Effect of the annealing atmosphere on the Au site in Er + Au-implanted silica

The Au site in Er + Au-implanted silica has been investigated by X-ray absorption spectroscopy, after annealing at 600 °C in either neutral N₂ or reducing H₂ (4%):N₂ (95%) atmosphere. High-resolution X-ray fluorescence spectra collected near the Au L_III-edge indicate the presence of oxidized Au atoms in the N₂-annealed sample. Correspondingly, the EXAFS analysis shows a weak Au-O coordination only for the sample annealed in neutral atmosphere. For both cases, the EXAFS results evidence the presence of sub-nanometer metallic Au clusters: the cluster size, always below 1 nm, is smaller for the sample annealed in reducing atmosphere. The Au clusters embedded in the Er-doped layer promote a strong enhancement of the Er photoluminescence emission at 1.5 μm.     

The range distribution and annealing behavior of Er ions implanted in silicon-on-insulator

The range distribution for energetic 400 keV Er ions implanted in silicon-on-insulator (SOI) at room temperature were measured by means of Rutherford backscattering followed by spectrum analysis. The damage distribution and annealing behavior of implanted Er ions in SOI at the energy of 400 keV with dose of 5 × 10¹⁵ cm⁻² were obtained by Rutherford backscattering technique. It has been found that the damage around the SOI surface had been almost removed after annealed in nitrogen atmosphere at 900 °C, and a lot of Er atoms segregate to the surface of sample with the recrystallization of surface Si of SOI sample after annealing at 900 °C.     

Strain-driven (0 0 2) preferred orientation of ZnO nanoparticles in ion-implanted silica

We present an experimental and theoretical study on the structural properties of ZnO nanoparticles embedded in silica. The ZnO-SiO₂ nanocomposite was prepared by ion implanting a Zn⁺ beam in a silica slide and by annealing in oxidizing atmosphere at 800 °C. From an experimental point of view, the structural properties of the ZnO-SiO₂ nanocomposite were studied by using glancing incidence X-ray diffraction. According to the results, zinc crystalline nanoclusters with an average diameter of 13 nm are in the as-implanted sample. The annealing in oxidizing atmosphere promotes the total oxidation of the Zn nanoclusters and increases their size until to an average of 22 nm. Moreover, the formed ZnO nanocrystals have a preferential (0 0 2) crystallographic orientation. From a theoretical point of view, the preferential orientation of the ZnO nanoparticles can be explained satisfactory by the minimization of the strain energy of the nanoparticles placed in proximity of the surface of the matrix.     

Damage recovery and optical activity in europium implanted wide gap oxides

In this study we compare and discuss the defects and optical behaviour of sapphire and magnesium oxide single crystals implanted at room temperature with different fluences (1 × 10¹⁵-1 × 10¹⁶ cm⁻²) of europium ions.Rutherford backscattering channelling shows that for fluences above 5 × 10¹⁵ cm⁻² the surface disorder level in the Al-sublattice reaches the random level. Implantation damage recovers fast for annealing in oxidizing atmosphere but even for the highest fluence we recover almost completely all the damage after annealing at 1300 °C, independently of the annealing environment (reducing or oxidizing). Annealing above 1000 °C promotes the formation of Eu₂O₃ in the samples with higher concentration of Eu. The optical activation of the rare earth ions at room temperature was observed after annealing at 800 °C by photoluminescence and ionoluminescence. In Al₂O₃ lattice the highest intensity line of the Eu³⁺ ions corresponds to the forced electric dipole ⁵D₀ → ⁷F₂ transition that occurs ∼616 nm. For the MgO samples the Eu³⁺ optical activation was also achieved after implantation with different fluences. Here, the lanthanide recombination is dominated by the magnetic dipole ⁵D₀ → ⁷F₁ transition near by 590 nm commonly observed for samples were Eu³⁺ is placed in a high symmetry local site. The results clearly demonstrate the possibility to get Eu incorporated in optical active regular lattice sites in wide gap oxides.     

Study on preventing segregation of erbium atoms to a silicon surface by annealing in oxygen atmosphere at high temperature

The damage produced by implantation of Er ions of 400 keV at a fluence of 5 × 10¹⁵ ions/cm² in silicon was investigated by Rutherford backscattering spectrometry with 2.1 MeV He²⁺ ions with multiple scattering models. It was found that the damage around the Si surface was almost removed after annealing in oxygen and nitrogen atmospheres successively at 1000 °C, and only a small portion of the Er atoms segregated to the silicon surface. Most of the Er atoms diffused to deeper depths because of the affinity of Er for oxygen.     

Synthesis and characterization of SnO2 nanoparticles embedded in silica by ion implantation

Tin dioxide nanoparticles embedded in silica matrix were fabricated by ion implantation combined with thermal oxidation. Silica substrate was implanted with a 150 keV Sn⁺ ions beam with a fluence of 1.0 × 10¹⁷ ions/cm². The sample was annealed for 1 h in a conventional furnace at a temperature of 800 °C under flowing O₂ gas. According to the structural characterization performed by X-ray diffraction and transmission electron microscopy techniques, metallic tetragonal tin nanoparticles with a volume average size of 12.8 nm were formed in the as-implanted sample. The annealing in oxidizing atmosphere promotes the total oxidation of the tin nanoparticles into tin dioxide nanoparticles with a preferential migration toward the surface of the matrix, where large and coalesced nanoparticles were observed, and a small diffusion toward the bulk, where smaller nanoparticles were found.     

Temperature dependence of lattice disorder in Ar-irradiated (1 0 0), (1 1 0) and (1 1 1) MgO single crystals

To better appreciate dynamic annealing processes in ion irradiated MgO single crystals of three low-index crystallographic orientations, lattice damage variation with irradiation temperature was investigated. Irradiations were performed with 100 keV Ar ions to a fluence of 1 × 10¹⁵ Ar/cm² in a temperature interval from −150 to 1100 °C. Rutherford backscattering spectroscopy combined with ion channeling was used to analyze lattice damage. Damage recovery with increasing irradiation temperature proceeded via two characteristic stages separated by 200 °C. Strong radiation damage anisotropy was observed at temperatures below 200 °C, with (1 1 0) MgO being the most radiation damage tolerant. Above 200 °C damage recovery was isotropic and almost complete recovery was reached at 1100 °C. We attributed this orientation dependence to a variation of dynamic annealing mechanisms with irradiation temperature.     

Absorption and photoluminescence study of Al2O3 single crystal irradiated with fast neutrons

Colour centers formation in Al₂O₃ by reactor neutrons were investigated by optical measurements (absorption and photoluminescence). The irradiation’s were performed at 40 °C, up to fast neutron (E_n > 1.2 MeV) fluence of 1.4 × 10¹⁸ n cm⁻². After irradiation the coloration of the sample increases with the neutron fluence and absorption band at about 203, 255, 300, 357 and 450 nm appear in the UV-visible spectrum. The evolution of each absorption bands as a function of fluence and annealing temperature is presented and discussed. The results indicate that at higher fluence and above 350 °C the F⁺ center starts to aggregate to F center clusters (F₂, F₂⁺ and ). These aggregates disappear completely above 650 °C whereas the F and F⁺ centers persist even after annealing at 900 °C. It is clear also from the results that the absorption band at 300 nm is due to the contribution of both F₂ center and interstitial ions.     

N-TiO2 nanoparticles embedded in silica prepared by Ti ion implantation and annealing in nitrogen

Room-temperature Ti ion implantation and subsequent thermal annealing in N₂ ambience have been used to fabricate the anatase and rutile structured N-doped TiO₂ particles embedded in the surface region of fused silica. The Stopping and Range of Ions in Matter (SRIM) code simulation indicates a Gaussian distribution of implanted Ti, peaked at ∼75 nm with a full width at half maximum of ∼80 nm. However, the transmission electron microscopy image shows a much shallower distribution to depth of ∼70 nm. Significant sputtering loss of silica substrates has occurred during implantation. Nanoparticles with size of 10-20 nm in diameter have formed after implantation. X-ray photoelectron spectroscopy indicates the coexistence of TiO₂ and metallic Ti in the as-implanted samples. Metallic Ti is oxidized to anatase TiO₂ after annealing at 600 °C, while rutile TiO₂ forms by phase transformation after annealing at 900 °C. At the same time, N-Ti-O, Ti-O-N and/or Ti-N-O linkages have formed in the lattice of TiO₂. A red shift of 0.34 eV in the absorption edge is obtained for N-doped anatase TiO₂ after annealing at 600 °C for 6 h. The absorbance increases in the ultraviolet and visible waveband.     

Structural studies of Ge nanocrystals embedded in SiO2 matrix

Germanium nanoparticles embedded in SiO₂ matrix were prepared by atom beam sputtering on a p-type Si substrate. The as-deposited films were annealed at temperatures of 973 and 1073 K under Ar + H₂ atmosphere. The as-deposited and annealed films were characterized by Raman, X-ray diffraction and Fourier transform infrared spectroscopy (FTIR). Rutherford backscattering spectrometry was used to quantify the concentration of Ge in the SiO₂ matrix of the composite thin films. The formation of Ge nanoparticles were observed from the enhanced intensity of the Ge mode in the Raman spectra as a function of annealing, the appearance of Ge(3 1 1) peaks in the X-ray diffraction data and the Ge vibrational mode in the FTIR spectra. We have irradiated the films using 100 MeV Au⁸⁺ ions with a fluence of 1 × 10¹³ ions/cm² and subsequently studied them by Raman and FTIR. The results are compared with the ones obtained by annealing.     

Tailoring optical and electrical properties of MgO thin films by 1.5 MeV H implantation to fluences

Thin films of magnesia (MgO) with (1 0 0) dominant orientations were implanted with 1.5 MeV H⁺ ions at room temperature to various fluences of 10¹³, 10¹⁴ and 10¹⁵ ions/cm². X-ray analysis unambiguously showed crystallinity even after a peak damage fluence of 10¹⁵ ions/cm². Rutherford backscattering spectrometry combined with ion channeling (RBS/C) was used to analyze radiation damages and defect distributions. Optical absorption band observed at 5.7 eV in implanted films was assigned to the anion vacancies and the defect was completely disappeared on annealing at 450 °C. Number of F-type defects estimated was 9.42 × 10¹⁵ cm⁻² for the film implanted with 10¹⁵ ions/cm². DC electrical conductivity of 4.02 × 10⁻⁴ S cm⁻¹ was observed in the implanted region which was three orders higher than the as-deposited films. In unison, film surface was modified as a result of the formation of aggregates caused by the atomic mixing of native matrix atoms (Mg and O) and precipitated hydrogen.     

The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel

Magnesium aluminate spinel crystals (MgAl₂O₄ (1 1 0)) deposited with 30 nm Cu film on surface were implanted with 110 keV Ar-ions to a fluence of 1.0 × 10¹⁷ ions/cm² at 350 °C, and then annealed in vacuum condition at the temperature of 500, 600, 700, 800 and 900 °C for 1 h, respectively. Ultraviolet-visible spectrometry (UV-VIS), scanning electron microscopy (SEM), Rutherford backscattering (RBS) and transmission electron microscopy (TEM) were adopted to analyze the specimens. After implantation, the appearance of surface plasmon resonance (SPR) absorbance peak in the UV-VIS spectrum indicated the formation of Cu nanoparticles, and the TEM results for 500 °C also confirmed the formation of Cu nanoparticles at near-surface region. In annealing process, The SPR absorbance intensity increased at 500 and 700 °C, decreased with a blue shift of the peak position at 600 and 800 °C, and the peak disappeared at 900 °C. The SPR absorbance intensity evolution with temperature was discussed combined with other measurement results (RBS, SEM and TEM).     

The interdiffusion and solid-state reaction of low-energy copper ions implanted in silicon

At room temperature, single-crystal silicon was implanted with Cu⁺ ions at an energy of 80 keV using two doses of 5 × 10¹⁵ and 1 × 10¹⁷ Cu⁺ cm⁻². The samples were heat treated by conventional thermal annealing at different temperatures: 200 °C, 230 °C, 350 °C, 450 °C and 500 °C. The interdiffusion and solid-state reactions between the as-implanted samples and the as-annealed samples were investigated by means of Rutherford backscattering spectrometry (RBS) and X-ray diffraction (XRD). After annealing at 230 °C, the XRD results of the samples (subject to two different doses) showed formation of Cu₃Si. According to RBS, the interdiffusion between Cu and Si atoms after annealing was very insignificant. The reason may be that the formation of Cu₃Si after annealing at 230 °C suppressed further interdiffusion between Si and Cu atoms.     

Surface exfoliation and defect structures in Si induced by 160 keV He and 110 keV H ion implantation

Cz n-type Si(100) wafers were implanted at room temperature with 160 keV He ions at a fluence of 5 × 10¹⁶/cm² and 110 keV H ions at a fluence of 1 × 10¹⁶/cm², singly or in combination. Surface phenomena and defect microstructures have been studied by various techniques, including scanning electron microscopy (SEM), atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM). Surface exfoliation and flaking phenomena were only observed on silicon by successive implantation of He and H ions after subsequent annealing at temperatures above 400 °C. The surface phenomena show strong dependence on the thermal budget. At annealing temperatures ranging from 500 to 700 °C, craters with size of about 10 μm were produced throughout the silicon surface. As increasing temperature to 800 °C, most of the implanted layer was sheared, leaving structures like islands on the surface. AFM observations have demonstrated that the implanted layer is mainly transfered at the depth around 960 nm, which is quite consistent with the range of the ions. XTEM observations have revealed that the additional low fluence H ion implantation could significantly influence thermal growth of He-cavities, which gives rise to a monolayer of cavities surrounded by a large amount of dislocations and strain. The surface exfoliation effects have been tentatively interpreted in combination of AFM and XTEM results.     

Formation of Au nanoparticles in silica by post-irradiation and thermal annealing

SiO₂ + Au thin films were prepared on SiO₂ substrates using ion beam assisted deposition (IBAD). The film was annealed at different temperatures. After each annealing, the optical absorption spectrum was taken to monitor the gold nanocluster formation in the thin film. By using Doyle’s formula, the size of the nanoclusters was determined and plotted as a function of the annealing temperature. Separately, other identical films were bombarded with ions of different energies and different fluence to monitor the nanoclusters forming during the bombardments. We have compared the effect of electronic energy deposition of the energetic ions with the effect of annealing at various temperatures.     

Determination of K shell absorption jump factors and jump ratios in the elements between Tm(Z = 69) and Os(Z = 76) by measuring K shell fluorescence parameters

The K shell absorption jump factors and jump ratios have been measured in the elements between Tm (Z = 69) and Os(Z = 76) without having any mass attenuation coefficient at the upper and lower energy branch of the K absorption edge. The jump factors and jump ratios for these elements have been determined by measuring K shell fluorescence parameters such as the total atomic absorption cross-sections, the K_α X-ray production cross-sections, the intensity ratio of the K_β and K_α X-rays and the K shell fluorescence yields. We have performed the measurements for the calculations of these values in attenuation and direct excitation experimental geometry. The K X-ray photons are excited in the target using 123.6 keV gamma-rays from a strong ⁵⁷Co source, and detected with an Ultra-LEGe solid state detector with a resolution 0.15 keV at 5.9 keV. The measured values have been compared with theoretical and others’ experimental values. The results have been plotted versus atomic number.     

Photoluminescence and radiation effect of Er and Pr implanted silicon-rich silicon oxide thin films

Er and Pr ions were implanted into silicon-rich silicon oxide (SRSO) thin films with Si crystals embedded in SiO₂ matrix. The 525 and 546 nm luminescence peaks were clearly observed in Er-only doped film, but disappeared in the photoluminescence (PL) spectra of Er-Pr codoped films. Instead, a broad PL spectrum extending from 450 to 700 nm was obtained for Er-Pr codoped films with Er/Pr concentration ratio of 1. Concentration profiles of Si, Er and Pr ions in films were simulated by SRIM2006 and related radiation effect on PL response was also discussed. Our results indicate that this material is a potential candidate for the development of white light-emitting diode (LED) and field emission displays for its visible luminescence.     

Determination of the E-pO stability diagram of plutonium in the molten LiCl-KCl eutectic at 450 °C

Plutonium trichloride solution in the molten LiCl-KCl eutectic was prepared by carbochlorination of plutonium oxide. Kinetics of this reaction was compared in different conditions in the range of 443-550 °C. Using this molten salt solution, the redox potential of the Pu(III)/Pu couple at inert tungsten electrode was measured at 450 °C by electromotive force measurement and was found to be E′^○ = −2.76 V vs. the Cl_2(g)(1 atm)/Cl⁻ reference electrode (molar fraction scale). Reaction between plutonium trichloride and oxide ions was studied by potentiometric titration, using yttria stabilized electrodes. In our experimental conditions, the titration curves indicate the precipitation of the sesquioxide Pu₂O₃. The solubility product cologarithm calculated from these curves is found to be pK_s(Pu₂O₃) = 22.8 ± 1.1 (molality scale). Using the experimentally obtained values for E′^○, activity coefficient and pK_s joined to the published thermodynamic data, the stability phase diagram of the Pu-O species was then drawn.     

Dynamic annealing study of SiC epilayers implanted with Ni ions at different temperatures

SiC epilayers grown on 4H-SiC single crystals were implanted with 850 keV Ni⁺ ions with fluences in the 0.5-9 × 10¹⁶ Ni⁺/cm² range. Most of the samples were implanted at 450 °C, but for comparison some implantations were performed at room temperature (RT). In addition, a post-implantation annealing was performed in N₂ at 1100 °C in order to recover the implantation-induced structural damage. The disorder produced by the implantation at 450 °C and the effect of the post-implantation annealing on the recrystallization of the substrates have been studied as a function of the fluence by Backscattering Spectrometry in channeling geometry (BS/C) with a 3.45 MeV He²⁺ beam. RT as-implanted samples showed a completely amorphous region which extends until the surface when irradiated with the highest dose, whereas in the case of 450 °C implantation amorphization does not occur. In general, partial recovery of the crystal lattice quality was found for the less damaged samples, and the dynamic recovery of the crystalline structure increases with the irradiation temperature.     

Microwave sintering of 8 mol% yttria-zirconia (8YZ): An inert matrix material for nuclear fuel applications

This study focused on reducing overall processing time and temperature for fully stabilized zirconia, an inert matrix material candidate, to minimize the loss of actinides (that will be incorporated into the matrix material), while maintaining at least 90% theoretical density (TD). The effects of different processing routes on bulk density and microstructure were evaluated. The results obtained by adopting microwave sintering for 8 mol% Y₂O₃-ZrO₂ were compared to conventional sintering. A 20 min soak time at 1300 °C resulted in pellets with 90% TD for microwave-processed samples, compared to 77% TD for pellets processed conventionally. A similar density was obtained at lower temperature (1200 °C) by increasing the soak time to 100 min in microwave processing. This time and temperature resulted in 60% TD conventionally processed pellets. Compressive strength values obtained for a 1300 °C (20 min soak time) microwave-processed sample were higher (1600 MPa) as compared to a conventionally processed sample (1300 MPa).