Near-infrared photoluminescence of V-doped GaN

The visible and infrared luminescence of vanadium-doped GaN (GaN:V) grown by metalorganic vapour phase epitaxy technique (MOVPE) on SiN-treated sapphire substrate were examined. Growth process was in-situ monitored by laser reflectometry. At room temperature and in the visible spectral range, photoluminescence (PL) shows a strong blue emission band. At 10 K, the near-infrared PL spectra exhibit several emissions dominated by a zero-phonon line (ZPL) at 0.821 eV with a full-width at half-maximum (FWHM) of 8.8 meV. Other peaks emerge in the low- and high-energy side of ZPL, which can be assigned to the fine structure of the charge state or the satellite lines. By increasing the temperature, the peaks’ intensities decrease and disappear above 150 K. The red-shift and the FWHM of the 0.821 eV line increase versus temperature, indicating a high contribution of the photonic Raman processes. This emission was assigned to be a vanadium intracenter emission.     

Effect of carrier gas on the surface morphology of V-doped GaN layers

Vanadium-doped GaN (GaN:V) have been elaborated by metalorganic chemical vapour deposition (MOCVD). We have used vanadium tetrachloride (VCl₄) to intentionally incorporate vanadium (V) during the crystal growth of GaN. The films were grown on sapphire substrate with tow procedures. A series of layers were elaborated under nitrogen (N₂) and another under hydrogen (H₂). For the growth of GaN:V in hydrogen atmospheric, we have used the SiN treatment consisting of an exposure of sapphire substrate to a mixture of ammonia (NH₃) and silane (SiH₄). In-situ laser reflectometry analysis show that the surface morphology of layers depends on VCl₄ flow rate and the growth conditions. The experiments show that the quality of the grown layers (as measured with X-ray diffractometer (XRD), scanning electron microscopy (SEM) and photoluminescence (PL) increases under N₂.     

Si掺杂的AlGaInP/GaInP多量子阱光学特性

低压MOCVD方法生长了掺Si与不掺Si的AlGaInP/GaInP多量子阱结构,运用X射线双晶衍射与光荧光技术研究了掺Si对量子阱性能的影响.测试结果表明掺Si使量子阱的生长速度增加,掺Si量子阱的光荧光强度比未掺Si量子阱的光荧光强度改善了一个数量级.     

Photoluminescence of V-doped GaN thin films grown by MOVPE technique

This work reports the photoluminescence (PL) study of vanadium-doped GaN (GaN: V) in the 9-300 K range. Samples have been successfully prepared on sapphire substrates by metalorganic vapour phase epitaxy technique (MOVPE). At room temperature (RT) the PL spectra of GaN: V are dominated by a blue band (BB) in the 2.6 eV range. This BB emission is very strong and its intensity increases with increasing V doping level. We also observed that the peak position of the blue luminescence shifted at lower energy with decreasing excitation density. Upon V-doping, the yellow luminescence band shows a drastic reduction in integrated intensity. This observation is explained by a reaction involving V and gallium vacancy (_√Ga). PL spectra at low temperature exhibited a series of peaks. The donor-acceptor (D-A) pair emission peak at 3.27 eV was strongly pronounced, as the temperature was decreased. On the other hand, the intensity of the BB emission decreased. This BB emission is due to a radiative transition from a shallow donor with a depth of 29 meV to a deep acceptor with a depth of 832 meV.     

Effect of Si doping on the photoluminescence properties of AlGaInP/GaInP multiple quantum wells

The influence of Si doping on the photoluminescence (PL) properties of (Al_0.3Ga_0.7)_0.5In_0.5P/Ga_0.5In_0.5P multiple-quantum-wells (MQWs) was studied. For the samples without p-type layers, the PL peak wavelength from (Al_0.3Ga_0.7)_0.5In_0.5P/Ga_0.5In_0.5P MQWs did not vary when Si was doped in MQWs, the PL peak intensity did not change obviously and the PL FWHM broadened. We consider that Si doping results in worse interface quality of (Al_0.3Ga_0.7)_0.5In_0.5P/Ga_0.5In_0.5P MQWs. However, for the full light-emitting diode (LED) structure samples, the PL intensity of MQWs obviously increased when Si was doped in MQWs. The PL intensity from MQWs with Si-doped barriers was about 13 times stronger than that of undoped MQWs. The PL intensity from MQWs with Si-doped barriers and wells was strong as 28 times as that of undoped MQWs. The reasons are discussed.     

Water bonding of 50-mm-diameter mirror substrates to AlGaInP light-emitting diode wafers

The feasibility of bonding 50-mm-diameter Si with a Au/AuBe mirror to AlGaInP light-emitting diode (LED) wafers is demonstrated. Wafer bonding over the entire wafer area is achieved while the metallic mirror still maintains high reflectivity. Using this technique, the mirror-substrate AlGaInP LEDs are fabricated across an entire 50-mm wafer. The test data show that 98% of the dice with operating voltages <2.2 V at 20 mA and 85% of the dice with luminous intensity in the 130∼140 mcd region. The wafer-bonded mirror-substrate LED lamps operating at 626 nm can emit 3 lm at 20 mA with a forward voltage of 2 V, corresponding to a luminous efficiency of 74 lm/W. Moreover, they present a peak power efficiency of 21% with 4 mW output at 10 mA (1.9 V). Essentially no degradation is observed for these LEDs after 2000 h stress at 80°C and 50 mA (55.6 A/cm²). The results indicate the mirror-substrate AlGaInP LEDs of highly reliable and efficient performance.     

Mechanism and thermal effect of delamination in light-emitting diode packages

This work reports on the mechanism of delamination in light-emitting diode (LED) packages and its effects on thermal characteristics of LEDs. The LED samples were subjected to moisture preconditioning followed by heat block testing. Transient thermal measurements were performed to investigate the thermal behavior of the delaminated LEDs. Increase of thermal resistance with the degree of delamination was observed from the transient measurement. The thermo-mechanical and hygro-mechanical stress distributions calculated from coupled-field FEA simulation agree well with the micrographical evidence. It was found that the thermo-mechanical stress plays more important role than the hygro-mechanical stress for the development of delamination in the LED packages. Moisture preconditioning for 3 and 6 h under 85 °C/85RH conditions was found to make little contribution to the delamination between the chip and lead frame.     

Realisation of ‘Solar Blind’ AlGaN Photodetectors: Measured and calculated spectral response

Al_xGa_1−xN solar blind photoconductors are fabricated and characterized. The cutoff wavelength of these detectors is as low as 275 and 271 nm with aluminium fraction of 49.6 and 54.1%, respectively. The used AlGaN active layers were grown on (0001) sapphire substrates by low pressure metalorganic chemical vapour deposition (LP-MOCVD). The full width at half maximum (FWHM) of X-ray rocking curve from (0002) diffraction indicates the good quality of these samples. Optical properties are investigated with photoluminescence and absorption measurements. The variation of the spectral response with applied voltage and modulation frequency is investigated. Better results are obtained with 12 Hz and 20 V. Compared to other researches, a high rejection ratio is obtained. The simulation of the photoresponse using the voltage dependent responsivity allows the determination of the carrier lifetime. We obtained a value of 0.15 and 0.13 ms for x=0.49 and 0.54, respectively.     

Frequency and temperature dependences of capacitance-voltage characteristics of InGaN/GaN light-emitting structures with multiple quantum wells

A frequency dependence of capacitance-voltage (C–V) characteristics in multiple quantum well InGaN/GaN heterostructures in the range of 60 Hz-5 MHz is investigated at temperatures from 77 to 300 K. It is found that temperature lowering and test frequency increase lead to the similar changes in obtained apparent carrier distributions. It is shown that commonly used conditions for capacitance-voltage profiling of InGaN/GaN LEDs correspond to an intermediate case between low- and high-frequency capacitance approximations. At all temperatures investigated, the edge low-frequency capacitance-voltage profiles are experimentally reached and found to be identical. The process of attainment of equilibrium of the charges in the active region is most likely determined by tunneling of the carriers through the barriers.     

The influence of high-temperature annealing on SiC schottky diode characteristics

The influence of high temperature (up to 800C) annealing on the current-voltage characteristics of n-type 6H-SiC Schottky diodes is presented. Our experimental results indicate that high-temperature annealing can result in the improvement of the forw ard and reverse electrical characteristics of SiC Schottky diodes by repairing any leaky low barrier secondary diode parallel to the primary diode that may be present due to the barrier inhomogeneities at the Schottky contact interface.     

Photoluminescence characterization of the effects of rapid thermal annealing on AlGaAs/GaAs modulation-doped quantum wells

In this study, we describe the effects of rapid thermal annealing on the electrical and optical properties of modulation-doped quantum wells (MDQWs). The sheet carrier concentration in MDQW structures which have been annealed in contact with a piece of GaAs tends to decrease with increasing annealing time due to Si auto-compensation in the doped AlGaAs regions. The high energy cut-off point of 4.2 K PL spectra, which occurs at the Fermi energy, and the 77 K PL linewidth are accurate measures of sheet carrier density. These two parameters track variations in carrier density produced by annealing. Photoluminescence spectra also provide additional insight into annealing-induced changes such as Si migration, which causes a degradation in the mobility of the two-dimensional electron gas.     

Optical characteristics of Si/SiO2 multilayers prepared by magnetron sputtering

Si/SiO₂ multilayers have been successfully prepared by magnetron sputtering and subsequently thermal annealed in an Ar atmosphere at a temperature of more than 500 °C. The surface of the as-deposited films is compact and smooth, and the distribution of grain size estimated to be 20 nm is uniform. For Si/SiO₂ multilayers annealed at 1100 °C, the Si sublayer sandwiched between potential barrier SiO₂ is crystalline structure by means of the analysis of Raman spectra and XRD data. The visible PL peak accompanying to a blue-shift with the decrease of Si sublayer thickness has been observed, and the intensity of this peak enhances with the increase of annealing temperature. The visible luminescence properties of Si/SiO₂ multilayers can be ascribed to quantum confinement of electron-hole pairs in quantum wells with grain size lower than 4.5 nm. In Si/SiO₂ multilayers, not only quantum confinement but also Si-SiO₂ interface states play an important role in the optical transition. The PL peak located at 779 nm is independent of the thickness of Si sublayer, so it may be ascribed to interface mediated transition. Typical Si dangling bonds defect could be a dominating obstacle to high luminescence efficiencies.     

Influence of temperature on the mechanism of carrier injection in light-emitting diodes based on InGaN/GaN multiple quantum wells

The experimental current-voltage characteristics and dependences of the external quantum yield on the current density of light-emitting diodes based on InGaN/GaN multiple quantum wells for the wide temperature range T = 10–400 K are presented. It is shown that, at low-temperatures T < 100 K, the injection of holes into the quantum wells occurs from localized acceptor states. The low-temperature injection of electrons into p-GaN occurs due to quasi-ballistic transport in the region of multiple quantum wells. An increase in temperature leads to an increase in the current which is governed by thermally activated hole and electron injection from the allowed bands of GaN.     

Analysis of the temperature dependence of the capacitance-voltage characteristics of InGaN/GaN multiple quantum well light-emitting structures

The capacitance-voltage characteristics and frequency dependences of the capacitance and conductance of InGaN/GaN multiple quantum well light-emitting structures are studied in the frequency range of 60 Hz-5 MHz and the temperature range of 77–300 K. It is shown that carrier relaxation in quantum wells can be described by two emission processes, i.e., the thermally activated one and with the power-law temperature dependence of the emission rate. It is also shown that one or several quantum wells in typical InGaN/GaN-based light-emitting structures can remain filled with electrons even at comparatively high reverse biases. This makes it possible to explain the depth shift of the apparent carrier concentration profiles, obtained from the capacitance-voltage characteristics, with decreasing temperature.     

The influence of annealing on the capacitance-voltage characteristics of metal/SIPOS/silicon capacitors

Semi-insulating polycrystalline silicon (SIPOS)/Si samples have been annealed in forming gas at temperatures ranging from 300°C to 900°C. The influence of the anneal on the high frequency capacitance voltage characteristics of metal/SIPOS/silicon capacitors built afterwards has been studied. Up to annealing temperatures of 500°C, the rate of change of capacitance with voltage increases, while a decrease of this rate of change is observed at higher temperatures. Furthermore, the capacitance-voltage curves are shifted along the voltage axis towards more positive values up to 700°C. At higher annealing temperatures a shift in the opposite direction occurs.     

The effects of the temperature and annealing on current-voltage characteristics of Ni/n-type 6H-SiC Schottky diode

The temperature dependence of current-voltage (I-V) characteristics of as-fabricated and annealed Ni/n-type 6H-SiC Schottky diode has been investigated in the temperature range of 100-500 K. The forward I-V characteristics have been analysed on the basis of standard thermionic emission theory. It has been shown that the ideality factor (n) decreases while the barrier height (Φ_b) increases with increasing temperature. The values of Φ_b and n are obtained between 0.65-1.25 eV and 1.70-1.16 for as-fabricated and 0.74-1.70 eV and 1.84-1.19 for annealed diode in the temperature range of 100-500 K, respectively. The I-V characteristics of the diode showed an increase in the Schottky barrier height, along with a reduction of the device leakage current by annealing the diode at 973 K for 2 min.     

Effects of distance between wells on band structure and characteristics of InGaAs/InGaAsP strain-compensated multiple quantum well lasers

In terms of the multi-well energy representation technique, the effects of the distance between wells on the valence band structure and characteristics are analyzed for InGaAs/InGaAsP strain-compensated multiple quantum well lasers with zero net strain. The computed result shows that a coupling effect exists between the wells, causes an energy split, and affects the properties of the laser, such as the density of states, optical gain, differential gain, threshold wavelength, threshold carrier density and threshold current density. We find that when the distance between wells equals twice the thickness of the well, the effect of the distance between wells on the characteristics of the laser becomes weak. Therefore, for the practical design of lasers, it is reasonable to take the thickness of the barrier to be twice that of the well.     

Tight-binding study of the optical properties of GaN/AlN polar and nonpolar quantum wells

The electronic structure of wurtzite semiconductor superlattices (SLs) and quantum wells (QWs) is calculated by using the empirical tight-binding method. The basis used consists of four orbitals per atom (sp³ model), and the calculations include the spin-orbit coupling as well as the strain and electric polarization effects. We focus our study on GaN/AlN QWs wells grown both in polar (C) and nonpolar (A) directions. The band structure, wave functions and optical absorption spectrum are obtained and compared for both cases.     

The effects of laser irradiation on InGaAs/GaAs multiple quantum wells grown by metalorganic molecular beam epitaxy

We studied the effects of Ar ion laser irradiation during the growth of InGaAs/ GaAs multiple quantum wells (MQW) structures by metalorganic molecular beam epitaxy. Structural and optical properties were characterized by Nomarski microscopy, Dektak stylus profiler, and low-temperature photoluminescence (PL) measurements. For MQW structures grown at a relatively low substrate temperature (500°C), the laser irradiation influences greatly the growth process of the In^Ga^^As well and results in a large blue shift of about 2000à in the PL peak. Such a large blue shift suggests that laser modification during growth could have some novel applications in optoelectronics. On the other hand, the laser irradiation has relatively small effects on samples grown at a higher substrate temperature (550°C).     

氧化钨薄膜对发光二极管特性的影响研究

氧化钨薄膜具有适中的光学带隙、折射率及高功函数等半导体特性,本文采用溅射法(Sput-tering)制备氧化钨薄膜测试其光电特性,使用AFM、XRD观察薄膜外观结构与晶体状态,应用XPS、UPS表征薄膜的化学计量组分及薄膜功函数,并将此薄膜应用于AlGaInP发光二极管器件中,以增加与p-GaP欧姆接触特性,增加载流子...