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1.
P. Burgaud L. Constancias G. Martel C. Savina D. Mesnager 《Microelectronics Reliability》2007,47(9-11):1653
GaN based FETs have demonstrated high microwave performance since several years, and exhibit attractive potential for microwave power source in electronic warfare and military radar application, and also for civilian telecommunication applications like wireless basestations, Wi-Max, Wi-Fi as well. Up to now, the main challenge remaining for this technology is the proof of good reliability. The Information Warfare Technology Center (CELAR) launched a GaN COTS assessment campaign in order to achieve a state of the art on this topic. In this paper, we presented and discussed the first results of a life test evaluation on HFET GaN/AlGaN structure on silicon substrate and the first results of investigations by physical analysis on a failed device. These preliminary reliability investigations show all the importance of reliability tests conditions applied in order to compare reliability results and also, the benefits of a screening to obtain representative technology quality of the batch of sample before stress. Our investigations on failure analysis by STEM around the gate area of a failed device show defects which could be responsible of a degradation of the Schottky gate. 相似文献
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Milan Ťapajna Nicole Killat Uttiya Chowdhury Jose L. Jimenez Martin Kuball 《Microelectronics Reliability》2012,52(1):29-32
Reliability of AlGaN/GaN HEMTs processed with different surface oxidation levels was studied using electrical and optical methods. It was found that HEMTs with more surface oxide content are more susceptible to degradation in terms of gate leakage and trapping characteristics, although this oxide layer initially passivates surface traps. In the degraded devices, trap level with activation energy of 0.45–0.47 eV was observed and attributed to surface related traps. This indicates that oxygen may play a crucial role for AlGaN/GaN HEMT reliability. 相似文献
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Changxi Chen Quan Wang Wei Li Qian Wang Chun Feng Lijuan Jiang Hongling Xiao Xiaoliang Wang 《半导体学报》2021,42(9):57-62
In this paper,we investigated the effect of post-gate annealing (PGA) on reverse gate leakage and the reverse bias reli-ability of Al0.23Ga0.77N/GaN high electron mobility transistors (HEMTs).We found that the Poole-Frenkel (PF) emission is domin-ant in the reverse gate leakage current at the low reverse bias region (Vth < VG < 0 V) for the unannealed and annealed HEMTs.The emission barrier height of HEMT is increased from 0.139 to 0.256 eV after the PGA process,which results in a reduction of the reverse leakage current by more than one order.Besides,the reverse step stress was conducted to study the gate reliabil-ity of both HEMTs.After the stress,the unannealed HEMT shows a higher reverse leakage current due to the permanent dam-age of the Schottky gate.In contrast,the annealed HEMT shows a little change in reverse leakage current.This indicates that the PGA can reduce the reverse gate leakage and improve the gate reliability. 相似文献
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Enhancement-mode AlGaN/GaN HEMTs on silicon substrate 总被引:3,自引:0,他引:3
Shuo Jia Yong Cai Deliang Wang Baoshun Zhang Lau K.M. Chen K.J. 《Electron Devices, IEEE Transactions on》2006,53(6):1474-1477
High-performance enhancement-mode AlGaN/GaN HEMTs (E-HEMTs) were demonstrated with samples grown on a low-cost silicon substrate for the first time. The fabrication process is based on a fluoride-based plasma treatment of the gate region and postgate annealing at 450 /spl deg/C. The fabricated E-HEMTs have nearly the same peak transconductance (G/sub m/) and cutoff frequencies as the conventional depletion-mode HEMTs fabricated on the same wafer, suggesting little mobility degradation caused by the plasma treatment. 相似文献
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Ching-Hui Lin Wen-Kai Wang Po-Chen Lin Cheng-Kuo Lin Yu-Jung Chang Yi-Jen Chan 《Electron Device Letters, IEEE》2005,26(10):710-712
A pulsed measurement of AlGaN/GaN high electron mobility transistors (HEMTs) current-voltage (I-V) output characteristics from 100 to 300 K temperatures has been systematically investigated, and a significant kink is clearly observed, which is more severe at cryogenic temperatures. By comparing the pulsed and dc I-V curves, the kink effect is more significant in the pulsed mode evaluation, which indicates a time constant related mechanism involved in the carrier transport. Moreover, a weak impact ionization by monitoring the gate current in the on-state of device has also been observed, and it is more significant at cryogenic temperatures. 相似文献
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Felbinger J.G. Chandra M.V.S. Yunju Sun Eastman L.F. Wasserbauer J. Faili F. Babic D. Francis D. Ejeckam F. 《Electron Device Letters, IEEE》2007,28(11):948-950
The performance of AlGaN/GaN high-electron-mobility transistors (HEMTs) on diamond and SiC substrates is examined. We demonstrate GaN-on-diamond transistors with periphery WG = 250 mum, exhibiting ft = 27.4 GHz and yielding a power density of 2.79 W/mm at 10 GHz. Additionally, the temperature rise in similar devices on diamond and SiC substrates is reported. To the best of our knowledge, these represent the highest frequency of operation and first-reported thermal and X -band power measurements of GaN-on-diamond HEMTs. 相似文献
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基于GaN HEMT器件的P波段小型化40 W发射模块 总被引:1,自引:0,他引:1
氮化镓高电子迁移率晶体管(GaN HEMT)器件具有高功率和功率密度、高导热率、高击穿场强、宽工作频带等特点,适合小型化、宽频带、大功率应用.基于GaN功率器件的特点研制了P波段宽带小型化40 W发射模块.通过负载牵引技术对GaN HEMT器件进行了大信号参数的提取,运用ADS软件进行了匹配电路的设计,对功率放大器的性能指标进行了优化,并基于LTC4440和nMOS器件设计了高压脉冲调制电路.研制结果表明,该模块在400 MHz工作带宽内(相对带宽100%)的输出功率为46.6 dBm (45.7 W),功率增益为36.6 dB,功率附加效率(PAE)为40.4%,杂波抑制为65.7 dBc,脉冲项降为0.4 dB,脉冲上升时间为75 ns,脉冲下降时间为50 ns,模块尺寸为50 mm×40 mm×20 mm. 相似文献
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Javorka P. Alam A. Wolter M. Fox A. Marso M. Heuken M. Luth H. Kordos P. 《Electron Device Letters, IEEE》2002,23(1):4-6
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF characteristics investigated. The AlGaN/GaN material structures were grown on (111) p-Si by LP-MOVPE. Devices exhibit a saturation current of 0.91 A/mm, a good pinchoff and a peak extrinsic transconductance of 122 mS/mm. A unity current gain frequency of 12.5 GHz and fmax/fT=0.83 were obtained. The highest saturation current reported so far, static output characteristics of up to 20 V and breakdown voltage at pinchoff higher than 40 V demonstrate that the devices are capable of handling ~16 W/mm static heat dissipation 相似文献
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首先论述了Al GaN/GaN高电子迁移率晶体管(HEMT)在微波大功率领域的应用优势和潜力;其次,介绍并分析了影响Al GaN/GaN HEMT性能的主要参数,分析表明要提高Al-GaN/GaN HEMT的频率和功率性能,需改善寄生电阻、电容、栅长和击穿电压等参数。然后,着重从材料结构和器件工艺的角度阐述了近年来Al GaN/GaN HEMT的研究进展,详细归纳了目前主要的材料生长和器件制作工艺,可以看出基本的工艺思路是尽量提高材料二维电子气的浓度和材料对二维电子气的限制能力的同时减小器件的寄生电容和电阻,增强栅极对沟道的控制能力。另外,根据具体情况调节栅长及沟道电场。最后,简要探讨了Al GaN/GaN HEMT还存在的问题以及面临的挑战。 相似文献
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研究了源漏整体刻蚀欧姆接触结构对AlGaN/GaN高电子迁移率晶体管(HEMT)的欧姆接触电阻和金属电极表面形貌的影响.利用传输线模型(TLM)对样品的电学性能进行测试,使用原子力显微镜(AFM)对样品的表面形貌进行表征,通过透射电子显微镜(TEM)和X射线能谱仪(EDS)对样品的剖面微结构和界面反应进行表征与分析.实验结果显示,采用Ti/Al/Ni/Au(20 nm/120 nm/45 nm/55 nm)金属和源漏整体刻蚀欧姆接触结构,在合金温度870 c℃,升温20 s,退火50 s条件下,欧姆接触电阻最低为0.13 Ω·mm,方块电阻为363.14 Ω/□,比接触电阻率为4.54×10-7Ω·cm2,形成了良好的欧姆接触,降低了器件的导通电阻. 相似文献
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Sheppard S.T. Doverspike K. Pribble W.L. Allen S.T. Palmour J.W. Kehias L.T. Jenkins T.J. 《Electron Device Letters, IEEE》1999,20(4):161-163
Record performance of high-power GaN/Al0.14-Ga0.86 N high-electron mobility transistors (HEMTs) fabricated on semi-insulating (SI) 4H-SiC substrates is reported. Devices of 0.125-0.25 mm gate periphery show high CW power densities between 5.3 and 6.9 W/mm, with a typical power-added efficiency (PAE) of 35.4% and an associated gain of 9.2 dB at 10 GHz. High-electron mobility transistors with 1.5-mm gate widths (12×125 μm), measured on-wafer, exhibit a total output power of 3.9 W CW (2.6 W/mm) at 10 GHz with a PAE of 29% and an associated gain of 10 dB at the -2 dB compression point. A 3-mm HEMT, packaged with a hybrid matching circuit, demonstrated 9.1 W CW at 7.4 GHz with a PAE of 29.6% and a gain of 7.1 dB. These data represent the highest power density, total power, and associated gain demonstrated for a III-nitride HEMT under RF drive 相似文献
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基于SiC衬底成功研制X波段0.25 μm栅长带有r栅场板结构的AlGaN/GaN HEMT,设计场板(field plate)长度为0.4 μm,0.6μm,0.7μm,0.9μm.研究了r栅场板长度及不同漏偏压下对器件直流,小信号特性及大信号的影响.器件直流I-V及转移特性并不依赖场板长度变化,增加场板长度器件击穿电压提高可达108 V,器件截止频率及振荡频率下降,输出功率大幅度提高,结合器件小信号提参结果分析.8 GHz下,总栅宽1 mm,场板长度为0.9 μm的器件,连续波输出功率密度7.11 W/mm,功率附加效率(PAE)35.31%,相应线性增益10.25 dB. 相似文献
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基于蓝宝石衬底的高微波特性 Al Ga N/Ga N HEMTs功率器件 ,器件采用了新的欧姆接触和新型空气桥方案。测试表明 ,器件电流密度 0 .784A/mm,跨导 1 97m S/mm,关态击穿电压 >80 V,截止态漏电很小 ,栅宽 1 mm的器件的单位截止频率 ( f T)达到 2 0 GHz,最大振荡频率 ( fmax) 2 8GHz,2 GHz脉冲测试下 ,栅宽 0 .75 mm器件 ,功率增益1 1 .8d B,输出功率 3 1 .2 d Bm,功率密度 1 .75 W/mm。 相似文献
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Lu W. Kumar V. Schwindt R. Piner E. Adesida I. 《Microwave Theory and Techniques》2002,50(11):2499-2504
High-performance AlGaN/GaN high electron-mobility transistors with 0.18-/spl mu/m gate length have been fabricated on a sapphire substrate. The devices exhibited an extrinsic transconductance of 212 mS/mm, a unity current gain cutoff frequency (f/sub T/) of 101 GHz, and a maximum oscillation frequency (f/sub MAX/) of 140 GHz. At V/sub ds/=4 V and I/sub ds/=39.4 mA/mm, the devices exhibited a minimum noise figure (NF/sub min/) of 0.48 dB and an associated gain (Ga) of 11.16 dB at 12 GHz. Also, at a fixed drain bias of 4 V with the drain current swept, the lowest NFmin of 0.48 dB at 12 GHz was obtained at I/sub ds/=40 mA/mm, and a peak G/sub a/ of 11.71 dB at 12 GHz was obtained at I/sub ds/=60 mA/mm. With the drain current held at 40 mA/mm and drain bias swept, the NF/sub min/,, increased almost linearly with the increase of drain bias. Meanwhile, the Ga values decreased linearly with the increase of drain bias. At a fixed bias condition (V/sub ds/=4 V and I/sub ds/=40 mA/mm), the NF/sub min/ values at 12 GHz increased from 0.32 dB at -55/spl deg/C to 2.78 dB at 200/spl deg/C. To our knowledge, these data represent the highest f/sub T/ and f/sub MAX/, and the best microwave noise performance of any GaN-based FETs on sapphire substrates ever reported. 相似文献