相移掩模和离轴照明在ArF浸没式光刻中对工艺窗口的影响

研究了交替型相移掩模及离轴照明对65nm分辨率ArF浸没式光刻的影响,在3／4环形照明和3／4四极照明方式下,分别选用传统掩模和交替型相移掩模,研究65nm线宽的密集线条、半密集线条、孤立线条在较大的曝光系统参数范围内,对光刻工艺窗口的改善。并对在不同的照明方式、掩模结构下获得的工艺窗口进行了比较,结果表明：①在较大焦深(DOF)范围内,满足光刻性能要求可以有较大范围的曝光系统参数配置;②相时于传统照明和传统掩模,采用交替型相移掩模或者离轴照明,焦深均可提高100％-150％。     

用于KrF准分子激光光刻的三相移掩模

讨论了相移掩模提高光刻分辨力的基本原理,提出了一种抗蚀剂相移器制作衰减相移掩模的新方法,利用自行设计、建立的ＫｒＦ准分子激光投影光刻实验曝光系统进行了实验研究,给出了实验结果,并与传统光刻方法作了比较。     

A super-oscillatory lens optical microscope for subwavelength imaging

The past decade has seen an intensive effort to achieve optical imaging resolution beyond the diffraction limit. Apart from the Pendry-Veselago negative index superlens, implementation of which in optics faces challenges of losses and as yet unattainable fabrication finesse, other super-resolution approaches necessitate the lens either to be in the near proximity of the object or manufactured on it, or work only for a narrow class of samples, such as intensely luminescent or sparse objects. Here we report a new super-resolution microscope for optical imaging that beats the diffraction limit of conventional instruments and the recently demonstrated near-field optical superlens and hyperlens. This non-invasive subwavelength imaging paradigm uses a binary amplitude mask for direct focusing of laser light into a subwavelength spot in the post-evanescent field by precisely tailoring the interference of a large number of beams diffracted from a nanostructured mask. The new technology, which--in principle--has no physical limits on resolution, could be universally used for imaging at any wavelength and does not depend on the luminescence of the object, which can be tens of micrometres away from the mask. It has been implemented as a straightforward modification of a conventional microscope showing resolution better than λ/6.     

Error analysis of the phase-shifting technique when applied to shadow moiré

An exact solution for the intensity distribution of shadow moiré fringes produced by a broad spectrum light is presented. A mathematical study quantifies errors in fractional fringe orders determined by the phase-shifting technique, and its validity is corroborated experimentally. The errors vary cyclically as the distance between the reference grating and the specimen increases. The amplitude of the maximum error is approximately 0.017 fringe, which defines the theoretical limit of resolution enhancement offered by the phase-shifting technique.     

Encryption of digital hologram based on phase-shifting interferometry and virtual optics

A new information encryption system is presented, based on phase-shifting interferometry and virtual optics. Three-step phase-shifting interferometry is used to record a digital hologram of the input data and a virtual optical system based on the scaled optical fractional Fourier transform is used for encryption of the recorded digital hologram. In the virtual optical system, the digital hologram to be encrypted is fractional Fourier transformed two times, and a random phase mask is placed at the output plane of the first fractional Fourier transform. Both the encryption and decryption processes are performed digitally. The encrypted data and the keys for decryption can be stored and transmitted in a conventional communication channel. Numerical simulations are presented to verify validity and efficiency.     

Two-point optical resolution with homogeneous,evanescent and self field: Resolution criterion in near field imaging

Abstract

The radiative and non-radiative electromagnetic field of a quantum particle is studied. An optical resolution criterion is proposed in terms of the two-point resolution. Resolution of optical microscopes is limited either by homogeneous diffraction (conventional microscopes) or by evanescent diffraction (near-field microscopes). The evanescent diffraction limit is a function of the wavelength and the observation distance (a portion of the wavelength), which may be circumvented by measuring the non-radiative field, namely the self field in the quantum range of the objects. The resolution then becomes a function of the object size, and is no longer limited by the wavelength of light used. The two-level hydrogen atom is taken as an example.     

制作光纤光栅的相移掩模-双光束干涉曝光方法

介绍将无铬相移掩模技术和双光束干涉曝光技术用于制作纳米级图形光纤光栅的基本原 理和实验系统设计。提出一种用可移动反射镜使写入光束扫描固定在一起的相移掩模和光纤组合体制作光纤光栅的方法,既便于系统调整,增强曝光能量,又可方便制作高分辨力、长尺寸光纤光栅,无论是周期光栅,还是非周期光栅。     

Parallel three-step phase-shifting digital holography

We propose parallel three-step phase-shifting digital holography as a technique capable of noiseless instantaneous measurement of three-dimensional objects based on phase-shifting interferometry. The proposed digital holography carries out three-step phase shifting at the same time by using a phase-shifting array device located in the reference beam. The array device has a periodic three-step phase distribution, and its configuration is simplified compared with that required for conventional parallel phase-shifting digital holography. Therefore the optical system of the proposed parallel phase-shifting digital holography is more suitable for the realization of the proposed holography. We conduct both a numerical simulation and a preliminary experiment. The results of the simulation and experiment agree well with those of the conventional phase-shifting method and are superior to the results obtained by conventional digital holography by using the Fresnel transform alone. Thus the effectiveness of the proposed technique is verified.     

Mask optimization approaches in optical lithography based on a vector imaging model

Recently, a set of gradient-based optical proximity correction (OPC) and phase-shifting mask (PSM) optimization methods has been developed to solve for the inverse lithography problem under scalar imaging models, which are only accurate for numerical apertures (NAs) of less than approximately 0.4. However, as lithography technology enters the 45 nm realm, immersion lithography systems with hyper-NA (NA>1) are now extensively used in the semiconductor industry. For the hyper-NA lithography systems, the vector nature of the electromagnetic field must be taken into account, leading to the vector imaging models. Thus, the OPC and PSM optimization approaches developed under the scalar imaging models are inadequate to enhance the resolution in immersion lithography systems. This paper focuses on developing pixelated gradient-based OPC and PSM optimization algorithms under a vector imaging model. We first formulate the mask optimization framework, in which the imaging process of the optical lithography system is represented by an integrative and analytic vector imaging model. A gradient-based algorithm is then used to optimize the mask iteratively. Subsequently, a generalized wavelet penalty is proposed to keep a balance between the mask complexity and convergence errors. Finally, a set of methods is exploited to speed up the proposed algorithms.     

Numerical feasibility study of the fabrication of subwavelength structure by mask lithography

Electromagnetic diffraction of a light wave by a single aperture of subwavelength width and subsequent propagation in a lossy medium are numerically investigated. This diffraction problem simulates exposure of a resist with an amplitude mask. It is found that there is the possibility of fabricating a lambda/2 structure on a resist of lambda/4 thickness, where lambda is the wavelength of the exposing light in vacuum, by conventional contact or by proximity lithography. It is also found that an air gap between a mask and a resist of up to lambda/2 does not have a significant effect on resolution. This approach permits easy and cost-effective fabrication of subwavelength structures and leads to wide availability of diffractive optical elements in the nonscalar domain.     

激光三角法距离传感：散斑的影响

描述了一个激光三角法距离传感，并用于鞋楦三维测量。讨论了系统的静态和动态测量误差，指出其深度分辨率主要由散斑决定，实验表明 ，增加透镜孔径或在成象透镜前加一随机振动位相掩膜均可极大改善深度分辨率。     

Effects of multilevel phase masks on interpixel cross talk in digital holographic storage

We study the interpixel cross talk introduced to digital holographic data storage by use of a multilevel phase mask at the data-input plane. We evaluate numerically the intensity distribution at the output detector for Fourier plane hologram storage in a limited-aperture storage medium. Only the effect at an output pixel of interpixel cross talk from the four horizontal and vertical neighboring pixels is considered, permitting systematic evaluation of all possibilities. For random two-level and pseudorandom six-level phase masks, the influence of the pixel fill factor, as well as the aperture size of the storage medium, is studied. Our simulations show that, for a given aperture size, a random two-level mask is more susceptible to interpixel cross talk than is a pseudorandom six-level mask. Decreasing the pixel fill factor below 94% with a pseudorandom six-level phase mask makes it theoretically possible to have a system with no errors from interpixel cross talk if one particular 5-pixel pattern is forbidden through modulation coding. Reducing the input fill factor below 85% means that no patterns need to be excluded.     

Parallel two-step phase-shifting digital holography

We propose a parallel two-step phase-shifting digital holography technique capable of instantaneous measurement of three-dimensional objects, with a view toward measurement of dynamically moving objects. The technique is based on phase-shifting interferometry. The proposed technique carries out the two-step phase-shifting method at one time and can be optically implemented by using a phase-shifting array device located in the reference beam. The array device has a periodic two-step phase distribution, and its configuration is simplified compared with that required for three-step and four-step parallel phase-shifting digital holographies. Therefore the optical system of the proposed technique is more suitable for the realization of a parallel phase-shifting digital holography system. We conduct both a numerical simulation and a preliminary experiment in the proposed technique. The results of the simulation and the experiment agree well with those of sequential phase-shifting digital holography, and results are superior to those obtained by conventional digital holography using the Fresnel transform alone. Thus the effectiveness of the proposed technique is verified.     

Pseudorandom phase masks for superresolution imaging from subpixel shifting

We present a method for overcoming the pixel-limited resolution of digital imagers. Our method combines optical point-spread function engineering with subpixel image shifting. We place an optimized pseudorandom phase mask in the aperture stop of a conventional imager and demonstrate the improved performance that can be achieved by combining multiple subpixel shifted images. Simulation results show that the pseudorandom phase-enhanced lens (PRPEL) imager achieves as much as 50% resolution improvement over a conventional multiframe imager. The PRPEL imager also enhances reconstruction root-mean-squared error by as much as 20%. We present experimental results that validate the predicted PRPEL imager performance.     

Image formation in phase-shifting digital holography and applications to microscopy

We discuss image formation in phase-shifting digital holography by developing an analytical formulation based on the Fresnel-Kirchhoff diffraction theory. Image-plane position and imaging magnification are derived for general configurations in which a spherical reference is employed. The influences of discrete sampling of the resulting interference patterns by a CCD and numerical reconstruction on qualities of point images are investigated. Dependence of the point images on the ratio of the minimum fringe spacing to pixel pitch of the CCD is numerically analyzed. Two-point resolution and magnification are also investigated as a function of pixel numbers by a simulation using a one-dimensional model. In experiments magnified images of biological objects and a resolution target were reconstructed with the same quality as by conventional microscopy.     

相移掩模方法及其一维数值模拟

相移掩模方法是一种新的光刻技术，它可以提高现有光刻设备的分辨率，使超大规模集成电路及二元光学的制作迈上一个新台阶。本文介绍了相移掩模方法的基本原理，用部分相干光成象理论分析了用于光刻的投影照相系统的成象特性，导出了一维成象的简化公式，对一维光栅结构进行了计算机数值模拟并给出了模拟结果。     

Geometric superresolution by code division multiplexing

In many highly resolved optical systems the resolution is limited not by the optics but by the CCD's nonzero pixel size. As a result, overall resolution is decreased. Here we propose a novel approach to enhancing resolution beyond the limit set by the CCD's pixels. This method does not involve additional mechanical elements, such as those used for microscans. In this scheme neither the CCD nor additional elements are moved. The geometric superresolving procedure is based on code-division multiplexing, with all its inherent benefits, such as relative noise immunity to single-tone interference. A setup is proposed for coherent and incoherent illumination, with slight modifications for the latter. A theoretical analysis of the setup is presented and compared with empirical results. This scheme is shown to enhance one-dimensional image resolution with the use of only a simple mask that doubles image resolution. This method can easily be expanded to two-dimensional images and to resolution-enhancement factors greater than 2.     

Continuous-wave terahertz phase imaging using a far-infrared laser interferometer

Terahertz phase imaging can reveal the depth information of an optically opaque object and provide much better contrast for weak-absorption materials. We demonstrate a continuous-wave terahertz interferometric imaging method in which a far-infrared laser interferometer is used to measure the phase distribution with diffraction-limited lateral resolution and subwavelength axial resolution. An improved four-step phase-shifting algorithm is introduced to retrieve the phase map with very high accuracy and low distortion. The relative depth profiles of two transparent samples are successfully extracted by using this method. Experimental results verify that terahertz interferometric imaging in combination with the phase-shifting technique enables effective reconstruction of the phase image of the object under test.     

Required optical characteristics of materials for phase-shifting masks

The reflectivity and transmission of a multiple-layer substrate are simulated to predict the optimum choice of materials for the fabrication of phase-shifting masks for optical lithography. Two types of materials are described: a transparent shifter layer with a refractive index closely matching that of quartz, and a partially transparent layer (5-15% transmission) inducing a 180° phase shift of light compared with air. A possible refractive index n and extinction coefficient k are defined, for both layers of the partially transparent material. The fabrication tolerances are calculated in terms of refractive index, extinction coefficient, and thickness accuracy. One of the major technological challenges for both material types is to control the thickness to ±2%, which is required to satisfy the phase-shifting mask specifications for deep UV lithography (±0.5% transmission control and ±4° phase control). These criteria were calculated by the simulation of the phase and transmission errors, thereby inducing a ±10% linewidth variation of the resist patterns on the wafers.     

Improved vertical-scanning interferometry

We describe a method that combines phase-shifting and coherence-peak-sensing techniques to permit measurements with the height resolution of phase-shifting interferometry without the interval-slope limitation of lambda/4 per data sample of phase-shifting interferometry. A five-frame algorithm is used to determine both the best-focus frame position and the fractional phase from the best-focus frame of the correlogram acquired through vertical scanning. The two surface profiles retrieved from the phase and the modulation contrast of the correlograms are compared in the phase-unwrapping process to remove fringe-order ambiguity.