Nanoporous TiO2 thin film based conductometric H2 sensor

Nanoporous titanium dioxide (TiO₂) based conductometric sensors have been fabricated and their sensitivity to hydrogen (H₂) gas has been investigated. A filtered cathodic vacuum arc (FCVA) system was used to deposit ultra-smooth Ti thin films on a transducer having patterned inter-digital gold electrodes (IDTs). Nanoporous TiO₂ films were obtained by anodization of the titanium (Ti) thin films using a neutral 0.5% (wt) NH₄F in ethylene glycol solution at 5 V for 1 h. After anodization, the films were annealed at 600 °C for 8 h to convert the remaining Ti into TiO₂. The scanning electron microscopy (SEM) images revealed that the average diameters of the nanopores are in the range of 20 to 25 nm. The sensor was exposed to different concentrations of H₂ in synthetic air at operating temperatures between 100 °C and 300 °C. The sensor responded with a highest sensitivity of 1.24 to 1% of H₂ gas at 225 °C.     

Nanostructured TiO2 — morphological and structural changes

Chemical modification of titanium to form TiO₂ is being extensively pursued. We compare the influence of acid pickling and post processing on the crystallinity and morphology of TiO₂ grown by H₂O₂ oxidation. Subsequent oxidation using two concentrations of H₂O₂ (15% and 30% by mass) indicates a variation in the fine surface morphology, apparent at low magnifications. No discernable difference in the quality of TiO₂ that was produced when evaluated by SEM, Raman or XRD (glancing angle and θ:2θ) could be detected between the samples oxidised in different H₂O₂ concentrations. The photoactivity of TiO₂ produced from ultra thin Ti films was confirmed by the photocatalytic reduction of Ag⁺ cations to Ag⁰.     

Low temperature preparation of transparent, antireflective TiO2 films deposited at different O2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering

A serial of crystalline titanium oxide ceramic films were deposited at low temperature using microwave electron cyclotron resonance (MW-ECR) magnetron sputtering with different O₂/Ar ratios. The influences of O₂/Ar ratio on the deposition rate, morphology, crystalline nature, optical adsorption property of the obtained titanium oxide thin films were investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectra. Therefore, the optimum O₂/Ar ratio for deposition of anatase TiO₂ thin films on unheated glass substrate was realized in a MW-ECR magnetron sputtering process. The as-deposited anatase TiO₂ films were transparent and were antireflective in the visible region.     

The microstructure and wettability of the TiOx films synthesized by reactive DC magnetron sputtering

Different chemical state of titanium oxide films were deposited on commercially pure Ti (CP Ti) by reactive DC magnetron sputtering under different oxygen flow rates to examine a possibility of their applications to endovascular stents. The chemical composition and crystal structure of the obtained films were analyzed by XPS and XRD, respectively. In dependence on the deposition parameters employed, the obtained films demonstrated different mixture of anatase TiO₂, Ti₂O₃, TiO and Ti. The wettability of the films was measured by the water contact angle variation. By formation of titanium oxide film on CP Ti, contact angle was decreased. In order to modify and control the surface wettability, the resultant TiO_x films were etched subsequently by different plasma. The wettability was influenced by etched process according to the decreased contact angle values of etched TiO_x film. Furthermore, TiO_x films became highly hydrophilic by ultraviolet (UV) irradiation, and returned to the initial relatively hydrophobic state by visible-light (VIS) irradiation. The wettability of the TiO_x film was enabled to convert between hydrophilic and hydrophobic reversibly by alternative UV and VIS irradiation. By adjusting deposition parameter and further modification process, the wettability of the TiO_x films can be changed freely in the range of 0–90°.     

Preparation of anatase TiO2 thin films for dye-sensitized solar cells by DC reactive magnetron sputtering technique

Anatase titanium dioxide (TiO₂) thin films are prepared by DC reactive magnetron sputtering using Ti target as the source material. In this work argon and oxygen are used as sputtering and reactive gas respectively. DC power is used at 100 W per 1 h. The distance between the target and substrate is fixed at 4 cm. The glass substrate temperature value varies from room temperature to 400 °C. The crystalline structure of the films is determined by X-ray diffraction analysis. All the films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperature grew in crystalline anatase phase. Phase transition from amorphous to anatase is observed at 400 °C annealing temperature. Transmittances of the TiO₂ thin films were measured using UV-visible NIR spectrophotometer. The direct and indirect optical band gap for room temperature and substrate temperature at 400 °C is found to be 3.50, 3.41 eV and 3.50, 3.54 eV respectively. The transmittance of TiO₂ thin films is noted higher than 75%. A comparison among all the films obtained at room temperature showed a transmittance value higher for films obtained at substrate temperature of 400 °C. The morphology of the films and the identification of the surface chemical stoichiometry of the deposited film at 400 °C were studied respectively, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The surface roughness and the grain size are measured using AFM.     

Mesoporous TiO2 thin films embedded with Au nanoparticles for the enhancement of the photocatalytic properties

Mesoporous TiO₂ thin films were prepared by hydrothermal-oxidation of titanium metal thin films, which were obtained by DC magnetron sputtering technique. Gold nanoparticles, which were prepared by reduction of HAuCl₄, were embedded into the holes of the mesoporous TiO₂ films by capillary method followed by annealing in air up to 400 °C. The size of pore of TiO₂ films is about 100 nm and that of Au nanoparticles is about 10 nm in average. The morphology of the films was analyzed by field emission scanning electron microscope (FE-SEM) and scanning probe microscopes (SPMs). Subsequently, the photocatalytic performances of the obtained nanosystems in the decomposition of methylene blue solution are discussed. The obtained results show that the dispersion of Au nanoparticles on the mesoporous TiO2 matrix will help enhancing the photocatalytic activity with respect to pure TiO₂ under visible light irradiation.     

Rapid erasing of wettability patterns based on TiO2-PDMS composite films

TiO₂-polydimethylsiloxane (TiO₂-PDMS) composite films are prepared using the sol–gel method from a Ti(OBu)₄–benzoylacetone solution containing PDMS. The prepared films are cured by irradiation with ultraviolet (UV) light. Structural changes in the films after UV irradiation are confirmed by UV–vis absorption experiments, which show that an absorption band characteristic of the benzoylacetonate chelate rings disappears. This finding is ascribed to structural changes associated with the dissociation of the chelate rings. The IR spectra of the thin films exhibit a broad absorption band after UV irradiation, indicating that a Ti–O–Ti network forms in the thin film. Contact angles are measured for the TiO₂-PDMS thin films, showing wettability conversion from hydrophobic to superhydrophilic states by irradiation with oxygen plasma for 1 s. This phenomenon is explained by XPS experiments which reveal that the number of carbon atoms decreases, whereas the number of oxygen atoms increases on the surface of the TiO₂-PDMS composite films. Finally, hydrophobic–superhydrophilic patterns are fabricated based on a patterned TiO₂-PDMS composite film. The film displays a rapid change to superhydrophilicity over the whole film surface upon plasma irradiation for 1 s, which means that the wettability patterns are rapidly erasable.     

Influence of metal plasma ion implantation on photo-sensitivity of anatase TiO2 thin films

Nano-scale TiO₂ thin films were synthesized by using sol-gel and spin-coating techniques on glass substrates for photo-catalytic applications. The Ti(IV) butoxide-based TiO₂ thin films were optimized for transforming into the high-purity crystalline anatase phase when calcined at 500 °C. To further enhance the photo-catalysis sensitivity of TiO₂ thin films for use in visible light environments, a metal plasma ion implantation process was implemented to modify the band gap electron configuration of Ti. Various transition metal atoms such as Ni, Cu, V, and Fe were ionized and accelerated at 20 keV to impinge on the surface of TiO₂ substrates at a dosage of 5 × 10¹⁵ ions/cm². ESCA analysis confirmed the binding energy shift of Ti by 0.8-1.2 eV, which accounted for the increased effective positive charge of Ti, resulting in more effective electron trapping capability and, thus, the electron-hole pair separation. In addition, the absorption spectroscopy demonstrated that optical absorption in the visible light regime occurred in specimens implanted with transition metal ions, likely due to the formation of extra impurity energy levels within the original TiO₂ band gap energy structure. Among all tested implant materials, the band gap energy of TiO₂ was effectively reduced by Cu and Fe ion implantation by 0.9-1.0 eV, which was sufficient enough to excite valence electrons over the band gap in visible light environments. The feasibility of the metal-doped TiO₂ thin films for effective applications under visible light irradiation was further confirmed by using super-hydrophilicity contact-angle measurement.     

Oxidation behavior of sputter-deposited Ti–Ni thin films at elevated temperatures

The isothermal oxidation kinetics of sputter-deposited equiatomic Ti–Ni thin films in pure oxygen from 823 to 923 K is studied using thermo-gravimetric analysis. The structure, composition-depth distribution and surface morphology of oxidized Ti–Ni thin films are investigated by X-ray diffraction (XRD), Auger electron spectroscopy (AES) and atomic force microscope (AFM), respectively. The results show that the oxidation kinetics of Ti–Ni thin films obeys a near-parabolic law. TiO₂, TiNi₃ and parent B2 phase are the compositions of oxidized Ti–Ni thin films. A double-layered scale including the outermost layer and the Ni-rich layer is formed outside the B2 matrix of oxidized Ti–Ni thin films. Moreover, thermal oxidation induces a surface smoothening of Ti–Ni thin films and surface roughness of oxidized Ti–Ni films decreases with the increasing oxidation temperature.     

Influence of annealing on the structure and stoichiometry of europium-doped titanium dioxide thin films

This work presents the influence of annealing on the structure and stoichiometry of europium (Eu)-doped titanium dioxide (TiO₂). Thin films were fabricated by magnetron sputtering from a metallic Ti-Eu target in oxygen atmosphere and deposited on silicon and SiO₂ substrates. After deposition the selected samples were additionally annealed in air up to 1070 K.Film properties were examined by means of X-ray diffraction (XRD), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) and the results were analyzed together with the undoped TiO₂ thin films prepared under similar technological conditions.XRD results showed that depending on the Eu content, as-deposited thin films consisted of the TiO₂-anatase or TiO₂-rutile.An additional annealing will result in the growth of anatase crystals up to 35 nm, but anatase to rutile phase transformation has not been recorded. AFM images display high quality and a dense nanocrystalline structure. From the XPS Ti2p spectra the 4+oxidation state of Ti was confirmed. The O1s XPS spectra displayed the presence of an O²⁻ photoelectron peak accompanied by an additional broader peak that originates from hydroxyl species chemisorbed at the sample surface. It has been found that Eu dopant increases the OH⁻ content on the surface of prepared TiO₂:Eu thin films. The calculated O/Ti ratio was in the range of 1.85-2.04 depending on the sample.     

Structural,morphological and photocatalytic characterisations of Ag-coated anatase TiO2 fabricated by the sol–gel dip-coating method

This study reports on the synthesis, characterisation and environmental applications of immobilised Titanium dioxide (TiO₂) as photocatalyst. Nanostructured thin films have been prepared on glass substrates using a layer-by-layer dip-coating method. The crystalline phase and surface morphology of the thin films were investigated by X-ray diffraction (XRD) pattern and scanning electron microscopy (SEM), respectively. The XRD results show that the TiO₂ thin films crystallise in anatase phase and we have found that the thin films consist of titanium dioxide nanocrystals. SEM shows that the nanoparticles are sintered together to form a compact structure and TiO₂ particles coated with silver nanoclusters were observed. Ag-coated TiO₂ films demonstrated photocatalysis performance when irradiated, and the Ag carrier further showed an electron-scavenging ability to mitigate electron–hole pair recombination, which can improve the photocatalytic efficiency. With the oxidisation and electron-scavenging ability of Ag and the photocatalysis ability of TiO₂, Ag-coated TiO₂ can decolour methyl orange (MO) more than bare TiO₂. It is a new approach to form Ag-coated TiO₂ nanoparticles with a simple system and non-toxic materials. The high photocatalytic effect of Ag-coated TiO₂ nanoparticles on pollutant (MO) suggests that it may have a promising future for water and wastewater treatments.     

Gas sensing mechanism of TiO2-based thin films

Two classes of thin film gas sensors have been studied: TiO₂ doped with Cr or Nb and TiO₂-SnO₂ mixed systems. Thin films have been prepared by the reactive sputtering from mosaic targets. It is demonstrated that titanium dioxide doped with Nb and Cr should be considered as a bulk sensor. Its performance is governed by the diffusion of point defects, i.e. very slow diffusion of Ti vacancies for TiO₂: 9.5 at% of Nb and fast diffusion of oxygen vacancies in the case of TiO₂: 2.5 at% Cr sensor. The corresponding response times are 55 min for TiO₂: 9.5 at% of Nb and 20 s for TiO₂: 2.5 at% Cr. In turn, sensors based on TiO₂-SnO₂, particularly those of the SnO₂-rich composition, belong to the group of surface sensors.     

Visible light enhanced TiO2 thin film bilayer dye sensitized solar cells

Visible light enhanced nitrogen-sulfur (N-S) doped titanium dioxide (TiO₂) thin films were prepared by the sol-gel method using thiourea as a dopant. The physical and chemical properties of the TiO₂ thin films were greatly influenced by the amount of thiourea added to the sol-gel solution. The greatest shift to longer wavelengths for visible light absorption was observed with 0.6 g of thiourea in the precursor solution, while 0.4 g yielded the largest particle sizes. These single-cycle dip-deposited N-S doped TiO₂ thin films were used as visible light harvesters as well as blocking layers in dye sensitized solar cells. When deposited directly on conducting fluorine doped tin oxide electrodes, photo-conversion efficiencies were reduced. However, the opposite configuration, with N-S doped thin films on top of nanoporous TiO₂, yielded an increased open-circuit voltage of 0.84 V, a short-circuit current density of 9.86 mA cm⁻², and an overall conversion efficiency of 5.88% greater than that of a standard cell. The effectiveness of the blocking layer on the cell efficiencies was analyzed by electrochemical impedance spectroscopy.     

Hydrothermal growth of rutile TiO2 nanorod films on titanium substrates

Rutile TiO₂ nanorod films have been successfully prepared on titanium substrate via a hydrothermal method using Tetra-n-butyl titanate as Ti source in the presence of concentrated hydrochloric acid. The effect of Ti substrate annealing treatment and adding of additional alkali metal chlorides in hydrothermal solution on the growth of TiO₂ nanorod films has been studied using scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and water contact angle measurement. The growth mechanism of the TiO₂ nanorods on Ti substrate has also been discussed. It has shown that the initial rutile film transformed from anatase promotes the nucleation and epitaxial growth of rutile TiO₂ nanorods. The superior wettabilities of the TiO₂ nanorods resulted from treatments of vacuum and ultraviolet show great potential for applications in orthopaedic, dental implants, and possible photocatalysis.     

Optical and electrical properties of TiOx thin films deposited by electron beam evaporation

The TiO_x thin films were prepared by electron beam evaporation using TiO as the starting material. The effect of the annealing temperature on the optical and electrical properties was investigated. The spectra of X-ray photoelectron spectroscopy reveal that Ti in the films mainly exist in the forms of Ti²⁺ and Ti³⁺ below 400 °C 24 h annealing. The charge transfer between different titanium ion contribute greatly to the color, absorption, and electrical resistance of the films.     

Synthesis and characterization of beta barium borate thin films obtained from the BaO-B2O3-TiO2 ternary system

This work reports on the synthesis and the structural and optical characterization of beta barium borate (β-BBO) thin films containing 4, 8 and 16 mol% of titanium oxide (TiO₂) deposited on fused silica and silicon (0 0 1) substrates using the polymeric precursor method. The thin films were characterized by X-ray diffraction, Raman spectroscopy, atomic force microscopy and scanning electron microscopy techniques. The optical transmission spectra of the thin films were measured over a wavelength range of 800-200 nm. A decrease was observed in the band gap energy as the TiO₂ content was raised to 16 mol%. Only the β-BBO phase with a preferential orientation in the (0 0 l) direction was obtained in the sample containing 4 mol% of TiO₂ and crystallized at 650 °C for 2 h.     

Surface properties of doped and undoped TiO2 thin films deposited by magnetron sputtering

In this work, transparent titanium dioxide (TiO₂) thin films were deposited onto microscope glass slides by means of the d.c. reactive magnetron sputtering method. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), UV-visible spectroscopy (UV) and contact angle analysis using the Owens-Wendt method for the surface energy calculation. The photocatalytic activity of the films was tested by measuring the photodegradation of Rhodamine-B (RhB) dye under radiation of UV light. Iron-doped TiO₂ films were also prepared in order to study the Fe-doping effect on TiO₂ photocatalytic activity. The influences of different iron concentrations on the contact angle of the series of Fe-doped TiO₂ thin films, were investigated. The influences of total sputtering pressures on TiO₂ photocatalytic activity were also investigated. It was observed that the photocatalytic activity of the TiO₂ thin films was slightly improved by increasing the total sputtering pressure. Moreover, it was also observed that in general, iron-doping was detrimental for photocatalytic activity, nevertheless the films with low iron concentrations showed better photocatalytic activity than those with high iron concentrations. It was found that iron-doping has changed the wettability appetency of TiO₂ coated surfaces.     

Preparation of anatase TiO2 thin films by vacuum arc plasma evaporation

Anatase titanium dioxide (TiO₂) thin films with high photocatalytic activity have been prepared with deposition rates as high as 16 nm/min by a newly developed vacuum arc plasma evaporation (VAPE) method using sintered TiO₂ pellets as the source material. Highly transparent TiO₂ thin films prepared at substrate temperatures from room temperature to 400 °C exhibited photocatalytic activity, regardless whether oxygen (O₂) gas was introduced during the VAPE deposition. The highest photocatalytic activity and photo-induced hydrophilicity were obtained in anatase TiO₂ thin films prepared at 300 °C, which correlated to the best crystallinity of the films, as evidenced from X-ray diffraction. In addition, a transparent and conductive anatase TiO₂ thin film with a resistivity of 2.6 × 10^− 1 Ω cm was prepared at a substrate temperature of 400 °C without the introduction of O₂ gas.     

Absorbing TiOx thin film enabling laser welding of polyurethane membranes and polyamide fibers

We report on the optical properties of thin titanium suboxide (TiO_x) films for applications in laser transmission welding of polymers. Non-absorbing fibers were coated with TiO_x coatings by reactive magnetron sputtering. Plasma process parameters influencing the chemical composition and morphology of the deposited thin films were investigated in order to optimize their absorption properties. Optical absorption spectroscopy showed that the oxygen content of the TiO_x coatings is the main parameter influencing the optical absorbance. Overtreatment (high power plasma input) of the fiber surface leads to high surface roughness and loss of mechanical stability of the fiber. The study shows that thin substoichiometric TiO_x films enable the welding of very thin polyurethane membranes and polyamide fibers with improved adhesion properties.     

Phase transformation in semi-transparent TiO2 films irradiated with CO2 laser

Anatase (TiO₂) thin films were obtained by immersion of glass plates into a titanium sol-gel precursor followed by calcination at 450 °C for 3 h. The Raman results for the CO₂ laser irradiated TiO₂ films show that laser radiation is able to promote favorable changes of anatase phase in anatase/rutile mixtures. Nevertheless, the transformation process level depends on laser characteristics and scan speed of the radiation treatment.