MB8镁合金疏水/超疏水表面制备与微摩擦特性研究

通过微弧氧化技术在MB8镁合金表面形成微细表面结构,再利用自组装方法在微弧氧化层表面制备1H,1H,2H,2H-全氟葵烷基三氯硅烷(FDTS)自组装分子膜。采用扫描电镜、表面粗糙度仪、X射线衍射仪、表面硬度仪、接触角测量仪和UMT-2型摩擦磨损试验机评价膜层形貌结构、力学特性、润湿性及其微摩擦学特性。结果显示,镁合金表面经微弧氧化处理和自组装分子膜修饰后,表面润湿性经历了由亲水到超亲水再到超疏水的转变过程。超疏水表面的获得是由微弧氧化处理得到的表面粗糙结构和低表面能物质自组装分子膜共同作用的结果。对试样进行摩擦磨损测试的结果显示,致密层和疏松层以及经自组装分子膜修饰后的膜层均具有比镁合金基底更好的抗磨性能;基于自组装技术制备的疏水、超疏水表面形成的边界润滑膜在一定载荷条件下均能有效地减少基底的摩擦系数,边界润滑膜失效后,基底表面特性占主导地位。     

铝基超疏水表面的制备及其在包装方面的应用进展

在铝基体上构建具有特殊浸润性的超疏水表面,可以赋予其耐腐蚀、防覆冰、润滑减阻等功能,使其具有更大的应用价值和市场前景。制备铝基超疏水表面的方法主要有刻蚀法、阳极氧化法、沉积法、水热法等。化学刻蚀法、阳极氧化法和水热法等操作简单,应用范围广,但在制备过程中用到的强酸强碱等对环境和人体有害;激光刻蚀法等可以控制超疏水表面微观结构的形貌,但使用设备昂贵,难以大范围使用。为拓展超疏水表面的应用领域,开发简便方法制备多级微纳米粗糙结构、使用黏合层加固微观结构、构建自修复超疏水表面是未来的主要研究方向。     

具有不同黏附力Al-Mg-Si合金超疏水表面的制备与表征

基于位错刻蚀理论利用溶液浸泡处理A1-Mg-Si合金在其表面形成微观粗糙表面结构,采用自组装技术在此表面制备FDTS自组装分子膜.采用X射线衍射仪、扫描电子显微镜和表面粗糙度仪对试样表面形貌进行了表征;采用接触角测量仪对试样表面接触角进行了测量.结果表明,试样经溶液浸泡处理和沉积自组装分子膜后,其表面润湿性实现了由亲水到超亲水再到超疏水的转变;改变溶液浸泡时间得到具有不同微观结构的表面,沉积自组装分子膜后得到的超疏水表面具有不同的滚动接触角,其表面黏附力具有明显差异.分析认为,超疏水表面的获得是溶液浸泡处理得到的粗糙表面结构和低表面能物质FDTS自组装分子膜共同作用的结果;表面黏附力的差异是试样表面微观形貌的不同造成水滴在其表面所处状态的差异引发的.     

Al2O3微滤膜的超疏水改性研究

采用多层自组装技术在Al₂O₃微滤膜表面制备TiO₂纳米涂层, 并利用1H,1H,2H,2H-全氟辛基乙基三乙氧基硅烷(PFDS)对其表面进行氟化处理, 获得超疏水改性膜。通过X射线衍射仪, 傅立叶变换红外光谱仪, 原子力显微镜, 水接触角测试仪和扫描电子显微镜对改性膜进行表征。分析了TiO₂纳米涂层的晶型结构, 探讨了TiO₂沉积时间与改性膜表面粗糙度和疏水性之间的关系, 研究了PFDS改性次数对膜表面形貌和疏水性能的影响规律。结果表明: 在600℃退火1 h后, 获得锐钛矿结构的TiO₂纳米涂层。随TiO₂沉积时间的延长, 膜表面粗糙度增大, 水滴在膜表面的接触由Wenzel状态转变为Cassie状态; 当TiO₂沉积时间为50?min, PFDS改性3次时, 获得理想的微纳米二级超疏水表面形貌, 水接触角达到174.5°。     

以丝网为模板量产聚烯烃超疏水/超亲水表面

以不锈钢丝网为模板,用热压微模塑方法制备了聚烯烃超疏水/超亲水表面。研究了热压温度对所制表面微观结构和超疏水性能的影响。考察了所得表面超疏水性的耐水冲击能力。结果表明,所制表面形成了均匀分布的微尖刺结构,并呈超疏水性能（接触角〉150°,滚动角5°）,但抗水压能力较弱,当水流动能稍大时（流速2 m/s、流量0.4 m3...     

消息报道

我国制备出可控超疏水超亲水可逆转换薄膜在中国科学院、国家自然科学基金委和科技部的支持下,中国科学院化学研究所有机固体院重点实验室的研究人员成功制备出双响应可控超疏水与超亲水可逆转换材料。在前期工作中,该组研究人员在紫外响应超疏水-超亲水可逆“开关”研究中,利用水热法成功制备阵列的氧化锌纳米棒,实现了其超疏水表面的浸润性由超疏水向超亲水转变。同时通过表面原子转移自由基聚合方法,在基底上制备温度响应高分子的可逆开关(该项目已入选2004年度“中国十大科技进展新闻”)。在此基础上,该组研究人员成功制备了温度、pH值…     

微纳米结构超疏水膜层的构建与性能研究进展

介绍了超疏水膜层制备的理论,综述了微纳米结构超疏水膜层的构建方法与纳米粒子在超疏水膜层制备中的应用。微纳米结构与低表面能是形成超疏水膜层的2个关键要素,目前的制备方法在一定程度上实现了基体表面的超疏水性能,但试验设备贵、操作复杂、成本高;改性纳米粒子在超疏水膜层制备中具有重要应用,但存在官能团不稳定、改性剂成本高、表面微观结构脆弱等问题。因此,研究易于操作、低成本的制备技术、获得耐用性好的膜层是超疏水材料的重要研究方向。     

纯钛基体长效超疏水表面的低成本制备

为降低钛基上超疏水表面的制备成本,提高超疏水表面的耐久性能,以喷砂-阳极氧化法在纯钛基体上构造微纳复合粗糙结构,并使用商用氟碳罩光漆直接对其进行修饰获得超疏水性表面。利用傅里叶变换红外光谱(FTIR),场发射扫描电子显微镜(FE-SEM)和接触角测试等技术对超疏水性表面的化学组成、表面形貌、润湿性和表面耐久性进行了研究。结果表明:喷砂处理在钛基表面构筑微米级凹坑,阳极氧化通过形成网状氧化膜在钛基表面构造纳米级结构,氟碳罩光漆修饰该微纳复合粗糙表面后,为表面引入大量含氟基团,使其获得超疏水性能。超疏水性表面与纯水的静态接触角达162°±2.3°,滚动角为2.1°±0.2°,具有优异的环境耐久性。     

超疏水-亲水CaBi4Ti4O15涂层制备及其表面浸润性研究

采用简单的涂抹方法, 在衬底上制备了CaBi₄Ti₄O₁₅涂层; 经不同温度退火和120℃放置处理, 得到了浸润性从超疏水到亲水, 其表面接触角从152.5°到43.6°变化的CaBi₄Ti₄O₁₅涂层表面; 通过扫描电镜分析,研究了不同退火温度下涂层表面微观结构变化对表面 浸润性的影响. 结果表明: CaBi₄Ti₄O₁₅涂层表面晶粒和孔洞尺寸变化是导致其表面浸润性从超疏水到亲水变化的主要原因, 而包含纳米颗粒的阶层结构导致亲水CaBi₄Ti₄O₁₅涂层表面呈现出超疏水性.     

电沉积法制备低碳钢超疏水表面及其耐蚀性能

电沉积法制备超疏水表面优势明显,但施加电压较高。采用一步快速电沉积法在低碳钢表面制备超疏水膜,测试了超疏水膜的接触角、形貌,通过动电位极化曲线研究了超疏水膜在3.5%NaCl溶液中的耐蚀性能,优选了超疏水膜的制备工艺。结果表明:超疏水膜最佳制备工艺条件为电解液组成0.20mol/L硬脂酸+0.1%HCl,电沉积电压8V,电沉积时间16h;最优工艺所制备的超疏水膜接触角达到了153°,在3.5%NaCl溶液中的缓蚀效率高达99.1%。     

Patterned hydrophobic-hydrophilic templates made from microwave-plasma enhanced chemical vapor deposited thin films

In the present research, nano-structured materials exhibiting super-hydrophobic behavior obtained by microwave-plasma enhanced chemical vapor deposition (MPECVD) had their surface chemical status altered through vacuum ultraviolet (VUV) light irradiation. Falling water droplets rolled and bounced without wetting or spreading over the initially super-hydrophobic surfaces. We demonstrate a surface preparation technique to create a patterned super-hydrophobic/super-hydrophilic substrate in which micropatterns with super-hydrophobic and super-hydrophilic regions were prepared through irradiation with VUV light. To confirm the method, growth of water droplets is observed in situ on such super-hydrophobic/super-hydrophilic micropatterns. We discuss the applicability of the super-hydrophobic/super-hydrophilic pattern to the bottom-up assembling of materials, like site-selective electroless Cu plating on patterned substrates made of paper and selective cell culture experiments.     

Preparation of super-hydrophobic Cu/Ni coating with micro-nano hierarchical structure

Micro-nano hierarchical structured Cu/Ni multilayer coating was prepared by a simple two-step method combined with electroless and electro deposition. Structure and morphology of the as-prepared Cu/Ni multilayer coating were analyzed by X-ray diffractometer and field emission scanning electron microscopy. Results show that micro-nano Cu/Ni coating is well-crystallized and exhibits sea cucumber-like microstructure with Ni nanocone arrays uniformly dispersed perpendicular to the circular conical surface of Cu cone. Static contact angles were measured to investigate the surfaces' wettability. The result reveals that the Cu/Ni multilayer coating is super-hydrophobic, of which the static contact angle with test liquid (water) was 156°(> 150°).Due to its super-hydrophobic property and unique shape, Cu/Ni multilayer coating is expected to have extensive practical applications.     

Fabrication of a super-hydrophobic nanofibrous zinc oxide film surface by electrospinning

We report a new approach for fabricating a super-hydrophobic nanofibrous zinc oxide (ZnO) film surface. The pure poly(vinyl alcohol) (PVA) and composite PVA/ZnO nanofibrous films can be obtained by electrospinning the PVA and PVA/zinc acetate solutions, respectively. After the calcination of composite fibrous films, the inorganic fibrous ZnO films with a reduced fiber diameter were fabricated. The wettability of three kinds of fibrous film surfaces were modified with a simple coating of fluoroalkylsilane (FAS) in hexane. The resultant samples were characterized by field emission scanning electron microscopy (FE-SEM), water contact angle (WCA), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). It was found that the pure PVA fibrous films maintained the super-hydrophilic surface property even after the FAS modification. Additionally, the WCA of composite fibrous films was increased from 105 to 132° with the coating of FAS. Furthermore, the surface property of inorganic ZnO fibrous films was converted from super-hydrophilic (WCA of 0°) to super-hydrophobic (WCA of 165°) after the surface modification with FAS. Observed from XPS data, the hydrophobicity of FAS coated various film surfaces were found to be strongly affected by the ratio of fluoro:oxygen on the film surfaces.     

Liquid phase deposition of BiFeO3 thin film on self-assembly monolayers

BiFeO₃ (BFO) thin films were successfully deposited on self-assembled monolayers (SAMs) by the liquid phase deposition method. The measurement of contact angle and atomic force microscopy (AFM) showed that after immersion in an octadecyl trichlorosilane (OTS) solution for 30 min, the surface of the substrate was covered with a smooth, hydrophobic layer. After UV irradiation for 30 min, the smooth hydrophobic layer changed into a serrated hydrophilic layer. This indicated that the OTS-SAMs played an active role as chemical templates in controlling nucleation and growth of the BFO thin film. The phase and the surface topography of the BFO film were investigated respectively by X-ray diffraction, Field emission scanning electron microscopy (FE-SEM) and AFM. The results showed that the optimum annealing temperature and deposition temperature for preparing the BFO thin film were 600 and 70 °C respectively. The films were annealed at 600 °C for 2 h. As-prepared thin films were smooth, uniform, and dense with the height varying between 20 and 100 nm. Moreover, patterned BFO nanoarrays were prepared.     

Synthesis and characterization of carbon/silica superhydrophobic multi-layer films

C/SiO₂ multi-layer films (3-layer films and 5-layer films) were obtained by sol-gel method and physical deposition on glass plates, and then heated at 500 °C for 1 h under a nitrogen atmosphere. The mechanical adhesive force with the substrate of the multi-layer films was sharply enhanced compared to the as-deposited amorphous carbon film. An absorption layer was formed on heat treated C/SiO₂ multi-layer films by modification of the surface with trimethylchlorosilane, and the wettability of the films changed from hydrophilic to super-hydrophobic. The structures of the physically deposited carbon and the multi-layer films were analyzed by X-ray diffraction, transmission electron microscopy and scanning electron microscopy. The experimental results showed that the 5-layer films had a concentric ring structure that caused the film to be superhydrophobic.     

Reactive DC Magnetron Sputtering Deposition of Copper Nitride Thin Film

Copper nitride thin film was deposited on glass substrates by reactive DC （direct current） magnetron sputtering at a 0.5 Pa N2 partial pressure and different substrate temperatures. The as-prepared film, characterized with X-Ray diffraction, atomic force microscopy, and X-ray photoelectron spectroscopy measurements, showed a composed structure of Cu3N crystallites with anti-ReO3 structure and a slight oxidation of the resulted film.The crystal structure and growth rate of Cu3N films were affected strongly by substrate temperature. The preferred crystalline orientation of Cu3N films were （111） and （200） at RT, 100℃. These peaks decayed at 200℃ and 300℃ only Cu （111） peak was noticed. Growth of Cu3N films at 100℃ is the optimum substrate temperature for producing high-quality （111） Cu3N films. The deposition rate of Cu3N films estimated to be in range of 18-30 nm/min increased while the resistivity and the microhardness of Cu3N films decreased when the temperature of glass substrate increased.     

Wettability property of CNT-graphene like film deposited by microwave plasma enhanced vapor deposition technique

Wettability property of carbon nano-tubes (CNT)-graphene like films have been investigated. In this work, we have studied the wettability of CNT-graphene like film deposited on Ni substrate by Microwave Plasma Enhanced vapor deposition Technique (MWPECVD). Compared to the water contact angles of 77.8° for bare Ni substrate, the water contact angle of the CNT-graphene like hybrid films is found to be 128.4°. The nanostructures have been deposited at fixed pressure of 20?Torr with different temperature of 500, 600 and 700?°C. The results indicate that wettability properties of nano-structure can be tailored, significantly. The solid surface energy (SE) of composite films was estimated using contact angle measurements. The wettability of CNT-graphene has been studied first time in film form.     

TEM characterization of super-hydrophilic Ni-Ti thin film

A super-hydrophilic Ni-Ti thin film is evaluated using cross-sectional transmission electron microscopy (TEM). Following sputter deposition and annealing, the Ni-Ti thin films are chemically treated with buffered oxide etchant, nitric acid and 30% hydrogen peroxide solution to produce a 100-nm-thick surface oxide layer. The fabricated Ni-Ti thin films show a 10- to 15-nm TiO₂ thick layer on its surface with a ~ 67° wetting angle. For the surface treated sample, a porous oxide 100 nm TiO layer is found with a < 5°. It is believed that TiOOH(H₂O)_n complex forms on the surface to produce the observed super-hydrophilic behavior.     

A novel patterning technique using super-hydrophobic PTFE thin films by Cat-CVD method

Super-hydrophobic poly-tetrafluoroethylene (PTFE) films, with a water contact angle of over 160°, are formed by catalytic chemical vapor deposition (Cat-CVD) under high catalyzer temperature or pressure. Hydrophobicity of the PTFE films is maintained even after annealing up to 300 °C. We demonstrate a novel method for forming metal lines using super-hydrophobic PTFE films. Water-based functional liquid containing silver nanoparticles dropped on the patterned PTFE film localizes only on hydrophilic regions, resulting in formation of metal lines after annealing up to 150 °C.     

Diffusion barrier property of TiN and TiN/Al/TiN films deposited with FMCVD for Cu interconnection in ULSI

Flow modulation chemical vapor deposition (FMCVD) with titanium tetrachloride (TiCl₄) and ammonia (NH₃) is effective for depositing titanium nitride (TiN) films with conformal morphology, good step coverage, low electrical resistivity, and low chlorine residual contamination. It means that FMCVD TiN film is a good candidate of diffusion barriers for copper interconnection technology in ULSI. But the diffusion barrier property of FMCVD TiN film against Cu diffusion has not been confirmed. So, firstly, we deposited Cu (100 nm)/FMCVD TiN (25 nm)/Si multilayer films and investigated the thermal stability of Cu/TiN/Si structure. Vacuum annealing was done at 400, 500, 550 and 600 °C. For films annealed for 30 min at 400 °C, Cu diffused through the TiN layer and formed copper silicides on the surface of Si substrates. Therefore, FMCVD films formed under such conditions are unsatisfactory diffusion barriers. To enhance the diffusion barrier property of FMCVD TiN films, we used sequential deposition to introduce a monolayer of Al atoms between two TiN films. Etch-pit tests showed that for TiN films with Al interlayer, Cu diffusion through the barrier occurred at 500 °C and that is 100 °C higher than TiN film without Al interlayer. Al atoms formed AlO_x with oxygen atoms present in the TiN films as impurities, and fill up the grain boundaries of TiN film, thereby blocking the diffusion of Cu atoms.