Influence of Differently Structured Aluminium–Polypropylene Interfaces on Adhesion

Polar groups were introduced on polypropylene surfaces for increasing the surface energy and the peel strength to evaporated aluminium layers. Three kinds of plasma processes were used for introducing such functional groups to polyolefin surfaces: low-pressure radio-frequency (RF) O₂ plasma exposure, atmospheric-pressure dielectric-barrier discharge (DBD) treatment in air, and the deposition of allylamine plasma polymer. The amino groups of the allylamine plasma polymer were also used as anchoring points for chemical introduction of covalently bonded spacer molecules equipped with reactive endgroups. Thus, silanol endgroups of a covalently bonded spacer were able to interact with the evaporated metal layer. The Al–PP composites achieved a maximal peel strength of 470 N/m by exposing the polymer to the lowpressure O₂ plasma and 500 N/m on exposure to the atmospheric DBD plasma. After allylamine plasma polymerization and grafting of spacers, the peel strength was usually higher than 1500 N/m and the composites could not be peeled.     

Surface characterization of polymers modified by keV and MeV ion beams

The present work deals with two different surface modification techniques for altering the surface properties of polymers: plasma treatment and ion implantation. Polymer foils were exposed in an inductively-coupled r.f. (13.56 MHz) plasma system with and without applying a negative high voltage pulse to the sample stage. The influence of low pressure plasmas of oxygen, nitrogen, or argon on the chemical composition, topography, and wettability of polymer surfaces was studied in detail. Etch rates of poly(ethylene terephthalate) for different plasma parameters were monitored. The polymer surface was also modified by a high energy ion beam process. Polyimide films were implanted with different ion species such as Ar⁺, N⁺, C⁺, He⁺, and O⁺ at doses from 1 × 10¹⁵ to 1 × 10¹⁷ ion/cm². Ion energy was varied from 10 to 60 keV for the plasma source ion implantation (PSII) experiment. Polyimide samples were also implanted with 1 MeV hydrogen, carbon, and oxygen ions at a dose of 1 × 10¹⁴ ion/cm². Depending on the ion energy, dose, and ion species, the surface resistivity of the film was reduced by several orders of magnitude. A study on the plasma-treated and ion beam-treated polymer surfaces was performed using TOF-SIMS, XPS, SEM, AFM, and water contact angle measurements.     

Plasma surface modification of poly(phenylene sulfide) films for copper metallization

Poly(phenylene sulfide) (PPS) films were modified by Ar, O₂, N₂ and NH₃ plasmas in order to improve their adhesion to copper metal. All four plasmas modified the PPS film surfaces, but the NH₃ plasma modification was the most effective in improving adhesion. The NH₃ plasma modification brought about large changes in the surface topography and chemical composition of the PPS film surfaces. The peel strength for the Cu/plasma-modified PPS film systems increased linearly with increasing surface roughness, R _a or R _rms, of the PPS film. The plasma modification also led to considerable changes in the chemical composition of the PPS film surfaces. A large fraction of phenylene units and a small fraction of sulfide groups in the PPS film surfaces were oxidized during the plasma modification process. Nitrogen functional groups also were formed on the PPS film surfaces. The NH₃ plasma modification formed S—H groups on the PPS film surfaces by reduction of S—C groups in the PPS film. Not only the mechanical interlocking effect but also the interaction of the S—H groups with the copper metal may contribute to the adhesion of the Cu/PPS film systems.     

Plasma amination of ultrananocrystalline diamond/amorphous carbon composite films for the attachment of biomolecules

Ultrananocrystalline diamond/amorphous carbon nanocomposite films (UNCD/a-C) have been deposited by microwave plasma chemical vapour deposition at 600 °C from 17% CH₄/N₂ mixtures. The as-grown films turned out to be hydrogen terminated and very stable. Photochemical amination of H-terminated diamond is a well-established route to attach functional groups to such surfaces for applications in biosensors. Here we report on experiments to aminate UNCD surfaces directly by exposure to ammonia plasmas. Thereafter the surfaces were reacted with the heterobifunctional crosslinker molecule SSMCC bearing a N-hydroxysuccinimide (NHS) ester group which should react with the surface NH₂ groups. By means of X-ray photoelectron spectroscopy (XPS), contact angle measurements and fluorescence microscopy it is shown that both steps, plasma amination and SSMCC attachment lead to the desired aims. On the other hand, experiments to attach a thiol-bearing fluorescein molecule directly to H-terminated UNCD films turned out to be partially successful although according to literature such a reaction should be very unlikely.     

Plasma modification of poly(oxybenzoate-co-oxynaphthoate) film surfaces for copper metallization

Poly(oxybenzoate-co-oxynaphthoate) (POCO) film surfaces were modified by four plasma gases, Ar, O₂, N₂ and NH₃, and the effects of the plasma modification were investigated in order to understand the adhesion with copper metal. The Ar, O₂, N₂ and NH₃ plasmas converted the POCO surfaces from hydrophobic to hydrophilic. The effect of the plasma on the hydrophilic modification was in the order: Ar plasma > O₂ plasma > N₂ plasma > NH₃ plasma. The plasma modification contributed to the adhesion between the deposited copper metal and the POCO film. The NH₃ plasma was most effective in improving the adhesion, and the Ar plasma was ineffective. The plasma-modified POCO film surfaces showed quite different C_ls spectra from that of the original POCO film. There were large differences in the C_ls and N_ls spectra between the NH₃ and Ar plasma modifications. The NH₃ plasma modification did not show C_ls component #5 due to π–π^* shake-up satellite, but the Ar plasma modification did show this component. Furthermore, NH₃ plasma modification led to a new N_ls spectrum. The plasmas caused etching of the POCO film surfaces, and the etch rate depended on what plasma was used and how much RF power was used. The NH₃ plasma-modified POCO film surface showed a larger R _a (25.5 nm) than the other plasma-modified surfaces (R _a = 16.4–19.0 nm), which were comparable to that of the original surface (R _a = 14.8 nm). The NH₃ plasma led to a highly-undulated surface, and the other plasmas did not alter the surface roughness. The roughened surfaces showed contribution to enhancement of the adhesion to the deposited copper metal.     

Attachment of amino groups to polymer surfaces by radiofrequency plasmas

Low temperature gaseous plasmas of ammonia or nitrogen–hydrogen mixtures contain ? NH₂ groups, or precursors thereof, formed in the plasma, which experimental evidence strongly suggests, can add to various polymer surfaces. The plasmas were established in the 0.3–1.5 torr range by radiofrequency (13.56 MHz) electrodeless excitation at powers ranging from 50 to 500 W. Samples of polypropylene, poly(vinyl chloride), polytetrafluorethylene, polycarbonate, polyurethane, and poly(methl methacrylate) were investigated. All these polymers added amino groups to varying degrees of amino site densities depending on the choice of plasma parameters and the reactivity of the polymer itself. In every instance the polymer was rendered more wettable, although no quantitative wettability measurements were made. Following the plasma treatment, degrees of amino attachment to the polymer were followed radiometrically and reported in terms of “heparin thicknesses” resulting from ionic heparin ? ³⁵S attachment to quaternary sites produced from the amino groups. Two implications of such a surface modification are to adhesion and blood compatible materials preparation.     

Surface modifications of EVA copolymers induced by low pressure RF plasmas from different gases and their relation to adhesion properties

Two ethylene vinyl acetate (EVA) copolymers (12 and 20 wt% of vinyl acetate,VA, content) have been treated with low pressure RF plasmas from non-oxidizing gases (Ar, N₂) and oxidizing gases (air, a mixture of 4N₂: 6O₂ (v/v), O₂ and CO₂). The formation of polar moieties on both EVAs was more noticeable by treatment with plasmas from non-oxidizing gases than from oxidizing ones (the higher the reactivity, the lower the difference with respect to untreated EVA surfaces). The surface etching with the non-oxidizing plasmas, giving rise to a high roughness, depends on the wt% of VA in the composition of the copolymer because of the different resistances of VA (low) and PE (high) to the non-oxidizing plasma particles bombardment. The adhesion properties obtained using a polyurethane adhesive (PU) showed high T-peel strength values and adhesion failure in EVAs treated with plasmas from oxidizing gases, due to roughness produced causing mechanical interlocking of the adhesive. Lower T-peel strength values were obtained with non-oxidizing plasmas: the values for EVA12 being, in general, lower than those obtained for EVA20. The durability of the treated EVAs/PU adhesive joints after ageing in humidity and temperature was quite good.     

Surface modification of PET films by a combination of vinylphthalimide deposition and Ar plasma irradiation

A new surface modification technique for PET films is proposed. This technique, called VPI modification technique, is a combination of two processes: The first step involves the deposition of vinylphthalimide (VPI) on the PET film surfaces, followed by Ar plasma irradiation of the VPI-covered film surfaces. The VPI modification technique led to large increases in the N/C atom ratio on the PET film surfaces. On the VPI-modified PET film surface, a new N_ls peak containing two components due to amide groups as well as imide groups appeared. The C_ls signal for the VPI-modified PET film surface also showed a new component due to ketone groups. These changes indicate that VPI reacted with the PET film surfaces to form nitrogen-containing groups. VPI modification made PET film surfaces hydrophilic. The VPI-modified film surfaces showed a decrease in water contact angle from 73 degrees to 48–56 degrees.     

Introduction of carboxylic groups on ethylene-co-tetra fluoroethylene (ETFE) film surfaces by CO2 plasma

ETFE film surfaces were modified by CO₂, O₂ and Ar plasmas in order to form carboxylic groups on their surfaces, and the possibility that carboxylic groups could be predominantly introduced into the CH₂–CH₂ component rather than the CF₂–CF₂ component in the ETFE polymer chains was investigated from the viewpoint of chemical composition analyzed by XPS. The CO₂ plasma modification was more effective in the selectivity of the CH₂CH₂ component for the introduction of carboxylic groups, as well as in the concentration of the carboxylic groups formed on the film surfaces than O₂ plasma modification. The concentration of carboxylic groups formed on the ETFE film surfaces by the CO₂ plasma modification was 1.40–1.50 groups per 100 carbons. Topographical changes on the ETFE film surfaces by the plasma modification were also investigated by scanning probe microscopy.     

Polymer Functionalization and Thin Film Deposition by Remote Cold Nitrogen Plasma Process

Modification of polymer surfaces by cold plasma processes is attracting a growing interest. Especially, the use of plasma gases such as N₂, O₂ or air, which are cheap and environmentally safe, is very attractive from an industrial point of view. The lifetime of atomic oxygen being very short, it is very difficult to operate with air or oxygen plasma when wide plasma volume is required. However, it is possible to obtain cold remote nitrogen plasma reaching volume of several m³ due to the long lifetime of atomic nitrogen because of a re-dissociation mechanism. Moreover, the temperature being close to the ambient makes this plasma very attractive for functionalization and/or coating of polymer surfaces. Several applications of this plasma process are presented in this paper. The incorporation of new chemical functions during the treatment of polymers leads to an increase of their adhesion properties. Several industrial applications (painting, sticking, bonding, foaming and thermo-covering) are presented. The ability of this remote plasma to decompose, to polymerize, or to react with a volatile chemical component is described through three examples involving polymer substrates: (i) the deposition of metallic films; (ii) the synthesis of a nitride film combining hardness and elastic behavior; (iii) the synthesis of an organosilicon film showing interesting barrier properties. Adhesion aspects are investigated for all these examples.     

Introduction of amino functionalities on ethylene-co-tetrafluoroethylene film surfaces by NH3 plasmas

In order to form active sites for grafting amino groups, a predominant elimination of fluorine atoms from fluoropolymers such as poly(tetrafluoroethylene), ethylene-co-tetrafluoroethylene co-polymer (ETFE) and poly(vinylidene fluoride) was carried out using the plasma irradiation technique, and the possibility that amino functional groups could be formed on the fluoropolymer surfaces was investigated. The NH₃ plasma irradiation led to considerable elimination of fluorine atoms from the fluoropolymers, as well as grafting of nitrogen functionalities. The formation of nitrogen-containing groups was strongly influenced by the magnitude of the W/FM parameter, and the NH₃ plasma operated at a low W/FM parameter of 79 MJ/kg was found to be preferable for the surface modification process. XPS spectra for the NH₃ plasma-modified surfaces showed that the NH₃ plasma attacked predominantly CF₂—CF₂ sequences rather than CH₂—CH₂ sequences in the ETFE polymer. The primary amino groups formed on the ETFE film surfaces were determined by fluorescence measurements. The concentration of the amino groups formed on the surfaces was not constant but varied according to the W/FM parameter. NH₃ plasma operated at a low W/FM parameter of 79 MJ/kg was found to be preferable in grafting amino groups on the ETFE film surfaces.     

Highly Hydrophobic Wood Surfaces Prepared by Treatment With Atmospheric Pressure Dielectric Barrier Discharges

Atmospheric dielectric barrier discharge (DBD) treatments of wood were done to attain water repellency on wood surfaces. A specially designed frequency controlled parallel-plate DBD reactor was utilized to produce the discharges. Ethylene, methane, chlorotrifluoroethylene and hexafluoropropylene were used as DBD reagents. Contact angle, water absorption, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) measurements on the modified surfaces were performed. For methane and ethylene, XPS data showed an increased surface atomic concentration of carbon from 72.7% on untreated samples up to 80.7 and 96%, respectively, whereas nearly 50% fluorine concentration was observed with fluorinated reagents. The C_1s spectrum of hexafluoropropylene-DBD-treated wood sample showed that the CF₃ group was introduced in a relative amount of 19%. AFM images showed distinct features for each of the DBD treatments, such as a deposit of a thin uniform film in the case of ethylene-DBD treatment, whereas the hexafluoropropylene-DBD treatment resulted in the nucleation of plasma-derived entities at the fiber surface and the subsequent growth of a film. Under optimized conditions the water contact angle was in the range of 139°–145°. The combination of depositing a low surface energy polymer on an already rough surface gave the surface-treated wood a highly hydrophobic character.     

Surface modification of Kevlar 149 fibers by gas plasma treatment

Kevlar 149 fibers have been surface treated with NH₃-, 0₂-, or H₂O-plasm to modify the fiber surfaces. SEM (scanning electron microscopy) is used to characterize the surface topography of fibers etched by gas plasmas. The chemical compositions and functional groups of the fiber surfaces are identified by ESCA (electron spectroscopy for chemical analysis) and SSIMS (static secondary ion mass spectroscopy), respectively. The contact angle of water on modified PPTA [poly(p-phenylene terepbthalamide)] film prepared from using Kevlar 149 fibers is also used to investigate the wettability. The results show that the etching abilities of gas plasmas are dependent on the type of gas used for plasma treatments. The contact angle data indicate that all the three gas plasma treatments are effective in rendering the surface of PPTA more hydrophilic. The ESCA analysis results show that the surface compositions of plasma-treated fibers are highly dependent on the type of gas used and treatment time. Changes in surface compositions of fibers treated by NH₃-, O₂-, and H₂O-plasma are observed. Increasing nitrogen and oxygen contents are observed for the NH₃-plasma treatment, and the O₂- and H₂O-plasma treatments, respectively. Furthermore, the incorporation of amino groups into fiber surfaces by NH₃-plasma treatment and the extensive damage of the aromatic ring and the polymer backbone by H₂O-plasma and O₂-piasma are evidenced by SSIMS.     

Surface characterization of nickel alloy plasma-treated by O2/CF4 mixture

The micro- or nano-structured mold used for polymer embossing typically must be coated with an anti-adhesion material to reduce its interaction with the embossing. The mold is typically made by nickel sulphamate electroforming. For the anti-adhesion coating to adhere to the mold, the nickel mold surface must be clean and preferably unoxidized or possess reactive groups suitable for covalent bonding with the anti-adhesion coating. The effectiveness of plasma cleaning using mixtures of oxygen (O₂) and tetrafluoromethane (CF₄) with varying ratios versus liquid-only cleaning was investigated. To simulate the nickel mold, Ni200 alloy was used. Plasma treatment using mixtures of O₂ and CF₄ was found to be more effective in cleaning the Ni200 surface than liquid-only cleaning or pure O₂ or pure CF₄ plasma treatment. Using a 1 : 1 O₂ /CF₄ mixture plasma, the contact angles of water, glycerol and diiodomethane on Ni200 were the lowest and the calculated surface energy was the highest among the investigated treatments. From X-ray photoelectron spectroscopy (XPS), the amount of organic contamination on Ni200 was significantly reduced with plasma treatment. For liquid-only cleaned samples, metallic nickel, NiO and Ni(OH)₂ are present on the surface. With pure O₂ or pure CF₄ or 1 : 1 O₂ /CF₄ mixture plasma, both oxidation and fluorination occur and the surface contains combinations of NiF₂, Ni(OH)₂, Ni(OH)F, Ni₂O₃ and NiO₁₅F instead (without metallic nickel and NiO). The proportions of these different compounds vary according to the O₂/CF₄ ratio; O/Ni ratio is highest for pure O₂ plasma treatment, whilst F/Ni is highest for pure CF₄ plasma treatment.     

Plasma treatment of PET and acrylic coating surfaces - I. In-situ XPS measurements

The surface modification of poly(ethylene terephthalate) (PET) and UV-cured tripropyleneglycol diacrylate (acrylic) films induced by remote N₂ and Ar microwave plasmas (2.45 GHz) was compared by in-situ XPS measurements. Both N₂ and Ar plasma treatments led to destruction of the initial oxygen-containing groups. The destruction of ester groups was much faster for the acrylic than for the PET film, and the destruction of ether groups was much faster than that of ester groups within the acrylic film. Among the plasma gases, N₂ was more effective than Ar in the case of PET, but their difference was negligible in the case of the acrylic film. The higher stability of the PET surface was attributed to the presence of a rigid aromatic backbone, which protected the ester groups from plasma UV irradiation and stabilized the free radicals. The lower stability of the acrylic film was associated with the presence of weak ether groups. New functional groups were created, attributed to carbonyl in the case of Ar, and carbonyl/amide and amine in the case of N₂ plasma treatments. The formation of these new functional groups was very small compared with the loss of ether and ester groups, suggesting that the destruction of these oxygen-containing groups proceeded mainly through elimination of the entire groups.     

XPS investigation of the reaction of carbon with NO, O2, N2 and H2O plasmas

The interaction of graphite with plasmas of pure gases (O₂, N₂ or H₂O), air or mixtures of gases containing NO has been studied by XPS “in situ” analysis. Depending on the type of plasma, different species of nitrogen, oxygen and carbon have been detected on the surface of graphite. The nitrogen containing species have been attributed to pyridinic, pyrrol, quartenary and oxidized groups adsorbed on the surface. The evolution with the treatment time of the relative intensity of the different nitrogen bands for Ar + NO, N₂ + NO, air or N₂ plasmas has served to propose a model accounting for the reactions of graphite with plasmas of NO containing gases. The model explains why carbon materials (in the form of graphite, soot particles, etc.) can be very effective for the removal of the NO present in exhaust combustion gases excited by a plasma. The analysis of the C1s and O1s photoemission peaks reveals the formation of C/O adsorbed species up to a maximum concentration on the surface of around 10% atomic oxygen. A general evolution is the progressive formation of C/O species where the carbon is sp³ hybridized. This tendency is enhanced when graphite is treated with the plasma of water.     

Improvement of paint adhesion to a polypropylene bumper by plasma treatment

Improvement of the paint adhesion to a polypropylene (PP) bumper has been investigated without using a primer by treating the bumper surface with O₂, H₂O, and acetylene plasmas. All the plasma treatments resulted in an increase of the adhesion strength in dry conditions. The adhesion strength could be increased up to a value comparable to that obtained by applying a primer. The treated surfaces were quite stable for 7 days in air. After exposure to wet conditions, however, the adhesion strengths for both O₂ and H₂O plasma-treated samples decreased significantly, while the adhesion strength for the acetylene plasma-treated sample did not change much.     

Characterisation of flame retardant plasma polymer deposited BOPP film

Abstract

Flame retardancy of polypropylene films was studied by plasma polymerisation technique. The surface of BOPP film was modified by boron containing plasma polymers at different plasma conditions. Plasma polymer coated polypropylene films were examined by flame retardancy test (limiting oxygen index, LOI) and TGA. Boron containing plasma polymer deposition on the film surface showed an improvement of flame retardancy. Furthermore, TGA thermograms pointed out that the first degradation temperature of treated polypropylene film was increased from 331 to 396°C, and the second degradation temperature was shifted from 401 to 455°C. Also, the plasma polymers were characterised by FTIR spectroscopy and XPS. According to XPS results, the BOPP surfaces treated with TMB showed significant difference in the composition with respect to the untreated sample. The FTIR spectra of plasma polymers obtained indicated that when the treatment time was increased to 60 min with a constant discharge power at 80 W, the absorption intensities of all the functional groups increased. As a result, boron containing plasma polymer treatment was found to be an effective method in enhancing the flame retardancy of BOPP film.     

Surface modification of tetrafluoroethylene–perfluoroalkyl vinylether copolymer (PFA) by plasmas for copper metallization

Tetrafluoroethylene–perfluoroalkyl vinylether copolymer (PFA) sheet surfaces were modified with argon, helium, oxygen, and hydrogen plasmas. How the four plasmas modified the PFA sheet surfaces was investigated. All plasmas modified the PFA surfaces and at the same time initiated degradation of the PFA polymer chains. The balance between modification and degradation was strongly influenced by the magnitude of the discharge current in the plasmas. Efficiency of the plasmas in modification was hydrogen plasma > oxygen plasma > argon plasma > helium plasma. The modification involved defluorination of CF₂ carbons into CHF and CH₂ carbons and oxidation into O? CH₂, O? CHF, and O? CF₂ groups. The surface‐modification technique (a combination of hydrogen plasma treatment and silane coupling treatment) proposed in this study was applied for copper metallization of the PFA surface. The utility of the technique was confirmed. © 2002 Wiley Periodicals, Inc. J Appl Polym Sci 85: 1087–1097, 2002