衬底温度对PLD法制备ZnO薄膜结构及发光特性的影响

在60Pa的高氧压气氛中,用脉冲激光沉积法以Si(111)为衬底在不同温度下制备了ZnO薄膜.RHEED和XRD结果表明,所有样品都是c轴高度择优取向的多晶ZnO薄膜.随衬底温度的升高,ZnO薄膜(002)衍射峰的半高宽不断减小,从0.227～0.185°.对(002)衍射峰的2θ值分析表明,650℃下生长的ZnO薄膜几乎处于无应力的状态,而在较低或较高温度下生长的薄膜中都存在着一定程度的c轴压应力.室温PL谱测试说明在650℃生长的ZnO薄膜具有最强的紫外发射峰和最窄的UV峰半高宽(83meV).在700℃得到的样品PL谱中,检测到一个位于3.25eV处的低能发射峰.经分析,该峰可能是来自于施主-受主对(DAP)的跃迁.     

PLD工艺制备高质量ZnO/Si异质外延薄膜

采用脉冲激光沉积工艺在不同条件下以Si(111)为衬底制备了Zno薄膜.通过对不同氧压下(0～50Pa)沉积的样品的室温PL谱测试表明,氧气氛显著地提高了薄膜的发光质量,在50Pa氧气中沉积的ZnO薄膜具有最强的近带边UV发射.XRD测试说明在氧气氛中得到的薄膜结晶质量较差,没有单一的(002)取向.利用-低温(500℃)沉积的ZnO薄膜作缓冲层,得到了高质量的ZnO外延膜.与直接沉积的ZnO膜相比,生长在缓冲层上的ZnO膜展现出规则的斑点状衍射花样,而且拥有更强的UV发射和更窄的UV峰半高宽(98meV).对不同温度下沉积的缓冲层进行了RHEED表征,结果表明,在600～650℃之间生长缓冲层,有望进一步改善ZnO外延膜的质量.     

不同衬底上低温生长的ZnO晶体薄膜的结构及光学性质比较

采用电子束反应蒸发方法,在单晶Si（001）及玻璃衬底上低温外延生长了沿C轴高度取向的单晶ZnO薄膜,并对沉积的ZnO晶体薄膜的结构和光学性质进行了分析比较。通过对ZnO蒲膜的X射线衍射（XRD）分析及光致荧光激发谱（PLE）测量,研究了衬底材料结构特性、生长温度及反应气氛中充O2对ZnO薄膜的晶体结构和晶体光学吸收特性的影响。结果表明：①衬底温度对沉积的ZnO薄膜的晶体结构影响显,玻璃衬底上生长ZnO薄膜的最佳温度比Si(001)衬底上生长的最佳温度要高70℃;②虽在最佳生长条件下获得的ZnO薄膜的的XRD结果（半高宽和衍射强度）相近,但光学吸收特性有较大差异,Si(001)衬底上生长的ZnO薄膜优于玻璃衬底上生长的ZnO薄膜;③反应气氛中的O2分压对XRD结构影响不大,但对PLE谱影响显,充O2后能明显改善吸收边特性。     

Si(111)衬底上多层石墨烯薄膜的外延生长

利用固源分子束外延(SSMBE)技术, 在Si(111)衬底上沉积碳原子外延生长石墨烯薄膜, 通过反射式高能电子衍射(RHEED)、红外吸收谱(FTIR)、拉曼光谱(RAMAN)和X射线吸收精细结构谱(NEXAFS)等手段对不同衬底温度(400、600、700、800℃)生长的薄膜进行结构表征. RAMAN和NEXAFS结果表明: 在800℃下制备的薄膜具有石墨烯的特征, 而 400、600和700℃生长的样品为非晶或多晶碳薄膜. RHEED和FTIR结果表明, 沉积温度在600℃以下时C原子和衬底Si原子没有成键, 而衬底温度提升到700℃以上, 沉积的C原子会先和衬底Si原子反应形成SiC缓冲层, 且在800℃沉积时缓冲层质量较好. 因此在Si衬底上制备石墨烯薄膜需要较高的衬底温度和高质量的SiC缓冲层.     

不同衬底温度下预沉积Ge对SiC薄膜生长的影响

分别在未沉积Ge和不同衬底温度(300、 500、700℃)沉积Ge条件下,利用固源分子束外延(SSMBE)技术在Si衬底上外延SiC薄膜.通过反射式高能电子衍射(RHEED)、X射线衍射(XRD)、原子力显微镜(AFM)和傅里叶变换红外光谱(FTIR)等仪器对样品进行测试.测试结果表明,预沉积Ge的样品质量明显好于未沉积Ge的样品,而且随着预沉积温度的升高,薄膜的质量在逐渐地变好.     

衬底温度对ZnO薄膜生长过程及微观结构的影响研究

以醋酸锌水溶液为前驱体,采用改进的超声喷雾热解法在Si(100)衬底上沉积ZnO薄膜,以X射线衍射(XRD)、扫描电镜(SEM)等手段分析所得ZnO薄膜的晶体结构和微观形貌,着重考察了衬底温度对ZnO薄膜生长过程及微观结构的影响.结果表明,在衬底温度为500℃下所得ZnO薄膜表面均匀光滑,属六方纤锌矿结构,且沿c轴择优生长,晶粒尺寸的为40～50nm;衬底温度对ZnO薄膜生长过程影响显著,随衬底温度的升高,薄膜生长速率存在一极限值,且ZnO薄膜的c轴取向趋势增强,晶粒尺寸得到细化.     

衬底温度对磁控溅射制备外延ZnO薄膜结构特性的影响

在不同的衬底温度下,采用磁控溅射方法在蓝宝石(0001)衬底上制备了外延生长的ZnO薄膜.采用原子力显微镜(AFM)、X射线衍射仪(XRD)、可见-紫外分光光度计系统研究了衬底温度对ZnO薄膜微观结构和光学特性的影响.AFM结果表明在不同村底温度制备的ZnO薄膜具有较为均匀的ZnO晶粒,且晶粒的尺寸随衬底温度的增加逐渐增大.XRD结果显示不同温度生长的ZnO薄膜均为外延生长,400℃生长的薄膜具有最好的结晶质量;光学透射谱显示在370nm附近均出现一个较陡的吸收边,表明制备的ZnO薄膜具有较高的质量,其光学能带隙随着衬底温度的增加而减小.     

不同衬底上低温生长的ZnO晶体薄膜的结构及光学性质比较

采用电子束反应蒸发方法,在单晶Si(001)及玻璃衬底上低温外延生长了沿c轴高度取向的单晶ZnO薄膜,并对沉积的ZnO晶体薄膜的结构和光学性质进行了分析比较。通过对ZnO薄膜的X射线衍射(XRD)分析及光致荧光激发谱(PLE)测量,研究了衬底材料结构特性、生长温度及反应气氛中充O     

Si(111)衬底上3C-SiC的固源MBE异质外延生长

国内首次利用固源分子束外延(MBE)技术,在衬底温度为1100℃时,以Si(111)为衬底成功地外延生长出了3C-SiC单晶薄膜。通过X射线衍射(XRD)、拉曼光谱(Raman)以及原位反射高能电子衍射(RHEED)等手段研究了外延薄膜的晶型、结晶质量、外延膜与衬底的外延取向关系,并考察了薄膜制备过程中衬底的碳化对薄膜质量的影响。结果表明,外延膜与衬底晶格取向完全一致;碳化可以减小SiC和衬底Si之间的晶格失配、释放应力、引入成核中心,有利于薄膜单晶质量的提高;碳化温度存在最佳值,这一现象与成核过程有关。     

衬底温度对Si(111)衬底上MBE异质外延3C-SiC薄膜的影响

利用固源分子束外延(SSMBE)技术, 在Si(111)衬底上异质外延生长3C-SiC单晶薄膜, 通过RHEED、XRD、AFM、XPS等实验方法研究了衬底温度对薄膜结构、形貌和化学组分的影响. 研究结果表明, 1000℃生长的样品具有好的结晶质量和单晶性. 在更高的衬底温度下生长, 会导致大的孔洞形成, 衬底和薄膜间大的热失配使降温过程中薄膜内形成更多位错, 从而使晶体质量变差. 在低衬底温度下生长, 由于偏离理想的化学配比也会导致薄膜的晶体质量降低.     

The theory of the boundary diffraction wave for wedge diffraction

A new potential function, line integration which gives the edge diffracted fields, is constructed for wedge diffraction by using the method of modified theory of physical optics. The surface integrals are transformed into line integrals by the technique of asymptotic reduction. As an application of the novel potential function, the diffracted field is obtained for the geometry of a wedge for arbitrary incidence of plane waves.     

波带片的聚焦特性

我们在研究中发现,文献[1]中所发表的关于菲涅尔波带片聚焦特性的结果,实际上是利用了夫朗和费近似而推导出的。本文指出,用这种方法推导出的结果,除了以瑞利准则定义的分解力外,都是不精确的,甚至是错误的。此外,本文还探讨了双相非光学波带片的聚焦特性。分析结果表明,在环数较少的情况下,对高分解力和低旁瓣的要求,双相波带片能提供正波带片或负波带片更好的折衷。     

Studies of deformation-induced texture development in sheet materials using diffraction techniques

Crystallographic texture measurements were made on a series of rolled aluminum sheet specimens deformed in equi-biaxial tension up to a strain level of 0.11. The measurement techniques used were neutron diffraction with a 4-circle goniometer, electron backscatter diffraction, conventional powder X-ray diffraction (XRD), and XRD using an area detector. Results indicated a complex texture orientation distribution function which altered in response to the applied plastic deformation. Increased deformation caused the {1 1 0} planes, to align parallel to the plane of the sheet. The different techniques produced results that were very consistent with each other. The advantages and disadvantages of the various methods are discussed, with particular consideration of the time taken for each method, the range of orientation space accessible, the density of data that can be obtained, and the statistical significance of each data set with respect to rolled sheet product.     

Influence of laser parameters on the geometric characteristics of a beam transformed by an optical system

The influence of the parameters of a laser on the divergence and the light radii of a beam formed by a plane optical resonator and transformed by an optical system is considered. The studies are conducted for a broad range of Fresnel numbers characteristic of lasers. __________ Translated from Izmeritel’naya Tekhnika, No. 1, pp. 24–27, January, 2008.     

Synthesis and photoluminescence of belt-shaped Si3N4 whiskers

Belt-shaped Si₃N₄ whiskers have been synthesized by a carbothermal reduction and nitridation method. The whiskers had an average width of 800 nm, width-to-thickness ratios of 4-6, and a length in the range of several tens of microns to hundreds of microns. Photoluminescence (PL) spectrum of the whiskers showed a strong blue emission peak at 410 nm, and PL lifetime measurement exhibited a rapid decay within a few nanoseconds. The growth of the whiskers was supposed to be dominated by a vapor-solid (VS) mechanism.     

Texture evolution in Copper film at high temperature studied in situ by electron back-scatter diffraction

Changes in texture and microstructure during the thermal treatment of Cu films have been studied in situ using electron back-scatter diffraction (EBSD). A partially recrystallized Cu film which still had its microstructure evolving at room temperature was investigated using orientation imaging microscopy. Two separate investigations were conducted—the first one at different locations of the film and at different temperatures and a second one at the same location of the film and at different temperatures. The orientation of the (111), (110) and (100) grains within the plane of Cu film was investigated from the orientation distribution functions. There was an increased tendency of the (111) and (110) grains to form either {111}<112> or {111}<110> and {110}<100> texture respectively at higher temperature. The impact of elastic strain energies and dislocation glide in formation of these textures at higher temperatures has been analyzed in the light of some recent observations reported in literature. The variation in the area fraction of different fiber texture components, as a function of temperature, has been discussed in correlation with the measured mean grain size, grain boundary misorientation distribution and stress states. Stress state during the entire thermal cycle was monitored by wafer curvature technique and the traces of additive impurities at the surface were measured using X-ray photoelectron spectrometry. The possible role of impurities in affecting the behavior of texture components at high temperature is discussed. Comparison was made between the EBSD and X-ray diffraction texture data.     

声衍射层析成像研究进展

在计算机层析成像中用声波或电磁波取代X射线照射目标时波长不能再看作无限小,需要将Fourier切片定理修改为Fourier衍射投影定理,基于射线的CT相应地推广为衍射CT。概述了近年来衍射CT的发展,特别是声衍射CT。在理论和算法方面讨论了非均匀Fourier变换算法及其实现、仅根据强度信息的图像重建方法、多频率入射的情况、不完整测量数据条件下的图像重建等问题。此外还扼要介绍了不同领域中衍射CT的研究和应用情况。     

光栅衍射特性的耦合波分析、计算与讨论

本文从麦克斯韦方程组及电磁场边界条件出发,推导了广泛应用于各类光栅衍射问题的矢量分析方法--严格的耦合波分析方法.针对光栅的衍射特性,编写了基于严格的耦合波分析方法的计算程序,并以TE模情形为例对光栅的衍射效率和收敛性作了数值计算.结果表明,当谐波数不断增加,即便对于厚光栅(d/λ>10)情形,光栅的衍射效率仍将收敛于某一确定值.     

Wavelength multiplexing and demultiplexing with one single volume hologram in photorefractive crystal

Based on anisotropic diffraction of a volume phase grating in a photorefractive crystal, we theoretically discuss an optical multi- and demultiplexing scheme implemented by one single grating in photorefractive LiNbO₃ crystal. It shows that our scheme can simultaneously demultiplex 93 channels in the telecommunication wavelength around 1550?nm. Using only one grating to realize WDM can avoid the multiple exposure problems encountered by multiple hologram scheme. Moreover, in our scheme, the transmitted and diffracted beams are orthogonal to each other, thus we don't need to use a normal recording and readout structure. Our theoretical results can be used in the design of a WDM device.     

Evaluation of Residual Stresses in the Bulk of Materials by High Energy Synchrotron Diffraction

High energy synchrotron diffraction is introduced as a new method for residual stress analysis in the bulk of materials. It is shown that energy dispersive measurements are sufficiently precise so that strains as small 10⁻⁴ can be determined reliably. Due to the high intensity and the high parallelism of the high energy synchrotron radiation the sample gauge volume can be reduced to approximately 50 μm×1 mm×1 mm compared to gauge volume of one mm³ up to several mm³ achievable by neutron diffraction. The benefits of the high penetration depth and the small gauge volume are demonstrated by the results of stress studies performed on a fiber reinforced ceramic, a functional gradient material and a metal-ceramic compound. Furthermore, it is shown that in case of a cold extruded metal specimen the energy dispersive measurement technique yields simultaneous information about texture and residual stresses and thus allows a detailed investigation of elastic and plastic deformation gradients.