable with those of the quantum dots of the same material grown by molecular beam epitaxy according to the Volmer-Weber mechanism.     

Influence of electron irradiation on the electronic transport mechanisms during the conductive AFM imaging of InAs/GaAs quantum dots capped with a thin GaAs layer

We have used conductive atomic force microscopy (C-AFM) to study the electronic transport mechanisms through InAs quantum dots (QDs) grown by molecular beam epitaxy on an n-type GaAs(001) substrate and covered with a 5?nm thick GaAs cap layer. The study is performed with a conductive atomic force microscope working inside a scanning electron microscope. Electric images can be obtained only if the sample is preliminarily irradiated with an electron probe current sufficiently high to generate strong electron beam induced current. In these conditions holes are trapped in QDs and surface states, so allowing the release of the Fermi level pinning and thus conduction through the sample. The electronic transport mechanism depends on the type of AFM probe used; it is explained for a metal (Co/Cr) coated probe and p-doped diamond coated probe with the aid of energy band diagrams. The writing (charge trapping) and erasing (untrapping) phenomena is conditioned by the magnitude of the electron probe current. A strong memory effect is evidenced for the sample studied.     

Optical properties of self-assembled InAs quantum dots grown on GaAs(211)A substrate

We have investigated the photoluminescence (PL) and growth properties of self-assembled InAs/GaAs quantum dots (QD) grown on (211)A-oriented GaAs substrate in a low coverage region. At the onset of the QD formation in the Stranski–Krastanov mode, structures of QD on (211)A substrate were quite different from those on (100) substrate. The uniformity of size distribution was better and the density was higher than that grown on (100) substrate. We found a PL peak at 1.32 eV when the InAs coverage was 1.57 ML. Another PL peak gradually appeared at 1.37–1.42 eV with increasing InAs coverage. The peaks at 1.32 and 1.37–1.42 eV were attributed to the emission from a defect-related QD and a typical QD, respectively. When the InAs coverage exceeded 1.89 ML, the QD density decreased with increasing InAs coverage, due to the coalescence of QD. The samples studied here showed PL spectra having a larger intensity and narrower full width at half-maximum compared with that grown on (100) substrate.     

Room-temperature photoluminescence at 1.55 μm from heterostructures with InAs/InGaAsN quantum dots on GaAs substrates

Room-temperature photoluminescence (PL) at 1.55 μm from heterostructures with InAs/InGaAsN quantum dots (QDs) grown by MBE on GaAs substrates is demonstrated for the first time. The effect of nitrogen incorporated into InAs/InGaAsN QDs on the PL wavelength and intensity was studied. The integral intensity of PL from the new structure with InAs/(In)GaAsN QDs is comparable to that from a structure with InGaAsN quantum wells emitting at 1.3 μm.     

InAs quantum dots capped by GaAs,In0.4Ga0.6As dots,and In0.2Ga0.8As well

We have fabricated and characterized three types of InAs quantum dots (QDs) with different InxGa1-xAs capping layers. Post-growth atomic force microscopy measurements show that the In0.2Ga0.8As/InAs structure has a smooth surface (dot-in-well structure), whereas the In0.4Ga0.6As/InAs structure revealed large QDs with a density similar to that underneath InAs QDs on GaAs (dot-in-dot). With increasing In mole fraction of the capping layer and increasing In0.4Ga0.6As thickness, the energy position of the room-temperature photoluminescence (PL) peak is red-shifted. The quantum dot-in-dot structure emits stronger room-temperature PL than does the quantum dot-in-well structure. With a spatially distributed strain in the InAs quantum dot, we have solved the three-dimensional Schr?dinger equation by the Green's function theory for the eigenvalues and eigen wave functions. It is concluded that the ground state increases its wave function penetration into the low-barrier InxGa1-xAs capping layer so that its energy position is red-shifted. The reduced PL peak intensity of the dot-in-well (compared with GaAs covered dots) is due to the reduced overlapping between the ground state and the extended states above the GaAs barrier. The overlapping reduction in the dot-in-dot is over compensated for by the reduced relaxation energy (full width at half-maximum), indicating the importance of the sample quality in determining the PL intensity.     

Defects in nanostructures with ripened InAs/GaAs quantum dots

InAs/GaAs quantum dot (QD) structures were grown by molecular beam epitaxy (MBE) with InAs coverages θ continuously graded from 1.5 ML to 2.9 ML. A critical coverage of 2.23 ML is found, above which the islands undergo ripening, which causes a fraction of quantum dots to increase in size and to eventually relax through the formation of pure, edge-type misfit dislocations which propagate towards the surface in the form of V-shaped defects. Concomitant with ripening, extended-defect related traps with activation energies of 0.52 and 0.84 eV were observed, and regarded as the cause of the significant worsening of the optical and electrical properties in high coverage structures. Their relationship with the observed dislocations is discussed.     

Self-assembling InAs and InP quantum dots for optoelectronic devices

Stranski–Krastanov growth in molecular beam epitaxy allows the preparation of self assembling InAs and InP quantum dots on GaAs and Ga_0.52In_0.48P buffer layers, respectively. InAs dots in GaAs prepared by slow growth rates and low temperature overgrowth provide intense photoluminescence at the technologically important wavelength of 1.3 μm at room temperature. Strain induced vertical alignment, size modification and material interdiffusion for stacked dot layers are studied. A blue shift of the ground state transition energy is observed for the slowly deposited stacked InAs dots. This is ascribed to enhanced strain driven intermixing in vertically aligned islands. For very small densely stacked InP and InAs dots the reduced confinement shift causes a red shift of the ground state emission. The InP quantum dots show intense and narrow photoluminescence at room temperature in the visible red spectral range. First InP/Ga_0.52In_0.48P quantum dot injection lasers are prepared using threefold stacked InP dots. We observe lasing at room temperature in the wavelength range between 690–705 nm depending on the size of the stacked InP dots.     

InAs自组织量子点(线)的制备和表征

在InP(001)基衬底上用分子束外延方法生长了InAs纳米结构材料，通过改变生长方式，得到了InAs量子点和量子线。根据扫描电镜和透射电镜观测结果的分析，认为衬底旋转时浸润层三角形状的台阶为InAs量子线的成核提供了优先条件，停止衬底旋转时InAlAs缓冲层沿[11^-0]方向分布的台阶促使InAs优先形成量子点。讨论了量子点和量子线的形成机理。     

Nucleation sequence of InAs quantum dots on cross-hatch patterns

InAs quantum dots (QDs) are grown via molecular beam epitaxy on cross-hatch pattern (CHP) templates that result from lattice-mismatched epitaxy of In(x)Ga(1-x)As on (100)-GaAs substrates. Growth of InAs on low-(x = 0.10) and medium-(x = 0.13) mismatch CHPs with InAs thickness grading from sub- to beyond critical thickness show different stages of QD nucleation that is dictated mainly by surface steps. Tangential surface stress fields arising from the buried network of (110) misfit dislocations (MDs) at the InGaAs/GaAs interface are simulated in two dimensions and found to have a direct correlation to QD height at various locations, implying sequential QD nucleation at the surface intersection of the glide plane of dislocation T-section, cross-hatch intersection, threading dislocation, [1-10] MD line, and [110] MD line, followed by nucleation on the flat areas. Deviations from this nominal sequence is possible due to material anisotropy and are accounted for in the stress calculation by dislocation-specific scaling factors.