Effect of Ga doping on micro/structural, electrical and optical properties of pulsed laser deposited ZnO thin films

Undoped and Ga doped ZnO thin films (1% GZO, 3% GZO and 5% GZO) were grown on c-Al₂O₃ substrates using the 1, 3 and 5 at. wt.% Ga doped ZnO targets by pulsed laser deposition. X-ray diffraction studies revealed that highly c-axis oriented, single phase, undoped and Ga doped ZnO thin films with wurtzite structure were deposited. Micro-Raman scattering analysis showed that Ga doping introduces defects in the host lattice. The E₂^High mode of ZnO in Ga doped ZnO thin film was observed to shift to higher wavenumber indicating the presence of residual compressive stress. Appearance of the normally Raman inactive B₁ modes (B₁^Low, 2B₁^Low and B₁^High) due to breaking of local translational symmetry, also indicated that defects were introduced into the host lattice due to Ga incorporation. Band gap of the Ga doped ZnO thin films was observed to shift to higher energy with the increase in doping concentration and is explicated by the Burstein-Moss effect. Electrical resistivity measurements of the undoped and GZO thin films in the temperature range 50 to 300 K revealed the metal to semiconductor transition for 3 and 5% GZO thin films.     

Very high temperature chemical vapor deposition of new carbon thin films using organic semiconductor molecular beam sources

We carried out the preparation and characterization of new carbon films deposited using an organic molecular beam deposition apparatus with very high substrate temperature (from room temperature to 2670 K), which we newly developed. When we irradiated molecular beam of organic semiconductor perylene tetracarboxylic acid dianhydride (PTCDA) on Y_0.07Zr_0.93O₂ (111) at 2170 K, a new carbon material was formed via decomposition and fusing of the molecules. The films were characterized with an atomic force microscope (AFM), Raman spectroscopy, X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Zirconium carbide (ZrC) films were identified beneath the topmost carbon layer by XRD and XPS analyses, which results from chemical reactions of the substrate and the molecules. Partially graphitized aromatic rings of PTCDA were observed from Raman spectroscopy. The present technique – very high temperature chemical vapor deposition using organic semiconductor sources – will be useful to study a vast unexplored field of covalent carbon solids.     

Structural and functional properties of Al:ZnO thin films grown by Pulsed Laser Deposition at room temperature

Current research on transparent conductive oxides (TCOs) is focusing on indium-free TCOs, such as Al-doped ZnO (AZO), as an alternative to indium-tin oxide. In this work, AZO thin films were grown by Pulsed Laser Deposition at room temperature in oxygen atmosphere. The O₂ pressure was varied from 0.01 Pa to 10 Pa, highlighting the effects of defect formation and oxygen vacancies on the film properties. Structural properties were characterized by X-ray diffraction and Scanning Electron Microscopy, while functional properties were characterized by measurement of electrical conductivity, Hall mobility, carrier density and optical transmission. At an optimal deposition pressure of 2 Pa, optical transparency in the visible range and minimum resistivity (4.5 ? 10^− 4 Ω cm) were found, comparable to state-of-the-art TCOs. Mean value of visible transparency was shown to increase with increasing pressure, up to 88% at a deposition pressure of 10 Pa.     

Annealing effects on the structural, electrical and H2 sensing properties of transparent ZnO thin films, grown by pulsed laser deposition

Transparent zinc oxide thin films were grown by reactive pulsed laser deposition on glass substrates. The substrates were kept at 200 °C constant temperature. Post-deposition heat treatment, applied to further promote crystallization and overcome any oxygen deficiency, yielded transparent thin films. Structural investigations carried out by atomic force microscopy (AFM) and X-ray diffraction (XRD), have shown a strong influence of deposition technique parameters and post-annealing on the crystallinity of the zinc oxide films. The gas sensing characteristics of these films were investigated towards different hydrogen concentrations (5000-30,000 ppm) at a selected operating temperature within the 150-230 °C range.     

改性金刚石膜的形貌、结构和附着性能

为了提高金刚石膜/基附着力,通过氧辅助使高温钨丝蒸发,在基底表面与碳氢基团反应生成纳米碳化钨,从而得到金刚石和纳米碳化钨混合的改性金刚石膜.用扫描电子显微镜、X射线衍射仪和压痕法研究了改性金刚石膜的形貌、结构和附着力性能.结果表明,碳钨化合物以纳米相存在于改性金刚石膜中.碳钨化合物的存在使改性金刚石膜的硬度下降,但是适当的碳钨化合物能使膜/基附着力性能得到较大提高.当氧气通入量为1.2sccm时,膜/基附着力性能最好.     

Enhancement of the dielectric properties of Pb(La,Ti)O3 thin films fabricated by pulsed laser deposition

PLT thin films with a thickness of 600 nm were grown by pulsed laser deposition (PLD) using different laser wavelengths of 355, 532 and 1064 nm, respectively. We have systematically investigated the variation of grain sizes depending on the process condition. A two-step process to grow (Pb_0.72La_0.28)Ti_0.93O₃ (PLT) films was adopted and verified to be useful to enlarge the grain size of the film and to enhance leakage current characteristics. Structural and electrical properties including dielectric constant, ferroelectric characteristics, and leakage current of PLT thin films were shown to be strongly influenced by grain size.     

Experimental studies of O2-SnO2 surface interaction using powder, thick films and monocrystalline thin films

Surface properties of solids and the interactions between molecules and solid surfaces are important for many technical applications. They also involve a range of physical and chemical phenomena of fundamental scientific interest. The importance of oxygen chemistry at SnO₂ surfaces follows from the fact that SnO₂ is used as an active material in gas sensor applications. The operation principle of these sensors is usually based on measurable conductance response of the material, which is understood in terms of reactions of gas molecules with different oxygen species adsorbed onto the surface. The role of the lattice oxygen, but in particular, the bridging oxygen atoms on SnO₂ surfaces, is also active. Detailed understanding of the reaction mechanisms of various oxygen species at SnO₂ surfaces is important, as it offers a way to improve the sensitivity and selectivity of the sensors.Oxygen adsorption-desorption kinetics at the SnO₂ surface is studied experimentally using O₂-temperature-programmed desorption (TPD) method together with conductance measurements in the case of SnO₂ powder and polycrystalline thick films made from the powder. In addition, CO-TPD is studied and the transient behaviour of various oxygen species is considered. Molecular beam epitaxy (MBE) was also used to fabricate polycrystalline and monocrystalline thin films with the SnO₂(101) face on single crystal sapphire substrate. Simultaneous surface potential and conductance measurements during heating and cooling in different ambient atmospheres were used to characterize the monocrystalline SnO₂(101) surface after various surface treatments.     

Characterization of organic thin films using transmission electron microscopy and Fourier Transform Infra Red spectroscopy

Organic Light Emitting Diodes (OLEDs) have received much attention for use in display and solid-state lighting applications. Consequently, evaluating materials analyses techniques to better understand potential issues between the different films constituting the OLED device structure becomes important. In particular, film thickness monitoring and control is essential for reproducible and reliable OLED performance. Typically, Quartz Crystal Microbalances (QCMs) are used to monitor the thicknesses in-situ. While QCMs can provide thickness information, they do not provide information about the composition or quality of the deposited films. To overcome these issues, in this paper, we have used Fourier Transform InfraRed Spectroscopy (FT-IR) to measure film thicknesses and compositions in individual as well as stacked organic layers relevant to OLED structures and used cross-sectional Transmission Electron Microscopy imaging to correlate the physical thickness of the organic films to their IR (infrared) absorption peak intensities from FT-IR. We demonstrate that this technique can be used to precisely measure film thicknesses within 5% of the nominal thickness and provide information about film composition.     

Deposition and structural properties of RF magnetron-sputtered ZnO thin films on Pt/Ti/SiNx/Si substrate for FBAR device

This work investigates high-quality bottom electrode and piezoelectric film used in a thin-film bulk acoustic resonator (TFBAR) device. The titanium (Ti) seeding layer and platinum (Pt) bottom electrode were deposited on silicon substrates by DC sputtering using a dual-gun system. Zinc oxide (ZnO) was then deposited onto the Pt bottom electrode by RF magnetron sputtering. Field-emission scanning electron microscopy (SEM), atom force microscopy (AFM) and the four-point probe method showed that the Pt bottom electrode deposited on the Ti seeding layer exhibited favorable characteristics, such as a crystallite size of less than 10 nm, a surface roughness of 0.69 nm and a sheet resistance of 2.27 Ω/□. The ZnO thin film with a highly c-axis-preferred orientation (FWHM = 0.28°) and a roughness of 6.22 nm was investigated by X-ray diffraction (XRD) and AFM analysis, respectively. The bottom electrode with a low resistance and the highly crystalline ZnO thin film will contribute significantly to the favorable characteristics of the FBAR devices.     

Synthesis and characterization of mesoporous silica thin films as a catalyst support on a titanium substrate

Mesoporous silica films with a thickness of 500-900 nm were synthesized on a titanium substrate by the evaporation-induced self-assembly method (with 900-1200 rpm for 90 s) using cetyltrimethylammonium bromide (CTAB) as structure-directing agent and tetraethyl orthosilicate as the silica source. Prior to coating deposition, the titanium substrate was oxidized to increase the surface roughness up to 500 nm and to produce a thin titania layer. Just before the synthesis, the titania layer was made super hydrophilic by an UV treatment for 2 h to provide a better adhesion of the silica film to the substrate. Films with hexagonal and cubic mesostructures with a uniform pore size of 2.8 nm and a surface area of 1080 m²/g were obtained and characterized by different methods. An alternative approach for surfactant removal by gradual heating up to 250 °C in vacuum was applied. Complete removal of CTAB from the as-synthesized silica films was confirmed by infrared spectroscopy.     

Preparation of CuInSe2 thin films through metal organic chemical vapor deposition method by using di-μ-methylselenobis(dimethylindium) and bis(ethylisobutyrylacetato) copper(II) precursors

Highly polycrystalline copper indium diselenide (CuInSe₂) thin films on molybdenum substrate were successfully grown at 330 °C through two-stage metal organic chemical vapor deposition (MOCVD) method by using two precursors at relatively mild conditions. First, phase pure InSe thin film was prepared on molybdenum substrate by using a single-source precursor, di-μ-methylselenobis(dimethylindium). Second, on this InSe/Mo film, bis(ethylisobutyrylacetato) copper(II) designated as Cu(eiac)₂ was treated by MOCVD to produce CuInSe₂ films. The thickness and stoichiometry of the product films were found to be easily controlled in this method by adjusting the process conditions. Also, there were no appreciable amounts of carbon and oxygen impurities in the prepared copper indium diselenide films.     

Synthesis and structure characterization of low dielectric constant MSQ films by using octamethyl cyclotetrasiloxane (D4) as a porosity promotion agent

Low dielectric methylsilsesquioxane (MSQ) film can be synthesized by spin-coating on P–Si (100) wafer. Octamethyl cyclotetrasiloxane (D4) was used as a porosity promotion agent to MSQ film. Seven samples with different treatment were prepared. The dielectric constants of these MSQ films significantly lowered from 3.0 to 2.1. Fourier transform infrared spectroscopy was used to identify the Si–O–Si network structure, Si–O–Si cage structure and other bonds. The change of structure resulted in significant lowering of the dielectric constant (k). The capacitance–voltage (C–V) characteristic by HP4294A was used to determine the dielectric constant. Current–voltage (I–V) measurement by Keithley6517A was used to determine the breakdown electric field.     

并五苯薄膜的AFM及XRD研究

报道了以热氧化硅片为衬底,用溶液溶解和真空蒸镀两种方法制备有机半导体材料并五苯薄膜.用原子力显微镜(AFM)分析了薄膜的形貌,用X射线衍射仪(XRD)分析了薄膜的晶体结构,讨论了诸多因素对薄膜的影响以及两种方法制备的并五苯薄膜的相结构.     

The preparation and characterization of preferred (110) orientation aluminum nitride thin films on Si (100) substrates by pulsed laser deposition

The preferred (110) oriented aluminum nitride (AlN) thin films have been prepared by pulsed laser deposition on p-Si (100) substrates. The films were characterized with X-ray diffraction, Raman spectroscopy, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and atomic force microscope (AFM). The results indicate that the AlN thin films are well-crystallized when laser energy is higher than 300 mJ/puls. The AFM images show that the surface roughness of the deposited AlN thin films gradually increases with increasing laser energy, but the surface morphologies are still very smooth. The crystallinity and morphology of the thin films are found to be strongly dependent on the laser energy.     

Comparative study of sputtered and electrodeposited CI(S,Se) and CIGSe thin films

Copper indium disulphide CuInS₂ (CIS) and diselenide CuInSe₂ (CISe) and their alloys with gallium CuIn_1 − xGa_xSe₂ (CIGSe) thin films have been prepared using both high- and non-vacuum processes. The well known two-stage process consisting in a sequential sputtering of Cu and In thin layers and a subsequent sulfurisation has led to the formation of good quality CuInS₂ ternary compound. The films exhibit the well known chalcopyrite structure with a preferential orientation in the (112) plane suitable for the production of the efficient solar cells. The absorption coefficient of the films is higher than 10⁴ cm^− 1 and the band gap value is about 1.43 eV. A non-vacuum technique was also used. It consists on a one step electrodeposition of Cu, In and Se and in a second time Cu, In, Se and Ga. From the morphological and structural point of view, the films obtained are similar to those prepared by the first technique. The band gap value increases up from 1 eV for the CIS films to 1.26 eV for the CuIn_1 − xGa_xSe₂ with 0 < x < 0.23. The resistivity at room temperature of the films was adjusted to 10 Ωcm after annealing. The films exhibit an absorption coefficient more than 10⁵ cm^− 1. The most important conclusion of this study is the interesting potential of electrodeposition as a promising option in low-cost CISe and CIGSe thin film based solar cells processing.     

Investigation on structural, electrical and optical properties of tungsten-doped tin oxide thin films

Tungsten-doped tin oxide (SnO₂:W) transparent conductive films were prepared on quartz substrates by pulsed plasma deposition method with a post-annealing. The structure, chemical states, electrical and optical properties of the films have been investigated with tungsten-doping content and annealing temperature. The lowest resistivity of 6.67 × 10^− 4 Ω cm was obtained, with carrier mobility of 65 cm² V^− 1 s^− 1 and carrier concentration of 1.44 × 10²⁰ cm^− 3 in 3 wt.% tungsten-doping films annealed at 800 °C in air. The average optical transmittance achieves 86% in the visible region, and approximately 85% in near-infrared region, with the optical band gap ranging from 4.05 eV to 4.22 eV.     

Variation of the key structural,morphological, and optical properties of nanostructured copper(II) oxide (CuO) thin films using surfactant CAPB as a capping agent

Journal of Materials Science: Materials in Electronics - In this study, copper(II) oxide thin-film samples were fabricated by the SILAR technique in the absence and presence of surfactant as a...     

Infrared and ultraviolet-visible spectroscopic studies of plasma polymerized 1, 1, 3, 3 - tetramethoxypropane thin films

Plasma polymerized 1, 1, 3, 3-tetramethoxy-propane (PPTMP) thin films of different thicknesses were prepared through glow discharge of 1, 1, 3, 3-tetramethoxypropane using a capacitively coupled reactor. The scanning electron micrographs show that as-deposited PPTMP thin films are smooth, uniform and pinhole free. Infrared spectroscopic investigation indicates the formation of conjugation along with C = O bonds in as deposited PPTMP thin films. Apart from aliphatic conjugation of C = C and C = O bonds there is formation of C-O-C bond owing to rearrangement of oxygen due to heat treatment of PPTMP thin films. A red shift in the maximum absorption wavelength of the ultra violet-visible spectra for all the PPTMP thin films is observed compared to the monomer maximum absorption wavelength. The absorption coefficient, allowed direct transition, E_qd, allowed indirect transition and E_qi, energy gaps were determined. The E_qd and E_qi are found to be about 2.92 to 3.16 eV and 0.80 to 1.53 eV respectively, for as deposited PPTMP samples of different thicknesses. The E_qi of two samples of different thicknesses heat treated at 673 K for 1 hour is 0.55 and 0.65 eV .     

On the optical, structural, and morphological properties of ZrO2 and TiO2 dip-coated thin films supported on glass substrates

This article reports the optical and morphological properties of dip-coated TiO₂ and ZrO₂ thin films on soda-lime glass substrates by metal-organic decomposition (MOD) of titanium^IV and zirconium^IV acetylacetonates respectively. Thermogravimetric and differential thermal analysis (DTA–TG) were performed on the precursor powders, indicating pure TiO₂ anatase and tetragonal ZrO₂ phase formation. Phase crystallization processes took place in the range of 300–500 °C for anatase and of 410–500 °C for ZrO₂. Fourier Transform Infrared Spectroscopy (FT-IR) was used to confirm precursor bidentate ligand formation with keno-enolic equilibrium character. Deposited films were heated at different temperatures, and their structural, optical and morphological properties were studied by grazing-incidence X-ray Diffraction (GIXRD) and X-Ray Photoelectron Spectroscopy (XPS), Ultraviolet Visible Spectroscopy (UV-Vis), and Atomic Force Microscopy (AFM) respectively. Film thinning and crystalline phase formation were enhanced with increasing temperature upon chelate decomposition. The optimum annealing temperature for both pure anatase TiO₂ and tetragonal ZrO₂ thin films was found to be 500 °C since solid volume fraction increased with temperature and film refractive index values approached those of pure anatase and tetragonal zirconia. Conditions for clean stoichiometric film formation with an average roughness value of 2 nm are discussed in terms of material binding energies indicated by XPS analyses, refractive index and solid volume fraction obtained indirectly by UV-Vis spectra, and crystalline peak identification provided by GIXRD.     

Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane,nitrogen and hydrogen

Carbon nitride (CN_x) thin films were deposited using radio frequency plasma enhanced chemical vapor deposition (rf PECVD) from a mixture of ethane (C₂H₆), nitrogen (N₂) and hydrogen (H₂) gases. The C₂H₆ and N₂ flow rates were kept constant, while the H₂ flow rate was varied. The effects of hydrogen dilution on the growth rate and structural properties of the films were studied. It was found that a significant increase in the films growth rate was observed with the introduction of H₂ at as low as 25 standard cubic centimeters per minute (sccm). A set of CN_x films deposited from C₂H₆:N₂ mixture without any inclusions of H₂ were also presented in this work as a reference to compare the differences between those two sets and to understand the roles of H₂ to the films properties. At highest H₂ flow rate, the structure of the films changed from polymeric to graphitic and the quenching of PL was observed. Furthermore, higher N incorporation with lower E_g was obtained for these films compared to those of C₂H₆:N₂ films. The change in the structure of the films corresponds to changes in their chemical bonding. As N incorporation increased, the porosity of the films increases and thus affects the disorder in the film structures.