全反射镜结构对AlGaInP发光二极管发光效率的影响

采用计算机模拟的方法,计算了SiO2/Al,ITO/Al,SiO2/Au和ITO/Au全方位反射镜结构和分布式布拉格反射镜的反射特性.用PECVD和溅射设备制作了Glass/SiO2/Au结构,用LP-MOCVD生长了DBR结构,并测量了其反射特性,实验与模拟结果基本吻合.从模拟和实验的结果得到,SiO2/Au ODR结构在波长为630nm的垂直入射光下反射率很高,达到91%以上.对于不同角度的入射光,SiO2/Au在20°～85°都有很高的反射率,远高于DBR结构的反射率.在实际器件测试中,ODR结构的AlGaInP红光LED比无DBR结构的LED提高了115%,比DBR结构的LED提高了28%.这说明,ODR结构与DBR结构相比可以大幅提高红光LED的出光效率.     

全反射镜结构对AlGaInP发光二极管发光效率的影响

采用计算机模拟的方法,计算了SiO2/Al,ITO/Al,SiO2/Au和ITO/Au全方位反射镜结构和分布式布拉格反射镜的反射特性.用PECVD和溅射设备制作了Glass/SiO2/Au结构,用LP-MOCVD生长了DBR结构,并测量了其反射特性,实验与模拟结果基本吻合.从模拟和实验的结果得到,SiO2/Au ODR结构在波长为630nm的垂直入射光下反射率很高,达到91%以上.对于不同角度的入射光,SiO2/Au在20°～85°都有很高的反射率,远高于DBR结构的反射率.在实际器件测试中,ODR结构的AlGaInP红光LED比无DBR结构的LED提高了115%,比DBR结构的LED提高了28%.这说明,ODR结构与DBR结构相比可以大幅提高红光LED的出光效率.     

Thin film AlGaInP light emitting diodes with different reflectors

The reflectivity versus incident angle of a GaP/Au reflector,a GaP/SiO_2/Au triple ODR(omni-directional reflector) and a GaP/ITO/Au triple ODR was calculated.Compared to AlGaInP LEDs with a GaAs absorbing substrate, thin film LEDs with a Au reflector,a SiO_2 ODR and an ITO ODR were fabricated.At a current of 20 mA,the optical output power of four samples was respectively 1.04,1.14,2.53 and 2.15 mW.The Au diffusion in the annealing process reduces the reflectivity of the Au/GaP reflector to 9%.The differe...     

薄膜AlGaInP发光二极管中光子吸收的研究

分析了薄膜发光二极管中光子的路径,对比了AlGaInP薄膜发光二极管的反光镜有无AlGaInP层的反射率,分析了AlGaInP层的吸收并计算了光提取效率。制作了不同GaP厚度的TF AlGaInP LED。在20mA的驱动电流下,0.6μm GaP的LED比8μm GaP 的LED光输出功率高33％。提出了在0.6μm GaP的LED中腐蚀去除非欧姆接触点处的重掺GaP。在n型电极和p型欧姆接触点间的电流扩展的设计和优化需要更进一步的研究。     

透明导电ITO欧姆接触的AlGaInP薄膜发光二极管

提出了一种透明导电氧化铟锡(ITO)欧姆接触的AlGaInP薄膜发光二极管(LED)的结构和制作工艺.在这个结构里,ITO还作为窗口层材料,增强电流扩展,并应用了高反射率的金属作为反光镜.用Au-Sn合金(Au∶Sn＝8∶2,重量比)作为焊料,把带有金属反光镜的AlGaInP LED(RS-LED)外延片倒装键合到GaAs基板上,并去掉外延GaAs衬底,把被GaAs衬底吸收的光反射出去.与常规AlGaInP吸收衬底LEDs(AS-LED)和带有分布布拉格反光镜(DBR)的AlGaInP吸收衬底LEDs(DBR-AS-LED)电、光特性的比较,用透明导电ITO做欧姆接触的AlGaInP薄膜RS-LED结构能极大提高光输出功率和发光强度.正向电流20 mA时,RS-LED的光输出功率分别是AS-LED和DBR-AS-LED的2.4倍和1.7倍;RS-LED 20 mA下峰值波长624 nm的轴向光强达到了179.6 mcd,分别是AS-LED 20 mA下峰值波长627 nm和DBR-AS-LED 20 mA下峰值波长623 nm轴向光强的2.2倍和1.3倍.     

基于Au/Au直接键合的高亮度ODRLED

提出利用Au/Au直接键合制作高亮度全方位反光镜(ODR)LED的新工艺。工艺采用Si做转移衬底,氧化铟锡(ITO)做窗口层和缓冲层,在0.35mPa压力,260°C的低温下实现Au/Au固相直接键合。直接键合后,Al-GaInP有源区与Si衬底结合牢固完整,保证了全方位反光镜的性能。在正向电流20mA下,键合ODR结构LED的正向压降是常规吸收衬底LED的80%,光输出功率和流明效率是常规吸收衬底LED的1.5倍和2.1倍。     

高亮度LED中ODR反光镜反射率温度特性研究

对Al/SiO2、Al/ITO、Au/SiO2、Au/ITO构成的ODR(Omni-directional reflector)结构,对应400～800 nm的不同波长,在不同温度下,对于反光镜的反射率的影响,进行了研究。提出了在460 nm的蓝光波段,Al/SiO2合金温度在500～700 K时,反射率会达到最小值,温度在700 K以上时,又到常温值,且略微增加;Al/ITO反射率是随着温度变化单调下降的,因此要在Al反光镜的表面采用Ti/Al/Ti/Au的结构,改善反光镜的特性;620 nm的红光波段,Au/SiO2和Au/ITO的合金温度在700 K时,具有最理想的反射率,且Au/SiO2结构的反射效果要优于Au/ITO结构。用实验的方式进行了验证,分析了可能造成反射率变化的原因。     

一种新型全方位反射AlGaInP薄膜发光二极管

提出了一种新型全方位反射A1GalnP LED结构和制作工艺.GaAs外延片与含导电孔的SiO2,Au形成全方位反射镜后,银浆键合在Si支架上,去除GaAs衬底,制作薄AuGeNi电极,粗化,生长ITO,制作厚AuGeNi电极,合金则形成ODR薄膜LED结构.300μm×300μm管芯裸装在TO-18金属管座上,在20mA的电流驱动下,测得电压为2.2V,光强达到195mcd,光功率达到3.78mW,比常规吸收衬底LED提高3.6倍.     

一种新型全方位反射AlGaInP薄膜发光二极管

提出了一种新型全方位反射A1GalnP LED结构和制作工艺.GaAs外延片与含导电孔的SiO2,Au形成全方位反射镜后,银浆键合在Si支架上,去除GaAs衬底,制作薄AuGeNi电极,粗化,生长ITO,制作厚AuGeNi电极,合金则形成ODR薄膜LED结构.300μm×300μm管芯裸装在TO-18金属管座上,在20mA的电流驱动下,测得电压为2.2V,光强达到195mcd,光功率达到3.78mW,比常规吸收衬底LED提高3.6倍.     

具有ITO/Ti3O5薄膜结构的高亮度AlGaInP LED

采用ITO/Ti_3O_5薄膜结构作为高亮度AlGaInP LED的电流扩展层、窗口层、电流阻挡层和增透膜层。通过在电极下形成肖特基结,避免电极下方无效电流注入,提高局域电流密度。通过ITO/Ti_3O_5增透膜设计提升LED的光提取效率。具有该ITO/Ti_3O_5薄膜结构的主波长621 nm的高亮度AlGaInP LED芯片(150μm×150μm)较传统结构芯片发光强度提升40%,20 mA注入电流下,电压均值在2.1 V左右。     

Performance enhancement of III–V compound multijunction solar cell incorporating transparent electrode and surface treatment

To enhance the performance of tandem‐type III–V compound multijunction solar cells, the transparent indium‐tin‐oxide (ITO) film was used to replace conventional metal electrode for increasing the incident light area. For performing ohmic contact between the n‐AlInP window layer and the ITO film, a transition layer of Au/AuGeNi thin metals was used and investigated. Besides, to improve ohmic performance and to passivate the surface states, (NH₄)₂S_x surface treatment was used. The conversion efficiency of the (NH₄)₂S_x‐treated triple‐junction solar cells was increased more than 3.09%. Furthermore, an improved oblique SiO₂/SiO₂/ITO triple antireflection structure was designed to reduce the reflectivity of illuminating sunlight. The conversion efficiency of the (NH₄)₂S_x‐treated triple‐junction solar cell with improved antireflection structure could be improved more than 4.23%. Simple and effective approaches were designed to improve the performances of tandem‐type III–V triple‐junction solar cells. Copyright © 2010 John Wiley & Sons, Ltd.     

Enhancing extraction efficiency from GaN-based LED by using an omni-directional reflector and photonic crystal

To enhance the light extraction efficiency of traditional light-emitting diodes（LEDs） by reducing the total internal reflection,an omni-directional reflector（ODR） and photonic crystal are adopted in the paper.The structures of photonic crystal and the ODR are designed by diffraction theory and finite difference time domain（FDTD） method.The photonic crystal is employed in the p-GaN layer and the ODR composed of TiO2/SiO2 is designed between the active region and substrate.The simulation results indicate that the light extraction of LEDs can be enhanced by 11.6 times,and the external quantum efficiency of LEDs will be effectively improved.     

Improved performance of lateral GaN-based light emitting diodes with novel buried CBL structure in ITO film and reflective electrodes

In this letter, lateral GaN-based Light Emitting Diodes (LEDs) with a SiO₂ current blocking layer (CBL) buried in the indium tin oxide (ITO) film and highly reflective metal materials have been proposed. Compared with the conventional CBL structure which was inserted between ITO film and p-type GaN, simulation results showed that LEDs with a buried CBL in the ITO film effectively facilitated current spreading under the CBL. We demonstrated that buried CBL was beneficial for suppressing current crowding (CC) effect around the edge of CBL and may facilitate higher LED efficiency. Furthermore, experimental results showed that LEDs with the buried structure we proposed showed lower working voltage and higher light output power (LOP) compared with those with conventional CBL structure. These results further confirmed that the buried CBL scheme was effective to reduce current crowding (CC) effect. In addition, highly reflective metal materials of Cr/Al/Pt/Au were employed to reduce light absorption and achieve high light extraction efficiency.     

Improvement in light-output efficiency of AlGaInP LEDs fabricated on stripe patterned epitaxy

Quaternary AlGaInP light-emitting diodes (LEDs) operating at a wavelength of 630 nm with a stripe-patterned omni-directional reflector (ODR) were fabricated. It is demonstrated that the geometrical shape of stripe-patterned structure improves the light extraction efficiency by increasing the extraction of guided light. The optical and electrical characteristics of stripe-patterned ODR LEDs are presented and compared to typical ODR and distributed Bragg reflector (DBR) LEDs with the same epitaxial structure and emitting wavelength. It is shown that the output power of the stripe-patterned ODR LED exceeds that of the typical ODR and DBR LEDs by a factor of 1.15 and 2 times, respectively, and with an acceptable forward voltage of about 2.2 V.     

带有锥状反射结构的AlGaInP键合衬底LED

本研究通过光辅助化学腐蚀技术在衬底键合AlGaInP反极性发光二极管中制备出锥状反射镜结构提升器件的光提取效率。首先利用氢氟酸与双氧水在532nm激光的辐射下载GaP:Mg层制备出锥状腐蚀结构,然后将金属反射镜蒸镀在锥状结构之上制备锥状的反射镜结构。在完成全部芯片工艺后,测试结果表明锥状反射镜结构可以显著提升光提取效率,并在光通量测量中与表面粗化集成平板反射镜LED相比较,得到了18.55%的增强。     

原子层沉积法制备高反射率的分布式布拉格反射镜

为提高GaN基发光二极管(LED)的发光强度,制备TiO₂/Al₂O₃分布式布拉格反射器(DBR)来提高其外量子效率是一种有效的方法。原子层沉积(ALD)法所制备的薄膜具有良好的均匀性,适合用来制备反射器材料。同时,TiN薄膜具有良好的类金属性质,且与TiO₂之间具有良好的粘附性,因此在DBR基础上再采用TiN反射层可以将反射率进一步提高。Matlab软件模拟结果表明,3~6周期厚的DBR,其反射率随厚度增加而提高。其中6周期DBR的反射率为95%,加上TiN薄膜后反射率可以得到进一步提高。实验结果与模拟结果吻合,6周期DBR+TiN结构的反射率达到99%。给带有该结构的LED注入50mA电流时,LED光输出功率(LOP)相对没有该结构的器件提升了约68.3%。