高可见光透过、高紫外截止镀膜玻璃的制备

为了提高镀膜玻璃的可见光透过率, 本研究通过反胶束溶液刻蚀法制备出一种新型玻璃基板, 即表面多孔玻璃。玻璃表面形成了蜂窝状的多孔膜层, 减小了对可见光的反射率, 从而使可见光平均透过率提高了7%。通过一系列射频磁控溅射实验, 探索了可见光平均透过率高, 紫外阻隔率最高的最佳工艺条件。在此条件下, 分别在制备的表面多孔玻璃和普通玻璃上镀CeO₂/TiO₂防紫外线膜, 并采用紫外-可见分光光度计、SEM、XRD、XPS等测试手段对样品进行了分析表征。结果表明, 在相同的镀膜条件下, 当镀膜后表面多孔玻璃与镀膜普通玻璃的紫外光阻隔率均为99%时, 表面多孔玻璃镀膜后的可见光平均透过率为85%, 而普通玻璃镀膜后的可见光平均透过率仅为79%。此外, 玻璃表面上的孔结构还提高了薄膜与基板的接触面积, 使膜基结合力提高2倍左右。     

ZrO2-SiO2薄膜对离子交换增强玻璃的光学和力学性能影响

采用溶胶-凝胶法在玻璃表面制备出ZrO₂-SiO₂薄膜, 然后通过离子交换形成镀膜增强玻璃, 研究了薄膜组成对离子交换增强玻璃的力学和光学性能的影响。利用紫外可见分光光度计、激光椭偏仪、纳米压痕、三点抗弯和能谱(EDX)分析了薄膜结构及性能。结果表明: 所有薄膜均连续均匀, 纯ZrO₂薄膜为四方相结构, 含Si薄膜为无定形结构; 薄膜具有较高弹性恢复率(>60%)以及H/E比(>0.1), 有利于强度增强; 随Si含量增加, 可见光透过率增大, 但表面硬度和杨氏模量随之降低; 0.5ZrO₂-0.5SiO₂薄膜综合性能最佳: 表面硬度为18 GPa, 抗弯强度为393 MPa, 厚度~45 nm时可见光透过率大于85%。     

多层增透膜对铒硼硅酸盐玻璃光学性质的影响

玻璃表面由于反射作用会使光能损失.为了减少玻璃表面的反射损失,可以通过在表面镀增透膜来解决.研究了多层增透膜对铒硼硅酸盐玻璃可见光透过率的影响.在理论上比较了不同膜系结构(层数不同)的增透膜对铒硼硅酸盐玻璃的增透效果.采用了六层膜的设计,并对镀膜前后玻璃的反射率和透过率进行了测试,玻璃在可见光区的430nm波段到800m波段的平均反射率从原来的7.5%左右下降到了1%左右,其吸收光谱曲线的最高透过率从未镀膜前的80%左右提高到了97%左右.同时,镀膜后的铒硼硅酸盐玻璃在0.53μm处的透过率仍然保持在0.01%(光密度D0.53=4),而可见光透过率达到了65%,比镀膜前提高了10%左右,玻璃的可视性得到了明显的改善.     

蓝宝石衬底上增透膜的设计与制备

采用彻底搜索法,在蓝宝石(α-Al2O3)衬底上分别设计出了SiO2单层和SiO2／Si双层增透保护膜系。设计结果表明单层及多层增透膜系均可实现蓝宝石中红外波段(3～5μm)的增透。利用射频磁控反应溅射法制备出所设计的增透膜系。结果表明,蓝宝石衬底上镀单层及多层增透膜系后红外透过率明显提高;当蓝宝石衬底双面镀SiO2膜后．在3～5μm波段范围内,平均透过率达到96．43％．比未镀膜时的平均透过率87．01％提高了9,42％．满足了设计使用要求。     

提高蓝宝石高温强度和透过率的研究

在蓝宝石(α-Al2O3)衬底上利用射频磁控反应溅射法制备出SiO2/Si3N4双层增透膜系,并对镀膜后的蓝宝石进行了高温强度测试及其透过率的研究.研究表明:镀膜后蓝宝石的高温强度和透过率均有明显提高;800℃时,镀膜蓝宝石的高温强度比未镀膜提高了41.0%;在3～5μm波段范围内,室温下镀膜后透过率比镀膜前提高8.0%;SiO2/Si3N4膜系具有较高的热稳定性,且与蓝宝石衬底附着良好.     

Si_3N_4/CrN_x/Ag/NiCrN_X/Si_3N_4复合涂层的光热性能

采用磁控溅射法在浮法玻璃上制备Si3N4/CrNx/Ag/NiCrNX/Si3N4复合涂层,并与浮法玻璃和传统Low-E玻璃进行对比研究了其光热性能。结果表明:随着Ag层厚度的增加,增加了红外线反射率,降低了可见光的透过率,具有良好的隔热性能;使用Si3N4作为内外保护层后,增加了复合涂层的硬度和附着力,而且不影响复合涂层的光谱特性。     

SiO2薄膜对蓝宝石红外透过性能的改善

采用射频磁控反应溅射法在蓝宝石衬底上制备了SiO2薄膜,测试了镀膜前后蓝宝石试样的红外透过率,测试并分析了镀膜与未镀膜蓝宝石试样在高温及雨蚀后的红外透过性能.结果表明,蓝宝石衬底上镀SiO2膜后红外透过率明显提高;在高温下,SiO2薄膜依然具有很好的增透作用,镀膜蓝宝石试样的平均透过率明显高于未镀膜蓝宝石试样的平均透过率;雨蚀测试后,镀膜蓝宝石试样的平均透过率损失很小,镀膜蓝宝石的红外透过率明显高于未镀膜蓝宝石的红外透过率.     

可钢化TiO2-Si3N4-CrNx-Ag-NiCrOx-ZnO-Si3N4玻璃涂层的制备和性能表征

采用磁控溅射法制备了可钢化TiO2-Si3 N4-CrNx-Ag-NiCrOx-ZnO-Si3 N4复合玻璃涂层(TSCANZSLow-E玻璃),并对其微观结构和物理性能进行了测试.AFM分析发现,薄膜表面光滑平整,粗糙度Ra为0.323nm;XPS探测到膜层表面存在TiO2和Si3N4;四探针面电阻测试仪测定薄膜方阻Rs为8.81Ω/□,比辐射率值为0.108;光学性能分析显示可见光透过率达81%,在2500nm处的中远红外区反射率达80%;剥落实验证明薄膜与玻璃基底之间具有良好的附着性;钢化测试结果符合国标要求.     

镀膜浮法玻璃的风化性能

采用人工加速风化的方法研究了镀有SiO2薄膜的浮法玻璃的风化性能,并与相同风化条件下的浮法玻璃原片的表面状态进行了比对,从风化机理上进行了分析。红外反射光谱和扫描电镜分析结果表明,镀有SiO2薄膜的浮法玻璃和未镀膜玻璃随着风化温度和风化时间的增加,均呈现风化现象逐渐加重的现象。但前者风化程度明显低于后者,尤其当风化条件(70℃,75%RH,风化15d)恶劣时,镀膜玻璃表面只出现了小块斑点和红外光谱的略微变化;而未镀膜玻璃表面则出现大面积的侵蚀斑块,在红外谱图上不仅≡Si—O—Si≡特征峰发生位移,而且出现了C?O的特征峰。说明SiO2膜层能够很好地阻挡玻璃表面Na+与空气中H+、H3O+的交换,有效地抑制玻璃表面风化的发生。     

层数变化对ZnO/In2 O3多层膜微观结构及光电性能的影响

用直流磁控溅射和热氧化法在玻璃衬底上制备ZnO/In2O3透明导电多层膜,当总厚度一定时,调节溅射沉积的层数与相应各层膜的厚度,研究该多层膜微观结构、光学性能和电学性能的变化.XRD和SEM分析表明:随着溅射沉积层数的增加,In2O3衍射峰的强度不断地减弱,ZnO衍射峰出现了不同的晶面择优取向;多层膜表面的ZnO晶粒粒径变小,光洁度增加.四探针法方块电阻测试表明:低温热氧化时,ZnO/In2O3多层膜的方块电阻随层数的增加而上升;高温氧化时,ZnO/In2O3多层膜的方块电阻随层数的增加而下降.可见光光谱分析表明:随着溅射沉积层数的增加,ZnO/In2O3多薄膜在可见光区的平均透过率增大,透过率的峰值向短波方向偏移.     

Preparation of silica thin films by novel wet process and study of their optical properties

Silicon dioxide (SiO2) thin films have gained considerable attention because of their various industrial applications. For example, SiO2 thin films are used in superhydrophilic self-cleaning surface glass, UV protection films, anti-reflection coatings, and insulating materials. Recently, many processes such as vacuum evaporation, sputtering, chemical vapor deposition, and spin coating have been widely applied to prepare thin films of functionally graded materials. However, these processes suffer from several engineering problems. For example, a special apparatus is required for the deposition of films, and conventional wet processes are not suitable for coating the surfaces of substrates with a large surface area and complex morphology. In this study, we investigated the film morphology and optical properties of SiO2 films prepared by a novel technique, namely, liquid phase deposition (LPD). Images of the SiO2 films were obtained by scanning electron microscopy (SEM) and atomic force microscopy (AFM) in order to study the surface morphology of these films: these images indicate that films deposited with different reaction times were uniform and dense and were composed of pure silica. Optical properties such as refractive index and transmittance were estimated by UV-vis spectroscopy and ellipsometry. SiO2 films with porous structures at the nanometer scale (100-250 nm) were successfully produced by LPD. The deposited film had excellent transmittance in the visible wavelength region.     

高激光损伤阈值266nm紫外增透膜研究

为了研制高激光性能紫外增透膜,分别使用HfO2/SiO2和Al2O3/MgF2两种高低折射率材料组合,采用物理气相沉积技术,设计制备了266 nm增透膜;分析测试了不同材料所组成的增透膜的剩余反射率、粗糙度、光学损耗、界面电场强度和激光诱导损伤阈值等特性。研究结果表明,两组不同膜料制备的266 nm增透膜都能达到剩余反射率<0.2%的要求,且激光诱导损伤阈值都大于5 J/cm(2266 nm,7 ns)。     

Ion-assisted sputtering deposition of antireflection film coating for flexible liquid-crystal display applications

The optical properties and surface morphologies of sputtering films both without and with use of the ion-assisted deposition (IAD) technique are investigated and compared. Optimal antireflection (AR) coating films with SiO2/Nb2O5 layers, which are grown at 80 degrees C with a 15 cm distance between target and substrate, 55 SCCM oxygen flow (SCCM denotes cubic centimeters per minute at STP), and 1250 W magnetron sputtering power with use of the IAD technique, are used to study the optical performance. By using an atomic force microscope to investigate the surface of the sputtered Nb2O5 films, we find that the films' roughness is 0.185 nm. On a flexible hardness polycarbonate (HPC) substrate with the multilayer AR films, the peak transmittances measured in the visible range are 95.89% and 93.40%, respectively, for coatings with and without use of the IAD sputtering technology. These results are better than those measured with a bare HPC substrate (91.25%) and are well above the commercial liquid-crystal display standard (90%) and flexible application.     

磁控溅射制备硅铝阻隔膜的研究

采用磁控溅射技术以10%Si～90%Al合金为靶材,通入O2将Si氧化成SiO2,Al氧化成Al2O3,在普通PET薄膜表面制备具有高阻隔性无机阻隔薄膜层,以增加其阻隔性.传统的磁控溅射法制备SiO2膜工艺,大多采用射频溅射法,但其成本较高,效率较低,无法充分满足大面积工业化镀膜生产的需要.而采用10%Si～90%Al合金不仅可以实现直流溅射工艺,而且测量结果表明,薄膜的阻隔性得到大幅度提高.     

TiNx/SiO2/Ag/SiO2低辐射膜耐H2S气体的腐蚀性能

为了提高玻璃片上SiO2/Ag/SiO2复合膜的耐腐蚀性能,用磁控溅射法在其上制备了TiNx薄膜.采用X射线衍射(XRD)、扫描隧道显微镜(STM)研究了TiNx薄膜的结构及表面形貌;参照GB/T 5137.3-2002电子产品硫化氢腐蚀的检验方法研究了TiNx/SiO2/Ag/SiO2低辐射膜耐H2S气体的腐蚀性能....     

减反射可见光与反射近红外线双功能镀膜玻璃

采用溶胶-凝胶工艺,用提拉法在光伏玻璃上制备了玻璃/TiO2-SiO2/SnO2∶F/SiO2减反射可见光与反射近红外双功能膜。用拟合方法研究了TiO2掺量对TiO2-SiO2膜层折射率的影响、以及溶胶中水含量对SiO2膜层折射率的影响;研究了快速热处理温度对SnO2∶F膜结构和方块电阻的影响,用紫外-可见光谱(UV-Vis)测试了膜层的透射率,用扫描电镜(SEM)观察了膜层的表面形貌。结果表明,TiO2掺量可以使TiO2-SiO2膜层的折射率在1.49~1.97之间变化,SiO2溶胶中的水含量能够在膜面上形成微孔,降低SiO2膜层的折射率。通过优化工艺,制备出了在可见光范围平均透过率约为96%、1120nm波长近红外起始反射的双功能复合膜。对得到的结果进行了讨论。     

Reactive pulsed-DC sputtered Nb-doped VO2 coatings for smart thermochromic windows with active solar control

Thermochromic VO2 thin films have successfully been grown on SiO2-coated float glass by reactive pulsed-DC magnetron sputtering. Different Nb doping amounts were introduced in the VO2 solid solution during the film growing which resulted in films with distinct semiconducting-metal phase transition temperatures. Pure VO2 showed improved thermochromic behavior as compared with VO2 films prepared by conventional DC sputtering. The transition temperatures were linearly decreased from 59 down to 34 degrees C with the increase in Nb content. However, the luminous transmittance and the infrared modulation efficiency were markedly affected. The surface morphology of the films was examined by scanning electron microscopy (SEM) and showed a tendency for grain sized reduction due to Nb addition. Moreover, the films were found to be very dense with no columnar microstructure. Structural analyses carried out by X-ray diffractometry (XRD) revealed that Nb introduces significant amount of defects in the crystal lattice which clearly degrade the optical properties.     

空间太阳电池玻璃盖板表面超薄ITO防静电层的设计及制备工艺

ITO/MgF2复合薄膜既具有较好的表面导电性能又具有较高的透过率,可应用于空间太阳电池玻璃盖板表面。文章主要对ITO/MgF2复合薄膜中表层的超薄ITO薄膜进行了研究。利用TFCalc软件模拟了ITO薄膜厚度对ITO/MgF2复合薄膜光学性能的影响,根据模拟结果采用电子束蒸发法在衬底上依次沉积MgF2薄膜和氧化铟锡(ITO)薄膜,研究了ITO薄膜工艺参数(沉积速率、沉积温度和工作气压)和ITO薄膜厚度对ITO/MgF2复合薄膜光电性能及微观结构的影响。当ITO薄膜沉积速率为0.05nm/s、沉积温度为400℃、工作气压为2.3×10~(-2) Pa、厚度为10nm时,表层ITO薄膜基本连续,其方块电阻(1.94kΩ/)已符合设计需求,ITO/MgF2复合薄膜在可见光区间(400~800nm)的平均透过率达到89.00%。     

Deposition and spectral performance of an inhomogeneous broadband wide-angular antireflective coating

Gradient index coatings and optical filters are a challenge for fabrication. In a round-robin experiment, basically the same hybrid antireflection coating for the visible spectral region, combining homogeneous refractive index layers of pure materials and linear gradient refractive index layers of material mixtures, has been deposited. The experiment involved three different deposition techniques: electron-beam evaporation, ion-beam sputtering, and radio frequency magnetron sputtering. The material combinations used by these techniques were Nb(2)O(5)/SiO(2), TiO(2)/SiO(2), and Ta(2)O(5)/SiO(2), respectively. The spectral performances of samples coated on one side and on both sides have been compared to the corresponding theoretical spectra of the designed profile. Also, the reproducibility of results for each process is verified. Finally, it is shown that ion-beam sputtering gave the best results in terms of deviation from the theoretical performance and reproducibility.     

自组装法制备中空二氧化硅纳米粒子减反射薄膜

以正硅酸乙酯(TEOS)为壳层材料, 聚丙烯酸(PAA)为核材料, 以传统的Stöber水解法为基础制备得到结构规整的中空二氧化硅纳米粒子, 并采用自组装法制备单层减反射薄膜和宽波段双层减反射薄膜。主要研究中空二氧化硅纳米粒子的结构调控方法; 自组装次数和中空二氧化硅纳米粒子分散液的pH值对减反射薄膜透光率的影响规律, 以及具有渐变折射率的双层减反射薄膜的制备。研究结果表明: 通过调节PAA和TEOS的用量可精确调控中空二氧化硅纳米粒子的粒径和空腔体积分率, 进而可精确调控减反射薄膜的厚度和折射率; 通过酸洗工艺, 将自组装次数由10次减少为2次, 简化了涂膜的工艺条件, 在最佳工艺条件下所制备的单层减反射薄膜在350~800 nm波长范围内可显著提高玻璃的透光率, 在最佳波长(λ=520 nm)处将玻璃的透光率由91.6%提高至98.1%; 双层减反射薄膜可在更宽的波段范围内提高基材的透光率, 在400~1500 nm波长范围内将玻璃的透光率提高了5%以上。