Physico-chemical and electrical properties of InSe films

Thin films of InSe were obtained by vacuum evaporation of polycrystalline material onto well cleaned glass substrates. After deposition on a cold substrate the samples were placed in a vacuum-sealed Pyrex tube for the annealing process. Physico-chemical and electrical properties of the InSe layers have been investigated. RBS and X-ray diffraction measurements showed that the InSe phase could be obtained. Electrical properties of the InSe layers are studied for different annealing temperatures. Conductivity measurements show that the behaviour of the films is sensitive to their thermal environment. The conductivity is controlled by grain boundaries.     

Effect of thermal annealing time on optical and structural properties of TeO2 thin films

TeO₂ thin films were deposited on quartz substrates by rf reactive sputtering technique from a Te metal target. The obtained samples were annealed in an argon atmosphere at 450 °C for different annealing times up to 90 min. X-ray diffraction studies revealed that the as-grown samples were amorphous and there was no appreciable change in structure for a short annealing time. Thin films became polycrystalline with the tetragonal (α-phase) structure of tellurium dioxide crystal with the increase of the thermal annealing time. The refractive index and optical energy gap of the films were calculated by modelling transmittance spectra. The optical energy gap decreased continuously from 3.83 eV to 3.71 eV with increasing thermal annealing time.     

Effects of annealing temperature on microstructure and electrical properties of Mn-Co-Ni-O thin films

Mn_1.85Co_0.3Ni_0.85O₄ (MCN) thin films were prepared on Al₂O₃ substrates by chemical solution deposition method at different annealing temperature (650, 700, 750 and 800 °C). Effects of annealing temperature on microstructure and electrical properties of MCN thin films were investigated. The MCN thin film annealed at 750 °C is of good crystallization and compact surface. It shows lower resistance (4.8 MΩ) and higher sensitivity (3720.6 K) than those of other prepared films. It also has small aging coefficient (3.7%) after aging at 150 °C for 360 h. The advantages of good properties make MCN thin film very promising for integrated devices.     

Effect of annealing on microstructural and optoelectronic properties of nanocrystalline TiO2 thin films

In this study, semi-transparent nanostructured titanium oxide (TiO₂) thin films have been prepared by sol–gel technique. The titanium isopropoxide was used as a source of TiO₂ and methanol as a solvent and heat treated at 60°C. The as prepared powder was sintered at various temperatures in the range of 400–700°C and has been deposited onto a glass substrate using spin coating technique. The effect of annealing temperature on structural, morphological, electrical and optical properties was studied by using X-ray diffraction (XRD), high resolution transmittance electron microscopy (HRTEM), atomic force microscopy (AFM), scanning electron microscopy (SEM), dc resistivity measurement and optical absorption studies. The XRD measurements confirmed that the films grown by this technique have good crystalline nature with tetragonal-mixed anatase and rutile phases and a homogeneous surface. The HRTEM image of TiO₂ thin film (annealed at 700°C) showed grains of about 50–60?nm in size with aggregation of 10–15?nm crystallites. Electron diffraction pattern shows that the TiO₂ films exhibited a tetragonal structure. SEM images showed that the nanoparticles are fine and varies with annealing temperature. The optical band gap energy decreases with increasing annealing temperature. This means that the optical quality of TiO₂ films is improved by annealing. The dc electrical conductivity lies in the range of 10^?6 to 10^?5?Ω?cm^?1 and it decreases by the order of 10 with increase in annealing temperature from 400°C to 700°C. It is observed that the sample Ti700°C has a smooth and flat texture suitable for different optoelectronic applications.     

Investigation on structural, electrical and optical properties of tungsten-doped tin oxide thin films

Tungsten-doped tin oxide (SnO₂:W) transparent conductive films were prepared on quartz substrates by pulsed plasma deposition method with a post-annealing. The structure, chemical states, electrical and optical properties of the films have been investigated with tungsten-doping content and annealing temperature. The lowest resistivity of 6.67 × 10^− 4 Ω cm was obtained, with carrier mobility of 65 cm² V^− 1 s^− 1 and carrier concentration of 1.44 × 10²⁰ cm^− 3 in 3 wt.% tungsten-doping films annealed at 800 °C in air. The average optical transmittance achieves 86% in the visible region, and approximately 85% in near-infrared region, with the optical band gap ranging from 4.05 eV to 4.22 eV.     

Study of annealing effects in Al-Sb bilayer thin films

In this paper, we present preparation and characterization of Al-Sb bilayer thin films. Thin films of thicknesses, 3000/1000 Å and 3000/1500 Å, were obtained by the thermal evaporation (resistive heating) method. Vacuum annealing and rapid thermal annealing methods were used to mix bilayer thin film structure. Results obtained from optical band gap data and Rutherford back scattering spectrometry showed mixing of Al-Sb bilayer system.     

Size dependent optical characteristics of chemically deposited nanostructured ZnS thin films

ZnS thin films of different thicknesses were prepared by chemical bath deposition using thiourea and zinc acetate as S²⁻ and Zn²⁺ source. The effect of film thickness on the optical and structural properties was studied. The optical absorption studies in the wavelength range 250–750 nm show that band gap energy of ZnS increases from 3·68–4·10 eV as thickness varied from 332–76 nm. The structural estimation shows variation in grain size from 6·9–17·8 nm with thickness. The thermoemf measurement indicates that films prepared by this method are of n-type.     

Effect of Al dopants on the structural,optical and gas sensing properties of spray-deposited ZnO thin films

Undoped and Al-doped ZnO thin films were deposited on glass substrates by the spray pyrolysis method. The structural, morphological and optical properties of these films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), UV–Vis spectroscopy, photoluminescence (PL) and photoconductivity (PC) measurements, respectively. XRD analyses confirm that the films are polycrystalline zinc oxide with the hexagonal wurtzite structure, and the crystallite size has been found to be in the range 20–40 nm. SEM and AFM analyses reveal that the films have continuous surface without visible holes or faulty zones, and the surface roughness decreases on Al doping. The Al-doped films have been found to be highly transparent (>85%) and show normal dispersion behavior in the wavelength range 450–700 nm. The doped films show only ultraviolet emission and are found to be highly photosensitive. Among all the films examined, at 300 °C the 1.0 at% Al-doped film shows the selective high response (98.2%) to 100 ppm acetone concentration over to methanol, ethanol, propan-2-ol, formaldehyde and hydrogen.     

热处理对CuInS2薄膜导电类型及光学特性的影响

真空蒸发在载玻片上沉积CuInS2薄膜(Cu、In、S原子配比为1∶0.1∶1.2).摸索CuInS2薄膜发生导电类型转换最有效的热处理条件,研究不同热处理工艺对CuInS2薄膜的结构、表面形貌、化学成分比和光学性能的影响.实验给出:沉积的薄膜进行360℃热处理30 min后,得到黄铜矿结构的CuInS2薄膜;SEN分析显示薄膜表面呈颗粒状较平整致密性略差,导电类型为N型,薄膜的本征吸收限为1.46eV,直接光学带隙Eg=1.38 eV.对薄膜进行370℃热处理20 min同样可得到N型CuInS2但含有少量的CuS2成分,薄膜表面致密性变好但粗糙度增大,本征吸收限发生红移为1.42 eV,Eg=1.40 eV.370℃,30 min热处理后可得到P型CuInS2薄膜,Eg=1.37 eV.制备的三种CuInS2薄膜的光吸收系数都在104 cm-1数量级以上.CuInS2薄膜中In或Cu元素含量大小,对薄膜的导电类型的变化起着决定性的作用,而薄膜中S和In元素的变化直接取决于热处理的条件.     

相变光透射特性具有窗口结构的VO2薄膜

利用无机溶胶凝胶法制备出具有优良热致相变光学特性的VO2薄膜,通过改变制备过程中的条件,发现在一定的制备参数下,可得到光透射性具有窗口形状的热致相变薄膜,该类薄膜相变前后在600～850nm范围出现显著透光度窗口状态化现象。利用XRD、XPS对相变光学特性具有窗口结构的薄膜和具有典型相变特性的薄膜进行对比分析,结果显示利用无机溶胶-凝胶法得到的薄膜表面没有衬底离子出现,衬底扩散离子主要存在于薄膜和衬底界面之间。通过对引起相变过程中光透射窗口状变化的原因进行讨论,得到薄膜在相变过程中出现透射光谱窗口状的变化是来源于V^3 和衬底扩散离子Na^ 的共同作用。     

Effect of annealing temperature on structural, electrical and optical properties of B-N codoped ZnO thin films

The B-N codoped p-type ZnO thin films have been prepared by radio frequency magnetron sputtering using a mixture of nitrogen and oxygen as sputtering gas. The effect of annealing temperature on the structural, electrical and optical properties of B-N codoped films was investigated by using X-ray diffraction, Hall-effect, photoluminescence and optical transmission measurements. Results indicated that the electrical properties of the films were extremely sensitive to the annealing temperature and the conduction type could be changed dramatically from n-type to p-type, and finally changed to weak p-type in a range from 600 °C to 800 °C. The B-N codoped p-type ZnO film with good structural, electrical and optical properties can be obtained at an intermediate annealing temperature region (e.g., 650 °C). The codoped p-type ZnO had the lowest resistivity of 2.3 Ω cm, Hall mobility of 11 cm²/Vs and carrier concentration of 1.2 × 10¹⁷ cm^− 3.     

Structural and optical properties of electron beam evaporated CdSe thin films

Thin films of cadmium selenide (CdSe) as a semiconductor is well suited for opto-electronic applications such as photo detection or solar energy conversion, due to its optical and electrical properties, as well as its good chemical and mechanical stability. In order to explore the possibility of using this in optoelectronics, a preliminary and thorough study of optical and structural properties of the host material is an important step. Based on the above view, the structural and optical properties of CdSe films have been studied thoroughly in the present work. The host material, CdSe film, has been prepared by the physical vapour deposition method of electron beam evaporation (PVD: EBE) technique under a pressure of 5 × 10⁻⁵ mbar. The structural properties have been studied by XRD technique. The hexagonal structure with a preferred orientation along the (0 0 2) direction of films has been confirmed by the X-ray diffraction analysis. The films have been analysed for optical band gap and absorbed a direct intrinsic band gap of 1·92 eV.     

射频功率对RF-PECVD法制备纳米硅薄膜结构特征和光学特性的影响

利用射频等离子体增强型化学气相沉积(RF-PECVD)工艺,以SiH4和H2作为反应气体源,在石英衬底上制备了氢化纳米硅(nc-Si∶H)薄膜。其中衬底温度为250℃,H2稀释比为99%,反应压强为133Pa和射频功率为20～60W。采用α-台阶仪、X射线衍射仪(XRD)、Raman光谱仪、傅立叶变换红外光谱仪(FT-IR)和紫外-可见光分光光度计等对薄膜的结构特征和光学特性进行了测试研究。结果表明,随着射频功率的增大,nc-Si∶H薄膜的沉积速率增加,晶化率提高,晶粒尺寸增大和氢含量减小,同时薄膜的吸收系数增强,光学带隙变窄,结构有序性增强和带尾态宽度减小。     

Effect of thermal annealing treatment on structural, electrical and optical properties of transparent sol-gel ZnO thin films

Effect of thermal annealing in different ambients on the structural, electrical and optical properties of the sol-gel derived ZnO thin films are studied. XRD results show that the annealed ZnO films with wurtzite structure are randomly oriented. Crystallite size, carrier concentration, resistivity and mobility are found to be dependent on the annealing temperature. The change in carrier concentration is discussed with respect to the removal of adsorbed oxygen from the grain boundaries. The highest carrier concentration and lowest resistivity are 8 × 10¹⁸ cm⁻³ and 2.25 × 10⁻¹ Ω cm, respectively, for the film annealed at 500 °C in vacuum. The annealed films are highly transparent with average transmission exceeding 80% in the wavelength region of 400-800 nm. In all three ambients, the optical band gap value does not change much below 500 °C temperature while above this temperature band gap value decreases for nitrogen and air and increases for vacuum.     

热致变色VO2薄膜的制备及光学性能研究

利用等离子体发射光谱监测系统(PEM)控制钒的等离子强度,在石英基底上磁控溅射制备了VO2薄膜。采用XRD、XPS、SEM、紫外-可见-近红外分光光度计及傅立叶红外分光光度计研究薄膜的结构、光学及相变特性。结果表明,所制备的VO2薄膜具有(011)取向,VO2薄膜的热滞回线宽度为25℃,可见光透过率和太阳光调节率分别可达Tlum,l=34.1%、Tlum,h=35.3%和ΔTsol=6.8%,相变前后,红外光区的反射率变化最大值可达44.4%。     

Effect of annealing on the characteristics of Au/Cr bilayer films grown on glass

Au layers with thickness of about 110 nm were sputter-deposited on unheated glass substrates coated with a Cr layer about 20 nm thick. The chamber was evacuated to a pressure of 2 Pa and then sputtering was carried out at Ar pressure of 4 Pa. The Au/Cr bilayer films were annealed in a vacuum of 5×10⁻⁴ Pa at 170°C, 180°C, 200°C and 250°C for from 5 to 120 min, respectively. Atomic force microscopy was used to observe the structural characteristic of the bilayer films. Auger electron spectroscopy was used to analyze the composition inside the Au layers. The sheet resistance of the films was measured using the four-point probe technique. The grain size of the bilayer film gradually increases with an increase in annealing temperature while its average surface roughness ranging from 4.5 to 6.8 nm does not show any systematic change with annealing temperature and time. No impurities such as carbon, nitrogen and oxygen are detected inside all of the Au layers. When the annealing temperature reaches 200°C and the annealing time exceeds 30 min, chromium atoms markedly diffuse into the Au layer. Furthermore, for the bilayer films annealed at 250°C, chromium atoms have markedly diffused into the Au layer even for annealing time of 5 min. Regardless of the increase in grain size of the Au layer, the diffusion of chromium atoms into the Au layer causes an increase in the resistivity of the bilayer film.     

Influence of the annealing in nitrogen atmosphere on the XRD, EDX, SEM and electrical properties of chemical bath deposited CdSe thin films

The influence of annealing in nitrogen atmosphere on the structure, optical and electrical properties of cadmium selenide (CdSe) thin films deposited by chemical bath deposition (CBD) onto glass substrates was studied. The samples were annealed in nitrogen atmosphere at various temperatures. A transition from metastable nanocrystalline cubic to stable polycrystalline hexagonal phase has been observed after annealing. The as-deposited CdSe thin films grow in the nanocrystalline cubic phase with optical band gap 1.93 eV. The electrical resistivity of the thin films has been measured in order of 10⁶ Ω cm. The activation energy of the samples has been found to be 0.26–0.19 eV at low temperature region, and 0.36–0.56 eV at high temperature region. It was also found that the activation energy and the resistivity of the films decrease with the increasing annealing temperature.     

Effect of sol concentration on the structural, morphological, optical and photoluminescence properties of zirconia thin films

ZrO₂ thin films were deposited on quartz substrates from 10 wt.%, 20 wt.% and 40 wt.% solutions of Zirconium-n-butoxide in isopropanol by sol-gel dip-coating technique. Higher concentrated sols of 20 wt.% and 40 wt.% exhibited faster gelation, where as 10 wt.% sol remained stable for two months and films synthesized from this sol remained transparent and continuous even for 12 coatings. Ellipsometric study revealed that refractive index of the films increased with increase in sol concentration which is ascribed to the decrease in porosity. X-ray diffraction study showed that a tailoring of grain size from 7.9 to 39.2 nm is possible with increase in sol concentration. Atomic force microscopy studies showed a change in growth mode from vertical to lateral mode with increase in sol concentration. The film surface revealed positive skewness and high kurtosis values which make them favorable for tribological applications. The average optical transmittance in the visible region is highest (greater than 90%) for the film deposited from 10 wt.% sol. The optical band gap decreased from 5.74 to 5.62 eV with increase in the sol concentration. Photoluminescence (PL) spectra of the films exhibit an increase in the emission intensity with increase in sol concentration which substantiates better crystalline quality of the film deposited from 40 wt.% sol and increase in oxygen vacancies. The “Red shift” of the PL spectra with increase in sol concentration originates from the increase in the grain size with sol concentration which makes it suitable for generation of solid state lighting in light emitting diode.     

一维纳米氧化锌的场发射性能和光学性能研究

采用真空热蒸发法在不同的制备温度下,制备出了准阵列状和阵列状一维纳米ZnO结构。并利用X射线衍射、扫描电子显微镜、场发射测试仪、光致发光谱对ZnO纳米材料的结晶质量、形貌及场发射性能进行了分析研究。阵列状纳米氧化锌有较明显的择优生长取向。准阵列状纳米氧化锌的场发射性能优于阵列状纳米氧化锌。并通过对PL谱的对比分析得出,准阵列状纳米结构的结晶质量较好,阵列状纳米结构中存在的缺陷较多。     

Intrinsic optical and structural properties of SrS thin films

SrS thin films were deposited by electron beam evaporation on heated silica substrates. The optical properties of the layers – complex refractive index and optical band gap –were derived from optical transmission spectra, measured by means of UV-VIS-NIR spectrophotometry. The influence of post-deposition annealing by rapid thermal processing (RTP) was studied. X-ray powder diffraction (XRD) was used to study the film crystal structure and preferential orientation.