共查询到19条相似文献,搜索用时 125 毫秒
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利用直流磁控溅射法,采用氧化锌铝(98%ZnO+2%Al2O3)为靶材,在普通载玻片上制备了AZO(Z n O:Al)薄膜。采用X射线衍射仪、场扫描电镜对薄膜的结构及表面形貌进行了分析,采用分光光度计和四探针法对薄膜的光电学性能进行了测试。结果表明:控制好工艺参数可以制备出致密、均匀并具有良好的光电性能的AZO薄膜;并计算了带隙能量和折射率。 相似文献
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实时在线监测磁控溅射反应气体的参数可有效保证镀膜质量;针对反应磁控溅射离子镀膜机反应气体的功能需求,分析了反应气体的控制原理,基于PEM方法提出了控制器方案和反应气体的参数监控方案,分析了监控系统的功能需求,自定义了串口通信协议,基于LabVIEW和串口设计了反应气体的参数监控系统系统,并与设计的控制器用于镀膜工艺试验;试验结果表明,基于PEM方法设计的反应气体参数监控系统功能正确,可为控制器和镀膜机提供参数调控依据,为提高硬质镀膜质量提供了一套有效的监控方法。 相似文献
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作为世界上第一家采用磁控溅射技术商业化生产窗膜的公司,圣戈班舒热佳特殊镀膜有限公司,同时也是国际公认的汽车膜、建筑膜、太阳能背板和工业镀膜行业的领导者,全球磁控溅射膜的最大生产商。凭借着产品优越的性能与节能环保的理念,舒热佳建筑隔热防爆膜备受追捧。不久前刚在贵阳试营业的某劳斯莱斯展厅就是舒热佳建筑隔热防爆膜的收益者之一。 相似文献
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In this study, the Aluminum element doped zinc oxide (Al:ZnO) thin film was deposited on the Corning glass substrate by RF magnetron sputtering technology and annealing treatment. After sputtering, all thin films are then annealed on nitrogen atmosphere and temperature of 300, 500 and 550 °C, respectively. The structural, electric and optical characteristics were then investigated. All films illustrate strong (002) for ZnO and (335) for Al preferential orientation by using XRD analysis. The lower resistivity can be observed at nitrogen annealing and temperature of 400 °C. The transmittance property of AZO thin film exhibited an excellent transparency in the visible light range. The transmittance reached to nearly 81.4 % for all Al:ZnO film. It can be clearly observed that the grain size of AZO thin film is very uniform by utilizing SEM technology. 相似文献
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Zhiguo Meng Huajun Peng Chunya Wu Chengfeng Qiu Kuen Kuen Li Man Wong Hoi Sing Kwok 《Journal of the Society for Information Display》2004,12(1):113-118
Abstract— Direct deposition of indium tin oxide (ITO) thin film on color filters is of practical use in the fabrication of state‐of‐the‐art flat‐panel displays. Room‐temperature dc magnetron sputtering of thin‐film ITO and issues related to the integration of ITO‐on‐glass panels containing micro‐fabricated color filters and other functional materials have been investigated. The resulting polycrystalline ITO exhibited good adhesion to the underlying color filters, as well as good optical transparency and high electrical conductivity. Application of this ITO deposition technology to color liquid‐crystal and organic light‐emitting diode displays will also presented. 相似文献
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基于电子印刷工艺的薄膜热电偶研制 总被引:2,自引:0,他引:2
薄膜热电偶由于具有体积小、热容量小及响应速度快等优点成为近年来学者们研究的重点。薄膜制备常用的方法有射频溅射法、离子镀膜法以及直流脉冲磁控溅射法等,但这些方法操作设备复杂,制作时间长,效率低,成功率低且复现性差。用电子印刷工艺制备薄膜热电偶,将Au,Pt的溶液化微纳米材料印制在基板上,印刷成为Au-Pt薄膜热电偶,该方法操作方便快捷,对电极材料污染小。通过试验证明:采用电子印刷工艺制备的Au-Pt薄膜热电偶符合Au-Pt热电偶检定规程的要求,热电偶精度高,重复性和一致性好。 相似文献
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光盘丝网印刷是整个光盘生产过程中的一个重要环节,而好的印刷质量与高质量的网版是密切相关的。本文从绷网张力、网框选用、制网过程各环节控制等探讨了高质量网版制作的要点。 相似文献
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《Data Processing》1984,26(4):31-34
Technology has created new ways to store and distribute information. The optical disc is one of these emerging technologies. As a computer storage medium, the optical disc has greater capacity to store data than any present magnetic medium. Optical disc technology includes read-only optical videodisc for storing visual data, and read-write optical digital disc for storing digital data. 相似文献
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A new fabrication process for nanoscale tungsten tip arrays was developed for scanning probe microscopy-based devices. It is suitable to make a huge array on a device chip and is potentially compatible with CMOS technology. In this study, tungsten was selected as a tip material because of its hardness and conductivity. The newly developed fabrication process mainly consists of several important techniques: a combination of optical lithography and electron beam (EB) lithography to reduce the total exposure time with high resolution and chromium/tungsten/chromium (Cr/W/Cr) sandwich deposition and etching in which the first chromium layer is used as a mask and a second one is used as an etch stop. A periodic array of dots in an EB resist with a spot diameter of less than 50 nm was obtained by a combination of optical lithography and EB lithography with a positive resist (polymethylmethacrylate) in which all processing conditions were optimized carefully. A thin and uniform chromium film, deposited by ion-beam sputtering, allowed the use of thin polymethylmethacrylate (PMMA) film which led to the high resolution. The conditions of dc magnetron sputtering were also optimized in order to deposit a densely packed and low-resistivity film. The resulting tungsten tip arrays had a cylindrical shape with diameters of less than 60 nm and heights of 300 nm 相似文献