Room temperature pulsed operation of 1.5 μm GaInAsP/InPvertical-cavity surface-emitting laser

Room-temperature pulsed operation of a GaInAsP/InP vertical-cavity surface-emitting laser diode (VCSELD) with an emission wavelength near 1.55 μm is reported. A double heterostructure with a 34-pair GaInAsP (λ_g=1.4 μm)/InP distributed Bragg reflector (DBR) was grown by metalorganic chemical vapor deposition (MOCVD). The measured reflectivity of the semiconductor DBR is over 97% and threshold current is 260 mA for a 40-μmφ device with a 0.88-μm-thick active layer. Threshold current density is as low as 21 kA/cm² at room temperature     

P—type AlAs／[GaAs／AlAs]Semiconductor／Superlattice DBR Grown by MBE

A p-type AlAs(70.2 nm)/16.5 period [GaAs(3 nm)/AlAs(0.7 nm)] semiconductor/superlatice distributed Bragg reflector (DBR) has been grown on n +-GaAs(100) substrate by V80H molecular beam epitaxy system. Experimental reflection spectrum shows that its central wavelength is 820 nm, with the peak reflectivity for 10-pair DBR of as high as 96 %, and the reflection bandwidth of as wide as 90 nm. We formed a 20×20 μm 2 square mesa to measure the series resistance using wet chemical etching. From the measurement result, the series resistance of about 50 Ω is obtained at a moderate doping (3×10 18 cm -3 ). Finally, the dependence of the resistance of the DBR on the temperature is analyzed. From the experimental result, it is found that the mechanism of the low series resistance of this kind of DBR may increase the tunneling current in the semiconductor/superlattice mirror structure, which will result in a decrease in series resistance.     

Sub-mA threshold 1.5-/spl mu/m VCSELs with epitaxial and dielectric DBR mirrors

In this letter, we report low threshold 1.5-/spl mu/m vertical-cavity surface-emitting lasers with epitaxial and dielectric distributed Bragg reflector (DBRs). The device consists of a lattice-matched InAlAs-InAlGaAs DBR grown on an InP substrate, an InAlGaAs quantum well active region, a metamorphic GaAs tunnel junction, and a SiO/sub 2/-TiO/sub 2/ dielectric DBR. The current confinement is achieved by oxidizing an AlAs metamorphic layer grown on top of the active region. Small aperture devices show a minimum threshold of 0.8 mA at room temperature in continuous-wave operation.     

Vertical cavity surface-emitting laser with an AlGaAs/AlAs Braggreflector

The letter elucidates the room temperature pulsed operation of a vertical cavity surface-emitting laser with an electrically conductive AlGaAs/AlAs distributed Bragg reflector (DBR). The maximum reflectivity of a DBR grown by MOCVD was 96% at 0.88 μm wavelength. The threshold current of 30 μm diameter devices was 200 mA under room temperature pulsed condition, which is the lowest value for such a broad area structure     

A novel vertical-cavity surface-emitting laser with semiconductor/superlattice distributed bragg reflectors

Taking into account the tunneling effect of the superlattice, the authors present for the first time a vertical-cavity surface-emitting laser with AlAs[GaAs-AlAs] semiconductor/superlattice distributed Bragg reflectors (DBRs). The structure of a 19-period-AlAs (73.3 nm)-18.5-pair [GaAs (3.0 nm)-AlAs (0.7 nm)] DBR was grown on an n-GaAs [100] substrate by molecular beam epitaxy, and the device was fabricated by using a modified technique of proton implantation. It was found from the experiments that the peak reflectivity of the DBR is as high as 99.7%, the central wavelength is at about 840 nm, and the reflection bandwidth is wide up to 90 nm. A 20/spl times/20 /spl mu/m/sup 2/ square mesa on the top of the DBR was made by the wet chemical etching method to measure the series resistance of the devices. It can be seen that more than a third of them are within 20-30 /spl Omega/ that lead to ideal optical characteristics, low dissipated power, and reliability-some of the most important factors for the devices to be used in a number of applications in the future.     

Low-temperature continuous-wave operation of AlGaAs-GaAs vertical-cavity surface-emitting lasers on Si substrates

An AlGaAs-GaAs multiquantum-well vertical-cavity surface-emitting laser (VCSEL) diode has been grown on a Si substrate using metalorganic chemical vapor deposition. The VCSEL structure grown on a Si substrate consists of ten quantum well active layers and a 23-pair of AlAs-Al/sub 0.1/Ga/sub 0.9/As distributed Bragg reflectors. The VCSEL on a Si substrate exhibited a threshold current of 82 mA and a threshold current density of 4.2 kA/cm/sup 2/ under continuous-wave (CW) conditions at 150 K. Electroluminescence observation showed that optical degradation is caused by the generation and growth of dark-line defects.     

Studies of the Cross Section and Photoluminescence of a GaAs Layer Grown on a Si/Al2O3 Substrate

Semiconductors - A GaAs/AlAs/GaAs/AlAs/Ge heterostructure grown on a Si/Al2O3(1 $$\bar {1}$$ 02) substrate is formed and studied. The Ge buffer layer is produced by the “hot wire”...     

单片集成GaAs基长波长谐振腔光探测器的研究

介绍了一种GaAs基的长波长谐振腔增强型(RCE)光探测器.通过两步生长法,在GaAs村底上异质外延生长了InP-InGaAs-InP的p-i-n光吸收结构和GaAs/AlAs的分布布拉格反射镜(DBR).所制备的器件在1 549.4 nm处获得了67.3%的量子效率和17 nm的光谱响应线宽,在1 497.7 nm处获得了53.5%的量子效率和9.6 nm的光谱响应线宽,而InGaAs吸收层厚度仅为200 nm.采用单片集成法,工艺简单、易于产业化,随着缓冲层技术的发展,此种RCE光探测器的性能还将获得进一步提升.     

RCLED的制作工艺与性能研究

设计并用MOCVD在GaAs衬底上分别生长了以34对AlAs/Al0.5Ga0.5As材料为下DBR,6对(Al0.3Ga0.7)0.5In0.5P/AlInP材料为上DBR,以及有源区为3个GaInP/(Al0.5Ga0.5)0.5In0.5P量子阱的外延片。设计了以SiO2做阻挡层,并且深腐蚀过有源区的台形RCLED的工艺结构,利用光刻、腐蚀、等离子化学气相沉淀(PECVD)以及溅射等工艺,成功制备了波长为650nm的谐振腔发光二极管(RCLED),并对其性能进行了测试。通过与普通LED相比较发现,RCLED不仅具备更强的轴向光强和更高的提取效率,而且具有更窄的光谱线宽、更小的发散角、更好的发射方向性,利于与塑料光纤进行耦合。     

GaAs-based 1.53 μm GaInNAsSb vertical cavity surface emitting lasers

Electrically-pumped GaAs-based 1.53 mum vertical cavity surface emitting lasers operating in pulsed mode at room temperature and continuous wave (CW) up to 20degC are reported for the first time. The lasers employ a GaInNAsSb/GaNAs multiple quantum well active region, a selectively oxidised AlAs aperture and p- and n-doped Al(Ga)As/GaAs distributed Bragg reflectors. Typical devices have room-temperature pulsed threshold current densities of 8.3 kA/cm and threshold voltages of 5.5 V. CW threshold currents as low as 2.87 mA for a 7 mum aperture device were observed at 15degC.     

1.3 /spl mu/m GaAs/GaAsSb quantum well laser grown by solid source molecular beam epitaxy

A highly strained GaAs/GaAs/sub 0.64/Sb/sub 0.36/ single quantum well laser has been grown on GaAs (100) substrate by using solid source molecular beam epitaxy. The uncoated broad-area laser demonstrates 1.292 /spl mu/m pulsed operation with a low threshold current density of 300 A/cm/sup 2/. The spontaneous emission of the laser was also studied. The result reveals that the Auger recombination component dominates the threshold current at high temperature.     

A low-threshold polarization-controlled vertical-cavitysurface-emitting laser grown on GaAs (311)B substrate

We have demonstrated a GaAs (311)B vertical-cavity surface-emitting laser (VCSEL) with a threshold current as low as 250 μA, which is the lowest value ever reported for that on non-(100) oriented substrates. Also, the fabricated VCSEL shows a stable polarization state for wide during current ranges and a large polarization-mode suppression ratio over 30 dB between the [2¯33] and [011¯] axis modes at 5 mA. The electrical specific resistance of 1.2×10^-4 Ω·cm^-2 at the threshold was reasonably low due to carbon autodoping to AlAs in a p-type distributed Bragg reflector (DBR)     

室温下高峰谷电流比、高峰电流密度的双势垒共振隧穿二极管

在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管.在GaAs层中加入In0.1Ga0.9As层用以降低势垒两边的势阱深度,从而提高了器件的峰谷电流比和峰电流密度.为了减小器件的接触电阻和电流的非均匀性,使用了独特形状的集电极,总的电流密度也因此提高.薄栅也有助于提高器件的PVCR和峰电流密度.在室温下测得其峰谷电流比高达13.98,峰电流密度大于89kA/cm2.     

A DBRTD with a High PVCR and a Peak Current Density at Room Temperature

AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs double-barrier resonant tunneling diodes(DBRTDs) grown on a semi-insulated GaAs substrate with molecular beam epitaxy is demonstrated.By sandwiching the In0.1Ga0.9As layer between GaAs layers,potential wells beside the two sides of barrier are deepened,resulting in an increase of the peak-to-valley current ratio (PVCR) and a peak current density.A special shape of collector is designed in order to reduce contact resistance and non-uniformity of the current;as a result the total current density in the device is increased.The use of thin barriers is also helpful for the improvement of the PVCR and the peak current density in DBRTDs.The devices exhibit a maximum PVCR of 13.98 and a peak current density of 89kA/cm2 at room temperature.     

1.55-μm buried-heterostructure VCSELs with InGaAsP/lnP-GaAs/AlAsDBRs on a GaAs substrate

We demonstrate 1.55-μm buried-heterostructure (BH) vertical-cavity surface-emitting lasers (VCSELs) on a GaAs substrate. Thin-film wafer-fusion technology enables InP-based BH VCSELs to be fabricated on GaAs/AlAs distributed Bragg reflectors. Detailed investigations of the device resistance are also described. As a result of introducing BH and obtaining low device resistance, the threshold current density under CW operation shows the independence of mesa size due to a strong index guide and small noneffective current. A 5-μm VCSEL exhibits a record threshold current of 380 μA at 20°C. This VCSEL also operates with single transverse mode up to the maximum optical output power     

纳米电子器件及其集成

对基于Top-Down加工技术的纳米电子器件如：单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论. 采用CMOS兼容的工艺成功地研制出单电子器件，观察到明显的库仑阻塞效应；在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件，在室温下测得其峰谷电流比高达13.98，峰电流密度大于89kA/cm2；概述了交叉阵列的分子存储器的研究进展.     

GaAs/Si/AlAs异质结的DLTS实验研究

利用深能级瞬态谱(DLTS)技术研究了Si夹层和GaAs层不同生长温度对GaAs/AlAs异质结晶体品质的影响.发现Si夹层的引入并没有引起明显深能级缺陷,而不同温度下生长的GaAs/Si/AlAs异质结随着温度的降低,深能级缺陷明显增加,并进行了分析,得到深能级是由Ga空位引起的,在600℃时生长的晶体质量最佳.     

High performance aluminum arsenic intraband resonant microwave devices

We report on GaAs/AlAs triple-barrier quantum well intraband (TBQWI) heterostructures grown by molecular beam epitaxy (MBE) on n⁺ GaAs substrate. Heterostructure quality was evaluated by X-ray diffraction and photoluminescence spectrum measurements. The position of the broad peak near 65.84° corresponds well to the diffraction from the (4 0 0) face of AlAs layers assuming intensity of total AlAs spacers and barriers. The 10K photoluminescence (PL) data has a strong peak at 8140 Å. The PL spectrum is dominated by a sharp peak centered at the emission energy of 1.52 eV attributed to the energy of e1-hh bond exciton of GaAs layer. TBQWI heterostructures were grown and processed into resonant tunneling diode (RTD). Room temperature electrical measurement of the TBQWI RTD yielded maximum peak to valley current ratio (PVCR) of 120 with peak current density (J_p) of 2.1 kA/cm². The high PVCR of this GaAs/AlAs TBQWI RTD is, to the better of our knowledge, one of the higher PVCRs obtained in any intraband tunnel device.     

GaAsSOI衬底上PHEMT器件特性演示

利用分子束外延生长了 Ga As/Al As/Ga As夹层结构材料 ,通过侧向湿法热氧化技术 ,成功制作了Ga As SOI衬底 ,并在其上生长了 PHEMT材料结构。X射线双晶摇摆曲线分析证明材料结构完整 ,晶体质量良好。器件结果显示了优良的 I-V特性 ,零偏压下漏源电流为 3 2 0 m A/mm,最大跨导为 2 5 0 m S/mm,器件具有良好的夹断性能 ,极好的电荷控制能力和高线性特性     

高反射性电流阻挡层用于提高InGaN/GaN发光二极管的光输出功率

由SiO₂/TiO₂分布布拉格反射镜(DBR)和Al镜组成的混合式反射电流阻挡层用于提高InGaN/GaN发光二极管的光输出功率。混合式反射电流阻挡层不仅增强了电流扩展效应而且有效的将射向p金属电极的光子反射防止其对p电极焊点附近光子的吸收。实验结果表明,淀积在p-GaN上1.5个周期的SiO₂/TiO₂DBR和Al镜在455nm垂直入射时的反射率高达97.8%。在20mA的工作电流下,与没有电流阻挡层的发光二极管相比,生长1.5对SiO₂/TiO₂ DBR和Al镜作为电流阻挡层的发光二极管的光输出功率提高了12.5%,且光输出功率的分布更加均匀。