碳靶电流对CrCN镀层摩擦系数的影响

采用闭合场非平衡磁控溅射离子镀技术于单晶硅和M2高速钢基片上制备CrCN镀层以研究C靶电流对CrCN镀层摩擦系数的影响,并通过能谱、原子力显微镜、X射线衍射、X射线光电子能谱分析了C元素的存在状态及其对CrCN镀层组织结构的影响规律.结果表明,当碳靶电流Ic从0A增大到1-5A时,镀层摩擦系数从0.75降至0.3,镀层...     

Structure and tribological property of MoSx-CrTiAlN film by unbalanced magnetron sputtering

MoS_x-CrTiAlN film was deposited on Mg alloy substrates using unbalanced magnetron sputtering. First of all, the CrTiAlN layer was synthesized in a gas mixture of Ar + N₂, and then the MoS_x layer on CrTiAlN were deposited by a single MoS_x target. The composition, structure and tribological property of MoS_x-CrTiAlN film were characterized by X-ray photoelectron spectrometry, X-ray diffraction, transmission electron microscopy and ball-on-disc tester. The experimental results show that crystallography structure of CrTiAlN layer is FCC whilst the MoS_x layer has a mixed microstructure with hexagonal and amorphous state. The coefficient of friction of MoS_x-CrTiAlN film is a function of load and shows a steady decreasing with the increasing in applied load.     

The properties of aluminium coating on sintered NdFeB by DC magnetron sputtering

Pure aluminium coating was deposited on sintered NdFeB magnets by direct current (DC) magnetron sputtering to improve the corrosion resistance. The corrosion behaviour of sintered NdFeB coated with aluminium was characterized by potentiodynamic polarization measurement. The adhesive strength between the aluminium coating and the sintered NdFeB was characterised by vertical tensile test and high-low temperature shock test. The influence of the coating on the magnetic properties of the sintered NdFeB was also characterised. It was found that the aluminium coating can improve the corrosion resistance of the sintered NdFeB evidently. The aluminium coating was well adhesive with the substrate and did not deteriorate the magnetic properties of the sintered NdFeB magnets. These two characters may overcome the disadvantages of NiCuNi coating which is usually electroplated on NdFeB in industry.     

Tribological properties of Ti2N-Wx% coatings deposited by magnetron sputtering

Ti₂N-W_x% coatings with different tungsten contents were deposited using unbalanced magnetron sputtering technology. The microstructures and mechanical properties of Ti₂N-W_x% coatings have been characterized by SEM, X-ray diffraction (XRD), nanoindentation and adhesion techniques. The tribological performance of the coatings was investigated using an oscillating friction and wear tester under dry conditions. Indexable inserts with Ti₂N-W_x% coatings were applied to turning AISI 1045 steel material by a lathe. Micron-drills with Ti₂N-W_x% coatings were adopted in the ultra-high speed (10⁵ rpm) Printed Circuit Board (PCB) through-hole drilling test. Experimental results indicate that the coating microstructure, mechanical properties and wear resistance vary according to the tungsten content. Ti₂N-W_14% coated inserts showed the best wear resistance in 1045 steel turning and PCB through-hole drilling tests. The service life of a Ti₂N-W_14% coated tool is five times greater than that of an uncoated tool in PCB through-hole drilling test.     

A novel magnetron sputtering for flexible coatings as a function for production of high quality films

A novel sputtering technique combining the symmetric compressive magnets with cylindrical cathode has been developed to mass produce high-quality oxide and nitride films on plastic sheets. The discharge characteristics of our sputtering can supply about three times larger power efficiencies than that of the conventional magnetron sputtering. Moreover, in continuous dielectric sputtering experiments, the substrate temperature was kept lower than 60 °C. The refractive index of SiN_X and SiO₂ thin film at 500 nm is 1.86 and 1.46 respectively. Moreover, 4 layered anti-reflection coatings of silicon nitride and oxide films deposited on both sides of the PET sheet is achieved to fabricate, and the reflection less than 1% is realized in the range from 420 to 680 nm.     

磁控溅射TiAIN和WTiN薄膜的制备与摩擦性能研究

采用双靶反应磁控溅射的方法在40Cr基体上制备了TiAlN薄膜和WTiN薄膜。用XRD,SEM,AFM等检测手段对薄膜的表面状态及结构等进行了表征,采用UMT-3型多功能摩擦试验机,在室温、大气环境、无润滑的条件下对TiAlN和WTiN薄膜的摩擦性能进行了评价。实验结果表明:TiAlN薄膜出现了两种硬质相TiN与TiAlN共存的物相结构,而WTiN薄膜出现了TiN0.6O0.4,TiN,W2N,WN等多种物相结构;制备的TiAlN、WTiN薄膜表面晶粒均匀细小,生长均以粒状结构为主;摩擦实验数据表明制备的TiAlN和WTiN薄膜均拥有良好的摩擦性能。     

交流磁控溅射制备ZAO薄膜工艺参数的研究

对于交流磁控溅射氧化锌铝陶瓷靶材制备ZAO薄膜,研究了氧流量、基体温度、靶电流密度、铝的掺杂量、本底真空压力和工作气体压力对ZAO薄膜电学性能的影响规律,优化了工艺参数,为工业化生产提供了实验依据.     

磁控溅射硅钼薄膜的抗氧化性能研究

用射频磁控溅射法在单晶Si基体上制备了硅钼薄膜,对薄膜进行真空退火处理以及高温氧化实验,借助SEM和X射线衍射仪(XRD)等仪器对退火前后的薄膜以及高温氧化后的薄膜进行了分析。结果表明沉积态的硅钼薄膜为非晶态,高温真空退火使薄膜由非晶态转变为晶态,致密的复合氧化物是硅钼薄膜具有良好的抗氧化性能的主要原因。     

Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering

Chromium nitride coatings were deposited by DC and RF reactive magnetron sputtering on AISI 304 stainless steels without substrate heating. A Cr₂N phase was formed in the RF sputtered coatings with a low N₂ flow content ranging within 30-50%. A NaCl type CrN_x phase was obtained by DC magnetron sputtering with different N₂ flow contents. The coating hardness increased with the increase of the N₂ flow content. When the coatings deposited with the same N₂ flow content were compared, the hardness of the RF sputtered CrN_x was higher than that of the DC sputtered CrN_x, which was mainly due to the distinct difference between the dense structure (RF process) and the porous structure (DC process). The RF sputtered CrN_x coatings showed an excellent adhesion strength as compared to the DC sputtered coatings. By selecting the deposition method and optimizing the N₂ flow content, CrN_x coatings with a preferred microstructure could be obtained, which would be a candidate material for research and applications in nano-science.     

三柱靶磁控溅射镀膜机在工艺品装饰镀中的应用

将三柱靶磁控溅射镀膜机应用于工艺品装饰镀生产中,开发多种镀膜工艺并进行了批量生产,实践证明:三柱靶磁控溅射镀膜技术结合特制的衬底漆和保护面漆涂装工艺,能够在工艺品上获得合格的装饰层.拓展该技术在工艺品行业的应用,可有效减轻传统电镀对环境的污染.     

Influence of Ni content on the structure and properties of Cr-Ni-N coatings prepared by direct current magnetron sputtering

Cr-Ni-N coatings were deposited on 304 stainless steel substrates using a conventional direct current magnetron reactive sputtering system in nitrogen-argon reactive gas mixtures. The influence of Ni content (0 ≦ x ≦ 20 at.%) on the coating composition, microstructure, and tribological properties was investigated by glow discharge optical spectroscopy, X-ray diffraction and transmission electron microscopy, scanning electron microscopy (SEM), nano-indentation, and pin-on-disk tests. The results showed that microstructure and properties of coatings changed due to the introduction of Ni. The ternary Cr-Ni-N coatings exhibited solid solution structures in spite of the different compositions. The addition of Ni strongly favoured preferred orientation growth of <200>. This preferred orientation resulted from the formed nano-columns being composed of grains with the same crystallographic orientation, as confirmed by SEM cross-sectional observations. The mechanical properties including the nano-hardness and reduced Young's modulus decreased with increasing Ni content. Pin-on-disk tests showed that low Ni content coatings presented higher abrasion resistance than high Ni content coatings.     

Functional properties of ceramic-Ag nanocomposite coatings produced by magnetron sputtering

In recent years, the use of nanocomposite materials to functionalize surfaces has been investigated, taking advantage of the complementary properties of the nanocomposite constituents. Among this family of materials, ceramic-Ag coatings have been widely studied due to the large variety of functionalities that silver possesses and the possibility of tuning the coating’s practical features by selecting the proper matrix to support this noble metal. Therefore, this review focuses on the effects of silver nanoparticles on the functional properties of ceramic-Ag nanocomposites. The chemistry, structure, morphology and topography of the coatings are analyzed with respect to the changes produced by the silver nanoparticles’ distribution, amount and sizes and by altering production process variables. To offer a clear understanding of the functionalities of these materials, the optical, electrical, mechanical, tribological, electrochemical and biological properties reported in the last decade are reviewed, focusing on the ability to tune such properties by modifying the silver distribution, morphology and composition. In particular, the surface plasmon resonance, self-lubricating ability and antibacterial effect of silver are covered in detail, establishing their correlation with factors such as silver diffusion, segregation and ionization.     

Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics was investigated and a combined mode of voltage and current was observed at a pressure as low as 0.007 Pa. Carbon nitride thin films were synthesized using this method. Characterization of the films showed that the deposition rate was high, and the films were composed of a single amorphous carbon nitride phase with N/C ratio close to that of C₃N₄, with the bonding mainly of C---N type.     

Studies of medium frequency high power density magnetron sputtering discharges

Optical emission spectroscopy and Langmuir probe have been used to study the power dependence of medium frequency, 100 kHz, pulsed magnetron sputtering discharge. Copper target was sputtered in the argon atmosphere. The examined power ranged from 0.5 to 4.5 kW which gave an average power density on target surface from 25 to 115 W/cm². Optical spectroscopy did not reveal any significant changes of copper ion contribution to the sputtering process. The electron temperature and plasma potential changed a little with applied power. The electron density depended linearly on the sputtering power.     

碳掺杂对CrN镀层显微硬度与组织结构的影响

采用闭合场非平衡磁控溅射离子镀技术在单晶硅(111)衬底上沉积了CrCN镀层以研究C靶电流对镀层显微硬度的影响,并通过X射线衍射、原子力显微镜、X射线光电子能谱和透射电镜对镀层进行了分析。结果表明:当C靶电流由0增加到1.5 A时,镀层显微硬度由1930 HV增加到2300 HV,提高约19%,并且镀层的颗粒明显变小;X射线衍射和透射电镜分析表明,随着C靶电流增大,镀层由晶态向非晶态转变;X射线光电子能谱分析表明,镀层碳元素主要以sp2键、sp3键和C-Cr键的形式存在。     

Preparation of B-C-N films by magnetron sputtering with different N2/Ar flow ratio

Amorphous B-C-N films were fabricated on silicon (100) substrates using radio frequency reactive magnetron sputtering technique with variable N₂/Ar flow ratios. The structures, chemical bonding and mechanical properties were characterized by Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and nanoindentation. We found that the N concentration is insensitive to the increment of N₂/Ar flow ratio while the B concentration decreases and C concentration increases. All B-C, C-N, and B-N bond contents increase as the N₂/Ar flow ratio varies from 1/10 to 5/10. Further improving the N₂/Ar flow ratio will promote N atoms prior to bonding with C, resulting in decreased B-C and increased C-N bond content, respectively. The changes of bond content lead to a shift of the main peaks of B1s, C1s, and N1s spectra toward higher binding energies. The hardness of B-C-N thin films is almost invariant with the N₂/Ar flow ratio.     

负偏压对Be上磁控溅射离子镀Al膜结构影响的研究

以Be为基体，采用磁控溅射离子镀的在其上镀制Al膜，研究了负偏压对Al膜微结构的影响；研究表明，不加基体负偏压，Al膜在（111）面择优生长；随着基体负偏压升高Al膜在（111）面择优生长趋势减北，Al膜在（200）面生长趋势加强；当基体负偏压超过150V后，Al膜在（111）面择优生长的趋势又得到加强。晶粒在低负偏压时随负偏压增加而细化，当较高的负偏压引起基体温度升高时，此时晶粒又变大了。     

磁控溅射V-Al-Ta-N四元涂层结构和性能研究

利用磁控溅射法制备出不同成分的(VAl)_(1-x)Ta_xN涂层,用X射线衍射、扫描电镜、原子力显微镜表征涂层微观结构,利用纳米压痕仪和摩擦磨损试验机测试了Ta含量对涂层的力学性能和摩擦磨损性能的影响。研究表明:Ta含量x≤0.31时,涂层为(111)结构,且硬度较低;当x≥0.57时,(111)结构完全消失,涂层呈现(200)择优取向,此时涂层变得较为致密,硬度和模量均得到明显提升,韧性也有显著提高。摩擦磨损实验表明Ta含量的增加能够降低涂层的摩擦系数,但同时也会增大涂层的磨损率。     

磁控溅射制备增透ITO薄膜及其性能研究

用射频磁控溅射法在低温下制备了光电性能优良的ITO(In2O3:SnO2=1:1)薄膜。质量流量计调节氩气压强PAr为0.2～3.0Pa,氧流量fO2为0～10sccm,并详细探讨了溅射时PAr和fO2变化对ITO薄膜光学性能的影响。结果表明:fO2的改变引起薄膜中氧空位浓度变化而影响ITO薄膜折射率n;fO2对ITO靶材表面的溅射阀值和对Ar 散射而改变溅射速率。衬底表面粗糙度对ITO薄膜的折射率测量准确性有较大影响。PAr为0.8Pa,fO2为2.4sccm,薄膜厚度为241.5nm时,nmin=1.97,最大透过率为89.4%(包括玻璃基体),方阻为75.9?/□,电阻率为8.8×10-4?·cm。AFM分析表明薄膜表面针刺很少,表面平整(RMS=3.04nm)。     

Finite element simulation and experimental research on ZnO:Al by magnetron sputtering

Aluminum doped zinc oxide (ZnO:Al) thin films are suitable for the use as transparent conductive electrode in copper indium gallium selenide Cu(In,Ga)Se₂ thin film solar cells. The resistivity and film quality of ZnO:Al deposited on soda lime glass is nonuniform in magnetron sputtering process. According to the measurement results of magnetic field on the top of the target, obvious magnetic field distribution nonuniformity is observed along the vertical and horizontal directions respectively. With the longer distance between target and substrate, the magnetic field intensity becomes lower and flatter between the two magnet poles. Based on the simulation results by finite element analysis, it is verified the nonuniformity of magnetic field distribution influences the probability of Ar⁺ particles collision and the deposition of zinc oxide (ZnO) particles in different regions on substrate. The higher resistivity of ZnO:Al films is obtained where the magnetic field intensity is stronger.