真空电弧离子镀ZrN涂层的工艺与性能

采用真空阴极电弧离子镀在不同基体材料上镀ZrN涂层,试验研究了ZrN薄膜的沉积工艺与性能,分析了基体偏压和沉积真空度对ZrN薄膜显微结构与性能的影响。XRD结果表明,随着偏压升高和炉底真空度的降低,ZrN（111）衍射峰逐渐增强,而（200）衍射峰逐渐减弱;炉底真空度降低,试样表面液滴状况明显变好。     

ZrN系列薄膜的研究进展

综述了近年来ZrN系列薄膜的研究现状,描述了ZrN薄膜的重要性质,介绍了以ZrN薄膜为基础的多层膜和复合膜的研究状况,分析了制备方法及工艺条件对薄膜的影响,并展望了ZrN薄膜未来的研究方向。     

20CrNiMo钢表面磁控溅射制备TiN/ZrN多层薄膜的形貌及摩擦学性能

利用非对称双极脉冲磁控溅射技术在20CrNiMo钢表面制备了TiN/ZrN多层薄膜,利用扫描电子显微镜和原子力显微镜观察了薄膜的截面和表面形貌,用划痕仪测试了薄膜与基体的结合力,通过球-盘摩擦磨损试验机对薄膜的摩擦学性能进行了研究。结果表明:制备的TiN/ZrN多层薄膜厚度约为2.1μm,薄膜均匀且致密,表面粗糙度为13.63nm;薄膜与基体结合较牢固,临界载荷达到51.0N;薄膜具有优良的减摩性,摩擦因数为0.16,较基体20CrNiMo钢的0.33明显减小,使该钢的耐磨性能得到提高。     

磁控共溅射制备锆-硅-氮复合薄膜的显微组织与性能

通过磁控共溅射方法制备了一系列不同硅含量的锆-硅-氮复合薄膜;采用能谱仪、X射线衍射仪、扫描电镜和微力学探针等对复合薄膜进行了表征;研究了薄膜中硅、锆原子比对复合薄膜的显微组织、高温抗氧化性能和力学性能的影响。结果表明：随着硅含量的增加,复合薄膜的ZrN（111）、（220）晶面衍射峰逐渐消失,呈现ZrN（200）择优取向;同时其性能逐渐提高,当硅、锆原子比为0．030时可获得最大硬度和最大弹性模量,分别为37．8GPa和363GPa;进一步增加硅含量,复合薄膜向非晶态转化,而薄膜的硬度和弹性模量迅速降低,抗氧化温度显著提高。     

ZrN涂层刀具的滑动磨损特性研究

山东大学摘要:采用电弧离子镀法在硬质合金刀具表面制备了厚度为2.19~5.23μm的ZrN系列涂层,测定了涂层的显微硬度,并通过划痕试验和摩擦磨损试验考察了涂层与基体的结合强度及其摩擦磨损性能。在扫描电镜下观察磨损表面形貌,结果表明:ZrN系列涂层能够显著提高硬质合金刀具的表面硬度;涂层与基体的结合强度较高,划痕临界载荷高于60N;与此同时,电弧离子镀法ZrN系列涂层可以显著改善硬质合金刀具的耐磨性能。磨损机理主要是磨粒磨损和涂层的微剥落。     

ZrN涂层YT15硬质合金刀具的制备及切削性能

采用中频磁控溅射和电弧离子镀相结合的方法,在YT15硬质合金刀片上制备了三种ZrN涂层,测试了涂层的物理性能,并通过切削试验研究了不同ZrN涂层对YT15硬质合金刀具切削性能的影响,并与无涂层刀具的切削效果进行了对比。结果表明:ZrN涂层的硬度较YT15硬质合金刀具的提高了12 GPa;三种涂层刀具中,有锆过渡层的ZrN涂层刀具降低了切削过程中刀具的切削力,使刀具的耐磨损性能得到提高。     

离子束辅助真空电弧沉积Zr-Ni-N薄膜的研究

采用多弧离子镀技术在高速钢和单晶硅基体上制备Zr-Ni-N复合薄膜,研究了低能氮离子束对Zr-Ni-N涂层结构、表面形貌和硬度的影响。研究表明:用低能氮离子束辅助真空电弧沉积Zr-Ni-N膜,ZrN结构在(111)晶面出现一定的择优取向,并对Zr-Ni-N膜层有一定的强化作用,膜层表现出较高的显微硬度。     

ZrN涂层YT15硬质合金刀具的制备与切削性能研究

应用多功能PVD涂层设备,选择了最佳的工艺参数,采用中频磁控溅射和电弧离子镀的组合工艺方法,在YT15硬质合金基体上沉积ZrN涂层,测试了涂层的物理胜能参数。通过切削试验研究了ZrN涂层对YT15硬质合金刀具切削性能的影响,并与未涂层刀具的切削效果做了对比,结果表明：ZrN涂层增强了刀具的硬度,降低了切削力,提高了刀具的耐磨损能力。     

ZrN/TiN复合涂层刀具的制备及其磨损性能研究

采用中频磁控溅射和电弧离子镀两种方法组合在硬质合金基体上沉积ZrN／TiN复合涂层，采用切削试验来研究ZrN／TiN涂层对硬质合金刀具切削性能的影响。结果表明：ZrN／TiN复合涂层提高了硬质合金刀具的硬度，涂层刀具的显微硬度受基体硬度的影响，基体YG6、YT14涂层后的显微硬度分别可达2300HV，2500HV；使涂层刀具切削力的降低了20％；提高了涂层刀具的耐磨损能力。     

TiO2薄膜电极光电转换性能的影响因素

采用溶胶-凝胶法在玻璃基体表面制备了不同粒径的TiO2薄膜和纳米SnO2/TiO2复合薄膜,将它们与不同对电极进行了光电转换性能测试.结果表明:氧化物薄膜电极经染料敏化、薄膜颗粒细化及薄膜复合化都有利于提高电极的光电转换性能.用汞溴红敏化后,粒径为25 nm的TiO2薄膜的光电转换性能提高了847倍;粒径为25 nm的TiO2薄膜的光电转换性能是粒径为136 nm的TiO2薄膜的5倍;粒径为25 nm的TiO2薄膜经粒径为27 nm的SnO2薄膜复合后,其光电转换性能提高了7.7%.     

多弧离子镀多元多层膜在旋铆头中的应用

采用多弧离子镀法在旋铆头沉积Ti/TiN/(Ti-Zr)N/ZrN多层膜处理,并对旋铆头的失效形式、膜层的组织形貌、显微硬度、耐磨性能进行了分析和讨论。结果表明镀膜旋铆头使用寿命比未镀膜旋铆头可提高一倍多。     

Corrosion and wear behaviour of ZrN thin films

Abstract

ZrN coating is an alternative candidate to replace the conventional TiN coating especially for high temperature oxidation resistance applications. ZrN coatings of varying thickness (1·5, 2·0, 2·5, 3·0 and 4·0 μm) were deposited on 316 stainless steel substrates by cathodic arc evaporation in a reactive nitrogen atmosphere. The influences of lamellae thickness on the microstructure, tribological and corrosive properties of the films were investigated. The coefficient of steady state friction of the films ranged from 0·213 to 0·659. The corrosion resistance of the coatings was tested in 1 N H₂SO₄ solution. The results indicate that the microstructure, wear and corrosion properties of the films were dependent on lamellae thicknesses and film structure.     

样品室真空度对磁控溅射Ti膜结构的影响

本文利用场发射扫描电子显微镜和能谱仪研究不同样品室真空度条件下磁控溅射Ti沉积膜膜层的氧含量和微观结构。结果发现,当样品室真空度较低时,膜层的氧含量很高,膜层为钛的氧化物;随着真空度的提高,膜层的氧含量降低,Ti的晶粒出现;进一步提高真空度,Ti晶粒更为明显,膜层的截面呈柱状晶结构。     

Atomic Force Microscope Investigation on Static Nanomechanical Properties Versus Dynamic Nanotribological Evaluation of Metal–ZrN and ZrN Thin Films

The present study offers for the first time a correlation between static nanomechanical properties (nanohardness (H), elastic modulus (E), H/E and H ³/E ² ratio) and dynamic properties (resulting from nanoscratch measurements) for Metal–ZrN thin films (Inconel–ZrN, Cr–ZrN and Nb–ZrN) as well as monolayer polycrystalline ZrN thin films. Metal–ZrN thin films have a great industrial potential, as they can combine high hardness with good elasticity and toughness making them effective for wear resistant application. Nanomechanical and nanotribological properties of Metal–ZrN and ZrN thin films deposited by DC unbalanced magnetron sputtering were investigated using an atomic force microscope interfaced with a Hysitron Triboscope. The elastic recovery of thin films under a normal load applied during nanoindentation was evaluated and correlated with elastic recovery of thin films under dynamic loading during nanoscratch measurements in order to asses which film compositions provide superior wear resistance. It is demonstrated that dynamic elastic recovery measurements correlated well with those derived from static nanoindentation tests. The nanoscratch test combines both normal and tangential loading, therefore, it is expected to be an even better predictor of wear-resistance. The AFM nanoindentation and nanoscratch measurements show superior nanomechanical and nanotribological properties for Metal–ZrN thin films when compared to polycrystalline ZrN thin films.     

真空热处理对硫化锌薄膜光学与微结构特性的影响

针对电子束蒸发离子辅助沉积的硫化锌薄膜,研究了550℃以下真空热处理对其光学与微结构特性的影响。薄膜光学和微结构特性的测试分析表明:制备后薄膜为类立方结构的ZnS,在337.5nm波长处出现临界特性转折点,随着热处理温度的增加,转折波长两侧的消光系数变化规律相反,折射率和物理厚度呈现下降趋势,薄膜的禁带宽度逐渐增加;在红外波段的薄膜折射率与热处理温度的变化并不显著,在350℃下热处理时消光系数出现转折,主要是由晶粒变小的趋势所致;通过晶相分析,硫化锌薄膜经历了类立方结构到六方结构的转换,与禁带宽度的变化趋势基本一致。分析结果表明,光学特性变化的根本原因是薄膜的微结构特性变化。     

Microstructure Evolution and Enhanced Tribological Properties of Cu-Doped WS2 Films

To improve the tribological properties of WS₂ film both in vacuum and in humid air conditions, its microstructure was optimized by doping different concentrations of Cu via radio frequency co-sputtering method. The film microstructure and composition were investigated by field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, grazing incidence X-ray diffraction and high-resolution transmission electron microscopy. It was verified that Cu was presented in amorphous phase in the WS₂ matrix and could also induce amorphization and densification of the composite films gradually. The film microstructure changed from coarse columnar platelet structure at low Cu content (0–5.8 at.%) to transition structure with two separate layers at increased Cu content (11.5–16.2 at.%) and to a featureless structure at high Cu content (above 24.4 at.%). The mechanical and tribological properties of films were evaluated using the scratch tester and ball-on-disk tribometer, respectively. It was found that the incorporation of a suitable content of Cu dopant could significantly improve the film toughness, but excess amount of Cu dopant lead to high brittleness. All the composite films exhibited much lower wear rate and longer wear life than those of pure WS₂ film both in vacuum and in humid air conditions. The wear mechanisms were proposed after correlating the mechanical performance with film microstructure.     

Al、Sn掺杂对于ZnO薄膜微结构及光学特性的影响

采用真空电子束蒸发金属薄膜及后续热氧化技术在石英衬底上分别制备出了ZnO、Al∶ZnO以及Sn∶ZnO薄膜。通过X射线衍射仪(XRD),紫外-可见分光光度计和原子力显微镜(AFM)等分析仪器对比研究了Al、Sn掺杂对ZnO薄膜结晶质量、光学性质及表面形貌的影响。测试结果表明,Al、Sn掺杂可以使薄膜结晶质量得到提高,薄膜应力部分释放,薄膜表面的粗糙度也相应增加,掺杂对薄膜光学带隙的影响在一定程度取决于金属薄膜的氧化程度,氧化充分可以使光学带隙变宽,反之则变窄。