用喔星锌作发光层的有机电致发光薄膜器件的研究

用喔星锌（Ｚｎｑ２）作发光材料，做出Ｇｌａｓｓ／ＩＴＯ／Ｚｎｑ２／Ａｌ结构的有机电致发光薄膜器件，测量了它的伏安特性，电光特性曲线及其电致发光光谱，同时也测量了喔星锌在粉末和薄膜状态下的荧光光谱、激发光谱、吸收光谱。     

喹啉梓有机电致发光薄膜器件的时间特性分析

用喹啉锌作发光材料,制备出Ｇｌａｓｓ／ＩＴＯ／Ｚｎｑ２／Ａ１结构的有机电致发光薄膜器件,分析并测量了它的伏安时间特性,电光时间特性,并与ＬＥＤ器件的电致发光时间特性进行了比较。实验表明有机薄膜发光的电光时间效应与ＬＥＤ器件相比有其特殊性。     

喹啉锌有机电致发光薄膜器件的时间特性分析

用喹啉锌（Ｚｎｑ２）作发光材料,制备出Ｇｌａｓｓ／ＩＴＯ／Ｚｎｑ２／Ａ１ 结构的有机电致发光薄膜器件,分析并测量了它的伏安时间特性,电光时间特性,并与ＬＥＤ器件的电致发光时间特性进行了比较。实验表明有机薄膜发光的电光时间效应与ＬＥＤ器件相比有其特殊性。     

有机薄膜电致发光器件

将无机薄膜电致发光器件和有机薄膜电致发光器件作了一个比较,并给出了有机薄膜电致发光器件的基本结构及其功能层材料选择的依据。最后分析了一个实际制备的双层器件。     

有机薄膜电致发光器件

将无机薄膜电致发光器件和有机薄膜电致发光器件作了一个比较,并给出了有机薄膜我器件的基本结构及其功能层材料选择的依据。最后分析了一个实际制备的双层器件。     

关于有机薄膜电致发光机理的定性分析

观测了有机电致发光薄膜器件的电流变化和相对应的发光变化特性 ,并作了定性分析 ,提出了类 PN结正向导通发光的有机薄膜电致发光机理的模型     

双重膜厚监控在中远红外光学镀膜工艺中的应用

为提高中远红外增透膜镀膜工艺中膜厚监控的精度,对石英晶振监控和光学极值法监控进行了对比研究,分析了两者的优缺点。通过对两种监控方法的结合,在镀膜工艺中应用一种新的薄膜厚度监控方法——双重监控法。该方法适合于监控中长波段红外光学薄膜的沉积,提高了膜厚监控的精度。     

利用磷光材料提高有机薄膜电致发光效率的研究进展

激活有机分子三重态可提高有机电致发光薄膜器件的发光效率。概述了有机电致磷光薄膜器件的结构、材料、提高器件电致发光效率的原理,目前的研究状况、存在的问题和研究的发展趋势。     

有机电致发光薄膜器件的研究

有机电致发光薄膜具有制备方便,驱动电压低,发光亮度高,可以与聚合物基底匹配等优点,成为目前世界显示技术的一大研究热点。论述了有机发光薄膜器件的结构、工作机理及其薄膜电致,光致发光的特性,论述了薄膜发光器件的电学特性与光学特性及其器件在脉冲电压波形驱动下的电光特性,提出了应用于显示技术的有机电致发光薄膜器件的电学于光学特性的优化方法。     

光谱法测量薄膜厚度算法的改进

提出了一种计算薄膜厚度的单极值点算法。在对SiO2二氧化硅薄膜的测试中，该测试方法与椭圆偏振仪的测试结果相对照，纵向测量误差小于2nm．讨论了双极值点算法计算薄膜厚度，对薄膜的反射干涉光谱曲线进行了分析。主要讨论了薄膜材料色散对测试精度的影响，在此基础上对算法进行了改进，最终利用单个极值点的数据计算出薄膜的厚度。该方法和双极值点算法相比较，其优点在于考虑了薄膜材料的色散对测试结果带来的影响，通过精确定位光谱曲线上的极值点阶数和选择合适的极值点，达到了很好的测量精度。     

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

A convenient and simple in situ and real-time method to control PVD processes for transparent thin films deposition on transparent substrate is described in this paper. This method designed for the glass industry and tested today in on-line monitoring, allows to control the thickness and complex indices and then the good running of the treatment. This method consists of a simple measurement of the interferential transmission through the substrate and the deposit. After recalling the principles of this classical method, the optical sensitivity parameters linked with the use of an inverse calculation method are evaluated and commented on. It is shown that, as expected when the refraction index values of the deposited material are close to those of the substrate, the sensitivity of the process control is low. It is often the case for the deposits used in the glass industry. Nevertheless to exploit this very useful method of process control, a solution currently tested on production lines is described here. To boost the sensitivity of the interferential transmission diagnostic it is shown that the measurements can be made through a high refractive index thin film layer, pre-deposited on the substrate with an adequate thickness.     

Method for measurement of the density of thin films of small organic molecules

An accurate and sensitive method is reported to measure the thin-film density of vacuum-deposited, small-molecular organic semiconductor materials. A spectrophotometer and surface profiler had been used to determine the mass and thickness of organic thin film, respectively. The calculated density of tris-(8-hydroxyquinolato) aluminum (Alq(3)) thin film was 1.31+/-0.01 gcm(3). Vacuum pressures and thin-film growth rates are found to have less impact on the thin-film density of organic material. However, the thin-film density of organic material strongly depends on its chemical structure and molecular weight. Specifically, the chemical structure determines the density of organic material that affects the molecular volume and intermolecular stacking.     

指定摩擦系数下富锌漆漆膜厚度的计算研究

对富锌漆接触面间的摩擦系数进行了测量,结果表明：不同处理方式的富锌漆接触面间的摩擦系数差异较大,并且摩擦系数与接触面积成正比。对某2 MW风机主轴与轮毂栓接面间异响的研究表明：喷砂后球型无机富锌漆接触面间的摩擦系数有时可接近于0。通过推导栓接面间的摩擦系数与粗糙度的数学解析表达式,结合球型无机富锌漆膜厚度与粗糙度在一定条件下近似相等的特性,找到了一种指定摩擦系数下富锌漆漆膜厚度的计算方法,保证了栓接面间在喷涂富锌漆后其摩擦系数的可靠性和可计算性。通过测量某塑性材料的摩擦系数,得到了一种简洁的估算该塑性材料的临界应力强度因子的方法。     

Optimum film thickness of thin metallic coatings on silicon substrates for low load sliding applications

The frictional behaviour of thin metallic films on silicon substrates sliding against 52100 steel balls is presented. The motivation of this work is to identify an optimum film thickness that will result in low friction under relatively low loads for various metallic films. Dry sliding friction experiments on silicon substrates with soft metallic coatings (silver, copper, tin and zinc) of various thickness (1–2000 nm) were conducted using a reciprocating pin-on-flat type apparatus under a controlled environment. A thermal vapour deposition technique was used to produce pure and smooth coatings. The morphology of the films was examined using an atomic force microscope, a non-contact optical profilometer and a scanning electron microscope. Following the sliding tests, the sliding tracks were examined by various surface characterization techniques and tools. The results indicate that the frictional characteristics of silicon are improved by coating the surface with a thin metallic film, and furthermore, an optimum film thickness can be identified for silver, copper and zinc coatings. In most cases ploughing marks could be found on the film which suggests that plastic deformation of the film is the dominant mode by which frictional energy dissipation occurred. Based on this observation, the frictional behaviour of thin metallic coatings under low loads is discussed and friction coefficients are correlated with an energy based friction model.     

Minimization of dose as a criterion for the selection of imaging modes in electron microscopy of amorphous specimens.

A fundamental limitation in electron microscopy of organic specimens is radiation damage by the electron beam. To minimize damage it is necessary to have maximum information collection for a given dose. Various modes of operation of conventional and scanning transmission microscopes are compared with respect to their ability to detect small changes in specimen thickness or density with a given signal to noise ratio. Incoherent imaging is assumed, and this is expected to apply to amorphous specimens under a variety of microscope conditions. For either very thin or very thick specimens, the scanning transmission microscope is found to require nearly 10 times less dose than a conventional microscope for the same signal to noise ratio in the image. For specimens of intermediate thickness, scanning and conventional transmission electron microscopes are roughly equivalent.     

X-ray microanalysis of organic thin sections in TEM using an UTW Si(Li) detector: comparison of quantification methods

We compared Hall's peak to continuum ratio method with a peak ratio method in order to quantify light elements (C, N, and O) in organic specimens as a model for biological thin sections. X-ray spectra were recorded by an energy dispersive X-ray spectrometer equipped with an ultra thin window detector. Spectra were processed by means of a top-hat filter adapted to peak full-width half maximum. The peak intensities were measured by multiple least square fitting to reference spectra. For most elements of biological interest, theoretical and experimental k-factors were determined. Absorption correction was found to be important for quantitation of carbon, nitrogen, and oxygen. Boron was efficiently detected; however, quantitative analysis was not possible. We conclude from our experiments that the peak ratio method is more suitable for quantitation of elemental concentrations in biological thin sections than the peak to continuum method.     

正置正交加筋薄壁柱壳优化设计参数化有限元方法研究

利用有限元软件建立轴压正置正交加筋薄壁圆柱壳的参数化有限元分析模型,研究结构参数对薄壁加筋圆柱壳结构的临界载荷和屈曲模式的影响。随着蒙皮厚度的增加,结构的屈曲模式由局部屈曲逐步变化到总体屈曲,屈曲载荷上升;随着加筋厚度或宽度的增加,由总体屈曲变化到局部屈曲,屈曲载荷上升。通过等体积时的参数变化对屈曲载荷和屈曲模式的影响研究,表明在对应某体积的设计中,只有一种设计使结构屈曲载荷达到最大,而当此最大的屈曲载荷等于设计载荷时,是最轻重量的设计。在此基础上发展一种基于APDL(Ansys parametric design language)语言的薄壁加筋圆柱壳结构优化设计方法,利用该方法给出设计算例的优化结果。     

Ni80Cr20合金薄膜制备影响因素的试验研究

利用直流磁控溅射的方法制备Ni80Cr20合金薄膜,以氩气流量、氩气工作压强、溅射功率作为三因素进行正交试验,在溅射时间相同的条件下分别测试了薄膜厚度、表面粗糙度、电阻率并进行了极差分析。分析结果表明:在一定范围内,氩气工作压强与溅射功率对薄膜厚度的影响较大;在氩气工作压强为3.0Pa时,薄膜厚度与溅射功率近似成正比关系;随着氩气流量的增大,Ni80Cr20薄膜厚度呈现先增大后减小的趋势;在氩气流量为50cm~3/min时,薄膜厚度达到最大值;各因素对薄膜表面粗糙度及电阻率影响不明显。     

Differential alternating current chip calorimeter for in situ investigation of vapor-deposited thin films

Physical vapor deposition can be used to produce thin films with interesting material properties including extraordinarily stable organic glasses. We describe an ac chip calorimeter for in situ heat capacity measurements of as-deposited nanometer thin films of organic glass formers. The calorimetric system is based on a differential ac chip calorimeter which is placed in the vacuum chamber for physical vapor deposition. The sample is directly deposited onto one calorimetric chip sensor while the other sensor is protected against deposition. The device and the temperature calibration procedure are described. The latter makes use of the phase transitions of cyclopentane and the frequency dependence of the dynamic glass transition of toluene and ethylbenzene. Sample thickness determination is based on a finite element modeling of the sensor sample arrangement. In the modeling, a layer of toluene was added to the sample sensor and its thickness was varied in an iterative way until the model fit the experimental data.     

溅射气压和衬底温度对Si1-xGex薄膜结构和光吸收性能的影响

采用射频磁控溅射法沉积了Si1-xGex薄膜,研究了溅射气压、衬底温度对薄膜结构、厚度、表面形貌、表面成分及光吸收性能的影响。结果表明:薄膜均为微晶结构且相组成不随溅射气压和衬底温度的改变而改变;随着溅射气压升高,薄膜结晶性能降低,升高衬底温度使其结晶性能提高;随气压或温度的升高,薄膜厚度均先增大后减小,在1.0Pa或400℃达到最大值;随温度的升高,薄膜表面团簇现象消失并变得平整致密,气压为8.0Pa时,表面有孔洞和沟道;随气压升高,薄膜中锗含量降低,光吸收强度减小,光学带隙增大;衬底温度的变化对光学带隙影响不大。