柱弧离子镀和非平衡磁控溅射镀制备Ti-N-C黑色硬质膜

采用柱弧离子镀和中频孪生靶非平衡磁控溅射镀膜技术制备了Ti-N-C多层复合黑色硬质膜.采用轮廊仪扫描电子显微镜(SEM)、分光光度计、显微硬度计等手段研究了所得膜层的各项性能.结果表明,两种工艺都可以获得颜色较深的黑色硬质膜,柱弧离子镀制备黑色硬质膜的效率高、力学性能更好;中频孪生靶非平衡磁控溅射制备的黑色硬质膜表面光滑、颜色更深.     

影响同轴磁控溅射镀膜性能的几个问题

7近几年来，镀膜玻璃在建筑行业以及装饰行业已经得到了广泛的应用。而磁控溅射镀膜因其具有高速、低温、低损伤等优点，已经成为真空镀膜技术的主要方式。适用于建筑玻璃镀膜的磁控溅射靶，就其形式有两种：平面靶和同轴圆柱形靶。本文就影响同轴圆柱型磁控溅射靶的溅射性能方面做以下探讨。1磁控溅射原理图1说明如下：电子在电场作用下，加速飞向基片的过程中与氢原子发生碰撞，电离出Ar“并产生电子。电子飞向基片，Ar“在电场作用下加速飞向阴极（溅射靶）并以高能量轰击靶面，使靶材发生溅射。在溅射粒子中，中性的靶原子（或分子）沉…     

第二十一讲真空卷绕镀膜

(接2021年第6期88页) 3.4 中频磁控卷绕镀膜 中频磁控卷绕镀膜是利用中频磁控溅射技术来实现卷绕镀膜的方法.中频交流磁控溅射通常采用两个尺寸大小和外形相同的靶并排布置或相对摆放,称为孪生靶.将双极脉冲中频电源的二个输出端连接到二个靶上,如图18所示.     

非平衡磁控溅射及其应用

磁控溅射镀膜技术由于其显著的特点已经得到广泛的应用。但是常规磁控溅射靶表面横向磁场紧紧地束缚带电粒子，使得在镀膜区域的离子密度很低，一定程度上削弱了等离子体镀膜的优势。通过有意识地增强或削弱其中一个磁极的磁通量，使得磁控溅射靶的磁场不平衡，可以大大提高镀膜区域的等离子体密度，从而改善镀膜质量。此外还讨论该项技术目前的发展状况。     

一种双真空室结构磁控溅射台的研制

本文研制了一种较高档的磁控溅射镀膜设备,用于微电子器件规模化生产过程中的基片表面镀膜.该设备采用双真空室结构,使溅射室始终维持较高的真空度和洁净度,提高镀膜质量和镀膜效率.环绕溅射室设计了3个直流靶和1个射频靶,能够溅射金属膜、介质膜、混合物和化合物薄膜.文中详述了该设备的设计原理、总体结构及工艺控制方法.该磁控溅射台已开发成功并投入使用,替代了同类进口设备.     

磁控溅射镀膜技术的发展

磁控溅射由于其显著的优点应用日趋广泛,成为工业镀膜生产中最主要的技术之一,相应的溅射技术与也取得了进一步的发展.非平衡磁控溅射改善了沉积室内等离子体的分布,提高了膜层质量;中频和脉冲磁控溅射可有效避免反应溅射时的迟滞现象,消除靶中毒和打弧问题,提高制备化合物薄膜的稳定性和沉积速率;改进的磁控溅射靶的设计可获得较高的靶材利用率;高速溅射和自溅射为溅射镀膜技术开辟了新的应用领域.     

溅射靶材的应用及发展前景

<正>溅射靶材是指通过磁控溅射、多弧离子镀或其他类型的镀膜设备在适当工艺条件下溅射沉积在基板上形成各种功能薄膜的溅射源。溅射靶材广泛应用于装饰、工模具、玻璃、电子器件、半导体、磁记录、平面显示、太阳能电池等众多领域,不同领域需要的靶     

非超高本底真空条件下沉积低氧含量ZrB_2薄膜

磁控溅射制备易氧化质薄膜一般需要超高本底真空条件,而超高真空条件在大面积、大批量镀膜工程中存在成本过高或较难实现的问题。通过在磁控溅射镀膜室内部附加1套辅助Ti靶,利用从Ti靶溅射出的Ti原子对氧的亲合作用,消耗镀膜腔内残余气氛特别是氧的含量,以期能够达到近似超高本底真空条件下的镀膜效果。以磁控溅射制备ZrB2薄膜为研究对象,对比研究了辅助Ti靶开启与否对制成ZrB2薄膜成分与微观组织及性能的影响,发现在相同的工艺条件下,辅助Ti靶开启可使ZrB2薄膜中的O含量由辅助Ti靶不开启的24.77 at.%降低为2.94 at.%;组织结构与性能对比分析结果表明,Ti靶不开启制成的高O含量ZrB2薄膜呈非晶结构,电阻率为682μΩ·cm,而Ti靶开启制成的低O含量ZrB2薄膜为多晶结构,电阻率降低至348μΩ·cm。     

非平衡磁控溅射及其应用

磁控溅射镀膜技术由于其显著的特点已经得到广泛的应用。但是常规磁控溅射靶表面横向磁场紧紧地束缚带电粒子，使得一镀膜区域的离子密度很低，一定程度上削弱了等离子体膜的优势。通过有意识地增强或削弱其中一个磁极的磁通量。使得磁控溅射靶的磁场不平衡，可以大大提高镀区域的等离子体密度，从而改善镀膜质量，此外还讨论该技术目前的发展状况。     

柱形靶电弧离子镀系统的研究

柱形靶电弧离子镀系统是在吸收了平面靶电弧离子镀系统高电离率、高沉积速率等优点的基础上,又综合了柱型磁控溅射系统装炉量大、设备结构简单等优点而研制出的一种新型镀膜技术。柱形阴极靶置于真空室的中央,弧斑在绕柱靶表面高速旋转的同时,可人为地控制弧斑沿柱靶表面往复运动。因而靶面刻蚀均匀,镀膜均匀区宽。通过控制弧斑的移动速率,可细化膜层组织,减少熔滴。被镀工件置于阴阳极之间,只作自转,无需公转。不仅简化了工件架的结构,而且对不同尺寸的工件可以混装。在制备氮化钛超硬薄膜时,沉积速率可达4～8μm/h。     

Evaluation of recent advances in continuous film coating processes

Background: Continuous film coating processes are recognized for their high production rates but have had slow acceptance for pharmaceutical production because of perceived high product losses during start-up and shut-down. In this article, the recent improvements in continuous coater designs were evaluated with respect to coating uniformity and reduction in product losses. Two separate studies represent trials conducted in newly redesigned continuous coating pans from two different coating pan manufacturers. Method: Multivitamin tablets were coated with Opadry® II, high performance film coating system, in both batch and continuous modes in the continuous coater. Tablet samples collected throughout all phases of the process were tested for color development and uniformity. Soft gelatin capsules were coated with a delayed release coating formulation, Nutrateric®, nutritional enteric coating system. Samples of the soft gelatin capsules were taken throughout the process and tested for resistance to simulated gastric fluid as a measure of coating uniformity and delayed release functionality performance. Conclusions: The results from both the immediate release and delayed release case studies support the assertion that continuous coating processes are capable of applying aqueous film coatings with significant improvements in coating uniformity and reduction in product loss.     

嵌入式高温共固化复合材料阻尼结构层间结合性能

使用正交实验法, 研制出满足嵌入式高温共固化复合材料阻尼结构制作工艺要求的黏弹性材料组分, 提出使用刷涂工艺代替压片工艺制备黏弹性材料薄膜, 并对两种工艺制备的碳纤维/双马来酰亚胺(T300/QY8911)复合材料试件进行层间剪切测试, 获得了薄膜厚度与层间最大剪切应力的变化关系, 实验数据表明: 刷涂工艺能提高嵌入式高温共固化复合材料阻尼结构层间结合性能10%以上, 而且阻尼层越薄, 提高幅度越大; 失效表面证明: 刷涂工艺所制得试件能在阻尼薄膜与复合材料界面间形成互穿网络结构。     

A novel corrosion self-protective copper/liquid microcapsule composite coating

Traditional methods to protect copper coating still exists with some shortages such as environmental pollution and high cost caused by multi-step processes. In this letter, Cu/liquid microcapsule composite coating was prepared by electroplating method. The corrosion resistance of the composite was investigated by means of electrochemical technique. The result of the XPS analysis proved that a thin hydrophobic film could form on the composite surface because of the slow release of microcapsules. This film improved greatly the corrosion resistance of composite coating. Especially, the corrosion inhibition efficiency reached up to 97.6% compared with that of the copper coating when the composite was stored in air for 30 days (d) at 25 °C.     

The Design and Performance of an Instrumentation System for Aqueous Film Coating in an Industrial Tablet Coating Machine

In recent years tablet coating has undergone several fundamental changes. The original sugar coating technique has been largely replaced by film coating processes using organic solvents. The organic solvents are now being replaced by water because of the development of suitable polymers, improvements in the coating process, and impending government legislation regulating the discharge of pollutants into the environment.

This change has resulted in increased interest in equipment designed for film coating based on cylindrical shaped side vented pans which allow the drying air to be drawn through the tablet bed. However, the process is complex and requires careful monitoring and control to ensure satisfactory results. The empirically derived conditions are not fundamentally understood and there are important differences in the operation     

Hochselektive Absorberschichten für thermische Sonnenkollektoren

High‐selective absorber coatings for solar thermal collectors Highly selective absorber coatings are necessary for the effective operation of state‐of‐the‐art solar thermal collectors. The thin film gradient optical coating with its spectrally selective characteristics achieves high solar absorptance combined with low thermal emittance. Such complex multi‐layer systems are produced in modular vacuum coating processes. Industrial air‐to‐air coating lines allow the continuous coating of metal bands in a pass‐through process and provide absorber coatings which meet highest demands for efficiency, durability and esthetics.     

Plasmamessungen und Schichteigenschaften

Plasma Analysis and Thin Film Properties of Sputter‐ and Ionplating PVD‐Processes For a large number of thin film applications just few thin film coating processes are used in industrial scale production. For example, Magnetron Sputtering (MS), Ionplating (IP), Arc Source Ablation (AS) and technical variations of them. Recent developments allow beside traditional dc modes also the use of pulsed dc modes, as for instance in magnetron sputtering and arc source deposition. In this work the Reactive Low Voltage Ionplating (RLVIP) with pulsed substrate bias (Ionplating Plasma Assisted IPPA), DC and DC‐pulse Magnetron Sputtering and Arc source deposition in DC‐ and DC‐pulse mode is of interest concerning their plasma. Pulsing the substrate‐bias of the RLVIP (IPPA) influences film stress and optical absorption but is not easy to handle in industrial production. Pulsing the sputter processes leads to massive changes in the coating plasma and the coatings itself. And finally pulsing the arc‐current of the Arc Source Ablation processes implements advantages for lower cathode temperatures, for use of less conducting cathode materials, less droplet formation and improved chemical reactivity with oxygen.     

Flächeneinfluss bei der PACVD‐Beschichtung

Impact of the active surface on properties of DLC films in the PACVD coating chamber. In the automotive industry, economic and stable industrial processes to apply hard coatings for tribological applications are required. Hence detailed knowledge about the influence of coating parameters on the film characteristics is essential. the following paper deals with the process of plasma activated chemical vapor deposition with focus on the effect of the parameter “active area in the coating chamber“ on the properties of diamond‐like‐carbons (DLC). the coatings are deposited in an industrial coating chamber using reactive magnetron sputtering with a pulsed bias voltage (40 kHz) and at constant pressure. During the investigation of the influence of active area and current density on the mechanical and tribological properties of the DLC films, the expected correlation between active area and current density could be confirmed. By regulating the current density, consistent film properties could be achieved, independently of the active area in the chamber. Furthermore improved wear characteristics of the film – crucial for the endurance of heavily loaded automotive components – were achieved by adapting the load pattern of the chamber.     

金属表面Sol-gel法制备耐腐蚀陶瓷涂层的研究进展

综述了溶胶－凝胶涂层的成膜原理，制备工艺，比较了溶胶－凝胶法与其它金属陶瓷涂层的制备工艺，讨论了溶胶－凝胶涂层对金属耐磨腐蚀性能，耐磨性能的改进及在腐蚀防护领域中的应用，还对溶胶－凝胶涂层技术的发展的提出了看法。     

Techniques to assess film coatings and evaluate film-coated products

Background: Polymeric film coatings have been applied to pharmaceutical solids for decorative, protective, or functional purposes. The application process is quite complex, with variables related to the coating formulation, substrate properties, processing parameters, and interactions thereof, all of which can affect product performance. Objective: This article describes a number of experimental techniques used to determine the physical, mechanical, adhesive, thermal, and permeability properties of free and applied films. These analytical tools can be used to optimize product performance, advance our knowledge of the film formation process, and investigate interactions between the coating and the solid surface. Conclusion: Through a better understanding of film-coating processes, the cause of problems that arise during manufacturing, defects observed in the coating, and changes in performance upon subsequent storage may be more quickly and accurately resolved.     

New target materials for innovative applications on glass

In the new emerging markets of flat panel display, photovoltaic and optical coating applications, the introduction of cylindrical rotating magnetron technology can accommodate the needs for faster, better and cheaper coating processes. Recent developments of hardware (compact end blocks, etc.) and target materials for rotatable magnetron technology offer a total solution to the innovative thin film applications.