金属陶瓷多弧离子镀TiN/TiAlN涂层的结构与性能

采用多弧离子镀技术在Ti(C,N)基金属陶瓷基体上沉积了TiN/TiAlN涂层,通过扫描电镜、能谱仪、X射线衍射仪、原子力显微镜等分析技术对其显微组织、成分、相结构、粗糙度及涂层与基体间的结合强度进行了分析.结果表明,多弧离子镀TiN/TiAlN涂层后试样的表面为金黄色,涂层光滑平整,其均方根粗糙度为20.6 nm,显微硬度达到2808 HK.TiN相和TiAlN相均存在强烈的(111)择优取向.Al的含量从涂层内部到表面逐渐增大,呈现梯度分布特征.TiN/TiAlN涂层与金属陶瓷之间的结合强度高达57.52 N.     

金属陶瓷多弧离子镀TiN／TiAlN涂层的结构与性能

采用多弧离子镀技术在Ti（C，N）基金属陶瓷基体上沉积了TiN／TiAlN涂层，通过扫描电镜、能谱仪、X射线衍射仪、原子力显微镜等分析技术对其显微组织、成分、相结构、粗糙度及涂层与基体间的结合强度进行了分析。结果表明，多弧离子镀TiN／TiAlN涂层后试样的表面为金黄色，涂层光滑平整，其均方根粗糙度为20．6nm，显微硬度达到2808HK。TiN相和TiAlN相均存在强烈的（111）择优取向。Al的含量从涂层内部到表面逐渐增大，呈现梯度分布特征。TiN／TiAlN涂层与金属陶瓷之间的结合强度高达57．52N。     

深冷处理对TiN涂层硬质合金力学性能的影响

采用电弧离子镀技术在YW2硬质合金基体上沉积了厚度为2μm的TiN涂层,对所获得的TiN/YW2体系进行了-196℃下30 h的深冷处理。采用X射线衍射仪(XRD)和显微硬度仪分别对深冷前后TiN涂层的相结构和硬度进行了检测,利用洛氏硬度仪采用压痕法研究了深冷处理前后YW2基体和TiN/YW2体系压痕形貌的变化,借助金相显微镜和扫描电镜(SEM)研究了基体显微组织及其对体系断裂韧性、界面结合状况的影响。结果表明:深冷处理后涂层中应力诱导晶粒扭转导致的TiN(111)面择优取向,使体系的硬度得到了提高。基体上压痕径向放射性裂纹密度明显降低,TiN涂层沿压痕周向的块状剥离得到缓解。深冷处理后弥散分布的颗粒状γ相显著减少或消失、孔隙率降低,组织变得更加致密,加之深冷处理过程中裂纹源的弥合,提高了YW2基体和TiN/YW2体系的断裂韧性和界面结合强度。     

多层结构对Ti/TiN涂层性能的影响（英文）

以TiN、TiAlN为主的过渡族金属氮化物硬质涂层以其较高的表面硬度、良好的耐磨以及抗高温氧化性能,被广泛应用于材料表面防护涂层。然而,涂层内部积聚的高内应力却容易引发涂层与基体的结合力问题。利用PVD技术很难在材料表面制备出厚度超过10μm的TiN或TiAlN涂层。多层复合结构能够有效控制涂层中的应力分布,从而使得其成为获得较厚硬质涂层的一种有效方法。本工作在TC4合金以及Si(100)基体上利用等离子增强离子镀技术制备了具有不同复合层数的多层Ti/TiN涂层,并研究了复合层数对涂层力学性能的影响。结果表明,随着复合层数的增加,涂层的各项力学性能得到了显著强化。涂层的显微硬度HV0.25高达27500 MPa,厚度大于50μm,且具有较好的韧性。涂层的韧性与显微硬度成正比例关系。同时,48层复合结构的Ti/TiN涂层具有低于0.35的摩擦系数以及最佳的抗磨损性能。然而,随着复合层数的进一步增加,涂层与基体的界面结合强度显著弱化。     

激光原位合成TiN/Ti_3Al基复合涂层

利用Ti与AlN之间的高温化学反应,在TC4钛合金表面激光原位合成了TiN/Ti3Al基金属间化合物复合涂层.借助XRD和SEM分析了涂层的物相组成和显微组织.结果表明,涂层主要由TiN和Ti3Al组成.当Ti与AlN摩尔比为4:2时,涂层中TiN含量随激光功率密度的增大而减小;Ti与AIN摩尔比为4:1时,TiN含量随激光功率密度的增大而增大.TiN增强相点阵常数的精确计算显示,涂层中TiN相出现晶格畸变现象,结合EDS分析表明,TiN固溶的Al含量随功率密度的增加而减小.SEM分析表明,TiN增强体的生长形态随着激光功率密度的增大由棒状逐渐向颗粒状转变.当Ti与AlN的摩尔比为4:1,激光功率密度为15.28 kW·s·cm~(-2)时,涂层表面的宏观形貌较好,微观组织无气孔和裂纹,试样截面显微硬度自基体至涂层表面变化平缓,涂层平均显微硬度达到844 HV_(0.2),约为基体合金的3.4倍.     

多层结构对Ti/TiN涂层性能的影响

以TiN、TiAlN为主的过渡族金属氮化物硬质涂层以其较高的表面硬度、良好的耐磨以及抗高温氧化性能,被广泛应用于材料表面防护涂层。然而,涂层内部积聚的高内应力却容易易引发起涂层与基体的结合力问题。利用PVD技术很难在材料表面制备出厚度超过10微米的TiN或TiAlN涂层。多层复合结构能够有效控制涂层中的应力分布,从而使得其成为获得较厚硬质涂层的一种有效方法。本文在TC4合金以及Si（100）基体上利用等离子增强离子镀技术制备了具有不同复合层数的多层Ti/TiN涂层,并研究了复合层数对涂层力学性能的影响。结果表明,随着复合层数的增加,涂层的各项力学性能得到了显著强化。涂层的显微硬度高达2750HV,厚度大于50微米,且具有较好的韧性。涂层的韧性与显微硬度成正比例关系。同时,48层复合结构的Ti/TiN涂层具有低于0.35的摩擦系数以及最佳的抗磨损性能。然而,随着复合层数的进一步增加,涂层与基体的界面显著弱化了涂层的结合强度。     

偏压对TiAlN涂层微观结构、力学和摩擦学性能的影响（英文）

采用磁过滤真空阴极弧在ZL109合金表面沉积由TiAl和TiAlN组成的TiAlN多层涂层,并系统研究偏压对涂层微观结构和性能的影响。结果表明,涂层具有以TiAlN相为主的多相结构。随着偏压的增大,由于原子迁移率和晶格畸变的增加,TiAlN择优取向由(200)晶面向(111)晶面转变。同时,涂层的硬度、弹性模量和附着力表现出相同的变化趋势,即先增大后减小。当偏压为75 V时,TiAlN涂层具有最高的硬度(～30.3 GPa)、弹性模量(～229.1 GPa)、附着力(HF 2)和最低的磨损率(～4.44×10^-5 mm³/(N·m))。与未涂覆ZL109合金相比,TiAlN涂层合金表面的力学和摩擦学性能得到有效提高。     

Ti靶电流对CrTiAlN镀层组织结构及硬度的影响

利用磁控溅射技术在高速钢和单晶硅基体上沉积CrTiAlN梯度镀层,研究Ti靶电流对CrTiAlN镀层组织、相结构及硬度的影响.利用EDS、XRD和SEM分析镀层的成分、相结构及形貌,采用显微硬度计测量镀层的硬度.结果表明:随着Ti靶电流的增大,镀层中的Ti原子逐渐置换CrN中的Cr原子形成Cr-Ti-N体系,同时出现少量的TiN相;镀层生长的择优取向由(111)晶面逐渐转变为(200)晶面;镀层柱状晶的结构更为致密,其表面形貌由三棱锥结构逐步变为胞状结构;随Ti靶电流的增大,镀层硬度逐渐由1267HV升至1876HV.     

基体偏压对TiAlN涂层性能的影响

基体偏压是多弧离子镀沉积TiAlN涂层工艺中的一个重要参数,它对涂层的结构以及涂层生长速度有重要影响.通过改变沉积过程中的基体偏压,发现TiAlN涂层表面熔滴的密度和直径随基体负偏压的增加而减小,涂层的显微硬度随着基体负偏压的增加而增加,孔隙率随着基体负偏压的升高而降低.     

基材硬度和涂层厚度对AlCrN多元复合纳米硬质涂层硬度的影响

采用真空阴极多弧离子镀技术制备了Al Cr N多元复合纳米硬质涂层,利用洛氏硬度计、划痕仪、HV显微硬度计、球磨仪、扫描电子显微镜、能谱仪及X射线衍射仪检测并分析了涂层膜基结合力、显微形貌、相结构以及基体硬度、涂层厚度对涂层硬度的影响。结果表明,涂层以Al Cr N/Cr N结构沉积,随着涂层厚度的增加,膜基结合强度提高。涂层表面成波纹状,有少量大颗粒,涂层内部呈Na Cl结构,含有大量呈柱状形式生长的面心立方的c-Cr N相和c-Al N相,择优取向均为(200)。同等基体硬度时,涂层厚度的增加有利于涂层硬度的提高,最佳涂层厚度为3.5~5.0μm。同等涂层厚度时,涂层硬度随着基体硬度的增加而增加,当涂层厚度低于4.0μm,基材硬度是影响涂层塑性变形抗力的主要因素。     

氮气流量对反应磁控溅射TiN薄膜微结构与力学性能的影响

利用磁控溅射镀膜技术分别在硬质合金YG6X和单晶Si片表面制备TiN薄膜,分析N2流量对薄膜相组成、表面形貌、显微硬度和膜基结合力的影响。结果表明,N2流量对薄膜的微结构以及力学性能具有重要影响。随着N2流量的降低,TiN薄膜表面孔洞和台阶明显减少,表面平整度得到明显改善;薄膜的物相组成在N2流量为0.2sccm时为TiN和TiN0.61两相;N2流量的变化改变了薄膜表面的能量状态,因此,降低N2流量导致TiN薄膜的生长取向由(200)面向(111)面转变。同时,N2流量为2.4 sccm时TiN薄膜的膜基结合力最高,此时TiN薄膜也具有最高的显微硬度。     

Effects of titanium-implanted pre-treatments on the residual stress of TiN coatings on high-speed steel substrates

This investigation examined how titanium ion implantation pre-treatment affects the residual stress of TiN coatings on M2 high-speed steel. Ions were implanted by metal plasma ion implantation. The adhesion strength of the TiN coatings was enhanced by pre-treatment that implanted Ti into the M2 tool steel substrate. The implanted substrate functioned as a buffer layer between the deposited TiN and the tool steel substrate, resulting in variations of the residual stress. The residual stress determined by glancing-angle XRD demonstrates that the deposited TiN films on ion-implanted substrates exhibited reduced compressive stress, from − 3.95 to − 2.41 GPa, which corresponded to a decrease in the grain size of the TiN films. The texture of the TiN film was clearly transformed from the preferred orientation of (220) to (111), subsequently enhancing wear resistance against a tungsten ball.     

Interdependence between stress and texture in arc evaporated Ti-Al-N thin films

Ex-situ X-ray diffraction was used to characterize the stress state and texture of TiAlN monolayer and TiN/TiAlN multilayer hard coatings deposited on WC-Co and tool steel substrates using the cathode arc evaporation method. For all coatings the compressive residual stress was found to be higher in the film deposited on tool steel than that deposited on WC-Co; this is due to the difference in the linear thermal expansion coefficient of the two substrates. X-ray diffraction polar scan measurements showed that the preferred orientation of the crystallites exhibits cylindrical symmetry but it is inclined with respect to the sample surface. Moreover, the inclination angle of the (002) diffracting planes increases with the increase of the residual stress in the coating. Different mechanisms that could explain the interdependence between fiber texture and residual stress are discussed.     

X射线衍射分析在硬质合金涂层中的应用

硬质合金涂层刀具的性能与其内在结构密切相关,特别是涂层部分。利用X射线衍射进行硬质合金涂层性能的综合分析,可测定涂层的物相组成、涂层厚度、晶粒尺寸、残留应力以及涂层中碳的含量等等。观察其衍射图谱,对各种涂层成分如:Al2O3、TiC、TiN、η相等进行分析,探讨他们对涂层刀片性能的影响;通过衍射峰强度、强度比、D值等定性分析各物相及其定性含量,确定是否存在择优取向。X射线衍射分析是一种非破坏性的测定方法,检测快速方便,有助于生产中优化涂层工艺,提高涂层的整体加工性能,对硬质合金涂层的质量控制、机理研究和新工艺的研发均有着不可忽视的作用。     

Microstructure and properties of CVD coated Ti(C,N)-based cermets with varying WC additions

In this paper, multilayer coatings of TiN/TiCN/Al₂O₃/TiN are deposited on the Ti(C, N)-based cermets containing WC, and the effect of WC on the growth and adhesion strength as well as the mechanical properties of the coating are investigated. The multilayer coatings deposited by chemical vapor deposition (CVD) are uniform and dense. TiN coating exhibits a dense fine-grained structures and the Ti (C,N) on TiN coating shows dense columnar structure. The α-Al₂O₃ layer deposited on transition coating presents coarse grains with limited voids. The grain size of the columnar crystals deposited on the substrates gradually decreases with WC addition. The Al₂O₃ layer shows a preferred growth orientation of (104) plane. For TiN/TiCN phase, a change in orientation from (111) to (200) is observed. Generally, the (200) preferred orientation enhances and (111) preferred orientation diminishes with increasing WC addition. Strong adhesion of the CVD coating is obtained due to a sufficient amount of chemical elements, especially tungsten, diffusing from the substrate to the interfacial layer. Scratch tests show that the adhesion strength of TiN/TiCN/Al₂O₃/TiN films gradually increases firstly, and then decreases. With the addition of WC, the hardness, elastic modulus and plasticity index increase at the beginning, and then decrease. The change in nanohardness and elastic modulus is related to the grain size, elemental diffusion, and preferred orientation of the coating.     

Nano-multilayer Ti-Zr-N coating by a central configured multi-arc coating process

In this work, a novel arc ion plating (AIP) system, consisting of a centrally configured multi-arc source array (CCMA), is developed. This system is aimed to satisfy the present industrial demands for the large-scale production of multicomponent, multilayered, and superlattice coatings. The central array is made up of three flat, independently powered, arc sources. These form a triangular pillar.The newly developed CCMA AIP system is used to deposit TiN/ZrN coatings, in order to evaluate its performance. The surface hardness of the specimens is measured by micro Vickers indentation. A scratch test is used to determine the adhesive strength of the coatings. Scanning electron microscopy (SEM) is used to observe the cross-sectional morphology and to measure the film thickness. An energy dispersive spectrometer (EDS) is used to characterize film composition. The crystal structures of the coatings are characterized by an X-ray diffractometer and transmission electron microscope (TEM).The deposited coatings range from a micro- to nano-layered (TiN/ZrN) structure as the rotation speed of the substrate table was increased. Each layer exhibits a (111) preferred orientation. At rotating speeds in excess of 10 rpm, a nano-multilayered Ti(Zr)N structure is formed, again with each layer having (111) preferred orientation. At the highest rotation speeds the greatest surface hardness and film adhesion strength are attained. This is attributed to the maximized stress accommodation of the nano-multilayer structure, through the different shear elastic modulus of each layer. This research demonstrates that this novel CCMA AIP system is highly flexible in coating material design and capable of mass production.     

低模量Ti6Al4V表面Ti(Al/Pt)N薄膜强化改性

为解决硬质薄膜因与软基体硬度和模量差较大导致的薄膜失效问题,提高硬质薄膜在Ti6Al4V(TC4)钛合金基体上的适应性,使用掺杂氮化钛（TiN）陶瓷薄膜对低模量Ti6Al4V合金表面强化。采用热丝增强等离子体磁控溅射技术在Ti6Al4V合金表面制备Ti(Al/Pt)N薄膜：包括本征TiN、Al&Pt掺杂TiAlN和TiAl(Pt)N薄膜。采用扫描电子显微镜、X-射线衍射仪、纳米压痕仪、洛氏硬度计和摩擦磨损测试仪分别表征三种薄膜组织形貌、能谱分析、相结构和内应力、纳米硬度和模量及耐磨性。结果表明：Al元素掺杂使TiN薄膜柱状晶细化,截面形貌柱状晶更致密;同时微量Pt掺杂后,截面断口呈韧性撕裂。本征TiN和TiAlN薄膜衍射峰图谱呈现TiN(111)取向,TiAl(Pt)N薄膜的衍射峰呈TiN(200)主峰位。Al元素掺杂使TiN薄膜晶格畸变增多,内应力从-13 MPa增大到-115 MPa,导致膜-基结合力恶化,洛氏压痕和摩擦磨损实验中均出现薄膜剥落。Pt掺杂后薄膜内应力降低到-66 MPa,在洛氏压痕试验中TiAl(Pt)N薄膜与基体结合良好,仅有少许环形裂纹。摩擦磨损试验中本...     

TiN, TiN gradient and Ti/TiN multi-layer protective coatings on Uranium

Single-layer TiN, gradient TiN and multi-layer Ti/TiN coating were deposited on silicon and uranium substrates by means of arc ion plating technique. The main phase in the single-layer TiN coating was TiN with a (111) preferred orientation. Ti and TiN were observed in the TiN gradient coating and Ti/TiN multi-layer coatings. The single-layer TiN coating has demonstrated the best wear resistance among the three coatings. Compared with the bare U substrate, the corrosion potential E_corr of the multi-layer Ti/TiN coatings is increased by 580 mV, and the corrosion current density I_corr is decreased at least by two orders of magnitude. The multi-layer Ti/TiN coatings possessed the highest corrosion resistance among the three coating in a 0.5 μg/g Cl⁻ solution.     

等离子合成TiN渗镀层组织结构及耐蚀性研究

采用等离子合成TiN渗镀层方法,在碳钢表面形成TiN沉积层＋含TiN的扩散层组织,Ti和N原子由表及里呈梯度分布,表面是均匀、致密的TiN胞状组织,显微硬度在20 GPa～25 GPa之间;沉积层与基体之间有一扩散过渡区,结合力好,无剥落现象.X射线衍射结果表明：渗镀层表面为TiN层,(200)晶面的衍射峰最强,具有明显的择优取向.将TiN渗镀试样与不锈钢1Cr18Ni9Ti和Q235钢在1 mol/L H2SO4溶液中进行电化学腐蚀对比实验表明：TiN渗镀层的耐蚀性能比不锈钢和Q235钢基体分别提高了1.4和4.2倍. 