Comparison of the dye-sensitized solar cells performances based on transparent conductive ITO and FTO

We investigated dye-sensitized solar cell (DSSC) performances with regard to transparent conducting oxide substrates: indium-doped tin oxide (ITO) and fluorine-doped tin oxide (FTO). The DSSCs were in a standard configuration: a photoelectrode of TiO₂ nanoparticles (9 nm size, anatase phase) deposited on transparent and electrically conductive substrates, counter electrodes of Pt-coated glass, ruthenium 535 dye, and AN50 iodolyte electrolyte (Solaronix). The cells manufactured from ITO (FTO) had an open circuit voltage of 705 (763) mV and short-circuit current of 7.87 (34.3) mA/cm². A direct correlation was found between transparent conductive film resistivity and cell efficiency. Resistivities of 52 Ω/sq for ITO substrates and 8.5 Ω/sq for FTO led to major differences in internal global efficiency: from 2.24% for ITO to 9.6% for FTO.     

Fabrication of high-performance fluorine doped-tin oxide film using flame-assisted spray deposition

A high-performance fluorine-doped tin oxide (FTO) film was fabricated by flame-assisted spray deposition method. By varying the NH₄F doping concentration, the optimal concentration was established as 8 at.%. X-ray diffractograms confirmed that the as-grown FTO film was tetragonal SnO₂. In addition, the FTO film was comprised of nano-sized grains ranging from 40 to 50 nm. The heat-treated FTO film exhibited a sheet resistance of 21.8 Ω/? with an average transmittance of 81.9% in the visible region (λ = 400-800 nm). The figures of merit shows that the prepared FTO film can be used for highly efficient dye-sensitized solar cells electrodes.     

Development and characterization of fluorine tin oxide electrodes modified with high area porous thin films containing gold nanoparticles

Different electrode materials are prepared using fluoride doped tin oxide (FTO) electrodes modified with high area porous thin films of metal oxides containing gold nanoparticles. Three different metal oxides (TiO₂, MgO and SnO₂) have been assayed to this end. The effect of the metal oxide nature and gold loading on the structure and performance of the modified electrodes was examined by Scanning Electron Microscopy, Transmission Electron Microscopy, X-Ray Diffraction (XRD), Diffuse Reflectance Spectroscopy and electrochemical techniques. XRD measurements reveal that MgO electrodes present the smallest gold nanoparticles after the sintering step however, the electrochemical response of these electrodes shows important problems of mass transport derived from the high porosity of these materials (Brunauer Emmett Teller area of 125 m²/g). The excellent sintering properties of titania nanoparticles result in robust films attached to the FTO electrodes which allow more reliable and reproducible results from an electroanalytical point of view.     

Preparation of fluorine-doped tin oxide (SnO2:F) film on polyethylene terephthalate (PET) substrate

Fluorine-doped tin oxide (FTO), one of the most popular transparent conductive oxide (TCO) materials, coated on glass has been used in various applications including many new-generation solar cells. However, there is a lack of reporting when it comes to FTO coated on flexible transparent substrate. For this paper, spray pyrolysis technique was used to have FTO firstly coated on to a brass substrate, which was then dissolved away after cementing an upper flexible transparent polyethylene terephthalate (PET) substrate, finally leaving high quality FTO film on PET substrate. Their structural, electrical, optical and flexible properties were investigated. The lowest resistivity was 7.6 × 10^− 4 Ω cm, which is as good as conventional FTO deposited on glass. Their fold ability could be significantly improved to transcend commercial ITO/PET only by increasing the pretreating time of the brass substrate.     

Organic photovoltaic cells fabricated on a SnOx/Ag/SnOx multilayer transparent conducting electrode

Transparent conducting multilayer structured electrode of a few nm Ag layer embedded in tin oxide thin film SnO_x/Ag/SnO_x was fabricated on a glass by RF magnetron sputtering at room temperature. The multilayer of the SnO_x(40 nm)/Ag(11 nm)/SnO_x(40 nm) electrode shows the maximum optical transmittance of 87.3% at 550 nm and a quite low electrical resistivity of 6.5 × 10^− 5 Ω cm, and the corresponding figure of merit (T¹⁰/R_S) is equivalent to 3.6 × 10^− 2 Ω^− 1. A normal organic photovoltaic (OPV) structure of poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate)/polythiophene:phenyl-C60-butyric acid methyl ester/Al was fabricated on glass/SnO_x/Ag/SnO_x to examine the compatibility of OPV as a transparent conducting electrode. Measured characteristic values of open circuit voltage of 0.62 V, saturation current of 8.11 mA/cm² and fill factor of 0.54 are analogous to 0.63 V, 8.37 mA/cm² and 0.58 of OPV on commercial glass/indium tin oxide (ITO) respectively. A resultant power conversion efficiency of 2.7% is also very comparable with the 3.09% of the same OPV structure on the commercial ITO glass as a reference, and which reveals that SnO_x/Ag/SnO_x can be appropriate to OPV solar cells as a sound transparent conducting electrode.     

Effect of TiCl4 treatment on the photoelectrochemical properties of LaTiO2N electrodes for water splitting under visible light

A lanthanum titanium oxynitride (LaTiO₂N) electrode was studied as a visible-light driven photoelectrode for water splitting. The electrode was prepared by casting a LaTiO₂N powder on a fluorine-doped tin oxide glass substrate, followed by calcination under dinitrogen. The as-prepared electrode exhibited an anodic photocurrent based on water oxidation under visible-light irradiation (λ > 420 nm) in an electrolyte (Na₂SO₄) solution. This current was increased by post-treatment with titanium(IV) chloride (TiCl₄) solution. Scanning electron microscopy and X-ray photoelectron spectroscopy revealed that the titanium species introduced by the post-treatment were titanium oxide, and that they were embedded within LaTiO₂N particles. Resistance measurements of LaTiO₂N electrodes suggested that the increase in the electrode photocurrent after TiCl₄ treatment was due to the improvement of inter-particle electron transfer in the LaTiO₂N thin film.     

Performance improvement of dye-sensitized solar cells by surface patterning of fluorine-doped tin oxide transparent electrodes

The surface modification of fluorine-doped tin oxide (FTO) transparent electrodes was carried out by lithography and inductively coupled plasma etching to improve the conversion efficiency of dye-sensitized solar cells (DSSCs). The concentration of Cl₂ gas and dc-bias voltage to the substrate were varied as the main etch parameters. The transmittance and sheet resistance of the FTO electrodes were compared before and after etching. The DSSCs fabricated on the patterned FTO electrodes showed higher conversion efficiency than those fabricated on the ordinary FTO electrodes without patterns. Scanning electron microscopy showed that more TiO₂ particles could be involved in the DSSCs with patterned FTO electrodes, and that the contact between the TiO₂ layer and electrode were improved by patterning the FTO electrode. The current-voltage curves and incident photon to current efficiency spectra showed that a significantly higher photocurrent was produced in the DSSCs fabricated on the patterned FTO.     

Preparation and characterization of spray deposited n-type WO3 thin films for electrochromic devices

The n-type tungsten oxide (WO₃) polycrystalline thin films have been prepared at an optimized substrate temperature of 250 °C by spray pyrolysis technique. Precursor solution of ammonium tungstate ((NH₄)₂WO₄) was sprayed onto the well cleaned, pre-heated fluorine doped tin oxide coated (FTO) and glass substrates with a spray rate of 15 ml/min. The structural, surface morphological and optical properties of the as-deposited WO₃ thin films were studied. Mott-Schottky (M-S) studies of WO₃/FTO electrodes were conducted in Na₂SO₄ solution to identify their nature and extract semiconductor parameters. The electrochromic properties of the as-deposited and lithiated WO₃/FTO thin films were analyzed by employing them as working electrodes in three electrode electrochemical cell using an electrolyte containing LiClO₄ in propylene carbonate (PC) solution.     

Characteristics of sputtered Al-doped ZnO films for transparent electrodes of organic thin-film transistor

Aluminum-doped ZnO (AZO) thin-films were deposited with various RF powers at room temperature by radio frequency (RF) magnetron sputtering method. The electrical properties of the AZO film were improved with the increasing RF power. These results can be explained by the improvement of the crystallinity in the AZO film. We fabricated the organic thin-film transistor (OTFT) of the bottom gate structure using pentacene active and poly-4-vinyl phenol gate dielectric layers on the indium tin oxide gate electrode, and estimated the device properties of the OTFTs including drain current-drain voltage (I_D-V_D), drain current-gate voltage (I_D-V_G), threshold voltage (V_T), on/off ratio and field effect mobility. The AZO film that grown at 160 W RF power exhibited low resistivity (1.54 × 10^− 3 Ω·cm), high crystallinity and uniform surface morphology. The pentacene thin-film transistor using the AZO film that's fabricated at 160 W RF power exhibited good device performance such as the mobility of 0.94 cm²/V s and the on/off ratio of ~ 10⁵. Consequently, the performance of the OTFT such as larger field-effect carrier mobility was determined the conductivity of the AZO source/drain (S/D) electrode. AZO films prepared at room temperature by the sputtering method are suitable for the S/D electrodes in the OTFTs.     

New transparent conductive films: FTO coated ITO

New transparent conductive films, fluorine doped tin oxide (FTO) films coated on indium-tin-oxide (ITO) films, were developed. These transparent conductive films were prepared by the spray pyrolysis deposition method at a substrate temperature of 350 °C in ITO and 400 °C in FTO. For ITO deposition, an ethanol solution of indium(III) chloride, InCl₃·4H₂O, and tin(II) chloride, SnCl₂·2H₂O [Sn/(In+Sn), 5 at.%] was sprayed on a Corning #7059 glass substrate (100×100×1.1 mm³). After the deposition, FTO films were consecutively deposited for protecting oxidation of ITO films. FTO deposition was carried out by an ethanol solution of tin(IV) chloride, SnCl₄·5H₂O within the saturated water solution of NH₄F. These new transparent conductive films achieved the lowest resistivity of 1.4×10⁻⁴ Ω cm and the optical transmittance of more than 80% in the visible range of the spectrum. The electrical resistance of these new transparent conductive films increased by less than 10% even when exposed to high temperatures of 300-600 °C for 1 h in the air.     

Titanium dioxide thin films prepared by electrolysis from aqueous solution of titanium-lactic acid complex for dye-sensitized solar cells

Titanium oxide (TiO_x) thin films were prepared on transparent conducting substrate (fluorine-doped tin oxide) by cathodic electrolysis of a solution containing a titanium bis(ammonium lactato)dihydroxide and an ammonium nitrate at 323 K. Post-deposition treatment: calcination at 723 K or hot-water treatment at > 363 K promoted the growth of an anatase type crystalline phase in the TiO₂ thin film, as evidenced by X-ray diffraction and X-ray photoelectron spectroscopy. The calcined films were used as electrodes of a dye-sensitized solar cells and the cells' energy conversion efficiency was comparable to that obtained with commercially available TiO₂ nanoparticle electrodes.     

Effects of laser-induced recovery process on conductive property of SnO2:F thin films

In this study, we developed a laser annealing process to enhance the electrical properties of SnO₂:F (FTO) films. It is already known that in contrast to indium oxides or zinc oxides, the carrier mobility of FTO films is relatively lower. Thus, improving the mobility is a direct way to enhance the conductivity of FTO films. Furthermore, improving the crystal quality of the thin films is in turn a direct way to enhance the mobility effectively. Contrary to the high working temperatures of traditional annealing processes, the laser annealing process, with its focusing character, enables us to modify the crystal quality of oxide films on substrates with low-melting points. Using a self-built laser system, which consists of a Nd:YAG solid-state laser with a wavelength of 1064 nm and a beam shaper lens, we carried out a series of experiments to achieve the optimal laser annealing process. Hall, SEM, and XRD measurements were used to characterize the opto-electrical as well as the structural properties. As experimental results show, the tin oxide crystallites recovered well during the laser annealing process. By using a suitable beam profile and a proper laser intensity, the film resistivity was reduced from 7.19 ± 0.55 × 10⁻³ Ω cm to 6.70 ± 0.20 × 10⁻³ Ω cm while the carrier mobility was enhanced from 11.18 ± 0.29 cm²/V s to 11.71 ± 0.34 cm²/V s.     

Low temperature processing of hybrid nanoparticulate Indium Tin Oxide (ITO) polymer layers and application in large scale lighting devices

We report on transparent conductive indium tin oxide (In₂O₃:Sn; ITO) nanoparticle films processed at a low temperature of 130 °C for the application in lighting devices using spin coating and doctor blading techniques. Major emphasis is put on the beneficial application of the particular transparent electrode material for the fabrication of patterned large area electroluminescence lamps. In order to improve film properties like adhesion and conductivity, hybrid nanoparticle-polymer blends out of ITO particles and organic film-forming agent polyvinylpyrrolidone (PVP) and the organofunctional coupling agent 3-methacryloxypropyltrimethoxysilane (MPTS) have been developed. The layers were cured by UV-irradiation, which was also used for lateral structuring of the transparent, conductive electrode. Additional low-temperature heat treatment (T = 130 °C) in air and forming gas improved the electronic properties. While pure ITO nanoparticulate layers processed at 130 °C exhibited conductance of up to 3.1 Ω^− 1 cm^− 1, the nanocomposite coatings showed a conductance of up to 9.8 Ω^− 1 cm^− 1. Corresponding layers with a sheet resistance of 750 Ω/□ were applied in electroluminescent lamps.     

Effects of cetyltrimethylammonium bromide on redox deposition and rectification properties of silicon oxide thin film

Silicon oxide (SiO_x) thin film was deposited onto fluorine-doped tin oxide (FTO) and silicon wafer substrate by the reduction of an aqueous solution containing ammonium hexafluorosilicate, dimethylamine borane and cetyltrimethylammonium bromide (CTAB). Characterization of the films by X-ray photoelectron spectroscopic depth profile and infrared spectroscopy proved that the addition of CTAB into the film enhanced the aggregation of silica particles and the growth rate. The SiO_x films (resistivity: 3.2 × 10⁸ Ω cm) remarkably improved the rectification properties of FTO/SiO_x/poly(3,4-ethylenedioxythiophene) derivative diodes. A rectification mechanism based on conduction of electron and ions was investigated.     

Deterioration and recovery in the resistivity of Al-doped ZnO films prepared by the plasma sputtering

A hot-cathode plasma sputtering technique was used for fabricating the highly transparent and conducting aluminum-doped zinc oxide (AZO) films on glass substrates from a disk-shaped AZO (Al₂O₃: 2 wt.%) target. Under particular conditions where the target voltage was V_T = −200 V and the plasma excitation pressure was P_S = 1.5 × 10⁻³ Torr, the lowest resistivity of 4.2 × 10⁻⁴ Ω cm was obtained at 400 nm, and this was associated with a carrier density of 8.7 × 10²⁰ cm⁻³ and a Hall mobility of 17 cm²/V s. From the annealing experiment of the AZO films in the oxygen and nitrogen gases of the atmospheric pressure it was revealed that both the oxygen vacancies and the grain boundaries in the polycrystalline AZO film played an important role in the electrical properties of the film.     

Organic solar cells with p-type amorphous chromium oxide thin film as hole-transporting layer

Efficient organic solar cells based on the blends of poly (3-hexylthiophene) (P3HT):fullerene derivative [6,6]-phenyl-C₆₁ butyric acid methyl ester (PCBM) composites have been fabricated by using the sputtered amorphous chromium oxide (ACO) film on fluorine-doped tin oxide (FTO) coated glass substrates as a hole-transporting layer (HTL). Through ACO layer sputtering temperature, film thickness and oxygen flow ratio optimization, the highest power conversion efficiency of 3.28% of FTO/ACO/P3HT:PCBM/Al solar cells on glass has been achieved under AM1.5G 100 mW/cm² illumination. It is found that the device with 10 nm thick ACO sputtered at 473 K and oxygen flow ratio f(O₂) (O₂/O₂ + Ar) = 40% shows the best photovoltaic properties. The photovoltaic properties in these devices are discussed in terms of the band diagrams and series resistance of the devices, and characteristics of ACO HTL. It is concluded that ACO is a suitable alternative to poly (3,4-ethylenedioxythiophene):poly (styrenesulfonate) as a HTL.     

Comparative study of ITO and FTO thin films grown by spray pyrolysis

Tin doped indium oxide (ITO) and fluorine doped tin oxide (FTO) thin films have been prepared by one step spray pyrolysis. Both film types grown at 400 °C present a single phase, ITO has cubic structure and preferred orientation (4 0 0) while FTO exhibits a tetragonal structure. Scanning electron micrographs showed homogeneous surfaces with average grain size around 257 and 190 nm for ITO and FTO respectively.The optical properties have been studied in several ITO and FTO samples by transmittance and reflectance measurements. The transmittance in the visible zone is higher in ITO than in FTO layers with a comparable thickness, while the reflectance in the infrared zone is higher in FTO in comparison with ITO. The best electrical resistivity values, deduced from optical measurements, were 8 × 10⁻⁴ and 6 × 10⁻⁴ Ω cm for ITO (6% of Sn) and FTO (2.5% of F) respectively. The figure of merit reached a maximum value of 2.15 × 10⁻³ Ω⁻¹ for ITO higher than 0.55 × 10⁻³ Ω⁻¹ for FTO.     

The role of transparent conducting oxides in metal organic chemical vapour deposition of CdTe/CdS Photovoltaic solar cells

A systematic study is made between the relationship of Cd_0.9Zn_0.1S/CdTe photovoltaic (PV) device properties for three different commercial transparent conducting oxide (TCO) materials and some experimental CdO to determine the role of the TCO in device performance. The resistance contribution from the TCO was measured after depositing the gold contact architectures directly onto the TCOs. These were compared with the Cd_0.9Zn_0.1S/CdTe device properties using the same contact arrangements. Series resistance for the commercial TCOs correlated with their sheet resistance and gave good agreement with the PV device series resistance for the indium tin oxide (ITO) and fluorine doped tin oxide (FTO) 15 Ω/Sq. superstrates. The devices on the thicker FTO 7 Ω/sq superstrates were dominated by a low shunt resistance, which was attributed to the rough surface morphology causing micro-shorts. The device layers on the CdO substrate delaminated but devices were successfully made for ultra-thin CdTe (0.8 μm thick) and compared favourably with the comparable device on ITO. From the measurements on these TCOs it was possible to deduce the back contact resistance and gave an average value of 2 Ω.cm². The correlation of fill factor with series resistance has been compared with the predictions of a 1-D device model and shows excellent agreement. For high efficiency devices the combined series resistance from the TCO and back contact need to be less than 1 Ω.cm².     

HFCVD grown graphene like carbon–nickel nanocomposite thin film as effective counter electrode for dye sensitized solar cells

The two step processes of hot filament chemical vapor deposition (HFCVD) and DC sputtering were used to grow graphene like carbon (GLC)–nickel (Ni) nanocomposite thin film on fluorine-doped tin oxide (FTO) glass and applied as counter electrode (CE) for dye sensitized solar cells (DSSCs). The morphological and absorption properties revealed uniform GLC–Ni thin film with reasonable transmittance. The GLC–Ni thin film showed enhanced electrical conductivity as compared to FTO. The good electrocatalytic activity towards iodide ions in redox electrolyte was showed by the prepared GLC–Ni/FTO thin film electrode. The fabricated DSSC with GLC–Ni/FTO counter electrode (CE) presented relatively moderate solar-to-electrical conversion efficiency of ∼3.1% with high short-circuit current density (J_SC) of ∼10.03 mA/cm², open circuit voltage (V_OC) of ∼0.663 V with fill factor (FF) of ∼0.45, which might attribute to enhanced electrical conductivity and the electrocatalytic activity of GLC–Ni/FTO CE.     

Investigation on indium concentration dependence of solution processed indium tin oxide thin film transistors

The effect of the indium content in indium tin oxide (ITO) films fabricated using a solution-based process and ITO channel thin film transistors (TFTs) was examined as a function of the indium mole ratio. The carrier concentration and resistivity of the ITO films could be controlled by the appropriate treatments. The TFTs showed an increase in the off-current due to the enhanced conductivity of the ITO channel layer with increasing indium mole ratios, producing an increase in the field effect mobility. The characteristics of the a-ITO channel TFT showed the best performance (μ_FE of 3.0 cm² V^− 1 s^− 1, V_th of 2.0 V, and S value of 0.4 V/decade) at In:Sn = 5:1.