10-Gb/s Direct Modulation up to 100 $^{circ}$C Using 1.3- $mu$m-Range Metamorphically Grown Strain Compensated InGaAs–GaAs MQW Laser on GaAs Substrate

We have realized 10-Gb/s direct modulation up to 100degC using a metamorphic InGaAs multiple-qunatum well (MQW) laser on a GaAs substrate. The highly strained InGaAs quantum well (QW) and strain-compensated GaAs barrier layer allowed 1.3-mum-range lasing and an increased number of QWs (six). This laser with a 200-mum-long short cavity and a narrow ridge had maximum relaxation oscillation frequencies of 13 and 6 GHz at 25degC and 100degC, respectively. A 10-km single-mode fiber error-free transmission was successfully obtained at a temperature of 85degC .     

LP－MOCVD生长InGaAs／GaAs量子阱

用低压ＭＯＣＶＤ（ＬＰ－ＭＯＣＶＤ）生长三种不同的ＩｎＧａＡｓ／ＧａＡｓ应变层量子阱材料，其中两种含ＡｌＧａＡｓ限制层。结果表明，ＡｌＧａＡｓ限制层对量子阱的发光强度影响很大，与没有ＡｌＧａＡｓ限制层的结果相比，带ＡｌＧａＡｓ限制层的结构的发光强度要强一个数量级以上。在低温（１８Ｋ）ＰＬ光谱图中，我们看到，除了存在主峰以外，在主峰两侧还各有一个子峰，这些子峰可能与量子阱的质量有关。     

分子束外延生长高应变单量子阱激光器

采用分子束外延方法研究了高应变InGaAs/GaAs量子阱的生长技术.将InGaAs/GaAs量子阱的室温光致发光波长拓展至1160nm,其光致发光峰半峰宽只有22meV.研制出1120nm室温连续工作的InGaAs/GaAs单量子阱激光器.对于100μm条宽和800μm腔长的激光器,最大线性输出功率达到200mW,斜率效率达到0.84mW/mA,最低阈值电流密度为450A/cm2,特征温度达到90K.     

InGaAs/GaAs应变量子阱激光器MOCVD生长研究

采用金属有机物化学气相淀积(MOCVD)方法生长了InGaAs/GaAs应变量子阱(QW),通过降低生长温度、提高生长速度以及采用应变缓冲层(SBL)结构,改善了应变QW生长表面质量和器件荧光(PL)谱特性,实验表明,通过优化工艺条件和采用SBL等手段提高了应变QW质量。生长的QW结构用于1054 nm激光器的制作,经测试,器件具有较低的阈值电流和较高的单面斜率效率,性能较好。     

Functional AlGaAs/GaAs heterostructure-emitter bipolar transistor with a pseudomorphic InGaAs/GaAs quantum-well base

A new functional AlGaAs/GaAs heterostructure-emitter bipolar transistor (HEBT) with a pseudomorphic InGaAs/GaAs quantum-well (QW) base structure is presented. Due to the insertion of an InGaAs QW between the emitter–base (E–B) junction, the valence band discontinuity can be enhanced. The excellent transistor characteristics including a high current gain of 280 and a low offset voltage of 100 mV are obtained. In addition, an interesting multiple S-shaped negative differential resistance (NDR) phenomenon is observed under the inverted operation mode. This may be attributed to an avalanche multiplication and sequential two-stage barrier lowering effect.     

The effects of quantum dot coverage in InAs/(In)GaAs nanostructures for long wavelength emission

We present a study on the effects of quantum dot coverage on the properties of InAs dots embedded in GaAs and in metamorphic In_0.15Ga_0.85As confining layers grown by molecular beam epitaxy on GaAs substrates. We show that redshifted emission wavelengths exceeding 1.3 μm at room temperature were obtained by the combined use of InGaAs confining layers and high quantum dot coverage. The use of high InAs coverage, however, leads to detrimental effects on the optical and electrical properties of the structures. We relate such behaviour to the formation of extended structural defects originating from relaxed large-sized quantum dots that nucleate in accordance to thermodynamic equilibrium theories predicting the quantum dot ripening. The effect of the reduced lattice-mismatch of InGaAs metamorphic layers on quantum dot ripening is discussed in comparison with the InAs/GaAs system.     

High temperature characteristics of strained InGaAs/lnGaAsP quantumwell lasers lattice matched to GaAs

The effect of high temperature on the threshold current density and the gain of In_xGa_1-xAs/InGaAsP (E_g=1.6 eV) QW lasers lattice matched to GaAs is investigated theoretically. These results are also compared with those of In_x Ga_1-xAs/GaAs QW lasers. It is found that better performance can be achieved in InGaAs/InGaAsP lasers compared to InGaAs/GaAs lasers at high temperature. This is due to the fact that the temperature dependence of the threshold carrier density for InGaAs/InGaAsP lasers is weaker than that for InGaAs/GaAs lasers. The calculated characteristic temperature is in good agreement with reported experimental results     

Metamorphic lasers for 1.3-µm spectral range grown on GaAs substrates by MBE

A new method for the epitaxial formation of 1.3-μm injection lasers on GaAs substrates is reported. A metamorphic heterostructure with an In content of about 20% is deposited onto an intermediate buffer layer intended for mismatch strain relaxation. The laser active region is formed by quantum wells with a higher In content (about 40%). Lasers with 100-μm-wide stripes demonstrate room-temperature lasing at 1.29 μm with a minimum threshold current density of 3.3 kA cm² (0.4 kA cm² at T=85 K). __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 37, No. 9, 2003, pp. 1143–1147. Original Russian Text Copyright ? 2003 by Zhukov, Kovsh, Mikhrin, Semenova, Maleev, Vasil’ev, Nikitina, Kryzhanovskaya, Gladyshev, Shernyakov, Musikhin, Maksimov, Ledentsov, Ustinov, Alferov.     

A novel pseudomorphic (GaAs1−xSbx-InyGa1−yAs)/GaAs bilayer-quantum-well structure lattice-matched to GaAs for long-wavelength optoelectronics

Two types of quantum well (QW) structures grown lattice matched on (100) GaAs have been studied. The first type of structure consists of pseudomorphic GaAs_xSb_1-x/GaAs (x≤0.3) SQWs which show emission wavelengths longer than those reported for pseudomorphic In_yGa_1−yAs/GaAs QWs. However, the attractive emission wavelength of 1.3 μm has not been achieved. To reach this goal, a novel type of bilayer QW (BQW) has been grown consisting of a stack of two adjacent pseudomorphic layers of GaAs_xSb_1−x and In Ga_1-y As embedded between GaAs confinement layers. In this BQW, a type-II heterojunction is formed between GaAs_xSb_1−x and In_yGa_1−yAs, resulting in a spatially indirect radiative recombination of electrons and holes at emission wavelengths longer than those achieved in the GaAs_xSb_1−x/GaAs and Ii_yGa_1−yAs/GaAs SQWs. The longest 300K emission wavelength observed so far was 1.332 μm.     

1.3 μm GaAs-based quantum well and quantum dot lasers: Comparative analysis

New generation of long-wavelength (1.3 μm) GaAs based lasers is discussed. The modal gain, threshold current, quantum efficiency characteristics and temperature stability of lasers based on InGaAsn quantum wells and InAs/InGaAs quantum dots are compared.     

A1.3 μm strained quantum well laser on a graded InGaAs buffer with a GaAs substrate

We grew a 1.3 μm strained-layer quantum well (SL-QW) laser with InGaP cladding layers on a lattice-relaxation buffer layer by metalorganic vapor phase epitaxy. For the lattice-relaxation buffer, we used a compositionally graded InGaAs/GaAs structure. The significantly reduced surface roughness of the InGaP cladding layers achieved by supplying a large amount of H₂Se enables CW operation of our 1.3 μm SL-QW laser. We achieved a low threshold current of less than 10 mA and a high characteristic temperature of 100K around room temperature.     

量子阱平面光学各向异性的偏振差分反射谱研究

在室温下用偏振差分反射谱技术观察到了 Ga As/Al Ga As、In Ga As/Ga As和 In Ga As/In P三种量子阱材料的平面光学各向异性。我们发现 Ga As/Al Ga As量子阱 1 h→ 1 e跃迁的偏振度与阱宽成反比 ,与 In Ga As/In P量子阱的报道结果类似。 Ga原子偏析引起的界面不对称可以很好地解释这种行为。与之相反 ,In Ga As/Ga As量子阱的光学各向异性倾向于与阱宽成正比。目前还不能很好地解释这种现象。     

Metalorganic vapor phase epitaxy growth and properties of GaAs/AlGaAs and InGaAs/GaAs quantum well structures on (111)A GaAs substrates

We review the recent advances in the fabrication and properties of GaAs/AlGaAs and InGaAs/GaAs quantum well (QW) structures grown on (111)A GaAs substrates by atmospheric pressure metalorganic vapor phase epitaxy (MOVPE). We show that a 25-period GaAs/AlGaAs multi-QW (MQW) structure was fabricated with good crystal quality, high photoluminescence (PL) emission intensity and monolayer (ML) interfacial roughness. A PL full width at half maximum (FWHM) of 10.5 meV was achieved for a 25-period MQW with a well width of 44 Å. This is the narrowest linewidth reported to date for any similar structures grown on (111)A or B substrates by any growth technique. We also report the properties of an InGaAs/GaAs single quantum well structure grown on (111)A GaAs. For this structure, the PL FWHM value was 9.1 meV, corresponding to a 1 ML interfacial roughness for a well width of 41 Å. This is the first demonstration of an InGaAs/GaAs quantum well structure grown on (111)A or (111)B GaAs by MOVPE.     

Low-threshold operation of 1.3-μm GaAsSb quantum-well lasersdirectly grown on GaAs substrates

GaAsSb quantum-well (QW) edge-emitting lasers grown on GaAs substrates were demonstrated. The optical quality of the QW was improved by optimizing the growth conditions and introducing a multi-QW to increase the gain. As a result, 1.27-μm lasing of a GaAs_0.66 Sb_0.34-GaAs double-QW laser was obtained with a low-threshold current density of 440 A/cm², which is comparable to that in conventional InP-based long-wavelength lasers. 1.30 μm lasing with a threshold current density of 770 A/cm² was also obtained by increasing the antimony content to 0.36. GaAsSb QW was found to be a suitable material for use in the active layer of a 1.3-μm vertical-cavity surface-emitting lasers     

Optical and structural properties of InAs quantum dot arrays grown in an InxGa1−x As matrix on a GaAs substrate

Structural and optical properties of InAs quantum dots (QDs) deposited on the surface of a thick InGaAs metamorphic layer grown on a GaAs substrate have been studied. The density and lateral size of QDs are shown to increase in comparison with the case of QDs grown directly on a GaAs substrate. The rise of In content in the InGaAs layer results in the red shift of the photoluminescence (PL) line, so that with 30 at % indium in the metamorphic layer the PL peak lies at 1.55 μm. The PL excitation spectroscopy of the electronic spectrum of QDs has shown that the energy separation between the sublevels of carriers in QDs decreases as the In content in the InGaAs matrix increases. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 38, No. 7, 2004, pp. 867–871. Original Russian Text Copyright ? 2004 by Kryzhanovskaya, Gladyschev, Blokhin, Musikhin, Zhukov, Maksimov, Zakharov, Tsatsul’nikov, Ledentsov, Werner, Guffart, Bimberg.     

MOCVD-grown broad area InGaAs/GaAs/InGaP laser diodes

A MOCVD technology for growth of InGaAs/GaAs/InGaP laser heterostructures on a modified Epiquip VP-50-RP installation was developed. Mesa stripe laser diodes with threshold current density J _th=100–200 A/cm², internal optical loss α_i=1.3–1.7 cm^?1, and internal quantum efficiency η_i=60–70% have been fabricated. A CW output optical power of 5 W has been obtained for a single 100-µm-wide aperture mesa stripe laser diode emitting at 1.03 µm. It is shown that use of AlGaAs waveguide layers, which increase the conduction band barrier offset, lowers the temperature sensitivity of laser heterostructures within the temperature range 10–80°C.     

New technique for measurement of electron saturation velocity in GaAs MESFET's

A new technique for the measurement of the electron saturation velocity in GaAs FET's is proposed using the "end" resistance measurement. The measurements performed on 1.3-µm gate-length ion-implanted GaAs MESFET's lead to the values of the saturation velocity ranging from 1 to 1.3 × 10⁵m/s.     

Investigation of high In content InGaAs quantum wells grown on GaAs by molecular beam epitaxy

Excitonic resonances and the quantum confined Stark effect are observed near 1.3 mu m in InGaAs quantum wells grown on GaAs using a slowly graded InGaAs buffer. The pin structure performs as a modulator with a relative transmission modulation of 12% at 1.3 mu m and as a low leakage photodetector.<>     

1.3 μm monolithic integrated optoelectronic receiver using anInGaAs MSM photodiode and AlGaAs/GaAs HEMTs grown on GaAs

The first 1.3 μm monolithic integrated optoelectronic receiver using an InGaAs MSM photodiode and AlGaAs/GaAs HEMTs grown on a GaAs substrate has been fabricated. At differential output of the implemented multistage amplifier the transimpedance is 26.8 kΩ (into 50 Ω). The bandwidth of 430 MHz implies suitability for transmission rates up to 622 Mbit/s     

Optimal quantum well width and the effect of quantum well position on the performance of transistor lasers

Transistor laser (TL) model based on InGaP/GaAs/InGaAs/GaAs is analyzed and presented. It is realized that quantum well (QW) with width of 10 nm may be formed for low base threshold current density J th . The emission wavelength is found to be 1.05 μm, and the indium (In) composition is 0.25 for optimal QW width. It is identified that J th decreases with the movement of QW towards the base-emitter (B-E) interface. Small signal optical response is calculated, and the effect of QW position is studied. The bandwidth is enhanced due to the movement of the QW towards the emitter base junction.