氨基醇阻锈剂对钢筋表面钝化膜性能的影响

氨基醇阻锈剂对钢筋表面钝化膜的影响机理尚不清楚。采用动电位极化曲线、X射线光电子能谱(XPS)和原子力显微镜(AFM)研究了氨基醇阻锈剂对钢筋表面生成的钝化膜的影响。结果表明:添加氨基醇阻锈剂后,钢筋表面钝化膜的抗点蚀能力提高,发生点蚀的临界Cl-浓度由未添加阻锈剂时的0.05~0.06 mol/L提高到0.06~0.07 mol/L;钢筋表面生成的钝化膜均是由Fe的氧化物(Feox)和氢氧化物(Fehydrox)组成,氨基醇阻锈剂提高了钝化膜表面的Fehydrox含量;氨基醇阻锈剂的添加使得钝化膜的表面更加光滑平整。     

亚硝酸钙对混凝土结构中钢筋氯腐蚀的缓蚀作用

以模拟环境研究钢筋混凝土结构中钢筋阻锈剂，通过圆柱形试样海水部分浸泡试验及立方试样间浸试验，测得了６个月内添加不同浓度的氯化钠及亚硝酸钙的混凝土试样中钢筋自腐蚀电位及腐蚀电流，并用线性极化方法测定了极化电阻，结果表明亚硝酸钙是一种有效的阳极型阻锈剂。     

X80钢母材和焊缝在高pH值土壤模拟溶液中的点蚀行为

目前,对管线钢焊缝应力腐蚀行为研究较多,而针对其点蚀行为的研究很少。采用动电位极化和电化学阻抗谱研究了X80钢母材和焊缝在高pH值土壤模拟溶液(0.50 mol/LNaHCO_3+0.02 mol/LNaCl)中的点蚀行为,通过金相显微镜观察了母材和焊缝的显微组织和极化后的点蚀形貌,借助Mott-Schokkty曲线分析了钝化膜的半导体特性。结果表明:X80钢母材和焊缝在高pH值土壤模拟溶液中都能够发生钝化,但母材的钝化区间范围更宽,击穿电位更高。母材和焊缝表面所成的钝化膜都呈n型半导体特征,但母材表面的钝化膜致密性和均匀性更好,膜电阻和电荷转移电阻更大,钝化膜内的缺陷密度也更低,这是导致母材抗点蚀性能优于焊缝的一个原因。此外,焊缝组织中高含量的贝氏体组织是造成其点蚀性能下降的另一个因素。     

阻锈剂对混凝土钢筋氯盐腐蚀行为的影响

过去对混凝土腐蚀的研究,其腐蚀液与实际的混凝土孔溶液有较大的差异。采用水泥提取液模拟混凝土孔溶液,通过自腐蚀电位、动电位极化和电化学阻抗谱研究了Ca(NO2)2及商用阻锈剂NNMI和NNRI对混凝土中钢筋氯盐腐蚀行为的影响。结果表明:3种阻锈剂均能有效降低钢筋受Cl-腐蚀的风险,减小腐蚀速率,并能不同程度地提高钢筋腐蚀的临界Cl-浓度;Ca(NO2)2为阳极型阻锈剂,当[NO2-]/[Cl-]为0.62～1.47时,阻锈效果最好,高达98.2%,NNMI和NNRI为以抑制阴极反应为主的综合型阻锈剂,在推荐掺量下,当环境中Cl-浓度为0.03 mol/L左右时,阻锈效率分别可达到85.0%和87.1%。因此,应根据腐蚀环境状况,选用不同的阻锈剂。     

等离子体钝化316L不锈钢抗点蚀性能研究

本文运用冷弧空气等离子体射流技术处理316L不锈钢表面,分别采用俄歇能谱、阳极极化和FeCl3加速腐蚀实验等研究316L不锈钢表面所形成钝化膜的成分、结构和抗点蚀性能。研究表明:316L不锈钢表面经空气等离子体射流氧化处理后,点蚀电位和开路电位与未经处理的样品相比提高400mV;点蚀坑的数量、直径和深度明显降低;316L不锈钢表面钝化膜的厚度大幅提高,从而提高基体的耐点蚀能力。     

氯盐环境中新型合金耐蚀钢筋Cr10Mo1的钝化行为

应用线性极化、电化学阻抗谱与电容电位法等方法对比研究了合金耐蚀钢筋Cr10Mo1和普通碳素钢筋在预含不同浓度(0mol·L~(-1)、0.1mol·L~(-1)、0.3mol·L~(-1)、0.6mol·L~(-1))氯盐的较低碱度(pH=12.5)模拟混凝土孔溶液中的钝化行为,利用XPS方法分析钢筋钝化膜组成结构,分析了氯盐作用下两种钢筋钝化行为变化存在差异的原因,揭示了合金耐蚀钢筋强易钝化机制。结果表明:在各氯盐浓度下,合金耐蚀钢筋均能良好致钝且钝化效果并无较大差距,而普通碳素钢筋随氯盐浓度增大钝化效果显著减弱,当氯盐超过一定浓度则几乎不钝化,甚至发生明显点蚀。Cr氧化物作为合金耐蚀钢筋钝化膜不同于普通碳素钢筋的关键成分,高浓度氯盐作用下仍可保持稳定并维持钝化膜层完整密实,从而使耐蚀钢筋呈现强易致钝特性。     

苯并三唑对模拟混凝土孔溶液中钢筋的阻锈作用

应用线性极化、电化学阻抗谱和动电位极化等电化学方法研究了苯并三唑(BTA)对含有氯离子的模拟混凝土孔溶液中钢筋的阻锈作用,并通过微观测试方法对其阻锈机理进行探索。结果表明,含有0.25mol/LNaCl的模拟混凝土孔溶液(pH为12.5的饱和Ca(OH)2溶液)中加入等物质量(0.25mol/L)的BTA对钢筋有良好的阻锈作用。电化学测试证实了BTA对模拟混凝土孔溶液中钢筋的阻锈效果比常用的亚硝酸盐更明显,微观形貌观察发现BTA能与钢筋生成多层有机保护膜,保护钢筋免受氯离子侵蚀。以上结论均预示着BTA可能成为钢筋混凝土结构中具有很好应用前景的钢筋阻锈剂。     

新型钢筋阻锈剂的合成及其阻锈性能的研究

合成了一种舍有氨基和菝基的有机阻锈刑，并用硬化砂浆法研究了该阻锈剂在砂浆中含有氯离子的条件下对钢筋锈蚀的抑制作用，同时与常用的亚硝酸盐的阻锈效果进行了比较。结果表明，该新型阻锈剂能够有效地阻止钢筋表面钝化膜的破坏，比亚硝酸盐具有更好的阻锈效果。     

适用于海水海砂混凝土阻锈剂的作用机理

采用X射线衍射、扫描电镜和X射线能谱、傅里叶变换拉曼光谱等方法分别研究了复合型阻锈剂对海水海砂混凝土中水泥水化作用、钢筋与混凝土交界面微观结构与组成、钢筋表面吸附的影响。结果表明,阻锈剂C3对水泥水化有一定的延缓作用,可以提高混凝土密实程度,对混凝土强度无不利影响,并且可以通过氨甲基丙醇的物理吸附作用、乙烯基三乙氧基硅烷的密封作用、单氟磷酸钠的化学反应沉淀作用等稳定地富集于钢筋与混凝土交界面处,增强钢筋及其钝化膜的稳定性。     

2507双相不锈钢在NaClO溶液中的腐蚀性能EI北大核心CSCD

采用电化学动电位再活化法(EPR)、动电位极化和交流阻抗测试方法(EIS)研究2507双相不锈钢(SAF2507)在5g/L NaClO溶液中的晶间腐蚀和点腐蚀行为,并采用X射线光电子能谱(XPS)研究SAF2507腐蚀后表面形成的钝化膜组成。结果表明:SAF2507的再活化率Ra为0.68%,具有良好的耐晶间腐蚀性能;动电位极化和EIS的测试结果表明:SAF2507极化后能够发生自钝化现象,钝化区间为-0.5~0.6V;电荷传递电阻为1.389×10~4Ω·cm^2,说明其具有较强的耐点腐蚀性能。XPS研究表明SAF2507在5g/L NaClO溶液中钝化膜主要成分为Cr,Fe等氧化物和氢氧型化合物。同时进一步探讨了SAF2507的腐蚀机理。     

Synthesis of nanostructured zirconia electrodeposited films on AISI 316L stainless steel and its behaviour in corrosion resistance assessment

This work deals with the study of AISI 316L stainless steel samples coated with nanostructured zirconia thin films, using electrodeposition methods. The chemical composition and compounds formed were determined by X-ray photoelectron spectroscopy (XPS). The morphology of zirconia films was analysed by scanning electron microscopy (SEM) and atomic force microscopy (AFM).Corrosion resistance of the coated steel was tested in a chloride environment. XPS analysis results show zirconium element on the metal surface, bound to oxygen-forming zirconia. The anodic polarization curves obtained in Hank's solution show that zirconia coating can be used as protective coating against pitting corrosion of AISI 316L stainless steels.     

Investigation of corrosion behavior of nitrogen doped and platinum/ruthenium doped diamond-like carbon thin films in Hank's solution

Undoped (DLC), nitrogen-doped (N-DLC) and platinum/ruthenium doped diamond-like carbon (PtRu-DLC) thin films were deposited on p-Si (100) substrates using a DC magnetron sputtering deposition system. The chemical composition, bonding structure, surface morphology and adhesion strength of the films were characterized using X-ray photoelectron spectroscopy (XPS), micro-Raman spectroscopy, atomic force microscopy (AFM) and micro-scratch test, respectively. The corrosion behavior of the films in a Hank's solution was investigated using potentiodynamic polarization test. The corrosion results revealed that the PtRu-DLC film had the highest corrosion potential among the films used in this study.     

Corrosion behavior of aluminum doped diamond-like carbon thin films in NaCl aqueous solution

Aluminum doped diamond-like carbon (DLC:Al) thin films were deposited on n-Si(100) substrates by co-sputtering a graphite target under a fixed DC power (650 W) and an aluminum target under varying DC power (10-90 W) at room temperature. The structure, adhesion strength and surface morphology of the DLC:Al films were characterized by X-ray photoelectron spectroscopy (XPS), micro-scratch testing and atomic force microscopy (AFM), respectively. The corrosion performance of the DLC:Al films was investigated by means of potentiodynamic polarization testing in a 0.6 M NaCl aqueous solution. The results showed that the polarization resistance of the DLC:Al films increased from about 18 to 30.7 k(omega) though the corrosion potentials of the films shifted to more negative values with increased Al content in the films.     

Influence of chloride ion concentration and temperature on the electrochemical properties of passive films formed on a superduplex stainless steel

Polarization measurements were conducted to monitor the corrosion behavior of superduplex stainless steel ASTM A995M-Gr.5A/EN 10283-Mat#1.4469(GX2CrNiMo26-7-4) when exposed to a) an electrolyte containing 22,700 parts per million (ppm) of chloride ions at seven different temperatures and b) an electrolyte at 25 °C and different chloride ion concentrations (5800, 22,700, 58,000 and 80,000 ppm of Cl^?). The polarization curves indicate that the passive films formed are only slightly affected by NaCl concentration, but the pitting potential decreases drastically increasing the temperature, in particular > 60 °C. The image analysis of the microstructure after potentiodynamic polarization showed that the pitting number and size vary in function of the temperature of the tested medium. Nyquist diagrams were determined by electrochemical impedance spectroscopy to characterize the resistance of the passive layer. According to Nyquist plots, the arc polarization resistance decreases increasing the temperature due to a catalytic degradation of the oxide passive films.     

Effect of substrate temperature on corrosion performance of nitrogen doped amorphous carbon thin films in NaCl solution

Nitrogen doped amorphous carbon (a-C:N) thin films were deposited on p-Si substrates by DC magnetron sputtering at varying substrate temperature from room temperature (RT) to 300 °C. The bonding structure, surface morphology and adhesion strength of the a-C:N films were investigated by using X-ray photoelectron spectroscopy (XPS), micro-Raman spectroscopy, atomic force microscopy (AFM) and micro-scratch testing. The corrosion behavior of the a-C:N films was evaluated by potentiodynamic polarization test in a 0.6 M NaCl solution. The results indicated that the corrosion resistance of the films depended on the sp³-bonded cross-link structure that was significantly affected by the substrate temperature.     

温度对X80管线钢在0.5mol/L Na_2CO_3+1.0mol/L NaHCO_3溶液中电化学腐蚀性能的影响

目前,有关温度对CO_3~(2-)-HCO_3~-环境下X80管线钢腐蚀行为的影响规律尚无统一的认识。为了探究高强度钢在不同温度的0.5 mol/L Na_2CO_3+1.0 mol/L NaHCO_3溶液中的腐蚀行为,采用动电位极化、电化学阻抗技术,并结合金相显微镜观察研究了温度对X80管线钢在0.5 mol/L Na_2CO_3+1.0 mol/L NaHCO_3溶液中电化学腐蚀行为的影响规律,并通过Mott-Schottky曲线对不同温度下钝化膜的半导体性质进行探讨。结果表明:温度从30℃上升至75℃时,X80钢的点蚀电位和电荷转移电阻均逐渐减小,腐蚀现象越明显;当温度达到90℃时,点蚀电位和电荷转移电阻反而增大,腐蚀程度有所减缓;在0.3~0.7 V内,钝化膜呈现出典型的n型半导体特征;随着温度的升高,钝化膜内的施主电流密度和平带电位呈现先降低后增加的趋势,钝化膜稳定性先减弱后增强;在75~90℃之间存在一个临界温度,此温度下钝化膜的缺陷密度最大,保护性最差。     

Pitting Corrosion Behaviour of Monel-400 Alloy in Chloride Solutions

1-IntroductionPittingcorrosionisthemostdestructiveformamongthedifferentformsoflocalizedcorrosionofmetals.Thebreakdownofthepassivefilmbyag-gressiveionssuchaschlorideionscanleadtohighpenetrationrates.Copper-nickelalloysarewidelyusedascorrosionresistantmaterialsinmarineengineering.Theircor-rosionratesdecreasesharplywithincresingNicon-tent.AseriesofCu-Nialloyshavebeenwidely.tudi.d[1~12]innaturalseawaterandinNaClsolu-tionsusingdifferentelectrochemicalmethods.Con-tradictoryresultshavebeenobtained…     

Activation of p-type conduction in ZnO:N films by annealing in atomic oxygen

ZnO:N epitaxial films have been grown by reactive magnetron sputtering. The effect of annealing in atomic oxygen on the structural and electrical properties of the ZnO:N films has been studied by X-ray diffraction, atomic force microscopy, Hall effect measurements, and X-ray photoelectron spectroscopy. By annealing at temperatures from 500 to 700°C, we have obtained p-type ZnO:N films with a resistivity of ～57 Ω cm, hole mobility of ～2.7 cm²/(V s), and hole concentration of ～6.8 × 10¹⁷ cm^?3. X-ray photoelectron spectroscopy results suggest that the p-type conductivity of the films is due to a decrease in the concentration of (N₂)_O and V _O donors.     

Properties of epitaxial ZnO:P films

Epitaxial ZnO:P films have been produced by annealing ZnP₂ substrates in atomic oxygen and characterized by X-ray diffraction, atomic force microscopy, Hall effect measurements, X-ray photoelectron spectroscopy, and photoluminescence measurements. The X-ray diffraction patterns of the films showed the 002 peak, indicating that their c axis was normal to the substrate surface. According to the Hall effect data, the layers were p-type, with a resistivity of ～20 Ω cm, hole mobility of ～9 cm²/(V s), and hole concentration of ～7.8 × 10¹⁷ cm^?3. The photoluminescence spectra of the ZnO:P films showed a peak at 3.356 eV (neutral acceptor bound exciton). Our results indicate that the ZnO:P films contain the P_Zn-2V_Zn defect complex as a shallow acceptor responsible for their p-type conductivity.     

硅片表面原子层沉积Al_2O_3薄膜及其长期腐蚀行为

目前,对硅基材表面利用原子层沉积技术(ALD)制备的Al_2O_3薄膜的耐蚀性鲜见研究报道。利用ALD技术在硅片表面制备非晶Al_2O_3薄膜。采用扫描电镜(SEM)观察薄膜的表面及截面形貌;采用X射线光电子能谱仪(XPS)分析薄膜的价键结构;通过交流阻抗谱和动电位极化曲线研究硅基材与薄膜在不同浸泡时间下的耐腐蚀性能;采用光学显微镜观察腐蚀过程中基材与薄膜的表面形貌。结果表明:ALD非晶态Al_2O_3薄膜具有致密结构,在浸泡过程中,镀膜基材比裸基材具有更好的耐腐蚀性能;且在长期浸泡情况下,Al_2O_3薄膜对基材仍能起到良好的保护作用。