基于聚偏氟乙烯的扫描探针显微镜系统

采用聚偏氟乙烯(PVDF)压电薄膜和压电陶瓷(PZT),并结合由电化学研磨得到的钨探针,研制了一种具有对称结构的新型轻敲模式扫描测头。在该测头中,PVDF压电薄膜作为振动梁,其下方中间位置固定有钨探针,在PZT的驱动下,PVDF和探针处于谐振振动状态,同时,PVDF作为微力传感器检测探针顶端原子与试样表面原子间的作用力。所构建测头结合三维纳米定位台、控制程序等构成了新型扫描探针显微镜系统。介绍了测头的构成、工作原理、特性以及SPM系统的整体结构、测量原理、三维工作台的定位控制、信号处理过程和整系统特性测试,并以一维标准光栅为试样进行三维图像扫描,证明了该新型扫描探针显微镜系统的可行性和有效性。     

表面轮廓测定用扫描探针测头研究

利用压电聚偏氟乙烯(PVDF, Polyvinilidene fluoride)薄膜和压电微音叉(Micro-fork),分别与钨探针结合,构成了三种新型的表面轮廓扫描测头。该新型测头与x-y压电工作台结合,采用与TM-AFM（Tapping mode atomic force microscope）相同的工作原理,构成了扫描探针显微镜。分别介绍了这些测头的构成及特点,给出了所构成测量系统所获得的试验结果,证明了这几种新型扫描测头的有效性。     

压电微音叉扫描探针显微镜测头研究

压电微音叉具有良好的谐振特性，并易于实现其振动的检测。利用这些特性，与钨探针结合，构成了一种新型的表面轮廓扫描测头。该新型测头与X-Y压电工作台结合，采用与TM-AFM相同的工作原理，构成了扫描探针显微镜。介绍了压电微音叉扫描测头的构成、工作原理及主要特性，给出了所构成的扫描探针显微镜测量系统。通过实验及其结果，证明了新型测头具有高垂直分辨率、低破坏力等优点。除此之外，由于采用了有效长度大的钨探针，使大台阶微观表面的测量成为可能。     

类金刚石薄膜微观摩擦性能的FFM评价——针尖尺度效应

采用等离子体增强气相沉积制备了类金刚石薄膜，利用原子力显微镜的轻敲模式观察了它们的形貌，并在考虑外加载荷和扫描速度的基础上，用摩擦力显微镜（FFM）对比考察了尖端探针和平头探针对类金刚石薄膜摩擦性能评价的影响。结果表明：类金刚石薄膜的表面粗糙度随基底负偏压的增加而减小；存在于探针和类金刚石薄膜之间的水膜对尖端探针的剪切阻力贡献较大，且尖端探针测得的摩擦力变化趋势受扫描速度影响显著；水膜对平头探针起着不同形式的润滑作用，从而导致平头探针和类金刚石薄膜之间摩擦性能的速度效应存在差异；利用摩擦力显微镜考察类金刚石薄膜的摩擦性能时，存在着明显的针尖尺寸效应。     

扫描隧道探针的制备研究

本文概述针尖对扫描隧道显微镜的重要性,总结制备探针的各种技术,并着重介绍电化学腐蚀制备钨和铂铱合金探针的原理及电路设计。     

STM探针电化学腐蚀装置的设计及实验研究

本文根据扫描隧道显微镜(STM)探针电化学腐蚀方法的特点,在总结其它STM探针电化学腐蚀装置的基础上,自制了STM探针电化学腐蚀装置。并用此装置进行探针制备的实验研究,摸索出了此装置制备高质量钨探针的较佳工艺条件,同时给出了所制探针的STM成像结果。     

石英音叉扫描探针显微镜

石英音叉是一种谐振频率稳定、品质因数高的时基器件,其音叉臂的谐振参数(谐振振幅和谐振频率)对微力极其敏感。利用石英音叉对外力的敏感性,与钨探针结合,构成一种新型的表面形貌扫描测头。该测头与xyz压电工作台结合,利用测头音叉臂谐振频率对扫描微力的敏感性,研制基于相位反馈控制的扫描探针显微镜。首先介绍石英音叉测头的构成、工作原理和特性测试,以及由该测头构建的扫描探针显微镜的结构和测试、分析。通过对测头和系统的测试结果分析,系统达到1.2 nm的垂直分辨率,并通过对一维栅的测量,给出扫描获得的试样表面微观形貌图以及相位图,证明系统的有效性。另外,由于采用大长径比的钨探针,该系统具有测量大深宽比微器件表面轮廓的能力。     

金刚石刀具刃口轮廓新型检测方法与技术

研究了原子力显微镜扫描方式及原子力微探针坐标方式的刃口轮廓测量技术。原子力探针新型检测方法与技术可以在亚微米尺度内很好地克服传统测量方法精确度低的缺点，而且操作简便，为目前超精密加工领域中金刚石刀具研磨技术水平的提高提供了有利的技术手段。     

微细电化学加工技术

介绍了微软电化学加工的原理及特点，详细介绍了基于电化学扫描探针显微镜进行的电化学微细加工技术，EFAB制作技术、刻蚀剂层技术（GELT）、超微细电极电化学加工技术等几种目前主要的微细电化学加工技术。     

推拉式小车法制备单层硒化钨薄膜

为了提升单层硒化钨（WSe₂）薄膜的制备质量，在传统化学气相沉积（CVD）法制备的基础上进行改进，通过引入推拉式小车来制备单层WSe₂薄膜，从而构造出可以调控沉积区域、精确控制生长时间，并可实现快速降温的生长方式。采用光学显微镜和原子力显微镜来表征制备材料的尺寸、荧光强度、形貌结构等特性，证明了利用推拉式小车法可成功制备出高质量的单层WSe₂薄膜。推拉式小车法可以稳定制备大面积、高质量、单层的WSe₂薄膜，为其在信息、能源、生物等前沿领域的应用提供参考。     

Mesoscale scanning probe tips with subnanometer rms roughness

Surface smoothness of probe tips is critical for applications, such as measuring surface tension of various liquids, oscillatory hydration forces, and interfacial shear strengths from friction experiments. In this study we establish conditions for fabricating tips with smooth surfaces by controlling the electrochemical polishing process throughout the tip evolution rather than following the current practice of producing tips by the drop-off method. Polishing is conducted under a constant voltage, with the wire immersed below the nominal air/electrolyte interface by no more than one-half of the wire diameter and stopping the etching at different current levels. This process provides a tip radius range of approximately 100 nm to 5 microm for a tungsten wire with a 0.2 mm diameter. Alternatively, the wire can be placed above the nominal air/electrolyte interface but within the meniscus until the current drops to zero. In this case, the tip radii range from 5 to 50 microm. In both cases, atomic force microscopy scans of these tips show that the surface rms roughness is about 0.3 nm.     

Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips

Dynamic electrochemical etching technique is optimized to produce tungsten tips with controllable shape and radius of curvature of less than 10 nm. Nascent features such as "dynamic electrochemical etching" and reverse biasing after "drop-off" are utilized, and "two-step dynamic electrochemical etching" is introduced to produce extremely sharp tips with controllable aspect ratio. Electronic current shut-off time for conventional dc "drop-off" technique is reduced to ～36 ns using high speed analog electronics. Undesirable variability in tip shape, which is innate to static dc electrochemical etching, is mitigated with novel "dynamic electrochemical etching." Overall, we present a facile and robust approach, whereby using a novel etchant level adjustment mechanism, 30° variability in cone angle and 1.5 mm controllability in cone length were achieved, while routinely producing ultra-sharp probes.     

The art of electrochemical etching for preparing tungsten probes with controllable tip profile and characteristic parameters

Using custom made experimental apparatus, the art of electrochemical etching was systematically studied for fabricating micro/nano tungsten probes with controllable tip profiles of exponential, conical, multidiameter, and calabashlike shapes. The characteristic parameters of probe including length, aspect ratio, and tip apex radius could also be well defined. By combining of static and dynamic etching, the conical-shape probe with length up to several millimeters, controllable tip apex radius, and cone angle could be fabricated. In addition, by continuously lifting the tungsten wire up during the electrochemical etching with different speeds and distances, the multidiameter shape probe could be fabricated. Finally by controlling the anodic flow, the multiple "neck-in" could be realized creating a calabashlike probe. The aspect ratio of probes depends on (i) the effective contact time between the surrounding electrolyte and the wire, (ii) the neck-in position of immersed tungsten wire. Under the optimized etching parameters, tungsten probes with a controllable aspect ratio from 20:1 to 450:1, apex radius less than 20 nm, and cone angle smaller than 3° could be achieved. The technique is well suited for the tungsten probe fabrication with a stabilized stylus contour, ultra-sharp apex radius, and high production reproducibility. The art for preparing microprobes will facilitate the application of such microprobes in diverse fields such as dip-pen nanolithography, scanning probe microscopy, micromachining, and biological cellular studies.     

Design of characteristic parameters for controlling tungsten tip profile during electrochemical etching

Micro/nano-scale tungsten tips fabricated by electrochemical etching have many diverse industrial applications. The characteristic parameters of the tungsten tip profile include apex radius, taper angle, and aspect ratio. These parameters are governed by many factors including applied voltage, concentration of the electrolyte (potassium hydroxide) solution, and diameter of the inner gold ring. However, a systematic investigation with the aim of determining the best conditions for fabricating micro/nano-scale tips with desired profiles has not been carried out yet. This study is aimed at obtaining controllable tungsten tip profiles—particularly with respect to the radius of curvature and aspect ratio of tips (taper angle)—by altering the experimental conditions. A series of experiments were executed and the results were aggregated and analyzed using response surface methodology in order to identify the relationships between the tungsten tip characteristics and input parameters. The method proposed herein would prove to be suitable for a variety of applications in industries that require tungsten tips with a specific profile.     

Reproducible tip fabrication and cleaning for UHV STM

Several technical modifications related to the fabrication and ultra-high vacuum (UHV) treatments of the scanning tunneling microscope (STM) tips have been implemented to improve a reliability of the tip preparation for high-resolution STM. Widely used electrochemical etching drop-off technique has been further refined to enable a reproducible fabrication of the tips with a radius 相似文献   

Effect of tip shape on capacitance determination accuracy in scanning capacitance microscopy

We present an analysis of the measurement error caused by the stray field of scanning capacitance microscope probes of various shapes. Cylindrical islands and wells of varying radius and height or depth, in both conducting surfaces and structures containing dielectric films, were used as test features for modelling. The results show that high accuracy and good contrast of small details are contradictory requirements. Probes with small radius of curvature of the tip apex yield smaller errors on features with small diameter but larger ones on features with large diameter than tips with large radius of curvature. The stray electrostatic field causes large errors, which are exceptionally severe with microfabricated probes. Contrary to general belief, differential measurements, based on modulation of the probe/sample separation or of the width of depletion layer in semiconductors, do not reduce the effect of the stray field significantly. For best results, the probe should be shielded as close to the tip apex as possible. In the case of microfabricated probes, at least the side of the cantilever facing the sample should be shielded.     

基于相位反馈控制的压电微音叉扫描探针显微镜

压电微音叉具有谐振频率稳定、品质因数高和易于实现音叉臂的振动检测等优点。利用微音叉的这些特性,将其与钨探针结合,构成了压电微音叉扫描探针显微镜(SPM)测头,可实现对微观表面的测量。该测头扫描时,压电微音叉的谐振频率被试样表面原子和钨探针尖端原子间的作用力调制。探针的谐振状态通过锁相环路(PLL)实现,微音叉测头与试样间的恒定测力及测头的Z向定位通过相位反馈控制实现。此外,测量系统可同时获得试样表面的微观轮廓图和相位图。     

Effect of fabrication process parameters on the apex‐radius of STM tungsten nanotip

Scanning tunneling microscope (STM) has found a wide application in nanoscience and nanotechnology. This microscope uses an ultra‐sharp metallic tip for image acquisition. Resolution of STM images depends largely on the radius of the tip apex; the smaller the radius the higher the resolution. In the present research, an experimental set‐up was designed and implemented for fabrication of STM tungsten nanotip using electrochemical‐etching method with the aim of optimization of nanotip fabrication process parameters by using Taguchi method. These parameters are electrolyte concentration, immersion length of the tungsten wire, inner diameter of the cathode tube, and the process voltage. It was found that the optimum level of the process parameters for gaining minimum radius of the nanotip apex is electrolyte concentration of 2 M/lit, wire immersion length of 4 mm, cathode tube inner diameter of 55 mm, and voltage of 3.5 V within the range of experiments. By setting the process parameters on the optimum level, the radius of the nanotip apex was decreased by five times in comparison to the mean value of the experimental results. The radius of the nanotip apex was improved down to about 10 nm under the optimum conditions. SCANNING 31: 65–74, 2009. © 2009 Wiley Periodicals, Inc.     

A method for manufacturing a probe for a combined scanning tunneling and atomic-force microscope on the basis of a quartz tuning fork with a supersharp metal tip

A method for manufacturing a probe for a combined scanning tunneling and atomic-force microscope on the basis of a quartz tuning fork with a metal tip, which is equipped with an independent conductor, is described. When the probe is manufactured, the billet for a tip has the form of a rather small (in order not to change the frequency and quality factor of the quartz tuning fork) metal cone, which is glued to the end of the beam of the quartz resonator-tuning fork together with a carbon fiber as a conductor. A spark is used to form a melted ball at the vertex of the cone. The thickness of the cone near the ball is reduced to a diameter of <0.5 μm by the electrochemical technique, and the ball is then mechanically detached. The main advantage of this method is that it allows manufacturing a high-quality-factor force detector with a single super sharp and clean tip, which is made of platinum (or platinum alloys) and tungsten, with a yield of ≥80%.