低温纳米压印技术制备微纳图案的研究

纳米压印需要将聚合物加热到它的玻璃化温度以上,然后用印章压印使其复制印章图案.采用低玻璃化温度的SU-82000.1和Hybrane胶体转移图案,能够在低温、甚至室温下实现微纳图案的转移.采用的印章制备方法是聚焦离子束(FIB)直接在衬底上制备图案,从而避免了传统工艺中效率较慢的电子束加工和取消了反应离子刻蚀步骤;并且采用FIB方法可同时在衬底上制备微米、纳米尺度的图案.实验结果表明用FIB方法可以得到比较均匀致密的微纳米图案印章,经过低温纳米压印后可成功地实现微纳图案的复制.     

用SIM Editor复制编辑手机个人资料

SIME ditor软件是与“一卡多号”SIM卡号码复制软件SIM Scanner一并同时安装的，其主要作用是复制SIM卡的电话簿、短消息和进行待机图案与铃声的编辑写入，此外还具有一定的SIM卡密码管理功能：     

克隆算子在民族图案生成中的应用研究

为了解决民族图案艺术得到传承和发扬的问题,提出了民族图案基元、民族图案元和民族图案再生元的概念。引进克隆算子对民族图案基元进行操作,并提出一种民族图案生成算法。利用本文提出的算法对民族图案的生成做实验,民族图案基元通过克隆操作、免疫基因操作、克隆选择操作和克隆死亡操作后能生成新的图案元。实验结果表明在继承图案民族内涵的情况下,能够生成新的民族图案元和再生图案元。利用本文提出的图案生成方法,可以为艺术设计者提供取之不尽的创新设计元素。     

LiNbO_3的反应离子刻蚀

介绍了在含有CCl_2F_2,CF_4,O_2和Ar的混合气体中的LiNbO_3反应离子刻蚀。讨论了总压强为1—10微米时强气体组分和压强的影响。它有可能在控制刻蚀剖面的情况下复制精细图案(～2000埃),所以可望用来制作电光和声光器件中LiNbO_3上的三维图案。     

基于层次结构的远程数据复制系统

针对传统的集中式复制结构存在的单点瓶颈和扩展性差等不足，提出了基于层次化结构的数据复制系统。通过将复制节点之间的拓扑结构抽象为图，提出了使用最小代价树的方式对节点进行组织。通过将数据由树根逐层扩散复制到树叶，使得在保证数据一致性的同时，分散了主节点的负荷。最后分析了使用复制数据进行灾难恢复的过程，并通过原型实验对集中式与层次化复制结构进行了比较。     

用于空间望远镜的大口径高衍射效率薄膜菲涅尔衍射元件

为满足空间成像领域对大口径、轻量化、高衍射效率光学衍射元件的需求,研究了薄膜衍射元件微结构设计及制作工艺。应用Zemax光学软件设计了320 mm口径,F/#100的四台阶薄膜菲涅尔衍射元件,并利用Matlab软件将连续位相结构转化为离散化台阶分布。研究了薄膜菲涅尔衍射元件的制作技术,选用透明聚酰亚胺薄膜作为基底材料,以石英玻璃作为复制模板,通过多次旋涂的方式实现了厚度为20 m的衍射薄膜制作。应用Solidworks软件设计并加工薄膜支撑装置。测量复制基板及薄膜对应区域的微结构,实验结果表明条纹线宽转移偏差小于1.3%,台阶深度偏差小于8.6%。搭建光路测试在波长632.8 nm处衍射效率平均值为71.5%,达到了理论值的88%。实验结果表明,制作的薄膜重量轻,复制精度高,并且具有高衍射效率,满足空间望远镜的应用要求。     

沉积在聚合物表面上的金属薄膜自发形成图案的实验研究

用离子溅射法在聚二甲基硅氧（polydimethylsiloxane,PDMS）表面沉积的金膜因金属与聚合物之间热膨胀系数的差异从而导致了具有正弦界面、微米尺度的波长和振幅的复杂而有序的褶皱图案。用光刘技术在硅片制备图形结构作为模板,通过复制模铸得到表面具有浮雕结构的聚二甲基硅氧烷基片。改变浮雕结构可以调控其上沉积的金膜的褶皱图案呈规则有序的排列。这种多尺度的复合结构将光刘技术、复制模铸和物理自组装等有效结合,可广泛应用于微纳制造领域。     

旋极HR-638手持智能终端用于国庆60周年阅兵式

在13前中华人民共和国国庆60周年阅兵式上，旋极HR-638智能终端被中国人民解放军某部队用来进行装备技术管理并参与阅兵活动。旋极HR-638手持智能终端，是在旋极HR-628的基础上，经过长达半年的研发和严密实验后定型，2009年刚刚发布的新产品。它在单一设备上融合了GPRS、GPS、蓝牙、条形码识别、WiFi无线通信、RFID射频识别等十多项先进技术，     

光学图象识别与防伪技术

光学图象识别与防伪技术近年来，伪造货币和信用卡的犯罪问题已增加到令人吃惊的地步，去年，世界范围内仅伪造倍用卡的面值就超过１０亿美元。随着计算机、ＣＣＤ技术、图象处理硬件及软件、打印机、扫描仪和复印机的迅速发展，照片、标牌、标识、纸币或图案的复制都变得...     

压电陶瓷扫描管在纳米加工中的应用

用一圆筒形压电陶瓷作三维微位移器，控制扫描隧道显微镜金属探针，利用场蒸发原理，实现了纳米加工。用Ａｕ，Ｃｕ和Ｎｉ等金属针尖在金表面制作了纳米尺寸的图案，汉字，其中组成这些图案和汉字的每个原子堆的直径约１０－４０ｎｍ，实验表现出非常好的可控性，重复性和稳定性。     

Direct fabricating patterns using stamping transfer process with PDMS mold of hydrophobic nanostructures on surface of micro-cavity

The transfer stamping process has been used to fabricate thin-film pattern in recent years. Due to the characteristics of the materials of molds and inks, residual inks on the cavities of mold and residual layers on the substrate are still a problem. To solve the problem, we present a concept for fabrication of hydrophobic nanostructures on the cavities of microstructures of the mold, which can effectively decrease the ink residing on the cavities of the mold during coating. First, the periodic nanopores are fabricated on the anodic aluminum oxide (AAO). Second, AAO membrane is employed as the template for fabricating nanostructures on the PC film by embossing. And then, by partial protrusion of the nano-structured PC film into the micro-holes of the mold, an array of protruded convex microstructures is formed. After that, polydimethylsiloxane (PDMS) mold is casted from the embossed PC film. The contact angle of nanostructures on the micro-cavities of PDMS mold is about 145°. Micro-patterns with no residual layers have been successfully transferred on the poly(ethylene terephthalate) (PET) substrate using a transfer stamping process with this PDMS mold.     

Multiple replication of thick PDMS micropatterns using surfactants as release agents

This paper introduces a simple approach for accurate replication of PDMS thick mould from previous PDMS replicas. The process starts with reinforcing the PDMS mould to provide enough strength for demoulding. Afterwards, the surface of the reinforced PDMS mould was treated with low concentration commercial ceramic surfactants before the replication process. The surfactants are D-3005 and Brij52 and diluted before use. A number of PDMS mould copies have been obtained with excellent dimensional precision. The proposed ceramic surfactants shown to have a good releasing ability, which enabled a clean separation process.     

高精度微结构聚合物光栅的复制技术

光栅复制是降低光栅制造成本,提高产量的一条有效途径。研究了利用紫外压印技术复制微结构光栅的方法。使用玻璃基底矩形浮雕结构的微结构光栅作为母光栅,给出了利用聚二甲基硅氧烷(PDMS)制作光栅模具和在光敏聚合物材料上复制微结构光栅的详细过程。经过优化工艺条件,成功地复制了一系列不同周期和开口比的微结构光栅,测试了复制光栅和母光栅的衍射图像和0级与±1级的衍射强度,结果表明,复制光栅和母光栅的衍射图像与光强分布基本一致。     

Soft UV-nanoimprint lithography on non-planar surfaces

We report on a simple and effective process that allows direct UV-imprinting of micro- and nanostructures on non-planar surfaces, even at sharp edges such as step surfaces. The key for the process is the use of a thin flexible polymer stamp, which was fabricated by spin-coating poly(dimethylsiloxane) (PDMS) on a pre-patterned Si or poly(methyl methacrylate) (PMMA) master and releasing the thin PDMS layer after curing. The thin PDMS stamp was used to conformally mold a UV resist layer coated on various non-planar substrates with different radii of curvature. With this method, we have successfully demonstrated micro- and nanopatterns down to 63 nm on curved surfaces as well as sharp step-like structures. The process so developed will improve the versatility and applicability of molding technologies in many applications that require patterning non-planar substrates, considering that most molding technologies allow for patterning only on planar substrates or surfaces with large curvature radii.     

Simple Patterning via Adhesion between a Buffered‐Oxide Etchant‐Treated PDMS Stamp and a SiO2 Substrate

A very simple polydimethylsiloxane (PDMS) pattern‐transfer method is devised, called buffered‐oxide etchant (BOE) printing. The mechanism of pattern transfer is investigated, by considering the strong adhesion between the BOE‐treated PDMS and the SiO₂ substrate. PDMS patterns from a few micrometers to sub‐micrometer size are transferred to the SiO₂ substrate by just pressing a stamp that has been immersed in BOE solution for a few minutes. The patterned PDMS layers work as perfect physical and chemical passivation layers in the fabrication of metal electrodes and V₂O₅ nanowire channels, respectively. Interestingly, a second stamping of the BOE‐treated PDMS on the SiO₂ substrate pre‐patterned with metal as well as PDMS results in a selective transfer of the PDMS patterns only to the bare SiO₂. In this way, the fabrication of a device structure consisting of two Au electrodes and V₂O₅ nanowire network channels is possible; non‐ohmic semiconducting I–V characteristics, which can be modeled by serially connected percolation, are observed.     

Microcontact printing of biomolecular gratings from SU-8 masters duplicated by Thermal Soft UV NIL

Thermal Soft UV nanoimprint lithography (NIL) was performed to replicate nanostructures in SU-8 resist. The SU-8 resist was structured with a PDMS stamp molded against an original silicon master which comported gratings of lines (500 nm width/1 μm pitch). The patterns obtained in SU-8 were used in a second step as a template for PDMS molding of daughter stamps. Pattern transfer quality and dimension control were achieved on these second generation PDMS stamps using AFM measurements. As a final validation of the whole duplication processes, these second generation PDMS stamps were finally employed to perform μCP of streptavidin molecules on a glass slide activated by plasma O₂ treatment. AFM observation and fluorescence microscopy reveal that molecular patterns produced with SU8-molded PDMS stamps are not discernable from those obtained with a PDMS stamp directly molded on the original silicon master. Coupling Thermal Soft UV NIL and microcontact printing opens a new method for generating a large quantity of SU-8 templates on which functional PDMS stamps can be replicated in a reduced time. We thus propose a functional duplication process for soft-lithography implementation which may further reduce the cost of this technology for industrial development.     

Individual Confinement of Block Copolymer Microdomains in Nanoscale Crossbar Templates

Highly ordered pattern formation of block copolymers (BCPs) within nanoscale templates is of great interest for generating diverse ordered nanostructures. Here, introduced is a combined methodology of nanotransfer printing (nTP) and BCP self‐assembly to guide the formation of spherical nanodots within a printed crossbar nanotemplate. By successfully accommodating poly(styrene‐b‐dimethylsiloxane) (PS‐b‐PDMS) BCPs in the guiding metallic crossbar nanotemplate (≈30 × 30 nm²), a well‐organized array of single‐domain PDMS spheres (≈10 nm) with a square symmetry is successfully obtained in an extremely short annealing time (<5 s). The self‐consistent field theory simulation results theoretically explain the spontaneous one‐to‐one accommodation of PDMS spheres in the confined area of the crossbar template. This approach can potentially be extended to the many other BCP materials and morphologies to diversify the geometry of self‐assembled BCP and/or transfer‐printed nanopatterns for various types of nanodevice applications.     

Direct Graphene Transfer and Its Application to Transfer Printing Using Mechanically Controlled,Large Area Graphene/Copper Freestanding Layer

Direct graphene transfer is an attractive candidate to prevent graphene damage, which is a critical problem of the conventional wet transfer method. Direct graphene transfer can fabricate the transferred graphene film with fewer defects by using a polymeric carrier. Here a unique direct transfer method is proposed using a 300 nm thick copper carrier as a suspended film and a transfer printing process by using the polydimethylsiloxane (PDMS) stamp under controlled peeling rate and modulus. Single and multilayer graphene are transferred to flat and curved PDMS target substrate directly. With the transfer printing process, the transfer yield of a trilayer graphene with 1000 µm s^?1 peeling rate is 68.6% of that with 1 µm s^?1 peeling rate. It is revealed that the graphene transfer yield is highly related to the storage modulus of the PDMS stamp: graphene transfer yield decreases when the storage modulus of the PDMS stamp is lower than a specific threshold value. The relationship between the graphene transfer yield and the interfacial shear strain of the PDMS stamp is studied by finite‐element method simulation and digital image correlation.     

Template replication for full wafer imprint lithography

Typically, the Step and Flash Imprint Lithography (S-FIL^TM) process uses field-to-field drop dispensing of UV-curable liquids for step-and-repeat patterning. Several applications, including patterned magnetic media, photonic crystals, and wire grid polarizers, are better served by a process that allows high-throughput, full-wafer patterning of sub-100 nm structures with modest alignment. Full-wafer imprinting requires a full-wafer template; however, creation of a wafer-scale imprint template with sub-100 nm structures is not feasible with direct-writing approaches. This paper describes a practical methodology for creating wafer-scale templates suitable for full-wafer imprinting of sub-100 nm structures.The wafer-scale template is replicated from a smaller area master template using the S-FIL step-and-repeat process. The pattern is repeated to accommodate the wafer substrate targeted for a particular application. The tone of the master template is maintained by employing an SFIL/R^TM (reverse tone) pattern transfer process. To create the replicate template, the patterns are imprinted onto a fused silica wafer that has been coated with chromium and an organic transfer layer. A silicon-containing resist, Silspin^TM, is spun on to planarize the organic monomer material. Following an etch back of the Silspin, the monomer and transfer layer are patterned using the Silspin as a hard mask. The Silspin and monomer stack then serves as a masking layer for the chromium and fused silica etches. The remaining monomer and chromium are then removed to create a conformal replicate template.     

Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers

Next‐generation lithography techniques based on the self‐assembly of block copolymers (BCPs) are promising methods for high‐resolution pattering. BCPs with a high incompatibility (high‐χ), such as polystyrene‐polydimethylsiloxane (PS‐PDMS), show encouraging results in terms of resolution. In the strong segregation regime, the high diffusive energy barrier of PS‐PDMS excessively reduces the self‐assembly kinetics; this is why solvent–vapor annealing is typically adopted to shorten the self‐assembly time. Plasticizers are generally used to reduce the glass transition temperature (T_g) of polymers. In this study, commercial plasticizers such as dioctylsebacate and diisooctyl adipate are blended with PS‐PDMS polymers, and their influence on the self‐assembly process is investigated. The intrinsic PS selectivity of the plasticizers brings the BCP to form PS‐PDMS micelles, which results in highly ordered self‐assembled body‐centered cubic spherical PS‐PDMS after spin‐coating without any annealing. The negligible vapor pressure of plasticizers and the decrease of T_g allow the high mobility of PS‐PDMS micelles in thin films. A transition into a stable horizontal cylindrical morphology is then possible by ultrafast thermal annealing (30 s). The complete process, from the BCP deposition to the final pattern transfer into Si, is presented on 300 mm standard wafers, which makes this method promising for microelectronic industrial integration.