负偏压对DLC薄膜结构和摩擦学性能的影响

采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。通过原子力显微镜(AFM)和拉曼光谱对DLC薄膜的表面形貌以及内部结构进行了分析表征。并用UTM-2摩擦磨损仪对其摩擦学性能进行了测试。结果表明,利用离子束溅射沉积制备的DLC薄膜具有良好的减摩抗磨性能。随着偏压的增加薄膜的摩擦因数先减小后增加,在-150 V偏压时,薄膜的摩擦学性能最好。     

DLC薄膜的表面形貌及其摩擦学性能研究

以真空蒸发碳离子束辅助镀膜法制备了DLC薄膜，通过原子力显微镜(AFM)和扫描电子显微镜(SEM)观察了该薄膜的表面形貌，对该薄膜的表面形貌对其摩擦学行为的影响进行了研究。研究发现：用真空蒸发碳离子束辅助镀膜的方法制备的类金刚石薄膜表面光滑，颗粒均匀，粒度小，摩擦因数降低；DLC薄膜比弹簧钢片及Ti6Al4V球基体耐磨；DLC薄膜的摩擦学性能在摩擦过程中会进一步改善。     

Boundary Tribological Behaviors of Untreated and Surface-Modified M50 Steel Lubricated by Fuel JP-10

To explore the possibility of using advanced surface engineering techniques (ASETs) to solve the wear problems caused by the poor lubricity of pure, low-viscosity aviation fuel JP-10, polished M50 bearing steel sample surfaces were treated with nitrogen ion implantation, TiAlN coating deposition, and Ta coating deposition followed by high current pulsed electron beam (HCPEB) irradiation, respectively. Boundary tribological behaviors of these ASET-treated and untreated steel samples sliding in pure JP-10 against a Si₃N₄ ball (ball-on-disc model) were investigated under 2.0 GPa in the atmosphere and the friction tests indicated that significant, reductions, although to different extents, in friction and wear were achieved by these modified surfaces. Simultaneously considering the tribological performance and potential pollution caused by wear debris to JP-10, HCPEB-treated Ta coating with a lowest average friction coefficient of 0.11 and a specific wear rate of around zero was the fittest to offset the inadequate lubricity of JP-10 itself under the laboratory condition.     

Monitoring of Wear Characteristics of TiN and TiAlN Coatings at Long Sliding Distances

TiN and TiAlN thin hard coatings have been widely applied on machine components and cutting tools to increase their wear resistance. These coatings have different wear behaviors, and determination of their wear characteristics in high-temperature and high-speed applications has great importance in the selection of suitable coating material to application. In this article, the wear behavior of single-layer TiN and TiAlN coatings was investigated at higher sliding speed and higher sliding distances than those in the literature. The coatings were deposited on AISI D2 cold-worked tool steel substrates using a magnetron sputtering system. The wear tests were performed at a sliding speed of 45 cm/s using a ball-on-disc method, and the wear area was investigated at seven different sliding distances (36–1,416 m). An Al₂O₃ ball was used as the counterpart material. The wear evolution was monitored using a confocal optical microscope and surface profilometer after each sliding test. The coefficient of friction and coefficient of wear were recorded with increasing sliding distance. It was found that the wear rate of the TiAlN coating decreases with sliding distance and it is much lower than that of TiN coating at longer sliding distance. This is due to the Al₂O₃ film formation at high temperature in the contact zone. Both coatings give similar coefficient of friction data during sliding with a slight increase in that of the TiAlN coating at high sliding distances due to the increasing alumina formation. When considering all results, the TiAlN coating is more suitable for hard machining applications.     

高能离子束辅助沉积制备钛纳米膜

用离子束溅射沉积和高能离子束辅助沉积方法制备了具有择尤性的钛纳米薄膜,并采用原子力显微镜、X射线衍射仪和俄歇电子谱仪研究了试样表面预处理、离子束流和温度等离子束工艺参数对钛薄膜结构的影响。结果表明：离子束溅射沉积的钛膜在[002]和[102]晶向上呈现出明显的择尤生长现象,并分别在该两个晶向上表现出纳米晶型和非纳米晶型结构;当用高能离子束辅助沉积时,[102]晶向择尤生长现象消失,且钛膜的结构对束流变化较为敏感,束流较低时,钛膜为纳米结构且择尤生长现象减弱,而束流增加时晶粒长大,择尤生长现象叉增强。另外钛膜容易受到氧的污染,并随辅助离子强度增加而增强。     

An investigation of redeposition effect for deterministic fabrication of nanodots by focused ion beam

Focused ion beam machining is a powerful technique for micro/nanofabrication. However its machined surface form accuracy will be degrade due to atoms redeposition in the nanofabrication process. In this paper, a 3D surface topography model and associated simulation program are developed to study redeposition effect for precise and deterministic fabrication of nanodots by focused ion beam. The simulation is implemented by level set method. The angular dependence of sputtering yield is calculated by a Monte Carlo simulation program - TRIDYN. The simulation results have been evaluated by focused ion beam fabrication of nanodots experiment on a silicon substrate. It demonstrates that the simulation method can precisely describe the generation of 3D surface in focused ion beam machining process (with less than 10% simulation error). Redeposition has made significant contribution to the surface generation in nanoscale fabrication by reducing more than 1/3 of intended depth. The model and simulation program developed has approved to be a good tool to determine proper machining parameter to achieve deterministic nanofabrication by focused ion beam.     

Specimen coating for high resolution scanning electron microscopy

Thin conducting films, produced by evaporation or soft vacuum sputtering generally show cracks and grain formation, when examined under high resolution scanning electron microscopy (SEM). These artefacts can obscure surface features of coated specimens or cause confusion in the interpretation of micrographs. No such structures have been observed in films produced by ion beam deposition. Ion beam deposition equipment is described in which a cold cathode saddle field ion source, operating at low pressure (15mPa), produces a 2 mm diameter beam of energetic ions (5 keV) and neutrals. With the beam directed onto a target at 30° to glancing incidence, the sputtered material coats the specimens, which are held in a planetary system for good coverage. Conditions favouring fine grain growth are a high nucleation density and low energy transfer to the substrate by thermal conduction or radiation or by particle or photon radiation. These conditions are satisfied by ion beam deposition but evidently not by evaporation or soft vacuum sputtering. With the specimen stationary, sharp shadowing is obtained because the target acts almost as a point source, because of the small diameter of the beam and because there is little scatter at the operating pressure.     

Influence of ion source configuration and its operation parameters on the target sputtering and implantation process

In the work, investigation of the features and operation regimes of sputter enhanced ion-plasma source are presented. The source is based on the target sputtering with the dense plasma formed in the crossed electric and magnetic fields. It allows operation with noble or reactive gases at low pressure discharge regimes, and, the resulting ion beam is the mixture of ions from the working gas and sputtering target. Any conductive material, such as metals, alloys, or compounds, can be used as the sputtering target. Effectiveness of target sputtering process with the plasma was investigated dependently on the gun geometry, plasma parameters, and the target bias voltage. With the applied accelerating voltage from 0 to 20 kV, the source can be operated in regimes of thin film deposition, ion-beam mixing, and ion implantation. Multi-component ion beam implantation was applied to α-Fe, which leads to the surface hardness increasing from 2 GPa in the initial condition up to 3.5 GPa in case of combined N(2)-C implantation. Projected range of the implanted elements is up to 20 nm with the implantation energy 20 keV that was obtained with XPS depth profiling.     

Low Friction CrNMPP/TiNDCMS Multilayer Coatings

Transition metal nitrides like CrN and TiN are widely used in automotive applications due to their high hardness and wear resistance. Recently, we showed that a multilayer architecture of CrN and TiN, deposited using the hybrid—high power impulse magnetron sputtering (HIPIMS) and direct current magnetron sputtering (DCMS)—HIPIMS/DCMS deposition technique, results in coatings which indicate not only increased mechanical and tribological properties but also friction coefficients in the range of diamond-like-carbon coatings when tested at RT and ambient air conditions. The modulated pulsed power (MPP) deposition technique was used to replace the HIPIMS powered cathode within this study to allow for a higher deposition rate, which is based on the complex MPP pulse configuration. Our results on MPP/DCMS deposited CrN/TiN multilayer coatings indicate excellent mechanical and tribological properties, comparable to those obtained for HIPIMS/DCMS. Hardness values are around 25 GPa with wear rates in the range of 2 × 10⁻¹⁶ Nm/m³ and a coefficient of friction around 0.05 when preparing a superlattice structure. The low friction values can directly be correlated to the relative humidity in the ambient air during dry sliding testing. A minimum relative humidity of 13% is necessary to guarantee such low friction values, as confirmed by repeated tests, which are even obtained after vacuum annealing to 700 °C. Our results demonstrate that the co-sputtering of high metal ion sputtering techniques and conventional DC sputtering opens a new field of applications for CrN/TiN coatings as high wear resistance and low friction coatings.     

Planetary motion cross bar friction test for application in machining process

This paper describes a new method to evaluate the friction coefficient at the tool-work interface in machining process where high stress and temperature are caused. In order to examine the feasibility of the proposed method, the present report introduces the method and the results obtained only at room temperature. Ti6Al4V, SUS304, AISI1045, FCD 700, FCD 450 and FC300 were used as work materials, while TiN coated carbide tool, TiAlN coated carbide tool and P15 were used as tool materials. The proposed method provided the friction coefficients of different coatings against different work materials, and demonstrated the variability of friction coefficient and the anisotropy of surface roughness.     

Preparation of (InGa)As/GaAs materials for TEM by one side non-rotation ion beam thinning

A technique is described for the preparation of thin specimens for transmission electron microscopy (TEM) of (InGa)As/GaAs multilayered materials. In this technique, a shielding method is used for selective-area perforation by ion beam thinning. Thin cross-sectional specimen slices are mechanically pre-thinned to about 30 μm and then thinned by ion sputtering from one side of the specimen at a time without rotation of the specimen stage. No direct ion sputtering occurs at the growth surface of the specimen so that a specimen with thin areas containing the desired near-surface structures can be obtained. The recipe for this technique is given in detail. A patterning method for increasing the size of the thin area for TEM investigation is also described. It is shown that a smooth surface can be obtained by sputtering without rotating the stage if obstacles that produce redeposits onto the sputtered surface are removed.     

基于离子束溅射Ta2O5薄膜的紫外吸收膜技术

为获得高性能紫外激光薄膜元件,急需研制紫外高反射吸收薄膜,实现吸收损耗的精确测量。本文采用离子束溅射技术,通过调控氧气流量实现了具有不同吸收的Ta_2O_5薄膜的制备。以Ta_2O_5薄膜作为高折射率材料,设计了355nm的紫外高反射吸收薄膜。采用离子束溅射沉积技术,在熔融石英基底上制备了355nm的吸收薄膜,对于A=5%的紫外吸收光谱,在355nm的透射率、反射率和吸收率分别为0.1%,95.0%和4.9%;对于A=12%的紫外吸收光谱,在355nm的透射率、反射率和吸收率分别为0.1%,87.4%和12.5%。实验结果表明,采用离子束溅射沉积技术,可以实现不同吸收率的355nm高反射吸收薄膜的制备,对于基于光热偏转测量技术的紫外光学薄膜弱吸收测量仪的定标具有重要的意义。     

用离子束溅射法制备长波段X射线多层膜

叙述了用离子束溅射镀膜机ＯＸＦＯＲＤ进行Ｘ射线长波段多层膜实验及制备Ｘ射线多层膜光学元件方面的工作。简述离子束溅射镀膜机的工作原理,Ｘ射线多层膜的制备过程,主要工艺参数,以及用Ｘ射线小角衍射仪对制备样品周期结构的检测和用软Ｘ射线反射率计测反射率的部分结果。     

TiAlN涂层及微观组织结构研究

通过改变工艺参数,采用非平衡磁控溅射法在硬质合金基体上制备Ti Al N涂层来研究涂层微观结构的变化规律。经表面和断口形貌的扫描电镜结果显示,增加主因素偏压,涂层表面趋向光滑平整,结构趋向致密,表面的大颗粒数量明显减少。EDS能谱分析表明,涂层元素的含量受偏压和N2流量影响较大。XRD分析发现,膜层中有Ti Al N系和Ti N系的物相结构,Ti N/Ti Al N多层涂层主要从(111)晶面择优取向生长。     

Ion beam-sputtered and magnetron-sputtered thin films on cytoskeletons: A high-resolution tem study

A comparison of ion beam-sputtered and magnetron-sputtered thin platinum (Pt) and tungsten (W) films was made. Cytoskeletons from detergent extracted glioma cells grown on gold grids were coated with Pt or W at thicknesses of 1, 1.5, and 2.5 nm. Transmission electron micrographs were taken at high magnification and the granularity of the metal films was evaluated both on the Formvar film and the filaments of the cytoskeleton. In order to make a comparison between the two deposition methods, the metal deposition rate must be equal when corresponding thicknesses are made. Since ion beam sputtering generally is a slower process than magnetron sputtering, an increased target to specimen distance was necessary with the latter technique. This resulted in a coarser granularity of the W films as compared with the ion beam sputtered. The Pt, however, showed no marked difference between the two techniques at equal deposition rates. The study also demonstrated that varying the deposition rate caused differences in the granularity of the magnetron-sputtered Pt and W films, even if the voltage of the target was kept constant. Decreasing the target to specimen distance which increased the deposition rate resulted in a finer granularity of both the Pt and the W films. At the highest deposition rate the granularity of both the Pt and W films was comparable with the granularity of the ion beam-sputtered films.     

Evaluation on Effectiveness of CVD and PVD Coated Tools during Dry Machining of Incoloy 825

With wide applications of nickel-based superalloys in strategic fields, it has become increasingly necessary to evaluate the performance of different advanced cutting tools for machining such alloys. With a view to recommend a suitable cutting tool, the present work investigated various machinability characteristics of Incoloy 825 using an uncoated tool, chemical vapor deposition (CVD) of a bilayer of TiCN/Al₂O₃, and physical vapor deposition (PVD) of alternate layers of TiAlN/TiN-coated tools under varying machining conditions. The influence of cutting speed (51, 84, and 124 m/min) as well as feed (0.08, 0.14, and 0.2 mm/rev) was comparatively evaluated on surface roughness, cutting temperature, cutting force, coefficient of friction, chip thickness, and tool wear using different cutting tools. Although the CVD-coated tool was not useful in decreasing surface roughness and temperature, a significant reduction in cutting force and tool wear could be achieved with the same coated tool under a high cutting speed of 124 m/min. On the other hand, the PVD-coated tool outperformed the other tools in terms of machinability characteristics. This might be attributed to the excellent antifriction and antisticking property of TiN and good toughness due to the multilayer configuration in combination with a thermally resistant TiAlN phase. Adhesion, abrasion, edge chipping, and nose wear were the prominent wear mechanisms of the uncoated tool, followed by the CVD-coated tool. However, remarkable resistance to such wear was evident with the PVD TiAlN/TiN multilayer-coated tool.     

Preparation of tungsten disulfide (WS2) soft-coated nano-textured self-lubricating tool and its cutting performance

This paper proposes a new effective dry cutting tool named tungsten disulfide (WS₂) soft-coated nano-textured self-lubricating tool which is fabricated by two steps. First, nano-texture is made on the tool–chip interface of rake face of uncoated YS8 (WC + TiC + Co) cemented carbide cutting inserts by femtosecond laser micromachining technology. Second, WS₂ soft coating is deposited on the nano-textured tool by medium-frequency magnetron sputtering, multi-arc ion plating and ion beam assisted deposition technique. Dry turning tests on 45# quenched and tempered steel were carried out with three kinds of cutting tools: conventional YS8 tool, nano-textured tool (CFT), and WS₂ soft-coated nano-textured self-lubricating tool (CFTWS). Results show that the cutting forces, cutting temperature, the friction coefficient at the tool–chip interface, and the antiadhesive effect of the nano-textured tools were significantly reduced compared with those of the conventional one. The CFTWS tool had the best cutting performance among all the tools tested under the same test conditions. Through cutting force and cutting temperature theoretical analysis and experimental results, four mechanisms responsible were found. The first one is explained as the formation of the WS₂ lubricating film with low shear strength at the tool–chip interface, which was released from the surface nano textures and smeared on the rake face, and served as lubricating additive during dry cutting processes to reduce the cutting forces and cutting temperature. The second one is explained by the reduced contact length at the tool–chip interface of the nano-textured tools; the smaller direct contact area between the chip and tool rake face leads to less friction force, which can also contribute to the decrease of cutting forces and cutting temperature. The third one can be explained that because of the excellent lubricity of the WS₂ lubricating film, the antiadhesive effect can be significantly improved which can reduce adhesive wear of the cutting tool and prolong the tool life. The fourth one can be explained that the advantage of CFTWS tool in cutting forces and cutting temperature is obvious in relatively high-speed and high-temperature conditions may be because of ultra-low friction coefficient, high temperature resistance, and the high oxidation resistance of WS₂ soft coating which is not sensitive to high cutting temperature and high cutting speed can significantly improve the severe dry cutting environment.     

Tribological properties of nanostructured DLC coatings deposited by C60 ion beam

The frictional and wear characteristics of nanostructured DLC films were investigated. The coatings were deposited on silicon substrates by irradiation of a mass-separated C₆₀ ion beam with 5 keV of energy and a deposition temperature ranging from 100 to 450 °C. The effects of deposition temperature on the surface morphology, nano-structure, mechanical properties and tribological characteristics of the coatings were assessed. Results showed that deposition temperature strongly affects the nanostructure and surface morphology of the coatings. Coatings deposited at temperatures exceeding 350–400 °C exhibited an increase in surface roughness as well as compressive stress due to the formation of graphite, which led to a significant increase in the friction coefficient and wear rate. Coatings deposited at 300 °C showed the best tribological properties.     

Technical use of compact micro-onde devices

Due to the very small size of a COMIC (Compact MIcrowave and Coaxial) device [P. Sortais, T. Lamy, J. Me?dard, J. Angot, L. Latrasse, and T. Thuillier, Rev. Sci. Instrum. 81, 02B31 (2010)] it is possible to install such plasma or ion source inside very different technical environments. New applications of such a device are presented, mainly for industrial applications. We have now designed ion sources for highly focused ion beam devices, ion beam machining ion guns, or thin film deposition machines. We will mainly present new capabilities opened by the use of a multi-beam system for thin film deposition based on sputtering by medium energy ion beams. With the new concept of multi-beam sputtering (MBS), it is possible to open new possibilities concerning the ion beam sputtering (IBS) technology, especially for large size deposition of high uniformity thin films. By the use of multi-spots of evaporation, each one corresponding to an independent tuning of an individual COMIC ion source, it will be very easy to co-evaporate different components.     

Effect of deposition orientations on dimensional and mechanical properties of the thin-walled structure fabricated by tungsten inert gas (TIG) welding-based additive manufacturing process

Welding-based additive manufacturing can potentially produce a cost-effective process for the production of dense metallic parts. Tungsten inert gas (TIG) welding-based additive manufacturing process uses wire as a filler material and offers a high deposition rate with low spattering. In this study, different orientations of wire feeding nozzle and TIG welding torch, such as front wire feeding (FWF), back wire feeding (BWF), and side wire feeding (SWF), were investigated for thin-walled metal deposition with enhanced dimensional accuracy and mechanical properties. The dimensional accuracy of thin-walls deposited at four different orientations were investigated in terms of deposition height and deposition width. The FWF orientation with higher wire feeding angle and SWF orientation produced poor dimensional accuracy in the deposition. FWF orientation with normal wire feeding angle and BWF orientation provided a decent dimensional accuracy and surface appearance. The deposited samples exhibited a similar trend for Vickers microhardness, residual stress, and microstructure for the four different wire feeding orientations.