Optical properties of ZnO thin films grown on diamond-like carbon by pulsed laser deposition

ZnO/diamond-like carbon(DLC)thin films are deposited by pulsed laser deposition(PLD),and the room-temperature photoluminescence(PL)is investigated.Using a fluorescence spectrophotometer,we obtain the PL spectra of DLC/Si and ZnO/Si thin films deposited at different substrate temperatures.The ZnO/DLC thin films show a broadband emission almost containing the entire visible spectrum.The Gaussian fitting curves of PL spectra reveal that the visible emission of ZnO/DLC thin films consists of three peaks centered at 381 nm,526 nm and 682 nm,which are attributed to the radiative recombination of ZnO and DLC,respectively.The Commission International de l,Eclairage(CIE)1931(x,y)chromaticity space of ZnO/DLC thin films indicates that the visible PL spectrum is very close to the standard white-light region.     

Waveguide properties of optical thin films grown by pulsed laser deposition

The propagation of optical beams in optical thin films grown by pulsed laser deposition is studied numerically in order to predict the influence of the film curvature on the performance of planar waveguide lasers. Several waveguiding structures are considered. The confinement of both the pump and the signal fields as well the overlap between the beams during propagation are examined.     

用脉冲激光沉积法制备类金刚石膜及金刚石薄膜

简要评述了用脉冲激光沉积技术制备类金刚石膜及金刚石薄膜的研究进展，总结了激光脉冲沉积制备薄膜的基本原理及其特点，分析了激光波长，能量，衬底温度等对薄膜质量的影响。     

脉冲激光沉积法沉积类金刚石薄膜的实验研究

为了研究脉冲激光沉积法中衬底温度和距离对类金刚石薄膜的影响,首先温度保持在200℃,靶和衬底间的距离分别取25.0mm和30.0mm来沉积类金刚石膜。其次温度保持在400℃,距离分别取25.0mm和30.0mm来沉积类金刚石膜。用Raman光谱仪对薄膜的微观结构进行检测,用原子力显微镜对薄膜的表面形貌进行检测。实验结果表明：距离增加或者温度升高都会导致类金刚石薄膜的密度和sp3/ sp2的比值减小,薄膜中石墨晶粒的数量增多和体积增大。近距离时温度的变化和低温时距离的变化对薄膜微观结构产生的影响更明显。距离和温度的变化对类金刚石薄膜的表面形貌也产生显著的影响。     

Thermal effects on structure and photoluminescence properties of diamond-like carbon films prepared by pulsed laser deposition

With their unique properties such as high hardness ,lowfriction,chemical inertness and optical transparency,Diamond-like carbon(DLC) fil ms are usedina wide ar-ea of industrial applications ,as a protective coating insuch areas as optical windows ,magneti…     

PLD生长Fe_3O_4薄膜的微结构及磁性能研究

以烧结α-Fe2O3为靶材,采用脉冲激光沉积(PLD)方法,在Si(100)基片上制备了Fe3O4薄膜。XRD分析表明,所得薄膜为立方尖晶石结构的Fe3O4,而且具有(311)和(440)择优取向;显微激光喇曼(Raman)光谱分析进一步证实薄膜中只出现单相Fe3O4;AFM分析表明,所得Fe3O4薄膜表面平整;采用VSM分析表明,Fe3O4薄膜的饱和磁化强度Ms约为170kA·m–1,而其矫顽力约为412kA·m–1。     

脉冲激光沉积法制备红外光学SiC薄膜特性研究

采用脉冲激光沉积法在锗基底制备无氢SiC薄膜,研究了激光能量对SiC薄膜显微结构、成分和红外光学性能的影响规律。利用傅里叶红外光谱仪测量了锗基底SiC薄膜样品的红外透射光谱,其在785 cm-1附近有一个强烈Si-C键特征吸收峰,并在红外波数4 000~1 300 cm-1之间具有良好的透过性。通过对透射光谱拟合计算可知:在红外波段2.5~7.7 m之间,SiC薄膜的折射率和消光系数均随着激光能量的增加而增大,折射率大约从2.15上升到2.33,激光能量从400 mJ增加到600 mJ,且当激光能量为400、500 mJ时,消光系数均在10-3量级以内,光学吸收很小。研究表明,SiC薄膜在红外2.5~7.7 m波段是一种优异的光学薄膜材料。     

Effect of AlN buffer layer thickness on the properties of GaN films grown by pulsed laser deposition

The GaN films are grown by pulsed laser deposition (PLD) on sapphire, AlN(30 nm)/Al₂O₃ and AlN(150 nm)/Al₂O₃, respectively. The effect of AlN buffer layer thickness on the properties of GaN films grown by PLD is investigated systematically. The characterizations reveal that as AlN buffer layer thickness increases, the surface root-mean-square (RMS) roughness of GaN film decreases from 11.5 nm to 2.3 nm, while the FWHM value of GaN film rises up from 20.28 arcmin to 84.6 arcmin and then drops to 31.8 arcmin. These results are different from the GaN films deposited by metal organic chemical vapor deposition (MOCVD) with AlN buffer layers, which shows the improvement of crystalline qualities and surface morphologies with the thickening of AlN buffer layer. The mechanism of the effect of AlN buffer layer on the growth of GaN films by PLD is hence proposed.     

磁场辅助激光沉积类金刚石膜初探

提出了磁场辅助激光沉积类金刚石（DLC）膜技术,在硅基底附近添加磁力线向基底收拢的磁场,用以迫使侧向飞行的离子向基底靠拢并参与成膜。由于离子向基底的集中,使其在膜层中含量大幅上升,间接地减少了大颗粒的比例,因此,与无磁场条件下制备的DLC膜相比,引入磁场不仅提高了DLC膜的沉积速率,而且提高了其机械硬度;更重要的是,间接地证明了激光对靶材离化的高效性,为脉冲激光沉积（PLD）结合磁过滤技术提供了可行性的依据。     

Characterization and optical properties of bismuth chalcogenide films prepared by pulsed laser deposition technique

Thin films of Bi-based chalcogenides were prepared by pulsed laser deposition (PLD) technique according to the stoichiometric formula: Bi₂(Se_1−xTe_x)₃. Their optical properties were studied aiming to find the suitable area of application and the optimum composition amongst the samples under study. X-ray diffraction analysis proved the crystallinity of the deposited samples; in addition, surface roughness and films homogeneity were studied by atomic force microscopy (AFM) confirming the suitability of PLD technique to prepare homogenous and smooth films of the concerned alloys. Absorption coefficient calculations showed higher absorption values of 5×10⁵ and 6×10⁵ cm⁻¹ for Te contents of 90% and 100% in the Bi₂(Se_1−xTe_x)₃ system respectively. Optical band gap of the concerned films were calculated and found to be in the range of 0.76–1.11 eV, exhibiting comparable values with the previously reported by other authors. Optical studies conformed direct and allowed transitions in all films. Refractive index (n) and dielectric constants (Ɛ_r) and (Ɛ_i) were calculated and studied as a function of the wavelength. Values and behavior of (n), (Ɛ_r) and (Ɛ_i) indicated strong dependence on the composition and the wavelength range.     

飞秒激光沉积红外窗口类金刚石增透保护膜

脉冲激光沉积法是一种制备类金刚石膜(DLC膜)的新技术.总结了脉冲激光法制备DLC膜在激光源、脉宽、沉积气氛及薄膜掺杂等方面的发展趋势.建立了飞秒脉冲激光沉积DLC膜系统,在不同的沉积条件下(如:真空、氧气氛、掺硅等)开展了实验研究,阐明了不同沉积条件对DLC膜性能的影响规律.在硅、锗红外窗口上镀制了工程实用的DLC增...     

Pulsed laser deposition of titanium nitride and diamond-like carbon films on polymers

We have investigated the deposition of titanium nitride (TiN) and diamond-like carbon (DLC ) films on polymethylmethacrylate (PMMA) substrates using pulsed laser deposition (PLD) technique. The TiN and diamond-like films were deposited by laser ablation (KrF excimer laser λ = 248 nm, pulse duration τ～25 × 10^?9 s, energy density ～2?15J/cm²) of TiN and graphite targets, respectively, at room temperature. These films were characterized by transmission electron microscopy, scanning electron microscopy, x-ray diffraction, Auger electron spectroscopy, UV-visible absorption spectroscopy, and Raman spectroscopy. The TiN films were smooth and found to be polycrystalline with average grain size of 120Å. The diamond-like carbon films were amorphous with a characteristic Raman peak at 1550 cm^?1. The TiN films are highly adherent to the polymer substrates as compare to DLC films. The adhesion strength of DLC films on polymers was increased by interposing thin TiN layer (200Å) on polymers byin-situ pulsed laser deposition. The DLC films were found to be amorphous with good adhesion to TiN/PMMA substrates.     

氧分压对PLD法生长Si(111)基ZnO薄膜性能的影响

在不同氧分压下用脉冲激光沉积(PLD)法在n型硅(111)衬底上生长ZnO薄膜。通过对其进行XRD、傅里叶红外吸收(FTIR)和光致发光谱(PL)的测量,研究了氧分压对PLD法制备的ZnO薄膜的结晶质量和发光性质的影响。XRD显示,氧分压为6.50Pa时可以得到结晶质量最佳的ZnO薄膜。PL谱显示,当氧分压由0.13Pa上升至6.50Pa时,位于380nm附近的主发光峰的强度最大。当氧分压进一步上升至13.00Pa时,主发光峰减弱,与氧空位有关的发光峰消失,显示出ZnO薄膜的PL谱和氧分压的大小密切相关。     

激光能量对脉冲激光沉积法制备ZnO薄膜性能的影响

脉冲激光沉积技术(PLD)易于获得高质量的氧化物薄膜已成为一种重要的制备ZnO薄膜的技术.采用脉冲激光沉积(PLD)(KrF准分子激光器:波长248 nm,频率5 Hz,脉冲宽度20 ns)方法在氧气气氛中以高纯Zn(99.999%)为靶材、在单晶硅和石英衬底表而成功生长了ZnO薄膜.通过X射线衍射仪、表面轮廓仪、荧光光谱仪、紫外可见分光光度计对合成薄膜材料的晶体结构、厚度、光学性质等进行了研究,分析了激光能量变化对其性能的影响.实验结果表明我们使用PLD法可以制备出(002)结晶取向和透过率高于75%的ZnO薄膜,激光能量为450 mJ的ZnO薄膜的发射性能较好,但激光能量的增加不能改善薄膜的透光率.     

溅射和激光淀积的ZnO多晶薄膜的结构和发光性质

我们分别通过直流反应溅射及脉冲激光淀积法制备了ZnO多晶薄膜。X射线衍射结果显示出薄膜的c轴取向。原子力显微镜证实薄膜的多晶结构。两种方法制备的ZnO在光子激发下都发射较强的带边荧光。绿色荧光未被观察到。激光淀积在(001)硅表面的ZnO的发光源自“自由激子”辐射。激光淀积在(0001)氧化铝晶体表面的ZnO的发光机制则在相当宽的激发强度范围内都呈现出电子．空穴等离子体(electron-hole plasma)的复合特性。     

Room-temperature ferromagnetic ordering in Mn-doped ZnO thin films grown by pulsed laser deposition

The ferromagnetic ordering in Mn-doped ZnO thin films grown by pulsed laser deposition (PLD) as a function of oxygen pressure and substrate temperature has been investigated. Room-temperature ferromagnetic behaviors in the Mn-doped ZnO films grown at 700°C and 800°C under 10⁻¹ torr in oxygen pressure were found, whereas ferromagnetic ordering in the films grown under 10⁻³ torr disappeared at 300 K. The large positive magnetoresistance (MR), ∼10%, was observed at 5 K at low fields and small negative MR was observed at high fields, irrespective of oxygen pressure. In particular, anomalous Hall effect (AHE) in the Mn-doped ZnO film grown at 700°C under 10⁻¹ Torr has been observed up to 210 K. In this work, the observed AHE is believed to be further direct evidence demonstrating that the Mn-doped ZnO thin films are ferromagnetic.     

电化学沉积DLC薄膜的AFM研究

类金刚石碳膜 (ｄｉａｍｏｎｄｌｉｋｅｃａｒｂｏｎｆｉｌｍｓ ,简称ＤＬＣｆｉｌｍｓ)是一类硬度、光学、电学、化学和摩擦学等特性都类似于金刚石的非晶碳膜。例如 ,它具有高硬度 ,抗磨损 ,化学惰性 ,介电常数低 ,宽光学带隙 ,良好的生物相容性等特点。它可以应用于机械、电子、化学、军事、航空航天等领域 ,具有广泛的应用前景。目前制备类金刚石碳膜一般用气相沉积方法(化学气相沉积法和物理气相沉积法 ) ,但是气相合成实验装置的复杂性和基底的高温都导致了这些方法具有一定的局限性。近年来 ,研究人员开始了在液态低温下电化学沉积制…     

The properties of annealed AlN films deposited by pulsed laser deposition

AlN films deposited on SiC or sapphire substrates by pulsed laser deposition were annealed at 1200°C, 1400°C, and 1600°C for 30 min in an inert atmosphere to examine how their structure, surface morphology, and substrate-film interface are altered during high temperature thermal processing. Shifts in the x-ray rocking curve peaks suggest that annealing increases the film density or relaxes the films and reduces the c-axis Poisson compression. Scanning electron micrographs show that the AlN begins to noticeably evaporate at 1600°C, and the evaporation rate is higher for the films grown on sapphire because the as-deposited film contained more pinholes. Rutherford backscattering spectroscopy shows that the interface between the film and substrate improves with annealing temperature for SiC substrates, but the interface quality for the 1600°C anneal is poorer than it is for the 1400°C anneal when the substrate is sapphire. Transmission electron micrographs show that the as-deposited films on SiC contain many stacking faults, while those annealed at 1600°C have a columnar structure with slightly misoriented grains. The as-deposited films on sapphire have an incoherent interface, and voids are formed at the interface when the samples are annealed at 1600°C. Auger electron spectroscopy shows that virtually no intermixing occurs across the interface, and that the annealed films contain less oxygen than the as-grown films.     

Properties of cobalt-doped zinc oxide thin films grown by pulsed laser deposition on glass substrates

Undoped and cobalt-doped zinc oxide (CZO) polycrystalline piezoelectric thin films (Co: 3, 5 at.%) using a series of high quality ceramic targets have been deposited at 450 °C onto glass substrates using a pulsed laser deposition method. The used source was a KrF excimer laser (248 nm, 25 ns, 2 J∕cm²). X-ray diffraction patterns showed that the Co-doped ZnO films crystallize in a hexagonal wurtzite type structure with a strong (0 orientation, and the grain sizes calculated from these patterns decrease from 37 to 31 nm by increasing Co doping. The optical waveguiding properties of the films were characterized by using a prism-coupling method. The distinct M-lines of the guided transverse magnetic (TM) and transverse electric (TE) modes of the ZnO films waveguide have been observed. With the aim of study the optical properties of the ZnO films, an accurate refractive index and thickness measurement apparatus was set up, which is called M-lines device. An evaluation of experimental uncertainty and calculation of the precision of the refractive index and thickness were developed on ZnO films. The optical transmittance spectra showed a good transparency in the visible region. Calculated optical band gap varying from 3.23 to 3.37 eV when the content of Co doping increases from 0 to 5 at.%.     

沉积气压对类金刚石薄膜结构和性能的影响

以纯甲烷为反应气体,采用等离子增强化学气相沉积技术通过改变沉积气压在316L不锈钢表面制备了一系列的类金刚石薄膜。薄膜结构、机械性能和摩擦学性能分别通过拉曼光谱仪（Raman）、纳米压痕仪（Nano-indententor Ⅱ）和往复球盘摩擦磨损试验仪获得。研究结果表明,随着沉积气压从7 Pa增加到15 Pa,薄膜的sp3含量和机械性能明显增加,而摩擦学性能显著降低。随着沉积气压从15 Pa增加到31 Pa,薄膜的sp3含量和机械性能明显降低,而摩擦学性能却显著增加。