Design of GaAs/AlxGa1?xAs asymmetric quantum wells for THz-wave by difference frequency generation

The energy levels, wave functions and the second-order nonlinear susceptibilities are calculated in GaAs/Al0.2Ga0.8As/Al0.5Ga0.5As asymmetric quantum well (AQW) by using an asymmetric model based on the parabolic and non-parabolic band. The influence of non-parabolicity can not be neglected when analyzing the phenomena in narrow quantum wells and in higher lying subband edges in wider wells. The numerical results show that under double resonance (DR) conditions, the second-order difference frequency generation (DFG) and optical rectification (OR) generation susceptibilities in the AQW reach 2.5019 mm/V and 13.208 mm/V, respectively, which are much larger than those of the bulk GaAs. Besides, we calculate the absorption coefficient of AQW and find out the two pump wavelengths correspond to the maximum absorption, so appropriate pump beams must be selected to generate terahertz (THz) radiation by DFG.     

Influence of temperature on Auger recombination lifetime in In1?xGaxAs materials

The influence of temperature and Ga composition on Auger recombination lifetime in n-type and p-type In1-xGaxAs materials is investigated through the simulation, assuming the concentrations of electrons and holes are 1017 cm-3 and 1018 cm-3, respectively. The results show that the temperature has little influence on Auger recombination lifetime of In1-xGaxAs materials at x<0.3. However, it has a great impact when x>0.3 and the effect is more obvious at a lower temperature. Moreover, Auger ...     

Influence of strain on hydrogenic impurity states in a GaN/AlxGa1?xN quantum dot

Within the effective-mass approximation, we calculated the influence of strain on the binding energy of a hydrogenic donor impurity by a variational approach in a cylindrical wurtzite GaN/Al _x Ga_1−x N strained quantum dot, including the strong builtin electric field effect due to the spontaneous and piezoelectric polarization. The results show that the binding energy of impurity decreases when the strain is considered. Then the built-in electric field becomes bigger with the Al content increasing and the binding energy of hydrogenic donor impurity decreases when the Al content is increasing. For dot height L < 2 nm, the change of the binding energy is very small with the Al content variety. This work has been supported by the National Natural Science Foundation of China (No. 10564003) and the Key Project of the Science and Technology Research of the Educational Ministry of China (No. 208025)     

多层In0.55Al0.45As/Al0.5Ga0.5As量子点 的变温光致发光研究

测量了自组织多层In     

In0.53Ga0.47As/In0.52Al0.48As雪崩光电二极管的数值模拟研究

建立了SACM型In0.53Ga0.47As/In0.52Al0.48As雪崩光电二极管(APD)的分析模型,通过数值研究和理论分析设计出高性能的In0.53Ga0.47As/In0.52Al0.48As APD。器件设计中,一方面添加了In0.52Al0.48As势垒层来阻挡接触层的少数载流子的扩散,进而减小暗电流的产生;另一方面,雪崩倍增区采用双层掺杂结构设计,优化了器件倍增区的电场梯度分布。最后,利用ATLAS软件较系统地研究并分析了雪崩倍增层、电荷层以及吸收层的掺杂水平和厚度对器件电场分布、击穿电压、IV特性和直流增益的影响。优化后APD的单位增益可以达到0.9 A/W,在工作电压(0.9 Vb)下增益为23.4,工作暗电流也仅是纳安级别(@0.9 Vb)。由于In0.52Al0.48As材料的电子与空穴的碰撞离化率比InP材料的差异更大,因此器件的噪声因子也较低。     

Effects of hydrostatic pressure and external electric field on the impurity binding energy in strained GaN/AlxGa1?xN spherical quantum dots

The binding energy and Stark effect energy shifts of a shallow donor impurity state in a strained GaN/AlxGa1-xN spherical finite-potential quantum dot (QD) are calculated using a variational method based on the effective mass approximation. The binding energy is computed as a function of dot size and hydrostatic pressure. The numerical results show that the binding energy of the impurity state increases, attains a maximum value, and then decreases as the QD radius increases for any electric field. Moreover, the binding energy increases with the pressure for any size of dot. The Stark shift of the impurity energy for large dot size is much larger than that for the small dot size, and it is enhanced by the increase of electric field. We compare the binding energy of impurity state with and without strain effects, and the results show that the strain effects enhance the impurity binding energy considerably, especially for the small QD size. We also take the dielectric mismatch into account in our work.     

Crystallophysical properties of the In1 ? yGayAs1 ? xNx/GaAs heterostructures

Some properties of the In_{1 − y} Ga _y As_{1 − x} N _x unordered alloys and physical prerequisites of their use in science and technology are considered. The results of studying the intermolecular interaction in the systems under study and the features of their application to the In_{1 − y} Ga _y As_{1 − x} N _x /GaAs functional hetero-structures are presented.     

正照射延伸波长In0.8Ga0.2As红外焦平面探测器

为了研究延伸波长In0.8Ga0.2As PIN短波红外探测器的温度响应光电特性,采用闭管扩散的平面型器件工艺,在金属有机化学气相外延（MOCVD）外延生长的NIN型InAs0.6P0.4/In0.8Ga0.2As/InAs0.6P0.4 buf./InP材料上制备了正照射延伸波长2561线列InGaAs红外焦平面探测器,研究了探测器在不同温度下的I-V特性、光谱响应特性和探测率。结果表明,随着温度的降低,在小偏压下,器件的正向暗电流由产生复合电流为主逐渐变为以扩散电流为主。在260~300 K温度范围内,反向电流主要由扩散电流和产生复合电流组成,当温度低于180 K时,器件的反向电流主要为隧穿电流。室温下器件响应截止波长和峰值波长分别为2.57 m和2.09 m,峰值探测率为7.25108 cmHz1/2/W,峰值响应率为0.95 A/W,量子效率为56.9%。焦平面的峰值探测率在153 K达到峰值,约为1.111011 cmHz1/2/W,响应非均匀性为5.28%。     

88 nm栅长fmax＝201 GHz InP基In0.53Ga0.47As/In0.52Al0.48As HEMT器件

我们成功研制了栅长88 nm, 栅宽2 50 μm, 源漏间距为2.4 μm 的InP基In0.53Ga0.47As/In0.52Al0.48As高电子迁移率器件(HEMT)。栅是使用PMMA/Al/UVⅢ,通过优化电子束曝光时间及其显影时间的方式制作的。这些器件有比较好的直流及其射频特性：峰值跨导、最大源漏饱和电流密度、开启电压、ft和fmax 分别为765 mS/mm, 591 mA/mm, -0.5 V, 150 GHz 和201 GHz。这些器件将非常适合于毫米波段集成电路。     

In0.68Ga0.32As热光伏电池的制作和特性分析

用在InP衬底上失配生长的能隙为0.6eV的In0.68Ga0.32As制成了热光伏(TPV)电池。对其光伏特性的测试分析表明,通过对As组分渐变的InAsxP1-x缓冲层厚度的优化,可以将晶格失配引起的位错完全弛豫在缓冲层内,从而大幅改善热光伏电池的性能。在AM1.5G标准光谱下,与晶格失配没有被完全弛豫的热光伏电池相比,优化措施可将开路电压从0.19V提高到0.21V,外量子效率在长波处可达到85%,转换效率也提高了30%。     

Synthesis,Structure and Electrical Properties of(SnO2)x(In2O3)1?x(x=0.5–1) Nanocomposites

The experimental results of synthesizing thin films (<1 μm thick) of (SnO₂) _x (In₂O₃)_{1 − x} (x = 0.5–1 wt) nanocomposites fabricated by high-frequency magnetron sputtering of metal-oxide targets in a controlled Ar + O₂ atmosphere are presented. The films, deposited on hot substrates (400°C), are studied by the X-ray diffraction analysis, atomic-force microscopy, and optical and electrical methods. The effect of the synthesis conditions and film composition on the size of crystalline grains, band gap, and the concentration and mobility of free charge carriers was determined. It is shown that films of the composition (SnO₂) _x (In₂O₃)_{1 − x} with x = 0.9 are the most promising for applications in gas sensorics.     

Electronic and Optical Properties of MgxZn1?xO and BexZn1?xO Quantum Wells

As a preparatory step toward establishing reliable numerical design tools for ZnO-based optoelectronic devices, we have reassessed the available information on material parameters relevant for the simulation of light-emitting diodes (LEDs) with active regions including ZnO, MgZnO, and BeZnO layers. The impact of different approximations for the electronic structure and the interface polarization charge on the optical properties of bulk ZnO and ZnO/MgZnO quantum wells has been evaluated, and a consistent set of parameters has been used not only for systematic comparison of ZnO/MgZnO and ZnO/BeZnO single quantum well structures but also for the first simulation of a realistic ZnO/BeZnO multiple quantum well LED.     

高量子效率InP/In0.53Ga0.47As/InP红外光电阴极模拟

将In0.53Ga0.47As吸收层设计为多个薄层,通过不同浓度掺杂实现吸收层杂质指数分布,建立了InP/In0.53Ga0.47As/InP红外光电阴极模型,在皮秒级响应时间的前提下模拟了吸收层厚度、掺杂浓度和阴极外置偏压对阴极内量子效率的影响,给出了光电子在吸收层和发射层的一维连续性方程和边界条件,计算了光电子克服激活层势垒发射到真空中的几率,进而获得阴极外量子效率随上述三个因素的变化规律,结果表明,吸收层掺杂浓度在1015~1018 cm-3范围内变化时,内量子效率变化很小;随着吸收层厚度在0.09~0.81 m内增大,内量子效率随之增大;随着外置偏压升高,内量子效率先增大后趋于平稳。文中给出一组既能获得高量子效率又能有快时间响应的阴极设计参数,理论上1.55 m入射光可以获得8.4%的外量子效率,此时响应时间为49 ps。     

基于晶格大失配In0.58Ga0.42As材料的高效四结太阳电池

Ⅲ-Ⅴ族晶格失配多结太阳电池是实现高效太阳电池的主要途径之一,但面临晶格失配材料的高质量生长及其所导致的子电池光电转换效率下降的难题。重点针对晶格失配子电池结构中的(AlGa)InAs缓冲层开展台阶层厚度优化研究,设计了150、200和250 nm三组不同台阶层厚度的缓冲层结构,并完成三组样品的外延生长实验。通过材料测试和子电池电性能测试,系统分析了台阶层厚度对In_0.58Ga_0.42As材料外延生长质量和子电池电性能的影响。获得了晶格弛豫度为96.71%的In_0.58Ga_0.42As子电池材料,制备的子电池开路电压达到205.10 mV。在此基础上,结合GaInP/GaAs/In_0.3Ga_0.7As三结电池研制了晶格失配四结薄膜太阳电池,其光电转换效率达到32.41%(AM0,25℃)。     

Spinodal Decomposition of GaxIn1?xAsyP1?yQuaternary Alloys

Using X-ray structural analysis, scanning electron microscopy, atomic force microscopy, and photoluminescent spectroscopy, it is shown that it is possible to obtain a small-scale domain structure on the surface of liquid-phase epitaxial heterostructures. The domain structure emerges as a result of spinodal decomposition of the Ga _x In_{1 − x} As _y P_{1 − y} quaternary alloy due to immiscibility of its components and relaxation of its lattice parameter to surrounding layers.     

The E3 Defect in MgxZn1?xO

The authors used highly rectifying PdO _y /Mg _x Zn_1−x O Schottky barriers to determine the apparent capture cross-section and the thermal activation energy of the E3 defect in Mg _x Zn_1−x O thin films by thermal admittance spectroscopy and deep-level transient spectroscopy for x < 0.08. The samples were grown by pulsed-laser deposition. It is observed that both the apparent capture cross-section and the thermal activation energy increase with increasing Mg mole fraction.     

Transport and Thermoelectric Properties of the Ca1?xSrxRu1?yMnyO3 System

The magnetic, transport, and thermoelectric properties of Ca_1−x Sr _x Ru_1−y Mn _y O₃ have been investigated. Ferromagnetism with relatively high T _C (>200 K) was introduced by Mn doping. In particular, ferromagnetism appeared in the Ca_0.5Sr_0.5Ru_1−y Mn _y O₃ system at y > 0.2. The maximum T _C (=270 K) was recorded for a specimen of Ca_0.5Sr_0.5Ru_0.4Mn_0.6O₃. The ferromagnetism seems to be due to the mixed-valence states of Mn³⁺, Mn⁴⁺, Ru⁴⁺, and Ru⁵⁺ ions. The metallic character of Ru-rich specimens was suppressed by Mn substitution, and the system was transformed into a semiconductor at relatively low Mn content near y = 0.1. Specimens with higher Mn content (y > 0.8) had large thermoelectric power (50 μV K⁻¹ to 130 μV K⁻¹ at 280 K) accompanied by relatively low resistivity (0.03 Ω cm to 1 Ω cm). The Ca_0.5Sr_0.5Ru_1−y Mn _y O₃ system seems to have good potential as a thermoelectric material for use above 300 K.     

一种基于In0.4Ga0.6As MOSFET 技术制备的新型射频开关器件

本文采用InGaAs MOSFET技术成功制备了一种新型射频开关器件。这是首次采用InGaAs MOSFET技术设计设开关器件。器件的饱和电流密度为250mA/mm,最大跨导为370mS/mm,导通电阻为0.72 mΩ?mm2,,开关比为1×106。最大开态功率容量密度为533 mW/mm,关态功率密度为3667 mW/mm。文中设计的In0.4Ga0.6As MOSFET开关器件在0.1GHz~7.5GHz频率范围内的插入损耗低于1.8dB,隔离度大于20dB。最小插入损耗和最大隔离度分别为0.27dB和65dB。本文的研究说明了InGaAs MOSFET技术对于射频开关器件的应用拥有巨大的潜力。     

不同退火处理的台面型In0.83Ga0.17As pin光电二极管暗电流分析

为了研究延伸波长In0.83Ga0.17As pin光电二极管的暗电流机制。采用两种不同工艺制备了台面型延伸波长In0.83Ga0.17As pin光电二极管。第一种工艺(M135L-5)是:台面刻蚀后进行快速热退火(RTA)。第二种工艺(M135L-3)是:台面刻蚀前进行快速热退火(RTA)。采用IV测试,周长面积比(P/A),激活能和暗电流成分拟合方法对器件暗电流机制进行分析。结果显示,在220~300 K之间,M135L-3器件暗电流低于M135L-5器件的,并且具有较低表面漏电流。在-0.01~-0.5 V之间和220~270 K之间,M135L-5器件的暗电流主要是扩散电流。在250~300 K之间,M135L-3器件的暗电流主要是扩散电流,而在-0.01~-0.5 V之间和220~240 K之间,其暗电流主要是产生复合电流和表面复合电流。与此同时,暗电流成分拟合结果也得出一致的结论。研究表明,在降低器件暗电流方面,M135L-3器件优于M135L-5器件,这主要是因为快速热退火降低了器件的体电流。     

Effect of the number of pairs of the layers on the quality of the superlattices of the InxGa1 ? xAs/GaAs/.../GaAs(001) type grown by molecular beam epitaxy under computer control

By the specified program of computer control over the growth process, superlattices of the In _x Ga_{1 − x} As/GaAs/.../GaAs(001) type with the number of alternating pairs N ₁ = 12, N ₂ = 6, and N ₃ = 3 were grown. Using the X-ray methods of quantitative analysis, the values of periods T ₁ = 22 nm, T ₂ = 22.5 nm, and T ₃ = 22.3 nm and the In content x ₁ = 0.09, x ₂ = 0.091, and x ₃ = 0.092 in these superlattices are measured. In the superlattice with N ₁ = 12, the plastic deformation is detected. In superlattices with N ₂ = 6 and N ₃ = 3, no plastic deformation during the growth was observed. The obtained magnitudes of the periods turned out smaller by a factor of approximately 2 and the alloy concentration turned out smaller by 1/3 than it was specified by the computer program. The measured and calculated values of elastic stresses turned out equal to σ_2N = 2.43 × 10⁶ Pa and σ^{2N − 1} = −0.88 × 10⁹ Pa, at which the plastic deformation took place in the layers of the superlattice with N ₁ = 12. In superlattices with N ₂ = 6 and N ₃ = 3, the elastic stresses were σ_2N = 1.96 × 10 6 Pa, σ_{2N − 1} = −1.45 × 10⁹ Pa and σ_2N = 0.99 × 10⁶ Pa, σ_{2N − 1} = −1.88 × 10⁹ Pa, respectively. These stresses turned out insufficient to initiate the process of dislocation generation. Original Russian Text ? G.F. Kuznetsov, 2009, published in Fizika i Tekhnika Poluprovodnikov, 2009, Vol. 43, No. 4, pp. 493–500.