Temperature-dependent electroluminescence in InGaN/GaN multiple-quantum-well light-emitting diodes

We present a comparative study on temperature dependence of electroluminescence (EL) of InGaN/GaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) with identical structure but different indium contents in the active region. For the ultraviolet (UV) and blue LEDs, the EL intensity decreases dramatically with decreasing temperature after reaching a maximum at 150 K. The peak energy exhibits a large redshift in the range of 20–50 meV with a decrease of temperature from 200 K to 70 K, accompanying the appearance of longitudinal-optical (LO) phonon replicas broadening the low energy side of the EL spectra. This redshift is explained by carrier relaxation into lower energy states, leading to dominant radiative recombination at localized states. In contrast, the peak energy of the green LED exhibits a minimal temperature-induced shift, and the emission intensity increases monotonically with decreasing temperature down to 5 K. We attribute the different temperature dependences of the EL to different degrees of the localization effects in the MQW regions of the LEDs.     

Transient and stable electroluminescence properties of alternating-current biased organic light-emitting diodes

In this work,transient electroluminescence (EL) (brightness-voltage waveform curve) was utilized to investigate the working mechanism of alternating-current biased organic light-emitting diodes (AC-OLE...     

InGaN/GaN multiple quantum well green light-emitting diodes prepared by temperature ramping

High-quality InGaN/GaN multiple-quantum well (MQW) light-emitting diode (LED) structures were prepared by a temperature-ramping method during metal-organic chemical-vapor deposition (MOCVD) growth. Two photoluminescence (PL) peaks, one originating from well-sensitive emission and one originating from an InGaN quasi-wetting layer on the GaN-barrier surface, were observed at room temperature (RT). The observation of high-order double-crystal x-ray diffraction (DCXRD) satellite peaks indicates that the interfaces between InGaN-well layers and GaN-barrier layers were not degraded as we increased the growth temperature of the GaN-barrier layers. With a 20-mA and 160-mA current injection, it was found that the output power could reach 2.2 mW and 8.9 mW, respectively. Furthermore, it was found that the reliability of the fabricated green LEDs prepared by temperature ramping was also reasonably good.     

生长停顿改善MOCVD生长InGaN/GaN多量子阱的特性

利用金属有机物化学气相淀积(MOCVD)生长了InGaN/GaN多量子阱(MQWs)结构,研究了生长停顿对InGaN/GaN MQWs特性的影响.结果表明,采用生长停顿,可以改善MQWs界面质量,提高MQWs的光致发光(PL)与电致发光(EL)强度;但生长停顿的时间过长,阱的厚度会变薄,界面质量变差,不仅In组分变低,富In的发光中心减少,而且会引入杂质,致使EL强度下降.     

Optical and electrical characterization of (Ga,Mn)N/InGaN multiquantum well light-emitting diodes

(Ga,Mn)/N/InGaN multiquantum well (MQW) diodes were grown by molecular beam epitaxy (MBE). The current-voltage characteristics of the diodes show the presence of a parasitic junction between the (Ga,Mn)N and the n-GaN in the top contact layer due to the low conductivity of the former layer. Both the (Ga,Mn)N/InGaN diodes and control samples without Mn doping show no or very low (up to 10% at the lowest temperatures) optical (spin) polarization at zero field or 5 T, respectively. The observed polarization is shown to correspond to the intrinsic optical polarization of the InGaN MQW, due to population distribution between spin sublevels at low temperature, as separately studied by resonant optical excitation with a photon energy lower than the bandgap of both the GaN and (Ga,Mn)N. This indicates efficient losses in the studied structures of any spin polarization generated by optical spin orientation or electrical spin injection. The observed vanishing spin injection efficiency of the spin light-emitting diode (LED) is tentatively attributed to spin losses during the energy relaxation process to the ground state of the excitons giving rise to the light emission.     

Investigation of GaN-based light-emitting diodes using double photonic crystal patterns

GaN-based LEDs with photonic crystal (PhC) patterns on an n- and a p-GaN layer by nano-imprint lithography (NIL) are fabricated and investigated. At a driving current of 20 mA on Transistor Outline (TO)-can package, the light output power of the GaN-based LED with PhC patterns on an n- and a p-GaN layer is enhanced by a factor of 1.30, and the wall-plug efficiency is increased by 24%. In addition, the higher output power of the LED with PhC patterns on the n- and p-GaN layer is due to better crystal quality on n-GaN and higher scattering effect on p-GaN surface using PhC pattern structure.     

InGaN/GaN light-emitting diodes with a reflector at the backside of sapphire substrates

Nitride-based light-emitting diodes (LEDs) with a reflector at the backside of the sapphire substrates have been demonstrated. It was found that an SiO₂/TiO₂ distributed-Bragg reflector (DBR) structure could reflect more downward-emitting photons than an Al-mirror layer. It was also found that the 20-mA output power was 2.76 mW, 2.65 mW, and 2.45 mW for the DBR LED, Al-reflector LED, and conventional LED, respectively. With the same 50-mA current injection, the integrated-electroluminescence (EL) intensity of a DBR LED and an Al-reflector LED was 19% and 15% larger than that observed from a conventional LED.     

InGaN/GaN LEDs with a Si-doped InGaN/GaN short-period superlattice tunneling contact layer

Nitride-based light-emitting diodes (LEDs) with Si-doped n⁺-In_0.23Ga_0.77N/GaN short-period superlattice (SPS) tunneling contact top layer were fabricated. It was found that although the measured specific-contact resistance is around 1 × 10⁻² Ω-cm² for samples with an SPS tunneling contact layer, the measured specific-contact resistance is around 1.5×10⁰ Ω-cm² for samples without an SPS tunneling contact layer. Furthermore, it was found that one could lower the LED-operation voltage from 3.75 V to 3.4 V by introducing the SPS structure. It was also found that the LED-operation voltage is almost independent of the CP₂Mg flow rate when we grow the underneath p-type GaN layer. The LED-output intensity was also found to be larger for samples with the SPS structure.     

高亮度微腔有机电致发光器件

为了实现有机电致发光器件(OLED)发射光谱的窄化和高亮度,真空热蒸镀具有不同微腔结构的OLED(MOLED):玻璃衬底/分布式布拉格反射器(DBR)(1～4对的SiO2/Ta2O5层)/ITO/空穴传输层(HTL,α-NPD)/发光层(EML,Alq3:Rubrene或Alq3:Coumarin6)/电子传输层(ERL,Alq3)LiF/Mg/Ag,其中沉积DBR结构采用电子束沉积法。实验表明:该MOLED的发射光谱半波长宽度(FWHM)随DBR层数的增加而减小至最小值10nm;并且在2层DBR时,掺杂Rubrene器件得到更大的电流效率,约20cd/A,最大亮度为2.6×105cd/m2。研究发现,蓝光MOLED能够对自发光产生吸收现象,降低了出光效率。     

Improved efficiency in green polymer light-emitting diodes with air-stable electrodes

By dispersing an electron transporting molecular dopant into the active semiconducting luminescent polymer, we have achieved improved efficiencies for green light-emitting diodes (LEDs). These green emitting LEDs were fabricated by adding an electron transporting molecular dopant, 2-(4-biphenylyl)-5-(4-tert-butylphenyl)-l,3,4-oxadiazole (PBD), into the semiconducting luminescent polymer as the emitting layer in the polymer LEDs. The devices used poly(2-cholestanoxy-5-thexyldimethylsilyl-l,4-phenylene vinylene) (CS-PPV), a new soluble green light emitter, as the semiconducting luminescent polymer and either aluminum or indium as the electron injection electrodes. Quantum efficiencies of LEDs with the electron transporting molecular additive in the luminescent polymer and an Al electrode are about 0.3% photons per electron, better by a factor of 18 than similar devices made without the addition of the electron transport molecular dopant; quantum efficiencies of similar LEDs fabricated with an In electrode are 0.23% photons per electron, better by a factor of 16 than devices without the electron transport molecular additive.     

InGaN/GaN多量子阱蓝光LED电学特性研究

对不同温度(120～363 K)下InGaN/GaN多量子阱(MQW)结构蓝光发光二极管(LED)的电学特性进行了测试与深入的研究.发现对数坐标下I-V特性曲线斜率随温度变化不大.分别用载流子扩散-复合模型和隧道复合模型对其进行计算,发现室温下其理想因子远大于2,并且随着温度的下降而升高;而隧穿能量参数随温度变化不大.这说明传统的扩散-复合载流子输运模型不再适用于InGaN/GaN MQW蓝光LED.分析指出由于晶格失配以及生长工艺的制约,外延层中具有较高的缺陷密度和界面能级密度,导致其主要输运机制为载流子的隧穿.     

Edge-emitting electroluminescence polarization investigation of InGaN/GaN light-emitting diodes grown by metal-organic chemical vapor deposition on sapphire (0001)

The edge-emitting electroluminescence (FL) state of polarization of blue and green InGaN/GaN light-emitting diodes (LEDs) grown in EMCORE’s commercial reactors was studied and compared to theoretical evaluations. Blue (∼475 nm) LEDs exhibit strong EL polarization, up to a 3:1 distinction ratio. Green (∼530 nm) LEDs exhibit smaller ratios of about 1.5:1. Theoretical evaluations for similar InGaN/GaN superlattices predicted a 3:1 ratio between light polarized perpendicular (E⊥c) and light polarized parallel (E‖c) to the c axis. For the blue LEDs, a quantum well-like behavior is suggested because the E⊥c mode dominates the E‖c mode 3:1. In contrast, for the green LEDs, a mixed quantum well (QW)-quantum dot (QD) behavior is proposed, as the ratio of E⊥c to E‖c modes drops to 1.5:1. The EL polarization fringes were also observed, and their occurrence may be attributed to a symmetric waveguide-like behavior of the InGaN/GaN LED structure. A large 40%/50% drop in the surface root mean square (RMS) from atomic force microscopy (AFM) scans on blue/green LEDs with and without EL fringes points out that better surfaces were achieved for the samples exhibiting fringing. At the same time, a 25%/10% increase in the blue/green LED photoluminescence (PL) intensity signal was found for samples displaying EL interference fringes, indicating superior material quality and improved LED structures.     

p型InGaN/GaN超晶格N面GaN基LED的光电特性

随着氮(N)面GaN材料生长技术的发展,基于N面GaN衬底的高亮度发光二极管(LED)的研究具有重要的科学意义.研究了具有高发光功率的N面GaN基蓝光LED的新型结构设计,通过在N面LED的电子阻挡层和多量子阱有源层之间插入p型InGaN/GaN超晶格来提高有源层中的载流子注入效率.为了对比N面GaN基LED优异的器件性能,同时设计了具有相同结构的Ga面LED.通过对两种LED结构的电致发光特性、有源层中能带图、电场和载流子浓度分布进行比较可以发现,N面LED在输出功率和载流子注入效率上比Ga面LED有明显的提升,从而表明N面GaN基LED具有潜在的应用前景.     

图形化蓝宝石衬底结构对GaN基LED发光性能的影响

为了研究图形化蓝宝石衬底(PSS)的结构和形貌对GaN基发光二极管(LED)光学性能的影响,对PSS的制备工艺和参数进 行了调控,从而 形成具有不同填充因子的蒙古包形PSS(HPSS)和金字塔形PSS(TPSS)两种衬底,用于生长 和制备蓝光LED 芯片。通过对TPSS-LED的光学性能测试和分析得到,随着PSS填充因子的增大, LED的 光输出功 率也增大;进而比较具有相同填充因子的HPSS和TPSS的光学性能表明,HPSS明显优于TPSS。 因此, PSS填充因子的增大,能够提高LED的光输出功率;优化PSS的结构可以改善LED中光出射途径 ,从而更有效提高LED的光发射效率。     

InGaN/GaN multi-quantum-well-based light-emitting and photodetective dual-functional devices

In this study, we fabricated and characterized an InGaN/GaN multi-quantum-well (MQW)-based p-n junction photodetector (PD) for voltage-selective light-emitting and photo-detective applications. The photode-tector exhibits a cutoff wavelength at around 460nm which is close to its electroluminescence (EL) peak position. The rejection ratio was determined to be more than three orders of magnitude. Under zero bias, the responsivity of the device peaks at 371 nm, with a value of 0.068 A/W, corresponding to a 23% quantum efficiency.The overall responsivity gradually rises as a function of reverse bias, which is explained by the enhanced photocarrier collection efficiency.     

Changes in electrical characteristics associated with degradation of InGaN blue light-emitting diodes

Because of the high concentration of threading dislocations, the reverse current-voltage (I–V) characteristics for either homo- or heterojunctions made on GaN-based materials grown on sapphire often show a strong electric field dependence (called a soft breakdown characteristic), which can be described by a power law I=Vⁿ, with n between 4 to 5. We find a significant increase of reverse currents associated with the early degradation of emission in InGaN blue single-quantum-well light-emitting diodes (LEDs) subjected to aging tests (injected current of 70 mA over a total time of about 300 h). The formation of dislocations might be due to the relaxation of strain in the thin InGaN active layer during the aging tests.     

Influence of GaN material characteristics on device performance for blue and ultraviolet light-emitting diodes

An analysis of blue and near-ultraviolet (UV) light-emitting diodes (LEDs) and material structures explores the dependence of device performance on material properties as measured by various analytical techniques. The method used for reducing dislocations in the epitaxial III-N films that is explored here is homoepitaxial growth on commercial hybride vapor-phase epitaxy (HVPE) GaN substrates. Blue and UV LED devices are demonstrated to offer superior performance when grown on GaN substrates as compared to the more conventional sapphire substrate. In particular, the optical analysis of the near-UV LEDs on GaN versus ones on sapphire show substantially higher light output over the entire current-injection regime and twice the internal quantum efficiency at low forward current. As the wavelength is further decreased to the deep-UV, the performance improvement of the homoepitaxially grown structure as compared to that grown on sapphire is enhanced.     

InGaN／AlGaN双异质结构蓝光LED的电学和光学性质

研究了ＩｎＧａＮ／ＡｌＧａＮ双异质结构（ＤＨ）蓝光发光二极管（ＬＥＤ）的电学和光学性质，实验表明，器件正向偏压下的Ｉ－Ｖ特性偏离了ｐｎ结二极管的肖克莱模型的结果，并且载流子的主要输运机制与载流子隧穿有关。通过对电致发光（ＥＬ）谱的测量，得到位于２．８ｅＶ的发射峰和位于３．２ｅＶ弱发射峰，随着电流增大而均出现蓝移。对大脉冲电流下ＬＥＤ的特性的退化作了研究。     

表面粗化高空穴浓度InGaN:Mg性能及其发光二极管应用

利用金属有机物化学气相淀积(MOCVD)技术在蓝宝石衬底上生长了InGaN:Mg薄膜,对不同源流量InGaN:Mg材料特件进行了研究.光学和电学特性观测表明,当外延生长温度在760℃,三甲基铟(TMIn)摩尔流量不变时,随CP2Mg和Ⅲ族源摩尔比([CP2Mg]/[Ⅲ])增加,当In摩尔成分增加,空穴浓度也线性增加;当...     

Electrical properties and spectra of deep centers in GaN p-i-n rectifier structures

GaN p-i-n rectifiers with 4 μm thick i-layers show typical reverse breakdown voltages of 100–600 V. We have studied the temperature dependence of current-voltage characteristics in these diodes, along with hole diffusion lengths and the deep level defects present. Generally we find that i-layer background doping varies significantly (from <10¹⁴ cm⁻³ to 2–3×10¹⁶), which influences the current conduction mechanisms. The hole diffusion lengths were in the range 0.6–0.8 μm, while deep level concentrations were ∼10¹⁶ cm⁻³.