高陡度非球面光学元件加工技术研究

高陡度非球面光学元件因形状特点,其毛坯成形、研磨和抛光等加工技术难度远高于传统的球面元件.其加工过程中根据不同材料和不同加工阶段分别应用化学气相沉积(CVD)精密复制方法、单点金刚石车削(DPT)、金刚石磨削、确定性微研磨(DMG)、磁流变抛光(MRF)和射流抛光等先进制造技术.分析高陡度非球面光学元件的形状特征,重点讨论高陡度非球面光学元件的加工技术及关键工艺,针对凹面抛光加工等技术难点做出工艺分析.     

刻面型水晶玻璃研抛工艺研究

针对刻面型水晶玻璃传统磨削加工过程中所用研磨盘、抛光盘存在的缺陷,提出了一种新型的结构化复合弹性研抛盘。通过对刻面型水晶玻璃的传统磨削加工工艺的研究,阐述了水晶玻璃上、下料,研磨和抛光的方法并深入分析其原理。针对不同发展时期的不同类型水晶磨削设备进行了详细地对比和分析,总结了现有水晶加工设备在工作过程中对水晶玻璃球上下料、粗磨、细磨、抛光时所用机构的结构和特点,提出了能进一步提高加工效率、加工精度、自动化程度的意见。研究结果指出了传统加工工艺存在的缺陷,并就其未来的发展进行了展望。     

柔性磨体振动抛光机理探讨与对比

探讨新发明的柔性磨体振支抛光机理，介绍机床结构特点与应用范围，并从加工表面质量怀生产率等方面与超声波抛光、粘弹性磨料流加工等作分析比较。     

模具型腔复合抛光工艺规律研究

阐述采用脉冲电流电化学抛光的特点、实施方案和工艺效果 ,并通过对某种模具型腔窄深槽抛光的工艺试验 ,讨论并分析实验数据 ,得出加工参数对表面粗糙度的影响规律 ,以及各加工参数影响表面粗糙度的经验公式。为这类孔槽抛光提供了一种有效的工艺方法     

全自动水钻加工设备的研究与开发

概述了目前国内水钻的加工工艺,国内外水钻加工设备的现状及发展趋势,通过分析目前国内水钻加工设备的加工特点及不足,提出一种全自动柔性水钻加工设备,并介绍其方案、功能及水钻柔性加工工艺路线等方面的研究和成果,对水钻行业的加工提升有着重要的意义。     

模具光整加工技术新进展

从工艺——机械抛光、特种抛光、复合抛光，自动化——数控机床、机器人、知识库、测量，“一次过加工技术”——高频窄脉冲和展成电解加工、混粉电火花镜面加工、高速铣加工三方面对现有的模具抛光技术进行了较为详细的介绍，分析了各自的特点、适用场合及某些技术关键。     

齿轮齿廓抛光方法研究进展

齿轮是现代机械传动系统中运用最为广泛的传动件，齿轮齿廓的精度和表面质量对齿轮传动的精度、平稳性、可靠性和噪声影响巨大。齿轮的加工过程通常要经历初切齿—热处理—初磨—精磨等工艺过程，然而，经磨削加工后齿廓仍然存在磨削横纹、表面粗糙度难以进一步降低、表面粗糙度沿齿廓分布不均匀等问题。目前，齿轮经磨削后进行齿廓抛光是解决上述问题的有效途径之一。为此，将现有主要齿轮齿廓抛光方法归纳为齿廓电化学机械抛光、齿廓磨料流抛光、齿廓磁流变抛光以及齿廓剪切增稠抛光等4大类。详细阐述了当前主要齿轮齿廓抛光方法的加工原理；列举了各种加工方法的加工实例；从加工的适应范围、加工效率、抛光后的齿廓表面粗糙度的改善率以及对加工设备的要求等方面归纳了各个加工方法的技术优势和存在的问题。结果表明，使用其他辅助能场（如超声、激光、磁场等）与传统抛光方法复合以实现高效、高精度、高表面一致性齿廓抛光将是未来的主要研究方向。     

机器人恒压球形公自转磨头抛光技术研究

采用工业机器人进行大口径光学元件的研抛过程中,机器人自身定位误差会导致研抛压力产生波动,进而影响去除函数稳定性,为此提出了一种机器人恒压球形公自转磨头抛光方法,并对其结构、工作原理、机器人定位特性以及研抛压力输出特性开展了研究。首先,基于Preston理论构建了材料去除模型,对去除函数形状进行了分析,对所设计抛光磨头的机械结构与工作原理进行了介绍。然后,对机器人定位误差以及磨头输出力响应性与稳定性进行了测量,验证了所提方法能够较好地适应机器人研抛压力波动而做出的力响应控制。最后,进行了定点抛光以及粗、精磨抛加工实验。实验结果表明：利用所提方法去除函数的稳定性强,通过10个周期的粗、精抛加工,面形收敛率分别为9095%、7261%,可获得较高的加工精度与面形质量。     

光整光饰技术在滚动轴承加工制造中的应用

在总结目前滚动轴承加工制造的终加工工序及光整加工概念的基础上,主要论述了滚动轴承的振动抛光方法及加工机理,以及滚动轴承自修磨技术(ART)的加工机理及应用特点,并进一步提出了光整加工新技术、新工艺,如电化学加工、磁流变抛光、超声波磁流变复合抛光、电泳抛光、磨料流抛光等在滚动轴承加工制造中的应用,以期改变传统滚动轴承的抛光要求,在提高表面光洁度的基础上,进一步提高滚动轴承的几何精度和力学性能。     

小模数齿轮抛光和去毛刺工艺方法

通过对小模数齿轮技术要求和加工方法特点的阐述,介绍了小模数齿轮抛光工艺过程中工艺装备和参数的选择、制作和确定,以及小模数齿轮去毛刺的几种工艺方法。     

Design and fabrication of a novel polishing tool for finishing freeform surfaces in magnetic field assisted finishing (MFAF) process

Surface finish is a critical requirement for different applications in industries and research areas. Freeform surfaces are widely used in medical, aerospace, and automobile sectors. Magnetic field assisted finishing process can be used very efficiently to finish freeform surfaces. In this process, magnetorheological fluid is used as the polishing medium and permanent magnet is used to control its rheological properties to generate finishing force during polishing. To avail sufficient magnetic field in the finishing zone, it is necessary to design an optimum polishing tool. In the present study, a specially designed polishing tool is designed using a finite element based software package (Ansys Maxwell^®) based on Maxwell equations. At first, dimension of the permanent magnet is determined for designing optimum tool geometry. After that, dimension and configuration of the magnet fixture are optimized. A special type of metal named mu-metal which is a nickel-iron based alloy is selected for magnet fixture due to its magnetic-field shielding property. Mu-metal directs the magnetic flux lines in such a way that in the finishing zone the magnetic flux can be concentrated on the workpiece surface required for finishing. Also, the Mu-metal magnet fixture shields the magnetic field from outside environment so that MR fluid as well as any surrounding magnetic materials do not stick to the polishing tool. Experiments are carried out to validate the Maxwell simulation results to compare the magnetic flux distribution on the workpiece surface which shows good agreement between them. Also, finishing of flat titanium workpieces are carried out and it is found that the novel polishing tool has the capability to finish the workpieces in the nanometer range.     

Corrective polishing of complex ceramics geometries

High quality surfaces in terms of low roughness and high form accuracy are achieved by polishing as the essential finishing step. Polishing of brittle materials is an established process in science and industry. However, the machining is limited to planar or spherical geometries. The objective of this paper is to present first results to overcome this limitations indicated by processing advanced ceramics.In order to finish complex surfaces, a technological transfer of known parameters and conditions of 2-dimensional to zonal polishing is undertaken. To shorten the development of stable and reproducible processes the knowledge and understanding of the complex interactions of the 2-dimensional process is used. The applicability of these conditions is evaluated by extensive research on the zonal polishing setup. The used machine tool is capable of adjusting significant process factors, such as free controlled force and heterodyne velocity profiles. By use of a small tool the material removal is only affecting a zonal area of a complex surface. Based on preliminary investigations concerning the material removal function the scientific insight on zonal processes is extended. This first approach will be used for corrective polishing of zonal form deviations.     

模具型面快速数控抛光研究

针对模具型面的特点,提出一种快速数控抛光工艺方法.通过对抛光轮和抛光装置的柔性设计,使得与普通数控机床相联的抛光工具能够随着模具表面形貌的变化,作出一定范围内的姿态调节,从而保持了抛光过程的一致性,能够获得均匀的抛光效果.通过抛光实验,初步验证了抛光工具对曲面的加工能力,并从实验数据中总结出抛光加工的去除模型.     

磁辅助超精密加工技术

综述了磁辅助超精密加工的研究现状,介绍了磁性研磨、磁流变抛光、磁辅助电化学加工、磁粒喷射加工、磁性浮体抛光的原理及典型加工设备,并分析了磁辅助超精密加工技术的发展趋势。     

Analysis of magnetorheological fluid behavior in chemo-mechanical magnetorheological finishing (CMMRF) process

Advanced nanofinishing is an important process in manufacturing technologies due to its direct influence on optical quality, bearing performance, corrosion resistivity, bio-medical compatibility and micro-fluidics attributes. Chemo-mechanical magnetorheological finishing (CMMRF) process, one of the advanced nanofinishing process, was developed by combining essential aspects of chemo-mechanical polishing (CMP) process and magnetorheological finishing (MRF) process for surface finishing of engineering materials. The CMMRF process was experimentally analyzed on silicon and copper alloy to generate surface roughness of the order of few angstroms and few nanometers respectively. However, the process needs theoretical exploration towards better understanding, process optimization and result prediction. Hence, an attempt has been made for theoretical study of CMMRF process to analyze the effects of MR fluid under various process parameters. The present theoretical work is split as per following two sub-activities to simplify intricacy of the work.1) FEA-CFD simulation to analyze magnetism, polishing pad formation and polishing pressure during the CMMRF process. The simulation results are used to conduct experiments on aluminium alloy.2) A mathematical model has been developed to predict material removal as well as surface roughness during the CMMRF process. Model validation is conducted by comparing finite element simulation results with the experiments on aluminium alloy.The theoretical results show good agreement with the experimental data and the same has been discussed in this paper.     

平面磁力研磨轨迹的研究与分析

利用自行设计的试验装置,改善了磁力刷的研磨轨迹。结果表明:改善磁力刷研磨轨迹后,不仅可以减小表面粗糙度值、提高平面精度,还改善了研磨截面微观形状均匀性。另外,可通过采取理论分析的方法对研磨效果进行预测。     

使用条件对合成抛光革粘弹性行为的影响

粘弹性行为是决定合成抛光革抛光性能的重要因素。在抛光中，抛光革由于温度、抛光度、使用状态等因素将使其粘弹性行为发生变化。本文研究了这种变化对抛光质量和抛光精度的影响     

Non-resonant vibration-assisted magnetorheological finishing

Nano-finishing of material surfaces is an important class of technology in precision manufacturing. This paper presents a non-resonant vibration-assisted magnetorheological finishing method for difficult-to-process materials. The aim is to enhance the shearing effects of the magnetorheological finishing. A two-dimensional vibration-assisted polishing device was developed, and the impact forces generated by the vibration could change the contact force during the experiments. A polishing force model that considered the vibration parameters was established, which could analyze the processing principles and explain the reason for the increase in shear force. Then, a set of processing experiments were carried out to study the effects of vibration parameters on the surface roughness and peak-to-valley value of silicon carbide samples. Finally, the relationship between the vibration parameters, surface quality, and polishing forces was studied. Theoretical calculations and experimental analyses show that the vibration could improve the shearing effects of the flexible polishing cluster. Meanwhile, a higher amplitude and frequency could raise the total shear force, which can lead to a better surface quality.     

磁流变斜轴抛光及其路径控制

为解决磁流变抛光较小曲率半径(φ8 mm以下)非球面光学零件困难和抛光效率不高等问题,以四轴超精密机床为平台,开发出一种基于磁场辅助的磁流变斜轴抛光工艺,采用微小磁性工具头斜轴抛光方式,通过X轴、Y轴、Z轴、B轴四轴联动,控制抛光路径,防止干涉,实现微小非球面的超精密抛光.并对微小磁性斜轴抛光工具头的抛光路径轨迹进行了分析计算,采用驻留时间修正方法对误差进行修正,在此基础上开发出适用于微小非球面斜轴抛光的数控加工与修正软件.     

Development of electrically controlled polishing with dispersion type ER fluid under AC electric field

This paper shows that a dispersion type functional fluid and AC electric field may be used to control the distribution of abrasives in free-abrasive polishing and to improve surface roughness and finishing time. In the case of polishing conductive materials, such as cemented carbide, an AC electric field created by a mono-pole electrode has concentrated abrasives in the polishing area. To obtain a minimum surface roughness, a peak-to-valley voltage of 2 kV at a frequency of 0.8 Hz has been applied. Then the surface roughness of a cemented carbide plate was reduced from 0.65 μm Ra to 0.02 μm Ra in 5 min. But to polish non-conductive materials, such as glass and semiconductors, a multi-layered concentric electrode must be introduced. The surface roughness of borosilicate glass plates has been reduced from 13.5 nm Ra to 7.5 nm Ra in 3 min under the optimum AC electric field gradient of 2 kV/mm and 0.8 Hz frequency.