Comment on: “Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering” [J Fusion Energ DOI 10.1007/s10894-012-9510-z]

In recent article [Ali Gelali. Azin Ahmadpourian. Reza Bavadi. M. R. Hantehzadeh. Arman Ahmadpourian. J Fusion Energ DOI 10.1007/s10894-012-9510-z], Ali Geleli et al. studied the PSD and RMS Roughness parameters in Titanium Nitride thin films by AFM data and used the computed fractal dimension value of micrographs to describe the surface morphology of thin films. Here, the correct form of equations and relationship between PSD and RMS will be discussed.     

Second Comment on: ‘‘Characterization of Micro-roughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering’’ [J Fusion Energ DOI 10.1007/s10894-012-9534-4]

At recent comment written by [A. Gelali, A. Shafiekhani, A. Ghorbani, A. Ahmadpourian. J. Fusion Energ. DOI: 10.1007/s10894-012-9542-4] that is a comment on [S. Solaymani, A. Ghaderi, N. B. Nezafat. J. Fusion Energ. DOI: 10.1007/s10894-012-9534-4] some clear and unavoidable errors can be seen. These issues will be discussed by the present brief communication.