热压印刻蚀技术

纳米压印技术是一种高分辨率、廉价、高效的纳米结构制备技术。它既继承了传统光刻技术所具有的并行性,又同时拥有传统光刻技术不易达到的纳米结构制备能力,这为今后纳米结构的广泛应用提供了良好的条件。文章介绍了纳米热压印技术中核心工艺流程,包括：模板的制备、抗粘层的制备、压印过程中温度与压力的影响、反应离子刻蚀,并且给出了利用纳米热压印技术制备的光栅结构,最后展望了纳米压印技术的前景。     

Revisiting the two-sample runs test

We give new representations for the two-sample runs test statistic, derive explicit expressions of its mean and variance also in the general non-null case, and present an elementary proof of the consistency of the runs test.     

Pressing ahead

<正>Summarizing 2014 anunforgettableyear,Chinese President Xi Jinping in his live New Year speech underscores the need to continue reform and to advance the rule of law in 2015,comparing them toa bird's two wings.Reviewing the Chinese standardization work of the past year,so much happened in this field.We cannot unfold all in the lim-     

Lithography: rewriting the rules

Dip-pen nanolithography (DPN) is generating significant interest as a means of patterning surfaces with submicron-scale designs. Advocates of DPN, which effectively uses an atomic force microscope (AFM) as a pen, herald its ability both to fabricate and monitor high-resolution, miniaturized molecular arrays. The novel technology is not without its critics, however, who question the utility and practicality of paint-pot-style nanofabrication. Nonetheless, the relative availability and affordability of DPN tools is allowing an increasing number of scientists and engineers to think small.In December 1959, the Nobel prize-winning physicist Richard Feynman gave a lecture to the American Physical Society that outlined his vision of a futuristic nanoscale world. He dismissed reports of fingernail-sized electric motors and devices that could cram text onto pinheads as little more than crude first steps towards true miniaturization. “It is a staggeringly small world that is below,” he advised the assembled throng.     

分步式压印光刻研究

针对微纳制造中光刻环节的光衍射限制，讨论了可能成为下一代光刻技术路线的压印光刻。通过对比热压印、微接触转印及常温压印的技术特点，设计了一套低成本、结构简单的紫外光固化常温压印光刻机构。其大行程纳米级定位、纳米级下压系统消除了压印过程中的机构热变形误差、驱动间隙、蠕动误差等，具有分步式纳米级驱动多场压印及纳米级下压加载能力，可实现多次重复高保真图形复制。     

One Step Lithography of Polypyrrole

Large areas of polypyrrole (PPy) thin films deposited onto inert polymeric substrates are structured by direct laser interference patterning (DLIP). Several square millimeter areas could be produced with one single (10 ns) pulse, at room temperature and atmospheric pressure. Nanometric arrays of lines (>600 nm) or grids of PPy deposited on dielectric polymers polypropilene or polypirrol (PP or PE) are fabricated by DLIP at 355 nm. The period of the lines structures, measured by white light interferometry (WLI), is 3.5 µm. Regular structures are analyzed using scanning electron microscope (SEM) and a focus ion beam (FIB) tomography. It is shown that only the PPy film is structured while the PP or PE substrate remains unaltered. Fourier transform infrared spectroscopy (FTIR) and UV‐vis spectroscopy, permit to ensure that PPy chemical structure remains unaltered after the structuration process. The width of PPy lines can be tailored by controlling the fluence of the laser beam. Contact angle measurement shows that the wettability is affected by the structuring, making the surface more hydrophobic. The structuring technique seems to be suitable for the fabrication of PPy regular structures over various substrates.     

Lithography with new metallo-organic photoresists

A new method of depositing plain or structured inorganic films onto inorganic substrates without using evaporating or sputtering equipment is described. This method is based on the use of metallo-organic photopolymerizable compounds. Resist formulations for a large variety of metallo-organic photoresists are described. Oxide deposition is demonstrated and the deposition of metallic copper layers is described.     

All orthogonal arrays with 18 runs

All combinatorially inequivalent orthogonal arrays with 18 runs and eight or less factors are generated. Their potential as practical experimental designs is evaluated by a classification using generalized word‐length patterns of the original arrays and those of their projections into less factors. Arrays of special interest are given explicitly. This paper includes the statistical analysis of results from a real‐life experiment based on one of the arrays. Copyright © 2008 John Wiley & Sons, Ltd.     

Two-Photon Lithography of Platinum-Porphyrin Oxygen Sensors

Oxygen sensing structures were generated by two-photon microfabrication. By copolymerizing metalloporphyrins with a two-photon (2P) photo-initiated polymer, oxygen sensors were patterned into complex 3-D shapes. The sensors were generated on the interior walls of small bore capillaries to allow for controlled concentrations of oxygenated water and cell-rich media to be pumped through their local environment. Phosphorescence lifetime of the patterns were acquired at known levels of O₂ as a standard for measuring the respiration rate of a tiny population of bacterial cells. In addition, we report that the inclusion of the Pt-Porphyrin significantly reduces the 2P polymerization threshold. Fabricating near the inferred polymerization threshold, 3-D structures as small as 50 nm were observed in both the Pt-Porphyrin enhanced and the pure photopolymerizable monomers