纳米级类金刚石梯度膜机械特性研究

本文采用非平衡磁控溅射及等离子体源离子混合注入方法在奥氏体不锈钢1cr18N9Ti基体上制备N/TiN/Ti(N,C)/DLC梯度涂层。采用原子力显微镜（AFM）及喇曼光谱等手段观察分析梯度膜的显微组织与相组成，同时采用了纳米压入技术评定膜层的力学性能。实验结果表明，采用此方法制备的金刚石膜组织致密，性能良好。     

类金刚石梯度膜的微观力学性能研究

采用非平衡磁控溅射及等离子体源离子混合注入方法在奥氏体不锈钢1Cr18Ni9Ti基体上制备N／TiNi/Ti(N,C)/DLC梯度涂层，采用原子力显微镜等手段观察分析梯度膜的显微组织与相组成，同时采用纳米压入技术评定膜层的力学性能。实验结果表明，采用此方法制备的金刚石膜组织致密，性能良好。     

基于LFM的类金刚石膜纳米摩擦现象研究

使用原子力显微镜(AFM)中的侧向力(LFM)模式对类金刚石膜纳米尺度的摩擦现象进行了研究,主要考察了载荷、微观形貌、粘附对类金刚石膜纳米摩擦性能的影响.首先结合粘附的影响提出了适用于外加载荷在100 nN以下类金刚石膜纳米摩擦力表征的修正Amonton公式.其次,试验发现摩擦过程中表面接触峰的斜率对薄膜的微观摩擦力的影响较大,微观摩擦系数与倾角θ成正比例关系,最后结合两者给出了综合考虑载荷、表面形貌、粘附且可用于类金刚石膜纳米尺度摩擦力表征的数学方法.     

PSII法制备DLC膜的纳米摩擦性能研究

微机电系统（MEMS）的研究引起了人们的极大关注,摩擦行为是影响MEMS性能的关键因素之一.本文采用等离子源离子注入（PSII）技术在硅衬底上制备薄膜,利用Raman光谱表征制备薄膜的类金刚石特性.详细介绍了采用原子力显微镜（AFM）进行纳米摩擦实验的原理,并利用其研究制得DLC膜的纳米摩擦特性.研究结果表明,制得DLC膜的摩擦系数较小,具有耐磨损性能,而且反应气体流量对薄膜的纳米摩擦特性有较大影响.PSII技术制备的DLC膜具有较好的纳米摩擦特性,并有望使可动MEMS的摩擦问题得到真正意义上的突破.     

掺氮类金刚石薄膜的微观结构和光学特性研究

采用射频等离子增强化学气相沉积法( PECVD)制备掺氮类金刚石薄膜(DLC:N),通过原子力显微镜,拉曼光谱和椭圆偏振光谱等对试验样品进行研究,实验结果表明,在薄膜中,氮元素主要以C=N键的形式存在,起到了降低薄膜内应力,提高薄膜附着力的作用;此外,通过控制掺氮量可以制得折射率在1.85～1.6范围内的DLC薄膜.     

射频磁控溅射制备类金刚石薄膜的特性

采用射频磁控溅射技术,用高纯石墨靶在单晶硅片、抛光不锈钢片上制备了类金刚石薄膜(DLC)。采用Raman光谱、原子力显微镜、显微硬度分析仪,表征了类金刚石薄膜的微观结构、表面形貌、硬度。结果表明,制备的类金刚石薄膜中含sp2、sp3杂化碳键,具有典型的类金刚石结构特征。计算表明,对应sp3杂化碳原子含量的ID1IG为3.18;薄膜的表面十分平整光滑,表面粗糙度极低,平均粗糙度Ra为0.17 nm;薄膜硬度可以高达30.8 GPa。     

类金刚石碳膜的热学特性

利用珀尔帖效应,采用三夹层技术测量了类金刚石碳(DLC)膜的热传导率,并指出在高离子轰击能量和低CH_4气压下。通过rf等离子体沉积所制得的DLC膜具有好的热稳定性,其热传导率为2.1—2.4W/cm.deg。     

通过制备Ti/TiC和Si/SixNy过渡层在铜基体上沉积类金刚石膜的研究

将磁控溅射物理气相沉积（MS-PVD）和电子回旋共振-微波等离子体增强化学气相沉积（ECR—PECVD）技术相结合，在铜基体上通过制备两种不同的过渡层，成功地沉积了类金刚石膜。拉曼光谱结果分析表明，所制备的碳膜都具有典型的类金刚石结构特征。通过原子力显微镜对薄膜的微观形貌进行分析，采用纳米压痕测量薄膜的硬度和模量。并对Ti／TiC过渡层和Si／SixNy过渡层上沉积的类金刚石薄膜进行了研究对比。     

类金刚石碳膜的红外特性研究

用射频等离子体方法分解甲烷，在Ｇｅ片上制备了类金刚石碳（ＤＬＣ）膜。该膜折射率在２左右，具有较好的增透作用。双面镀ＤＬＣ膜系统在红外透射比，随膜厚不同，其极大值在３．８－１０．６μｍ范围内，在１０．６μｍ处红外透射比达９４．５％。镀制在直径为１００ｍｍＧｅ基片上的ＤＬＣ／Ｇｅ／ＤＬＣ膜系，在１０．６μｍ处，膜片中心的红外透射比为９３．９％，距中心不同距离的５个点的红外透射比为９１．１％，该膜系具有     

金属掺杂类金刚石膜的研究进展

金属掺杂类金刚石（Diamond—like Carbon,DLC）膜可以优化纯类金刚石膜的很多性能。金属掺杂DLC膜不仅在缓解薄膜应力方面具有良好的效果,而且还能改变薄膜的力学和摩擦磨损性能。目前,掺杂DLC膜正以单一掺杂向复合掺杂、均匀掺杂向梯度掺杂发展。文章对掺杂DLC膜的研究进展作了概括及分析。     

Characterization of the Diamond—like Carbon based Functionally Gradient Film

Diamond-like carbon coatings have been used as solid lubricating coatings in vacuum technology for their good physical and chemical properties. In this paper, the hybrid technique of unbalanced magnetron sputtering and plasma immersion ion implantation (Pill) was adopted to fabricate diamond-like carbon-based functionally gradient film, N/TiN/Ti(N,C)/DLC, on the 304 stainless steel substrate. The film was characterized by using Raman spectroscopy and glancing X-ray diffraction (GXRD), and the topography and surface roughness of the film was observed using AFM. The mechanical properties of the film were evaluated by nano-indentation. The results showed that the surface roughness of the film was approximately 0.732 nm. The hardness and elastic modulus, fracture toughness and interfacial fracture toughness of N/TiN/Ti(N,C)/DLC functionally gradient film were about 19.84 GPa, 190.03 GPa, 3.75 MRa.m1/2 and 5.68 MPa-m1/2, respectively. Compared with that of DLC monolayer and C/TiC/DLC multilayer, this DLC grad     

类金刚石碳膜在硬磁盘中的应用

射频离解烃制备了适用于５英寸计算机硬磁盘减摩、耐磨保护用的类金刚石碳膜。保护膜厚度不均匀性小于５％，硬度１５．２ＧＰａ，结合力３３１ＭＰａ。无润滑下头盘摩擦系数μ≤０．２６，脉动值Δμ≤０．０５。最佳效果是在添加润滑油的组合润滑下得到，μ≤０．１４，Δμ≤０．０４．电磁动态特性和读写试验表明，４０ｎｍ类金刚石碳保护盘达到实用水平。     

类金刚石膜的性能及应用研究

研究了利用低能离子束技术，在单晶硅片等多种基体表面形成类金刚石薄膜（ＤＬＣ膜）的工艺，测试了其物理化学力学性能，在硅片，硅太阳电池和半导体等表面进行了形成类金刚石膜的应用研究。     

利用脉冲激光真空弧沉积技术制备类金刚石薄膜

介绍了一种新的脉冲激光真空弧沉积技术, 利用该技术在硅基片上制备了类金刚石薄膜. 利用激光拉曼分析技术对沉积膜进行了结构分析, 结果表明沉积膜为非晶结构, 具有明显的sp³ 结构特征. 同时利用纳米划痕压痕仪、原子力显微镜等分析设备对膜的表面形貌、微观摩擦学性能进行了分析, 结果表明Si<100>基片上沉积膜的表面形貌和微观摩擦学性能略优于 Si<111>基片上沉积的薄膜, 其摩擦系数平均值为0.036.     

类金刚石碳膜的制备工艺

用射频－直流等离子体化学气相沉积法制备出类金刚石膜，用多因素和单因素正交试验设计方法对类金刚石的沉积工艺进行了研究，结果表明，极板偏压、真空度和气体成分是影响膜沉积速率的主要因素。沉积速率与ＰＶ成正比，且随反应气体深度单调增加，但当Ｃ２Ｈ２浓度低于１０％时，几乎不能成膜。     

Measurement of the Loss and Depolarization Probability of UCN on Beryllium and Diamond Like Carbon Films

Currently several institutes worldwide are working on the development of a new generation of ultracold neutron (UCN) sources. In parallel with source development, new materials for guiding and storage of UCN are developed. Currently the best results have been achieved using ⁵⁸Ni, Be, solid O₂ and low temperature Fomblin oil (LTF). All of these materials have their shortcomings like cost, toxicity or difficulty of use. A novel very promising material is diamond like carbon (DLC). Several techniques exist to coat surfaces, and industrial applications (e.g., for extremely hard surfaces) are already wide spread. Preliminary investigations using neutron reflectometry at PSI and Los Alamos yielded a critical velocity for DLC of about 7 m/s thus comparable to Beryllium. A low upper limit of depolarization probability for stored polarized UCN has been measured at the PF2 facility of the Institut Laue-Langevin (ILL) by North Carolina State University (NCSU), Los Alamos National Laboratory (LANL), and Petersburg Nuclear Physics Institute (PNPI), thus making it also a good material for storage and guidance of polarized UCN. Still missing is the loss probability per bounce. We will be able to extract this number and a more stringent value for the depolarization from our experiment thus proving the suitability of DLC as a wall material for a wide range of UCN applications.     

非晶金刚石薄膜对温度的敏感性研究

采用过滤阴极真空电弧技术制备非晶金刚石薄膜, 在-190～600℃范围研究非晶金刚石薄膜的温度敏感性. 利用液氮泵在Linkam试验台上冷却样品并实时采样, 通过炉中退火实现样品加热. 分别测试可见光拉曼光谱和纳米压痕, 研究薄膜的微结构和机械性能的变化. 实验表明: 过滤阴极真空电弧制备的非晶金刚石薄膜具有较好的热稳定性. 在空气中退火到400℃, 其硬度和弹性模量基本保持不变, 其结构可以一直稳定到500℃, 但是到600℃, 薄膜因为氧化作用而快速消耗. 非晶金刚石薄膜的可见光拉曼光谱显示随着温度的升高, 谱峰峰位向高频偏移. 在低温冷却过程中, 薄膜对温度变化不敏感, 其结构保持不变.     

AFM Study on Interface of HTHP As-grown Diamond Single Crystal and Metallic Film

The study for the interface of as-grown diamond and metallic film surrounding diamond is an attractive way for understanding diamond growth mechanism at high temperature and high pressure (HTHP), because it is that through the interface carbon atom groups from the molten film are transported to growing diamond surface. It is of great interest to perform atomic force microscopy (AFM) experiment; which provides a unique technique different from that of normal optical and electron microscopy studies, to observe the interface morphology. In the present paper,we report first that the morphologies obtained by AFM on the film are similar to those of corresponding diamondsurface, and they are the remaining traces after the carbon groups moving from the film to growing diamond. The fine particles and a terrace structure with homogeneous average step height are respectively found on the diamond(100) and (111) surface. Diamond growth conditions show that its growth rates and the temperature gradients inthe boundary layer of the molten film at HTHP result in the differences of surface morphologies on diamond planes,being rough on (100) plane and even on the (111) plane. The diamond growth on the (100) surface at HPHT could be considered as a process of unification of these diamond fine particles or of carbon atom groups recombination on the growing diamond crystal surface. Successive growth layer steps directly suggest the layer growth mechanism of the diamond (111) plane. The sources of the layer steps might be two-dimensional nuclei and dislocations.     

表面波激发等离子体合成类金刚石薄膜的实验研究

用表面波等离子体装置进行了类金刚石薄膜的合成实验,研究了微波功率、基底负偏压和气体组成等条件对成膜的影响.用拉曼光谱和扫描电子显微镜对薄膜结构和表面形貌进行了分析,得出在100Pa的工作气压下,使用CH4放电,大功率和高偏压有利于生成质量较好的薄膜.